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1. 发明授权

US6094941A Process for manufacturing optical member for excimer laser 失效
标题翻译：准分子激光用光学元件的制造方法
公开(公告)号：US6094941A
公开(公告)日：2000-08-01
申请号：US115741
申请日：1998-07-15
申请人： Akira Fujinoki , Toshikatsu Matsuya , Hiroyuki Nishimura
发明人： Akira Fujinoki , Toshikatsu Matsuya , Hiroyuki Nishimura
IPC分类号： C03B19/14 , C03C3/06 , C03C15/00 , C03B27/012 , C03B37/00 , C03B37/01 , C03B37/018
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/21 , C03B2207/32 , C03C2201/21 , C03C2203/40 , C03C2203/52 , C03C2203/54 , Y02P40/57
摘要： An excellent quartz glass optical member having stable laser beam resistance, can be obtained by preparing quartz glass in a process having:a first step of subjecting a starting material obtained from silicon halide, alkoxysilane, alkylalkoxysilane, etc. to an oxidizing heat treatment in a temperature range between 600 and 1,500.degree. C., to decrease the hydrogen concentration to 5.times.10.sup.16 molecules/cm.sup.3 or less and at the same time eliminate reducing defects;a second step of subsequently holding the quartz in a hydrogen-containing atmosphere in a temperature range between 200 and 600.degree. C., to establish a hydrogen concentration in the glass of 1.times.10.sup.17 molecules/cm.sup.3 ; anda third step of carrying out a treatment of making the hydrogen concentration of the resultant quartz glass uniform in an atmosphere of air, inert gas, hydrogen, a mixture of hydrogen and inert gas, or a mixture of air and inert gas in a temperature range between 300 and 800.degree. C.
摘要翻译：具有稳定的激光束电阻的优良的石英玻璃光学部件可以通过以下工序制备石英玻璃得到：第一步是将由卤化硅，烷氧基硅烷，烷基烷氧基硅烷等获得的原料进行氧化热处理温度范围为600〜1500℃，将氢浓度降低至5×1016分子/ cm3以下，同时消除了缺陷; 随后在200℃至600℃的温度范围内将石英保持在含氢气氛中，以在玻璃中形成1×10 17分子/ cm 3的氢浓度; 以及在空气，惰性气体，氢气，氢气和惰性气体的混合物或空气和惰性气体的混合物的温度下进行使所得石英玻璃的氢浓度均匀的处理的第三步骤范围在300和800℃之间

2. 发明授权

US5523266A Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
标题翻译：用于准分子激光的合成石英玻璃的光学元件及其制造方法
公开(公告)号：US5523266A
公开(公告)日：1996-06-04
申请号：US286538
申请日：1994-08-05
申请人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
发明人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , G03F7/20 , C03B20/00
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03C3/06 , G03F7/70958 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , Y02P40/57 , Y10S501/90 , Y10S65/08
摘要： A synthetic quartz glass optical member for an ultraviolet laser, where the quartz glass has a hydroxyl content of 10-100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less.
摘要翻译：一种用于紫外线激光的合成石英玻璃光学构件，其中石英玻璃的羟基含量为10-100ppm，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性在DELTA n方面为5×10 -6以下，双折射为5nm / cm以下。

3. 发明授权

US5364433A Optical member of synthetic quartz glass for excimer lasers and method for producing same 失效
标题翻译：用于准分子激光的合成石英玻璃的光学元件及其制造方法
公开(公告)号：US5364433A
公开(公告)日：1994-11-15
申请号：US977397
申请日：1993-05-15
申请人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
发明人： Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , G03F7/20
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03C3/06 , G03F7/70958 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , Y02P40/57 , Y10S501/90 , Y10S65/08
摘要： A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1.times.10.sup.-2 Torr or above to a temperature of 1,400 .degree. C. or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at last one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.
摘要翻译： PCT No.PCT / JP92 / 00821 Sec。 371日期1993年3月15日 102（e）1993年3月15日PCT提交1992年6月29日PCT公布。公开号WO93 / 00307 日期：1993年1月7日。一种用于紫外线激光的合成石英玻璃光学元件，适用于使用准分子激光束和其它光学部件的平版印刷机的步进透镜，其中石英玻璃的羟基含量为10〜100ppm ，氯含量为200ppm以下，氢含量为1×1016分/ cm 3以下，折射率均匀性为DELTA n为5×10 -6以下，双折射为5nm / cm以下。光学构件可以通过使挥发性硅化合物用氢氧焰火焰水解，将形成的颗粒二氧化硅沉积在耐热载体上以制备多孔二氧化硅基质来制造，在高达1×10 -2乇的真空中加热基质以上至1400℃以上的温度进行脱水脱气，将得到的透明石英玻璃均匀化成最后一个方向不含条纹的高度均匀的石英玻璃，成型高度均匀的石英玻璃，退火成型玻璃。

4. 发明授权

US08635886B2 Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same 有权
标题翻译：含铜石英玻璃及其制造方法以及使用其的氙闪光灯
公开(公告)号：US08635886B2
公开(公告)日：2014-01-28
申请号：US13558698
申请日：2012-07-26
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
IPC分类号： C03B37/00 , C03B20/00
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译：本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为即使在高产量使用方面，长期稳定性也优异。含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

5. 发明申请

US20060183622A1 Optical synthetic quartz glass and method for producing the same 有权
标题翻译：光学合成石英玻璃及其制备方法
公开(公告)号：US20060183622A1
公开(公告)日：2006-08-17
申请号：US10548237
申请日：2004-03-03
申请人： Hiroyuki Nishimura , Akira Fujinoki
发明人： Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03C3/06 , C03B37/07 , C03B37/075 , C03B37/018
CPC分类号： C03B32/00 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C2201/12 , C03C2201/23 , C03C2203/40 , C03C2203/42 , Y02P40/57
摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.
摘要翻译：本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化能量密度，例如每个脉冲的能量密度为0.3mJ / cm 2以下。本发明还提供一种制造该方法的方法。为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

6. 发明授权

US06761951B2 Synthetic quartz glass blank 有权
标题翻译：合成石英玻璃毛坯
公开(公告)号：US06761951B2
公开(公告)日：2004-07-13
申请号：US10315990
申请日：2002-12-11
申请人： Hisatoshi Otsuka , Kazuo Shirota , Akira Fujinoki , Hiroyuki Nishimura , Takayuki Shimakawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Akira Fujinoki , Hiroyuki Nishimura , Takayuki Shimakawa
IPC分类号： B32B300
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B19/1469 , C03B2201/21 , C03B2201/23 , C03B2207/06 , C03B2207/20 , C03B2207/32 , C03C2201/21 , C03C2201/23 , Y02P40/57 , Y10T428/21 , Y10T428/2913
摘要： A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1×10−6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.
摘要翻译：通过沿着生长方向均匀化具有周期条纹的合成石英玻璃锭获得的具有特定尺寸的圆柱形，无氯合成石英玻璃坯料具有（a）在工作和离轴方向上的条纹等级，其满足美国A级军事规格MIL-G-174B，（b）工作和离轴方向的平均羟基浓度分别为700〜1,000ppm，（c）工作和离轴方向的平均假想温度为850〜950℃ ，和（d）工作方向上最多为1×10 -6的633nm波长的光的折射率分布。该空白对激光具有良好的透射率，当用激光照射时几乎不发生劣化，并且特别适用于ArF准分子激光相关应用。

7. 发明授权

US6031238A Projection aligner for integrated circuit fabrication 失效
标题翻译：用于集成电路制造的投影对准器
公开(公告)号：US6031238A
公开(公告)日：2000-02-29
申请号：US29451
申请日：1998-02-26
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toshiki Mori
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toshiki Mori
IPC分类号： G02B13/14 , G03F7/20
CPC分类号： G03F7/701 , G02B13/14 , G03F7/70225 , G03F7/70241 , G03F7/70958
摘要： A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.
摘要翻译： PCT No.PCT / EP97 / 03406 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月30日PCT公布。出版物WO98 / 00761 日本1998年1月8日在集成电路制造中，集成电路图案投影在晶片上的已知投影对准器包括ArF准分子激光器和由合成石英玻璃制成的石英玻璃光学部件组成的光学系统。为了提供一种投影对准器，其具有在长时间不劣化的光学性能，例如耐久性，光透射率等，并且光学系统可以以低成本整体构造，因此建议光学系统包括其氢分子浓度在1×10 17和5×10 18分子/ cm 3之间的第一石英玻璃光学构件组和氢分子浓度在5×1018至5×1019分/ cm 3之间的第三石英玻璃光学构件组。

8. 发明授权

US07312170B2 Optical synthetic quartz glass and method for producing the same 有权
标题翻译：光学合成石英玻璃及其制造方法
公开(公告)号：US07312170B2
公开(公告)日：2007-12-25
申请号：US10548237
申请日：2004-03-03
申请人： Hiroyuki Nishimura , Akira Fujinoki
发明人： Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03C3/06 , C03B37/07 , C03B37/075 , C03B37/018
CPC分类号： C03B32/00 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C2201/12 , C03C2201/23 , C03C2203/40 , C03C2203/42 , Y02P40/57
摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.
摘要翻译：本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化能量密度，例如每个脉冲的能量密度为0.3mJ / cm 2以下。本发明还提供一种制造该方法的方法。为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

9. 发明授权

US07007510B2 Method of producing an optical member 有权
标题翻译：光学构件的制造方法
公开(公告)号：US07007510B2
公开(公告)日：2006-03-07
申请号：US10731186
申请日：2003-12-09
申请人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura , Martin Trommer , Stefan Ochs
发明人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura , Martin Trommer , Stefan Ochs
IPC分类号： C03C23/00
CPC分类号： C03C23/007 , C03B19/1453 , C03B32/00 , Y10T428/131 , Y10T428/24612
摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.
摘要翻译：本发明的目的是提供一种改进的坯料，使得可以获得高均匀性的光学构件，并提供用于热处理高度均匀的合成石英坯的容器和热处理方法。在本发明的第一方面，提供了一种特殊设计的坯件，其显示出凹形外表面。在本发明的第二方面，提供了一种用于热处理坯料的特殊设计容器，由此将中心处的发热度设定为高于周围环境的热量。

10. 发明授权

US06810687B2 Method for producing synthetic quartz glass members for excimer lasers 有权
标题翻译：用于准分子激光的合成石英玻璃构件的制造方法
公开(公告)号：US06810687B2
公开(公告)日：2004-11-02
申请号：US10076034
申请日：2002-02-13
申请人： Hiroyuki Nishimura , Toru Yokota , Akira Fujinoki
发明人： Hiroyuki Nishimura , Toru Yokota , Akira Fujinoki
IPC分类号： C03C2100
CPC分类号： G03F7/70958 , C03B19/1453 , C03B2201/21 , C03C3/06 , C03C2201/21 , C03C2203/54 , Y02P40/57
摘要： In the light of the disadvantages of the prior art technology, an object of the present invention is to provide a method for producing a synthetic quartz glass member for excimer lasers, which comprises, while suppressing the generation of reductive defects which impairs the resistance against laser radiations, incorporating a sufficient amount of hydrogen molecules capable of achieving a high resistance against laser radiation into the quartz glass, yet uniformly incorporating the hydrogen molecules to realize a flat distribution in refractive indices attributed to the distribution in the density of hydrogen molecules. It is also an object of the present invention to provide a synthetic quartz glass member for excimer lasers obtained by the production method above, which yields high resistance against laser radiations and homogeneity. The above problems have been overcome by a method for producing a synthetic quartz glass member for excimer lasers, which, in a method for producing a synthetic quartz glass member for excimer laser optics comprising a step of incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body at a temperature of 600° C. or lower under an atmosphere in a pressure range of 1 atm or higher but lower than 150 atm and containing hydrogen, said method comprises varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of the heat treatment.
摘要翻译：鉴于现有技术的缺点，本发明的一个目的是提供一种制造用于准分子激光器的合成石英玻璃构件的方法，该方法包括在抑制减少激光器抗性的还原性缺陷的产生的同时，将足够量的能够实现激光辐射的高分子氢分子掺入到石英玻璃中，同时均匀地掺入氢分子以实现归因于氢分子密度分布的折射率的平坦分布。本发明的另一个目的是提供一种通过上述制造方法获得的用于准分子激光器的合成石英玻璃构件，其产生高的抗激光辐射和均匀性。上述问题已经通过用于制造用于准分子激光器的合成石英玻璃构件的方法得到克服，该方法在用于准分子激光光学器件的合成石英玻璃构件的制造方法中包括通过以下步骤将氢分子掺入合成石英玻璃体中：在1atm以上但低于150atm的压力范围的气氛中在600℃以下的温度下对合成石英玻璃体进行热处理，并含有氢，所述方法包括改变含氢气体的压力在热处理的至少一部分中连续地或逐步地。

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