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1. 发明申请

US20160300690A1 Charged-Particle-Beam Device 有权
标题翻译：带电粒子束装置
公开(公告)号：US20160300690A1
公开(公告)日：2016-10-13
申请号：US15035265
申请日：2014-11-05
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Akira IKEGAMI , Hideto DOHI , Hideyuki KAZUMI , Yoichi OSE , Naomasa SUZUKI , Momoyo ENYAMA , Ryuji NISHI , Akio TAKAOKA
IPC分类号： H01J37/28 , H01J37/153 , H01J3/12 , H01J37/14
CPC分类号： H01J37/28 , H01J3/12 , H01J37/14 , H01J37/147 , H01J37/153 , H01J2237/15 , H01J2237/2611 , H01J2237/2814
摘要： Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.
摘要翻译：提供一种带电粒子束装置，其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。带电粒子束装置设有像差产生透镜，用于产生由于穿过离轴的带电粒子束造成的像差，以及校正透镜，用于使带电粒子束的轨迹会聚在物镜不管带电粒子束的能量如何。校正透镜的主表面设置在交叉位置，在该交叉位置处，具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

2. 发明申请

US20150364290A1 CHARGED PARTICLE BEAM APPLICATION DEVICE 有权
标题翻译：充电颗粒光束应用器件
公开(公告)号：US20150364290A1
公开(公告)日：2015-12-17
申请号：US14741324
申请日：2015-06-16
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Momoyo ENYAMA , Akira IKEGAMI , Hideto DOHI , Hideyuki KAZUMI , Naomasa SUZUKI
IPC分类号： H01J37/147 , H01J37/06 , H01J37/141
CPC分类号： H01J37/1478 , H01J37/153 , H01J37/28 , H01J2237/1534
摘要： The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole. The aberration generating element has such a function that when the charged particle beam is tilted relative to the sample by the tilt-use deflector, a plurality of resulting aberrations are cancelled with one another. Moreover, the first electromagnetic field superposing multipole has a function to change the orbit of a charged particle beam having energy different from that of the main charged particle beam in the charged particle beam.
摘要翻译：带电粒子束施加装置设置有带电粒子源和将由带电粒子源产生的带电粒子束会聚到样本上的物镜。在这种情况下，带电粒子束施加装置还设置有安装在带电粒子束源和物镜之间的像差产生元件，安装在像差产生元件和物镜之间的倾斜用偏转器，偏转像差控制用于控制像差产生元件的单元，安装在像差产生元件和物镜之间的第一电磁场叠加多极，以及用于控制第一电磁场叠加多极的电磁场叠加多极控制单元。像差产生元件具有这样的功能：当通过倾斜使用偏转器使带电粒子束相对于样本倾斜时，多个得到的像差彼此抵消。此外，第一电磁场叠加多极具有改变具有与带电粒子束中的主带电粒子束的能量不同的能量的带电粒子束的轨道的功能。

3. 发明申请

US20180233320A1 Charged Particle Beam Device 审中-公开
公开(公告)号：US20180233320A1
公开(公告)日：2018-08-16
申请号：US15747847
申请日：2016-07-27
申请人： Hitachi High-Technologies Corporation
发明人： Akira IKEGAMI , Yuta KAWAMOTO , Hideto DOHI , Manabu YANO , Yutaka TANDAI , Hideyuki KAZUMI
IPC分类号： H01J37/147 , H01J37/28 , H01J37/21
CPC分类号： H01J37/147 , H01J37/04 , H01J37/21 , H01J37/248 , H01J37/28 , H01J2237/0473
摘要： A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.

4. 发明申请

US20160217967A1 Charged Particle Beam Device 有权
标题翻译：带电粒子束装置
公开(公告)号：US20160217967A1
公开(公告)日：2016-07-28
申请号：US15006721
申请日：2016-01-26
申请人： Hitachi High-Technologies Corporation
发明人： Hideto DOHI , Akira IKEGAMI , Hideyuki KAZUMI
IPC分类号： H01J37/141 , H01J37/147 , H01J37/28 , H01J37/21
CPC分类号： H01J37/141 , H01J37/1471 , H01J37/1472 , H01J37/1478 , H01J37/21 , H01J37/28 , H01J2237/04922 , H01J2237/1506 , H01J2237/1534 , H01J2237/2448 , H01J2237/24592 , H01J2237/2809
摘要： In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.
摘要翻译：在包括聚焦带电粒子束的物镜的带电粒子束装置中; 第一偏转器，其使带电粒子束偏转，以从与物镜的理想光轴不同的方向将带电粒子束发射到样品; 以及第二偏转器，其使从样品发射的带电粒子偏转，带电粒子聚焦透镜将样品发射的带电粒子聚焦在样品和第二偏转器之间，物镜和带电粒子聚焦透镜的强度为根据第一偏转器的偏转条件进行控制。

5. 发明申请

US20150357155A1 Charged Particle Beam Apparatus and Trajectory Correction Method in Charged Particle Beam Apparatus 有权
标题翻译：带电粒子束装置和带电粒子束装置的轨迹修正方法
公开(公告)号：US20150357155A1
公开(公告)日：2015-12-10
申请号：US14760053
申请日：2014-01-21
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Hideto DOHI , Akira IKEGAMI , Hideyuki KAZUMI
IPC分类号： H01J37/147 , H01J37/22 , H01J37/28
CPC分类号： H01J37/1478 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/222 , H01J37/28 , H01J2237/1506 , H01J2237/1507 , H01J2237/221 , H01J2237/2806
摘要： There is provided a charged particle beam apparatus that includes a trajectory monitoring unit which is disposed above an objective lens (14) and which includes an optical element (12) having a lens action and a trajectory correcting deflector (10). An applied voltage and an excitation current of the optical element (12) are set to zero after a trajectory correction of a primary charged particle beam (30). Accordingly, the lens action and an aberration of the optical element (12) have no influence on resolution.
摘要翻译：提供了一种带电粒子束装置，其包括设置在物镜（14）上方并包括具有透镜作用的光学元件（12）和轨迹校正偏转器（10）的轨迹监测单元。在一次带电粒子束（30）的轨迹校正之后，光学元件（12）的施加电压和激励电流被设置为零。因此，透镜作用和光学元件（12）的像差对分辨率没有影响。

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