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1. 发明授权

US06576559B2 Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses 有权
公开(公告)号：US06576559B2
公开(公告)日：2003-06-10
申请号：US10095066
申请日：2002-03-12
申请人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
发明人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
IPC分类号： H01L21302
CPC分类号： G01N21/53 , G01N21/94 , G01N21/9501 , H01J2237/0225
摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

2. 发明授权

US06355570B1 Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses 有权
公开(公告)号：US06355570B1
公开(公告)日：2002-03-12
申请号：US09260074
申请日：1999-03-02
申请人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
发明人： Toshihiko Nakata , Takanori Ninomiya , Sachio Uto , Hiroyuki Nakano
IPC分类号： H01L21302
CPC分类号： G01N21/53 , G01N21/94 , G01N21/9501
摘要： The present invention provides a semiconductor manufacturing method, a plasma processing method and a plasma processing apparatus for generating a plasma in a processing chamber and carrying out processing on material to be processed by using the plasma, comprising a floating-foreign-particle measuring apparatus including: a light radiating optical system for radiating a light having a desired wavelength and completing intensity modulation at a desired frequency to the processing chamber; a scattered-light detecting optical system for separating a component with the desired wavelength from scattered lights obtained from the processing chamber as a result of radiation of the light by the light radiating optical system, for optically receiving the component and for converting the component into a first signal; and a foreign-particle-signal extracting unit which separates a second signal representing foreign particle floating in the plasma or in an area in proximity to the plasma from a third signal obtained by emission of the plasma for detection of the second signal by extraction of a component with the desired frequency used for the intensity modulation from the first signal obtained from the scattered-light detecting optical system.

3. 发明授权

US5479259A Method and apparatus for detecting photoacoustic signal 失效
标题翻译：用于检测光声信号的方法和装置
公开(公告)号：US5479259A
公开(公告)日：1995-12-26
申请号：US994150
申请日：1992-12-21
申请人： Toshihiko Nakata , Takanori Ninomiya , Hilario H. Kobayashi
发明人： Toshihiko Nakata , Takanori Ninomiya , Hilario H. Kobayashi
IPC分类号： G01K5/52 , G01N21/17 , G01N29/06 , G01N29/24 , G01N29/34 , G01B9/02
CPC分类号： G01N29/346 , G01K5/52 , G01N21/1702 , G01N29/0609 , G01N29/2418 , G01N2291/012
摘要： A method and an apparatus for detecting a photoacoustic signal are provided which irradiate an excitation light beam, modulated by a desired frequency, simultaneously to a plurality of points being measured on a surface of a sample, irradiate the excitation light and a probe light simultaneously to the plurality of the points being measured, detect an interference light of a reflected light beam of the probe light and a specified reference light with a detector made up of a plurality of photoelectric converting elements corresponding to the respective points being measured, the detector being in conjugate relation with the surface of the sample, detect a thermal distortion of the frequency component equal to the intensity-modulated frequency at the plurality of the points being measured from the interference light intensity signal detected by the detector, and detect information relative to the surface and the subsurface of the measuring points on the sample from the thermal distortion of the frequency component.
摘要翻译：提供了一种用于检测光声信号的方法和装置，其将在期望频率下调制的激发光束同时照射到在样品表面上测量的多个点，同时将激发光和探针光照射到测量的多个点，利用由与被测量的各个点相对应的多个光电转换元件组成的检测器检测探测光的反射光束和指定参考光的干涉光，检测器处于与样品表面的共轭关系，根据由检测器检测到的干涉光强度信号测量的多个点处，检测与等于强度调制频率的频率成分的热失真，并检测相对于表面的信息和样品上的测量点的地表从热失真的频率分量。

4. 发明授权

US5645351A Temperature measuring method using thermal expansion and an apparatus for carrying out the same 失效
标题翻译：使用热膨胀的温度测量方法及其执行装置
公开(公告)号：US5645351A
公开(公告)日：1997-07-08
申请号：US364777
申请日：1994-12-27
申请人： Toshihiko Nakata , Shigeki Hirasawa , Yoko Saito , Takanori Ninomiya , Mineo Nomoto
发明人： Toshihiko Nakata , Shigeki Hirasawa , Yoko Saito , Takanori Ninomiya , Mineo Nomoto
IPC分类号： G01K5/52 , G01N21/17 , G01N29/24 , G01N29/34 , G01J5/38
CPC分类号： G01N29/346 , G01K5/52 , G01N21/171 , G01N29/2418 , G01N2291/012
摘要： A temperature measuring method and apparatus for measuring temperature of at least one measuring point of a sample. At least one measuring point on a surface of a sample at least with a first light. A displacement of the at least one measuring point on the surface of the sample occurs from thermal expansion of the sample in response to the first light impinging thereon and a signal indicative of the displacement is produced. The temperature of the at least one measuring point of the sample is determined from the signal.
摘要翻译：一种用于测量样品的至少一个测量点的温度的温度测量方法和装置。至少一个样品表面上至少有一个测量点至少有一个第一个光。样品表面上的至少一个测量点的位移是由于样品响应于其上的第一个光的热膨胀而发生的，并且产生了表示位移的信号。根据信号确定样品的至少一个测量点的温度。

5. 发明授权

US5989928A Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device 失效
标题翻译：用于检测等离子体处理终点的方法和装置，用于制造半导体器件的方法和装置以及半导体器件
公开(公告)号：US5989928A
公开(公告)日：1999-11-23
申请号：US51767
申请日：1998-04-20
申请人： Toshihiko Nakata , Takanori Ninomiya
发明人： Toshihiko Nakata , Takanori Ninomiya
IPC分类号： C23F4/00 , H01J37/32 , H01L21/302 , H01L21/3065 , H01L21/66 , H01L21/00
CPC分类号： B24B37/013 , H01J37/32935 , H01J37/32963 , H01L22/26
摘要： In order to detect the end point of a plasma process stably and at a high precision always without being affected by the fine delineation of a pattern to be processed and an external disturbance, it is constructed such that emission wavelength components 27 of species are taken out of a plasma emission 24 and only a frequency component synchronous with a high-frequency electric power for plasma excitation is extracted by a synchronous detection circuit 30 and so on. Thereby, the progressing status of etching is seized more accurately and a change in signal at an end point becomes clear. As a result, the precision of detection of the end point of a plasma process for a minute aperture pattern is improved.
摘要翻译： PCT No.PCT / JP96 / 03042 Sec。 371日期：1998年4月20日 102（e）1998年4月20日PCT PCT 1996年10月21日PCT公布。出版物WO97 / 15074 日期1997年04月24日为了在不受待处理图案的精细描绘和外部干扰的影响的情况下稳定且高精度地检测等离子体处理的终点，构成为使发射波长成分27 的物质从等离子体发射24中取出，并且只有与用于等离子体激发的高频电力同步的频率分量由同步检测电路30等提取。因此，更精确地检测蚀刻的进行状态，并且终点处的信号变化变得清晰。结果，提高了用于微小孔径图案的等离子体处理的终点的检测精度。

6. 发明授权

US5781294A Method and apparatus for detecting photoacoustic signal to detect surface and subsurface information of the specimen 失效
标题翻译：用于检测光声信号以检测样品的表面和地下信息的方法和装置
公开(公告)号：US5781294A
公开(公告)日：1998-07-14
申请号：US548015
申请日：1995-10-25
申请人： Toshihiko Nakata , Takanori Ninomiya , Hilario Haruomi Kobayashi , Kazushi Yoshimura
发明人： Toshihiko Nakata , Takanori Ninomiya , Hilario Haruomi Kobayashi , Kazushi Yoshimura
IPC分类号： G01N21/17 , G01N29/06 , G01N29/24 , G01N29/34 , G01B9/02
CPC分类号： G01N29/346 , G01N21/1702 , G01N29/0609 , G01N29/2418 , G01N2291/012
摘要： A method and an apparatus for detecting a photoacoustic signal are provided which irradiate an excitation light beam, modulated by a desired frequency, simultaneously to a plurality of points being measured on a surface of a sample, irradiate the excitation light and a probe light simultaneously to the plurality of the points being measured, detect an interference light of a reflected light beam of the probe light and a specified reference light with a detector made up of a plurality of photoelectric converting elements corresponding to the respective points being measured, the detector being in conjugate relation with the surface of the sample, detect a thermal distortion of the frequency component equal to the intensity-modulated frequency at the plurality of the points being measured from the interference light intensity signal detected by the detector, and detect information relative to the surface and the subsurface of the measuring points on the sample from the thermal distortion of the frequency component. A plurality of measuring points on a specimen are excited simultaneously with an intensity-modulated flat light beam and the thermal expansion displacements of the measuring points are detected simultaneously by interference between a flat probe light beam and a flat reference light beam to detect photothermal displacement signals representing the photothermal displacements of the plurality of measuring points simultaneously.
摘要翻译：提供了一种用于检测光声信号的方法和装置，其将在期望频率下调制的激发光束同时照射到在样品表面上测量的多个点，同时将激发光和探针光照射到测量的多个点，利用由与被测量的各个点相对应的多个光电转换元件组成的检测器检测探测光的反射光束和指定参考光的干涉光，检测器处于与样品表面的共轭关系，根据由检测器检测到的干涉光强度信号测量的多个点处，检测与等于强度调制频率的频率成分的热失真，并检测相对于表面的信息和样品上的测量点的地表从热失真的频率分量。试样上的多个测量点与强度调制的平坦光束同时激发，并且通过平坦探测光束和平坦参考光束之间的干涉同时检测测量点的热膨胀位移，以检测光热位移信号同时表示多个测量点的光热位移。

7. 发明授权

US08946567B2 Power module, power converter device, and electrically powered vehicle 有权
标题翻译：电源模块，电源转换器和电动车
公开(公告)号：US08946567B2
公开(公告)日：2015-02-03
申请号：US12920296
申请日：2009-10-30
申请人： Kinya Nakatsu , Hiroshi Hozoji , Takeshi Tokuyama , Yusuke Takagi , Toshiya Satoh , Taku Oyama , Takanori Ninomiya
发明人： Kinya Nakatsu , Hiroshi Hozoji , Takeshi Tokuyama , Yusuke Takagi , Toshiya Satoh , Taku Oyama , Takanori Ninomiya
IPC分类号： H05K7/00 , H02M7/00 , B60L11/14 , B60L11/18 , H05K7/20 , H01L23/00
CPC分类号： H02M7/003 , B60L11/14 , B60L11/18 , B60L11/1803 , B60L2200/26 , B60L2210/40 , H01L21/4882 , H01L23/36 , H01L23/473 , H01L24/33 , H01L25/072 , H01L2924/12042 , H01L2924/1305 , H01L2924/13055 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2924/351 , H02M7/44 , H02M7/5395 , H02M2001/327 , H02P27/08 , H05K7/20409 , H05K7/205 , H05K7/209 , H05K7/20927 , Y02T10/70 , Y02T10/7005 , Y02T10/7077 , H01L2924/00 , H01L2924/00012
摘要： A power module and a power converter device including the power module include: two base plates with their main surfaces facing each other; a semiconductor circuit unit disposed between the two base plates; a connecting member that is connected to the two base plates and forms a housing region in which the semiconductor circuit unit is housed; and an insulating member that is placed between the base plate and the semiconductor circuit unit and secures electrical insulation of the base plate and the semiconductor circuit unit. A rigidity or thickness of the connecting member is less than a rigidity or thickness of the base plate.
摘要翻译：包括功率模块的功率模块和功率转换器装置包括：两个基板，它们的主表面相互面对; 设置在所述两个基板之间的半导体电路单元; 连接构件，其连接到所述两个基板并形成容纳所述半导体电路单元的壳体区域; 以及绝缘构件，其设置在所述基板和所述半导体电路单元之间，并且确保所述基板和所述半导体电路单元的电绝缘。连接构件的刚性或厚度小于基板的刚度或厚度。

8. 发明授权

US07692779B2 Apparatus and method for testing defects 失效
标题翻译：检测缺陷的装置和方法
公开(公告)号：US07692779B2
公开(公告)日：2010-04-06
申请号：US11244080
申请日：2005-10-06
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/00
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An apparatus for detecting defects on a specimen including an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.
摘要翻译：一种用于检测试样上的缺陷的装置，包括照射光学单元，该照明光学单元将激光倾斜地突出到在一个方向上比沿垂直于所述一个方向的横向方向在一个方向上更长的区域;安装所述样本的台单元检测光学单元，其利用图像传感器检测在所述图像传感器上形成有从所述一个方向的两个方向和横向方向反射的光形成的光，并且在所述图像传感器上形成两个方向的反射光当所述表移动时，信号处理器处理从所述检测光学单元的所述图像传感器输出的信号，以提取所述样本的缺陷。一种显示由所述信号处理器提取的缺陷信息的显示单元。

9. 发明授权

US07639350B2 Apparatus and method for testing defects 失效
标题翻译：检测缺陷的装置和方法
公开(公告)号：US07639350B2
公开(公告)日：2009-12-29
申请号：US11681981
申请日：2007-03-05
申请人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
发明人： Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Shunichi Matsumoto , Yukio Kembo , Ryouji Matsunaga , Keiji Sakai , Takanori Ninomiya , Tetsuya Watanabe , Hisato Nakamura , Takahiro Jingu , Yoshio Morishige , Shuichi Chikamatsu
IPC分类号： G01N21/00
CPC分类号： B82Y15/00 , G01N21/94 , G01N21/95623 , G01N21/95684 , G01N2021/8822 , G01R31/308 , H01J37/00 , H01J2237/022 , H01J2237/0225 , H01L21/67253 , H01L21/67288 , H01L21/681 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method for detecting defects on a specimen includes mounting a specimen on a table with which is movable, obliquely projecting a laser as a line onto a surface of the specimen, detecting with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks scattered light resulting from repetitive patterns formed on the specimen, processing a signal outputted from the image sensor to extract defects of the specimen, and a displaying information of defects extracted by the signal processor.
摘要翻译：一种检测试样缺陷的方法，其特征在于，将试样安装在可移动的台面上，将作为线的激光线倾斜投射到试样的表面上，用图像传感器检测由试样反射的光形成的光的图像通过滤波器，该滤波器阻挡由样本上形成的重复图案产生的散射光，处理从图像传感器输出的信号，提取样本的缺陷，以及由信号处理器提取的缺陷的显示信息。

10. 发明申请

US20090231499A1 LIQUID CRYSTAL DEVICE AND PROJECTOR 有权
标题翻译：液晶装置和投影仪
公开(公告)号：US20090231499A1
公开(公告)日：2009-09-17
申请号：US12389657
申请日：2009-02-20
申请人： Takanori Ninomiya , Hiromi Saito
发明人： Takanori Ninomiya , Hiromi Saito
IPC分类号： G02F1/13363 , G02F1/13
CPC分类号： G02F1/133632 , G02B27/283 , G02F1/133526 , G02F1/133634 , G02F1/13454 , G02F2202/09 , G02F2413/02 , H04N9/3105 , H04N9/3167
摘要： A liquid crystal device includes a liquid crystal panel, a pair of polarizers and a phase plate. The phase plate is formed by a supply direction of an inorganic material to the substrate surface set such that a ratio of a front phase difference, which is produced when light is incident along a normal direction of the phase plate, and a first phase difference, which is produced when light is incident along a first direction different from the normal direction, falls within a predetermined range.
摘要翻译：液晶装置包括液晶面板，一对偏振器和相位板。相位板通过无机材料的供给方向形成在基板表面上，使得当沿着相位板的法线方向入射光时产生的前相位差与第一相位差的比率，当光沿着与法线方向不同的第一方向入射时产生的光，落在预定范围内。

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