专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06515719B2 Liquid crystal display apparatus and manufacturing method for the same 失效
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US06515719B2
公开(公告)日：2003-02-04
申请号：US09877141
申请日：2001-06-11
申请人： Hirotaka Yamaguchi , Hiroaki Tanaka , Seiji Suzuki , Hiroaki Matsuyama , Takahiko Watanabe , Yoshihiko Hirai , Masayoshi Suzuki , Toshiya Ishii , Teruaki Suzuki , Syuusaku Kido
发明人： Hirotaka Yamaguchi , Hiroaki Tanaka , Seiji Suzuki , Hiroaki Matsuyama , Takahiko Watanabe , Yoshihiko Hirai , Masayoshi Suzuki , Toshiya Ishii , Teruaki Suzuki , Syuusaku Kido
IPC分类号： G02F11343
CPC分类号： G02F1/134336 , G02F1/133707 , G02F1/136213 , G02F2001/136236
摘要： A liquid crystal display apparatus includes a first substrate, a second substrate and a liquid crystal layer interposed between the first substrate and the second substrate. The first substrate includes on a surface facing the second substrate, a plurality of gate bus lines extending into a row direction, a plurality of drain bus lines extending into a column direction, and a plurality of pixels arranged in matrix. Each of the plurality of pixels includes a portion of one of the plurality of gate bus lines associated with the pixel, a portion of one of the plurality of drain bus lines associated with the pixel, a portion of a capacitance line associated with the pixel, a pixel transistor having a source and a drain which is connected with the associated drain bus line, a control electrode connected with the source and formed in at least a portion of a region of the pixel, and a the pixel electrode which is in an electrically floating state and which is formed to cover the control electrode and a portion of the capacitance line through at least one of a first insulating film and second insulating film.
摘要翻译：液晶显示装置包括第一基板，第二基板和介于第一基板和第二基板之间的液晶层。第一基板包括在面向第二基板的表面上，延伸到行方向的多个栅极总线，延伸到列方向的多个漏极总线以及以矩阵排列的多个像素。多个像素中的每一个包括与像素相关联的多个栅极总线之一的一部分，与像素相关联的多个漏极总线之一的一部分，与像素相关联的电容线的一部分，具有源极和漏极的像素晶体管，其与相关联的漏极总线连接;控制电极，与源极连接并形成在像素的区域的至少一部分中;以及像素电极，其处于电气并且其形成为通过第一绝缘膜和第二绝缘膜中的至少一个覆盖控制电极和电容线的一部分。

2. 发明申请

US20050117082A1 Color liquid crystal display device and manufacturing method of the same 有权
公开(公告)号：US20050117082A1
公开(公告)日：2005-06-02
申请号：US11028310
申请日：2005-01-04
申请人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
发明人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
IPC分类号： G02F1/1368 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G09F9/00 , G09F9/30 , G09F9/35 , H01L21/336 , H01L29/786 , G02F1/136
CPC分类号： G02F1/136209 , G02F1/136227 , G02F2001/136236
摘要： In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).

3. 发明授权

US06897927B2 Color liquid crystal display device and manufacturing method of the same 有权
标题翻译：彩色液晶显示装置及其制造方法
公开(公告)号：US06897927B2
公开(公告)日：2005-05-24
申请号：US09867423
申请日：2001-05-31
申请人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
发明人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
IPC分类号： G02F1/1368 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G09F9/00 , G09F9/30 , G09F9/35 , H01L21/336 , H01L29/786 , G02F1/1337
CPC分类号： G02F1/136209 , G02F1/136227 , G02F2001/136236
摘要： In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).
摘要翻译：在彩色液晶显示装置的制造方法中，在透明绝缘基板上形成第一导电膜，形成栅电极和栅极总线（第一PR处理）。沉积栅极绝缘膜，半导体层，欧姆层和第二导电膜以形成薄膜晶体管和漏极总线（第二PR处理）的岛。然后，在透明绝缘基板上的各自的预定区域中连续形成三种颜色的滤色器（第三至第五PR处理）。通过使用黑矩阵作为掩模（第六PR处理），通过去除与沟道区对应的区域上的第二导电膜和欧姆层，在岛中形成漏极和源电极。然后，形成平坦化膜和像素电极（第七和第八PR处理）。

4. 发明授权

US07041522B2 Color liquid crystal display device and manufacturing method of the same 有权
标题翻译：彩色液晶显示装置及其制造方法
公开(公告)号：US07041522B2
公开(公告)日：2006-05-09
申请号：US11028310
申请日：2005-01-04
申请人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
发明人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
IPC分类号： H01L21/00
CPC分类号： G02F1/136209 , G02F1/136227 , G02F2001/136236
摘要： In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).
摘要翻译：在彩色液晶显示装置的制造方法中，在透明绝缘基板上形成第一导电膜，形成栅电极和栅极总线（第一PR处理）。沉积栅极绝缘膜，半导体层，欧姆层和第二导电膜以形成薄膜晶体管和漏极总线（第二PR处理）的岛。然后，在透明绝缘基板上的各自的预定区域中连续形成三种颜色的滤色器（第三至第五PR处理）。通过使用黑矩阵作为掩模（第六PR处理），通过去除与沟道区对应的区域上的第二导电膜和欧姆层，在岛中形成漏极和源电极。然后，形成平坦化膜和像素电极（第七和第八PR处理）。

5. 发明授权

US07532270B2 Manufacturing method of a liquid crystal display device using a photo resist having regions with different thicknesses, ashing, and reflow processing 有权
标题翻译：使用具有不同厚度的区域的光刻胶的液晶显示装置的制造方法，灰化和回流处理
公开(公告)号：US07532270B2
公开(公告)日：2009-05-12
申请号：US12020390
申请日：2008-01-25
申请人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
发明人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
IPC分类号： G02F1/136 , G02F1/1343
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/136236
摘要： A method for manufacturing a liquid crystal display that provides a wide viewing angle and in which its manufacturing processes are shortened and high reliability is provided. The method includes the steps of forming a gate electrode metal layer and forming a gate electrode by patterning using photolithography; forming an interlayer insulating film, an a−Si layer, an n+ a−Si layer, and a drain electrode metal layer and forming a drain line and an island by performing patterning, ashing processing, reflow processing using photolithography, and peeling; forming an insulating film on a transparent insulating substrate and forming an insulating film contact used to provide a connection to a source electrode of an island at a specified position by patterning or a printing method; forming a transparent conductive film and forming a pixel electrode and common electrode by patterning using photolithography.
摘要翻译：一种提供宽视角的液晶显示器的制造方法，其制造工艺缩短并提供高可靠性。该方法包括以下步骤：通过使用光刻法进行图案化形成栅极金属层并形成栅电极; 形成层间绝缘膜，a-Si层，n + a-Si层和漏电极金属层，并通过进行图案化，灰化处理，使用光刻法的回流处理和剥离来形成漏极线和岛; 在透明绝缘基板上形成绝缘膜，形成用于通过图案化或打印方法提供到指定位置处的岛状源极的连接的绝缘膜接触; 形成透明导电膜，并通过使用光刻图案化形成像素电极和公共电极。

6. 发明申请

US20080124825A1 MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE 有权
标题翻译：液晶显示装置的制造方法
公开(公告)号：US20080124825A1
公开(公告)日：2008-05-29
申请号：US12020390
申请日：2008-01-25
申请人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
发明人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
IPC分类号： H01L33/00
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/136236
摘要： A method for manufacturing a liquid crystal display that provides a wide viewing angle and in which its manufacturing processes are shortened and high reliability is provided. The method includes a process of forming a gate electrode metal layer, gate insulator, and a—Si layer and forming an island by patterning using photolithography, a process of forming an interlayer insulating film and drain electrode metal layer and forming a drain line by patterning using photolithography, a process of forming an organic insulating film and forming an organic insulating contact used to provide a connection to a source electrode and a drain electrode at a specified position by photolithography, and a process of forming a transparent conductive layer and forming a pixel electrode and common electrode by patterning using photolithography.
摘要翻译：一种提供宽视角的液晶显示器的制造方法，其制造工艺缩短并提供高可靠性。该方法包括通过使用光刻法图案化形成栅电极金属层，栅极绝缘体和a-Si层并形成岛的工艺，形成层间绝缘膜和漏电极金属层的步骤，以及通过图案化形成漏极线使用光刻法，形成有机绝缘膜并形成用于通过光刻在特定位置提供与源电极和漏电极的连接的有机绝缘接触的工艺，以及形成透明导电层并形成像素的工艺电极和公共电极。

7. 发明授权

US06891196B2 Active matrix substrate and manufacturing method therefor 有权
标题翻译：有源矩阵基板及其制造方法
公开(公告)号：US06891196B2
公开(公告)日：2005-05-10
申请号：US10617035
申请日：2003-07-11
申请人： Hiroaki Tanaka , Hirotaka Yamaguchi , Wakahiko Kaneko , Michiaki Sakamoto , Satoshi Ihida , Takasuke Hayase , Tae Yoshikawa , Hiroshi Kanou
发明人： Hiroaki Tanaka , Hirotaka Yamaguchi , Wakahiko Kaneko , Michiaki Sakamoto , Satoshi Ihida , Takasuke Hayase , Tae Yoshikawa , Hiroshi Kanou
IPC分类号： G02F1/1345 , G02F1/1333 , G02F1/1343 , G02F1/136 , G02F1/1368 , G09F9/00 , G09F9/30 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/786
CPC分类号： H01L27/12 , G02F1/134363 , H01L27/124 , H01L27/1248 , H01L27/1288
摘要： An active matrix substrate of a channel protection type having a gate electrode, a drain electrode and a pixel electrode is isolated in each layer by insulating films. The active matrix substrate is to be prepared by four masks. A gate electrode layer, a gate insulating film and an a-Si layer are processed to the same shape on a transparent insulating substrate to form a gate electrode layer and a TFF area. A drain electrode layer is formed by a first passivation film with the first passivation film formed as an upper layer. In a second passivation film, formed above the first passivation film, are bored a first opening through the first and second passivation films and a second opening through the second passivation film. A wiring connection layer is formed by ITO provided as an uppermost layer. A storage capacitance unit, including the first and second passivation films sandwiched between the gate electrode and an electrode layer formed as a co-layer with respect to the gate electrode, is connected to the pixel electrode.
摘要翻译：通过绝缘膜在每一层隔离具有栅电极，漏电极和像素电极的沟道保护型有源矩阵基板。有源矩阵基板由四个掩模制成。栅极电极层，栅极绝缘膜和a-Si层在透明绝缘基板上被加工成相同的形状以形成栅极电极层和TFF区域。漏极电极层由第一钝化膜形成，第一钝化膜形成为上层。在形成在第一钝化膜之上的第二钝化膜中，穿过第一和第二钝化膜的第一开口和通过第二钝化膜的第二开口。由设置为最上层的ITO形成布线连接层。夹持在栅电极和相对于栅电极形成为共层的电极层之间的第一和第二钝化膜的存储电容单元连接到像素电极。

8. 发明授权

US06788355B1 Active matrix LCD panel 有权
标题翻译：有源矩阵液晶面板
公开(公告)号：US06788355B1
公开(公告)日：2004-09-07
申请号：US09695212
申请日：2000-10-25
申请人： Satoshi Ihida , Hirotaka Yamaguchi , Hiroaki Tanaka , Takasuke Hayase , Hiroshi Kanou , Wakahiko Kaneko , Tae Miyahara , Michiaki Sakamoto , Shinichi Nakata
发明人： Satoshi Ihida , Hirotaka Yamaguchi , Hiroaki Tanaka , Takasuke Hayase , Hiroshi Kanou , Wakahiko Kaneko , Tae Miyahara , Michiaki Sakamoto , Shinichi Nakata
IPC分类号： G02F11343
CPC分类号： G02F1/13458 , G02F1/1362 , G02F1/1368 , G02F2001/136231
摘要： A method for fabricating an active matrix LCD panel for use in an active matrix LCD device includes the step of forming a passivation layer acting as a channel protection layer for protecting an amorphous silicon active layer, thereby reducing the number of photolithographic steps. A transparent conductive film is used for forming a gate electrode and a pixel electrode before formation of an amorphous silicon film for the TFTs.
摘要翻译：制造用于有源矩阵LCD器件的有源矩阵LCD面板的方法包括形成用作保护非晶硅有源层的沟道保护层的钝化层的步骤，从而减少光刻步骤的数量。在形成用于TFT的非晶硅膜之前，使用透明导电膜来形成栅电极和像素电极。

9. 发明授权

US06674093B1 Active matrix substrate and manufacturing method therefor 有权
标题翻译：有源矩阵基板及其制造方法
公开(公告)号：US06674093B1
公开(公告)日：2004-01-06
申请号：US09695321
申请日：2000-10-25
申请人： Hiroaki Tanaka , Hirotaka Yamaguchi , Wakahiko Kaneko , Michiaki Sakamoto , Satoshi Ihida , Takasuke Hayase , Tae Yoshikawa , Hiroshi Kanou
发明人： Hiroaki Tanaka , Hirotaka Yamaguchi , Wakahiko Kaneko , Michiaki Sakamoto , Satoshi Ihida , Takasuke Hayase , Tae Yoshikawa , Hiroshi Kanou
IPC分类号： H01L29786
CPC分类号： H01L27/12 , G02F1/134363 , H01L27/124 , H01L27/1248 , H01L27/1288
摘要： An active matrix substrate of a channel protection type having a gate electrode, a drain electrode and a pixel electrode isolated from one another from layer to layer by insulating films. The active matrix substrate is to be prepared by four masks. A gate electrode layer, a gate insulating film and an a-Si layer are processed to the same shape on a transparent insulating substrate to form a gate electrode layer (102 of FIG. 6) and a TFF area. A drain electrode layer (106 of FIG. 6) is formed by a first passivation film (105 of FIG. 6) via a first passivation film (105 of FIG. 6) formed as an upper layer. In a second passivation film (107 of FIG. 6) formed above it are bored an opening through the first and second passivation films and an opening through the second passivation film. A wiring connection layer is formed by ITO (108 of FIG. 6) provided as an uppermost layer. A storage capacitance unit, comprised of the first and second passivation films sandwiched between the gate electrode and an electrode layer formed as a co-layer with respect to the gate electrode, is provided in the pixel electrode.
摘要翻译：沟道保护型有源矩阵基板，具有通过绝缘膜从一层到另一层隔离的栅电极，漏电极和像素电极。有源矩阵基板由四个掩模制成。栅极电极层，栅极绝缘膜和a-Si层在透明绝缘基板上被加工成相同的形状以形成栅极电极层（图6的102）和TFF区域。经由形成为上层的第一钝化膜（图6的105）由第一钝化膜（图6的105）形成漏极电极层（图6的106）。在其上形成的第二钝化膜（图6的107）中，其穿过第一和第二钝化膜的开口以及通过第二钝化膜的开口。布线连接层由作为最上层设置的ITO（图6的108）形成。在像素电极中设置存储电容单元，该第一钝化膜和第二钝化膜夹在栅电极和形成为相对于栅电极的共层的电极层之间。

10. 发明授权

US07626671B2 LCD device having scanning lines and common lines 有权
公开(公告)号：US07626671B2
公开(公告)日：2009-12-01
申请号：US11152422
申请日：2005-06-14
申请人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
发明人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
IPC分类号： G02F1/1345
CPC分类号： G02F1/134363 , G02F1/1345
摘要： An active matrix LCD device includes a TFT panel, a counter panel and liquid crystal interposed therebetween. The TFT panel includes a plurality of scanning lines and a plurality of common lines formed in one layer and extending in a row direction, and a plurality of signal lines extending in a column direction. A coupling line for coupling the common lines together is disposed outside the pixel array of the TFT panel, such as in a TCP mounted on the TFT panel and mounting thereon a driver IC for driving the scanning lines.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式