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    • 1. 发明授权
    • Medical service support apparatus
    • 医疗服务支援设备
    • US08417548B2
    • 2013-04-09
    • US13091833
    • 2011-04-21
    • Hiroyuki ArakiTakashi HosakaMasakazu OmuraYusuke KatoEmiko OuchiRyoichi Hosoya
    • Hiroyuki ArakiTakashi HosakaMasakazu OmuraYusuke KatoEmiko OuchiRyoichi Hosoya
    • G06Q50/00
    • G06Q50/24G06F19/00G06F19/325G06Q50/22G16H50/70
    • A recording unit holds a plurality of examination data including the examination date of a performed examination. A search unit extracts examination data matching a set condition, of the plurality of examination data held in the recording unit. An output unit outputs a search result by the search unit. A first narrowing unit extracts examination data in which the examination date is included within a designated first period. A reference data determination unit classifies the examination data extracted by the first narrowing unit by an examinee and determines, for every examinee, one piece of the examination data to be a reference in accordance with a predetermined rule. A second narrowing unit sets, for every examinee, a second period designated in at least one of the past direction and the future direction starting from a reference date that is the examination date of the examination data determined by the reference data determination unit and extracts examination data in which the examination date is included within the second period.
    • 记录单元保存包括执行检查的检查日期的多个检查数据。 搜索单元提取与保持在记录单元中的多个检查数据相匹配的设定条件的检查数据。 输出单元通过搜索单元输出搜索结果。 第一缩小单元提取在指定的第一周期内包括检查日期的检查数据。 参考数据确定单元将由第一变窄单元提取的检查数据分类为受检者,并且根据预定规则为每个受检者确定一个检查数据作为参考。 第二缩小单元针对每个受试者设定从作为由参考数据确定单元确定的检查数据的检查日期的参考日期开始的至少一个过去方向和未来方向指定的第二时段,并且提取检查 在第二期间内包含审查日期的数据。
    • 5. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US08815048B2
    • 2014-08-26
    • US11853231
    • 2007-09-11
    • Masahiro MiyagiMasanobu SatoHiroyuki Araki
    • Masahiro MiyagiMasanobu SatoHiroyuki Araki
    • H01L21/461B08B3/04
    • H01L21/67051
    • A substrate processing apparatus has a cup part for receiving processing liquid which is applied from a processing liquid applying part and is splashed from a substrate, and the cup part is formed of electrical insulation material. Hydrophilic treatment is performed on an outer annular surface of the cup part and water is held on the outer annular surface of the cup part while processing the substrate. With this structure, charged potential of the cup part generated in splashing of pure water can be suppressed by the water held on the outer annular surface, without greatly increasing the manufacturing cost of the substrate processing apparatus by forming the cup part with special conductive material. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate.
    • 基板处理装置具有用于接收从处理液施加部施加并从基板溅出的处理液的杯部,杯部由电绝缘材料形成。 在杯部的外环形表面上进行亲水处理,并且在处理基板的同时将水保持在杯部的外环形表面上。 通过这种结构,通过保持在外环形表面上的水可以抑制在纯水溅出中产生的杯部分的带电电位,而不会通过用特殊导电材料形成杯部而大大增加基板处理装置的制造成本。 结果,可以在将处理液施加到基板上时防止由于基板的感应充电而在基板上发生放电。
    • 8. 发明授权
    • Substrate drying apparatus and substrate processing apparatus
    • 基板干燥装置和基板处理装置
    • US06354311B1
    • 2002-03-12
    • US09522205
    • 2000-03-09
    • Masahiro KimuraHiroyuki Araki
    • Masahiro KimuraHiroyuki Araki
    • B08B704
    • H01L21/67034H01L21/67028Y10S134/902
    • A deionized water temperature control part cools deionized water which is supplied from a deionized water supply source into a processing bath through a pipe after completely cleaning a substrate in the processing bath for maintaining the deionized water at a constant temperature which is lower than the ordinary temperature. A supply port of an IPA.N2 supply part provided in a casing of a multi-functional processing part is directed upward, thereby supplying IPA vapor upward with carrier gas of N2 for forming an atmosphere containing IPA vapor in high concentration above the processing bath. Thus, the substrate cooled to a low temperature is dried in the atmosphere containing the IPA vapor of the ordinary temperature in the upper portion of the processing bath when pulled up from the processing bath. Thus, the amount of the IPA vapor dissolved in the deionized water stored in the processing bath may be small, whereby consumption of the IPA vapor as well as generation of particles can be suppressed.
    • 去离子水温度控制部件在去离子水中冷却去离子水,所述去离子水在完全清洁处理槽中的基底之后通过管道从加工槽中提供到处理槽中,以将去离子水保持在低于常温的恒定温度 。 设置在多功能处理部件的壳体中的IPA.N2供给部的供给口朝向上方,从而向N 2的载气向上供给IPA蒸气,以形成含有高浓度的IPA蒸汽的气氛,高于处理槽。 因此,在从处理槽拉出时,在含有处理槽上部的常温的IPA蒸气的气氛中冷却到低温的基板被干燥。 因此,溶解在处理槽中的去离子水中的IPA蒸气的量可能较小,从而可以抑制IPA蒸气的消耗以及颗粒的产生。
    • 9. 发明授权
    • Substrate treating apparatus and substrate treating method
    • 基板处理装置及基板处理方法
    • US06352083B1
    • 2002-03-05
    • US09195190
    • 1998-11-17
    • Hiroyuki ArakiKenichiro AraiMasaaki Yabuta
    • Hiroyuki ArakiKenichiro AraiMasaaki Yabuta
    • B08B300
    • H01L21/67057B08B3/102H01L21/67051
    • A control unit controls a lifter to raise at least part of each of a group of substrates above the liquid level of a treating liquid in a treating bath. Thereafter, a valve is opened to drain the treating liquid from the treating bath at a high speed. As a result, a physical force to tilt and adhere an upper portion of the adjacent substrates accompanied by lowering of the liquid level of the treating liquid due to the high speed drainage acts upon a lower portion of the substrates near the lowered liquid level of the treating liquid, thereby reducing the physical force exerted on the substrates. This arrangement, even if a holding interval between the substrates is narrowed at a half of a normal pitch, eliminates a contact of the adjacent substrates and prevents damage of the substrates due to the contact without providing an additional member such as a substrate support guide in the treating bath.
    • 控制单元控制升降器,以将处理液中的处理液的液面以上的一组基板中的每一个的至少一部分升高。 此后,打开阀门以高速排出处理液。 结果,伴随着由于高速排水引起的处理液的液面的降低而倾斜并附着相邻基板的上部的物理力作用在基板的较低部分附近, 从而减少施加在基板上的物理力。 这种布置,即使基板之间的保持间隔在正常间距的一半处变窄,消除了相邻基板的接触,并且防止了由于接触而导致的基板的损坏,而没有提供诸如基板支撑引导件的附加构件 治疗浴。