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1. 发明授权

US06825437B2 Apparatus enabling particle detection utilizing wide view lens 失效
标题翻译：利用广视镜进行粒子检测的装置
公开(公告)号：US06825437B2
公开(公告)日：2004-11-30
申请号：US10231267
申请日：2002-08-30
申请人： Hiroyuki Nakano , Takeshi Arai , Toshihiko Nakata
发明人： Hiroyuki Nakano , Takeshi Arai , Toshihiko Nakata
IPC分类号： B23K1000
CPC分类号： G01N21/51 , G01N21/94 , H01J2237/0225
摘要： When determining the presence of foreign particles in a processing chamber by radiating a laser beam inside a processing chamber and detecting scattered light from foreign particles within the processing chamber, the detection of scattered light is performed using a detecting lens having a wide field angle and deep focal depth. Accordingly, the detection of foreign particles floating in the processing chamber can be performed across a wide range, and with uniform sensitivity, with a detecting optical system having a simple constitution.
摘要翻译：当通过在处理室内辐射激光束并且检测处理室内的异物的散射光来确定处理室中外来颗粒的存在时，使用具有宽场角和深度的检测透镜来执行散射光的检测焦点深度因此，利用具有简单结构的检测光学系统，可以在宽范围内以及具有均匀灵敏度的方式对漂浮在处理室中的异物进行检测。

2. 发明申请

US20050016953A1 Method of detecting particles and a processing apparatus using the same 审中-公开
标题翻译：检测粒子的方法及使用其的处理装置
公开(公告)号：US20050016953A1
公开(公告)日：2005-01-27
申请号：US10790180
申请日：2004-03-02
申请人： Takeshi Arai , Akira Kagoshima , Hideyuki Yamamoto , Daisuke Shiraishi , Hiroyuki Nakano , Toshihiko Nakata
发明人： Takeshi Arai , Akira Kagoshima , Hideyuki Yamamoto , Daisuke Shiraishi , Hiroyuki Nakano , Toshihiko Nakata
IPC分类号： G01N21/956 , G01L21/30 , G01N15/02 , H01L21/66
CPC分类号： G01N15/0205
摘要： A sample is processed while suppressing film deposition generated during plasma processing and fogging on a measurement window caused by etching to stably detect floating contaminants in a processing chamber with an improved contaminant capture rate. A particle detector is provided in the processing chamber, except for a space defined between electrodes of the plasma generator or a portion above the platform in which the plasma is generated. Laser light for scanning is emitted from the measurement window to the processing chamber, so that the particle detector detects scattered light from contaminants present in the processing chamber. The particle detector detects contaminants based on the detected scattered light during operation of the processing apparatus.
摘要翻译：处理样品，同时抑制等离子体处理期间产生的膜沉积和由蚀刻引起的测量窗上的雾化，以稳定地检测具有改进的污染物捕获率的处理室中的漂浮污染物。除了等离子体发生器的电极之间的空间或其上产生等离子体的平台之上的部分之外，在处理室中设置有粒子检测器。用于扫描的激光从测量窗口发射到处理室，使得颗粒检测器检测来自处理室中存在的污染物的散射光。颗粒检测器在处理装置的操作期间基于检测到的散射光检测污染物。

3. 发明授权

US07751037B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07751037B2
公开(公告)日：2010-07-06
申请号：US12435523
申请日：2009-05-05
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/958 , G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

4. 发明授权

US07355143B1 Circuit board production method and its apparatus 失效
标题翻译：电路板生产方法及其设备
公开(公告)号：US07355143B1
公开(公告)日：2008-04-08
申请号：US09763735
申请日：1999-12-27
申请人： Hiroyuki Nakano , Toshihiko Nakata , Masayoshi Serizawa , Hideaki Sasazawa
发明人： Hiroyuki Nakano , Toshihiko Nakata , Masayoshi Serizawa , Hideaki Sasazawa
IPC分类号： B23K10/00 , B23K26/00
CPC分类号： G01N15/0227 , G01N15/0211 , G01N2015/0216
摘要： Making it possible to execute the detection of the particles floating inside a processing chamber with the use of an optical system including one observing window and one unit (An object of the present invention is, by using an optical system including one observing window and one unit, to make it possible to execute the detection of the particles floating inside a processing chamber.) Also, in order to be able to detect exceedingly feeble particle scattered-lights with a high-accuracy, when performing a desired thin-film forming or thin-film processing treatment toward a to-be-processed target inside the processing chamber, the following method is employed: First, the irradiation with a beam is executed into the processing chamber through the observing window. Here, the beam is P-polarized and is intensity-modulated with a frequency differing from an exciting source's frequency and its integer-multiples, and the observing window has an inclination that forms Brewster angle toward the P-polarized incident beam. Next, backward scattered-lights scattered by the particles inside the processing chamber are received and image-photographed at a detecting optical system through the above-described one and the same observing window. Moreover, the above-described frequency component and a wavelength component of the above-described intensity-modulated beam are detected out of the received signals. Finally, the detected components and the image-photographed image information are used so as to judge the number, the size, and the distribution of the particles.
摘要翻译：通过使用包括一个观察窗口和一个单元的光学系统，可以执行浮动在处理室内的颗粒的检测。本发明的目的是通过使用包括一个观察窗口和一个单元的光学系统，使得可以执行浮在处理室内的颗粒的检测。）此外，为了能够以高精度检测到极度微弱的粒子散射光，当进行所需的薄膜形成或薄对处理室内的待处理靶材进行膜处理，采用以下方法：首先，通过观察窗口将光束照射进入处理室。这里，光束是P偏振光并且以不同于激发光源的频率和其整数倍的频率进行强度调制，并且观察窗口具有朝向P偏振入射光束形成布鲁斯特角的倾斜度。接下来，通过上述同一观察窗口，在检测光学系统中接收并处理由处理室内的颗粒散射的向后散射光并进行图像拍摄。此外，从接收信号中检测出上述强度调制波束的上述频率分量和波长分量。最后，使用检测到的分量和图像拍摄图像信息来判断粒子的数量，大小和分布。

5. 发明授权

US07175875B2 Method and apparatus for plasma processing 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US07175875B2
公开(公告)日：2007-02-13
申请号：US10075244
申请日：2002-02-15
申请人： Hiroyuki Nakano , Toshihiko Nakata
发明人： Hiroyuki Nakano , Toshihiko Nakata
IPC分类号： B05D3/06 , H05H1/24 , B08B6/46
CPC分类号： H01J37/32862 , C23C14/564 , C23C16/4401 , H01J37/32935
摘要： The apparatus for processing an in-process substrate by generating a plasma have a processing chamber with an observation window, in which the in-process substrate is disposed; plasma generating means for generating a plasma in the inside of the processing chamber; irradiation means for projecting a light beam into the inside of the processing chamber through the observation window; detection means for detecting the light projected and reflected from the inside wall of the chamber by the irradiation means; and data processing means for obtaining information on the state of contamination of the inside wall of the processing chamber by processing signals obtained through detection of the reflected light by the detection means, and thereby permitting simultaneously monitoring of both the state of contamination of an inside wall of the processing chamber and foreign materials suspended in the processing chamber, with a single observation window and an optical system composed of one unit.
摘要翻译：用于通过产生等离子体处理工艺衬底的设备具有处理室，其具有观察窗，其中设置了处理前衬底; 用于在所述处理室的内部产生等离子体的等离子体产生装置; 照射装置，用于通过观察窗将光束投射到处理室的内部; 检测装置，用于通过照射装置检测从室的内壁投影和反射的光; 以及数据处理装置，用于通过处理通过检测装置检测到反射光而获得的信号来获得关于处理室的内壁的污染状态的信息，从而允许同时监测内壁的污染状态的处理室和悬浮在处理室中的异物，具有单个观察窗和由一个单元组成的光学系统。

6. 发明授权

US08634069B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08634069B2
公开(公告)日：2014-01-21
申请号：US12992903
申请日：2009-05-13
申请人： Hiroyuki Nakano , Shunji Maeda , Toshihiko Nakata
发明人： Hiroyuki Nakano , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N21/9501 , G01N2021/9563
摘要： A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions.
摘要翻译：检查存在于其上形成有布线等的电路图案的样本上存在的异物的缺陷检查装置设置有照明光学系统，该照明光学系统用多个线性照射多个不同的区域以及形成在多个检测器上的多个照明区域的图像的图像形成光学系统，并且检测器被配置为基本上同时和单独地接收多个偏振分量，其中偏振分量是不同的并且被包含在由图像形成光学系统形成的多个光学图像的每一个中，从而检测对应于偏振分量的多个信号，并且在多个光学条件下高速执行检查。

7. 发明授权

US07528942B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US07528942B2
公开(公告)日：2009-05-05
申请号：US11472426
申请日：2006-06-22
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

8. 发明授权

US06355570B1 Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses 有权
公开(公告)号：US06355570B1
公开(公告)日：2002-03-12
申请号：US09260074
申请日：1999-03-02
申请人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
发明人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
IPC分类号： H01L21302
CPC分类号： G01N21/53 , G01N21/94 , G01N21/9501
摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

9. 发明授权

US08462330B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US08462330B2
公开(公告)日：2013-06-11
申请号：US13362808
申请日：2012-01-31
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统方向。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

10. 发明授权

US06712928B2 Method and its apparatus for detecting floating particles in a plasma processing chamber and an apparatus for processing a semiconductor device 失效
标题翻译：用于检测等离子体处理室中的浮动颗粒的方法及其装置和用于处理半导体器件的装置
公开(公告)号：US06712928B2
公开(公告)日：2004-03-30
申请号：US09791677
申请日：2001-02-26
申请人： Hiroyuki Nakano , Toshihiko Nakata
发明人： Hiroyuki Nakano , Toshihiko Nakata
IPC分类号： H05H100
CPC分类号： H01J37/3299 , C23C14/564 , C23C16/4401 , H01J2237/0225
摘要： The following operations are performed in order to allow particles suspended in a processing chamber to be detected using a single observation window and an optical system formed as a single unit and in order to provide precise detection of very weak particle-scattered light: when a desired film-forming/processing operation is being performed on a body being processed in a processing chamber, a beam that is P-polarized and that is intensity amplified at a frequency different from an excitation source frequency and integer multiples thereof is passed through an observation window sloped to form a Brewster angle relative to the P-polarized entry beam; back-scattered light scattered by particles in the processing chamber passes through the same observation window and received and imaged by a detection optical system; the frequency component described above and the intensity-modulated beam wavelength component are detected from the received light signal; and these detected components and the image information imaged as described above is used to determine the quantity, sizes, and distribution of the particles.
摘要翻译：执行以下操作以便使用单个观察窗和形成为单个单元的光学系统来检测悬浮在处理室中的颗粒，并且为了提供非常弱的粒子散射光的精确检测：当期望的正在对处理室中正在处理的物体进行成膜/处理操作，通过观察窗口将P偏振光束以不同于激发源频率和整数倍的频率进行强度放大的光束进行成膜/ 倾斜以相对于P偏振入射梁形成布鲁斯特角; 处理室中的颗粒散射的背散射光通过相同的观察窗，并由检测光学系统接收和成像; 从接收到的光信号中检测上述频率分量和强度调制波长分量; 并且将这些检测到的成分和如上所述成像的图像信息用于确定颗粒的数量，尺寸和分布。

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