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1. 发明授权

US4479711A Mask aligner 失效
标题翻译：面罩对齐器
公开(公告)号：US4479711A
公开(公告)日：1984-10-30
申请号：US446366
申请日：1982-12-02
申请人： Masao Kosugi , Hiroshi Sato , Kazuo Takahashi , Ichiro Ishiyama , Shuichi Yabu
发明人： Masao Kosugi , Hiroshi Sato , Kazuo Takahashi , Ichiro Ishiyama , Shuichi Yabu
IPC分类号： G03F9/00 , G03B27/52
CPC分类号： G03F9/7076
摘要： In a mask aligner, the actual element pattern of a mask is transferred onto a resist applied to the surface of a wafer, while the alignment pattern of the mask is not transferred onto said resist. That is, the line width of the alignment pattern of the mask is a line width which is not transferred to the wafer. If the pattern of the mask is formed so that the line width of the alignment pattern is thin as compared with that of the actual element pattern, the exposure amount in the alignment pattern portion on the resist applied to the surface of the wafer becomes excessive due to the diffraction phenomenon and thus, the alignment pattern of the mask is not transferred onto the wafer.
摘要翻译：在掩模对准器中，掩模的实际元件图案被转移到施加到晶片表面的抗蚀剂上，同时掩模的对准图案不被转印到所述抗蚀剂上。也就是说，掩模的对准图案的线宽是不传送到晶片的线宽。如果掩模的图案形成为使得对准图案的线宽与实际元件图案相比较薄，则施加到晶片表面的抗蚀剂上的对准图案部分中的曝光量变得过大因此，掩模的对准图案不会转印到晶片上。

2. 发明授权

US4506977A Transfer apparatus provided with an auto-focusing mechanism 失效
标题翻译：具有自动对焦机构的传送装置
公开(公告)号：US4506977A
公开(公告)日：1985-03-26
申请号：US482812
申请日：1983-04-07
申请人： Hiroshi Sato , Shuichi Yabu , Masao Kosugi
发明人： Hiroshi Sato , Shuichi Yabu , Masao Kosugi
IPC分类号： G03B27/32 , G02B7/36 , G03B27/34 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G03B27/42 , G03B27/52
CPC分类号： G03F9/7026 , G02B7/36 , G03F7/70241
摘要： A transfer apparatus comprises a projection device operable with a photomask having a semiconductor circuit pattern therein and includes a projection lens for projecting the image of the photomask to a photosensitive member sensitive to the image of the photomask projected by the projection lens. The apparatus further includes an illuminating device for illuminating the photomask, a memory circuit for storing the time characteristic .DELTA.l of a focus error occurring in the projection lens due to the exposure light from the photomask having passed through the projection lens, a history detector for detecting the illuminating history to/t of the illuminating device, a transmission signal forming device for forming a transmission signal regarding the transmission factor .tau. of the photomask used, a length measuring device for measuring the length of a part of the optical path between the photomask and the photosensitive member, an operation circuit for calculating a proper value in accordance with the output of the memory circuit, the output of the history detector and the transmission signal, and an adjusting device for adjusting the length of the optical path of the projection device until the proper value and the value measured by the length measuring device are in accord with each other.
摘要翻译：传送装置包括投影装置，其可与其中具有半导体电路图案的光掩模一起工作，并且包括投影透镜，用于将光掩模的图像投影到对由投影透镜投影的光掩模的图像敏感的感光部件。该装置还包括用于照射光掩模的照明装置，存储电路，用于存储由于来自已经通过投影透镜的光掩模的曝光而在投影透镜中出现的聚焦误差的时间特性DELTA 1，历史检测器检测照明装置的照明历史/ t，发送信号形成装置，用于形成关于所使用的光掩模的发送因子τT的发送信号;长度测量装置，用于测量光掩模之间的光路的一部分的长度和感光部件，根据存储电路的输出，历史检测器和传输信号的输出计算适当值的运算电路，以及用于调整投影装置的光路长度的调整装置直到由该长度测量装置测量的适当的值和值是一致的彼此。

3. 发明授权

US4786947A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4786947A
公开(公告)日：1988-11-22
申请号：US45203
申请日：1987-05-04
申请人： Masao Kosugi , Toshikazu Matsushita , Shuichi Yabu , Masakatsu Ohta
发明人： Masao Kosugi , Toshikazu Matsushita , Shuichi Yabu , Masakatsu Ohta
IPC分类号： G03B27/52 , G03F7/20 , G03F7/207 , H01L21/027 , H01L21/30
CPC分类号： H01L21/30 , G03F7/70833 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： A semiconductor device manufacturing projection exposure apparatus in which a pattern of a reticle is projected onto a semiconductor wafer through a projection optical system having a lens element and in which the reticle is irradiated with a light of a predetermined wavelength to thereby transfer the pattern of the reticle onto the semiconductor wafer. The apparatus includes a chamber adapted to house the reticle, the wafer and the projection optical system in a substantially closed space, detectors for detecting a temperature and a pressure of a gas contained in the space, and an adjusting unit for adjusting the temperature and pressure of the gas in the chamber, from the outside of the chamber, the operation of the adjusting unit being controlled on the basis of the detection by the detectors, whereby the temperature and pressure of the gas contained in the space are regulated so as to be best suited to retain a predetermined optical performance of the projection optical system and, whereby, high-precision pattern transfer is assured.
摘要翻译：一种半导体器件制造投影曝光装置，其中通过具有透镜元件的投影光学系统将掩模版的图案投影到半导体晶片上，并且其中用预定波长的光照射掩模版，从而传输掩模版到半导体晶片上。该装置包括适于将掩模版，晶片和投影光学系统容纳在基本封闭的空间中的室，用于检测包含在该空间中的气体的温度和压力的检测器，以及用于调节温度和压力的调节单元在室内的气体从腔室的外部开始，基于检测器的检测来控制调节单元的操作，由此将包含在空间中的气体的温度和压力调节为最适合于保持投影光学系统的预定光学性能，从而确保高精度图案转印。

4. 发明授权

US4617469A Exposure apparatus with detecting means insertable into an exposure path 失效
标题翻译：具有可插入曝光路径的检测装置的曝光装置
公开(公告)号：US4617469A
公开(公告)日：1986-10-14
申请号：US552313
申请日：1983-11-16
申请人： Kazuo Takahashi , Hiroshi Sato , Masao Kosugi
发明人： Kazuo Takahashi , Hiroshi Sato , Masao Kosugi
IPC分类号： G03B27/32 , G03F7/20 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/30 , H01L21/68 , G01N21/86
CPC分类号： G03F9/70 , H01L21/30
摘要： An exposure apparatus for aligning an original, having at least one alignment mark thereon, and radiation sensitive member, having at least one alignment mark thereon and adapted to receive the image of the original, with each other includes a first detecting device including a sensor retractable from the optical path of a light for illuminating the original, the sensor being adapted to sense the original and radiation sensitive member to detect a relative displacement (degree of misalignment) between the original and radiation sensitive member when the sensor is in the optical path; a second detecting device including a sensor set out of the optical path and adapted to detect the position of one of the original and radiation sensitive member in the absolute coordinates of the apparatus; and a driving mechanism for moving one of the original and radiation sensitive member in response to the output of the second detecting device to correct the above mentioned displacement.
摘要翻译：用于对准在其上具有至少一个对准标记的原稿和其上具有至少一个对准标记并适于接收原稿的图像的辐射敏感元件的曝光设备包括：第一检测装置，包括可伸缩的传感器从用于照射原稿的光的光路中，传感器适于感测原始和辐射敏感元件，以便在传感器处于光路时检测原始和辐射敏感元件之间的相对位移（未对准度）; 第二检测装置，其包括设置在所述光路中的传感器，并且适于检测所述原始和辐射敏感部件中的一个在所述装置的绝对坐标中的位置; 以及驱动机构，用于响应于第二检测装置的输出来移动原件和辐射敏感部件之一，以校正上述位移。

5. 发明授权

US4488806A Shot arranging method in a divisional printing apparatus 失效
标题翻译：分割印刷装置中的拍摄布置方法
公开(公告)号：US4488806A
公开(公告)日：1984-12-18
申请号：US449825
申请日：1982-12-14
申请人： Kazuo Takahashi , Hiroshi Sato , Masao Kosugi
发明人： Kazuo Takahashi , Hiroshi Sato , Masao Kosugi
IPC分类号： H01L21/30 , B41J2/44 , G03F7/20 , H01L21/027 , H01L27/02 , G03B27/32 , G03B27/44
CPC分类号： G03F7/70425 , B41J2/44 , G03F7/70433 , H01L27/0207
摘要： In a divisional printing apparatus wherein the pattern of a mask is reduced and projected for printing onto a wafer and the mask and the wafer are moved relative to each other at each shot so that the exposed areas thereof do not overlap each other, and whereby the same pattern as that for collective printing is printed onto the effective area of the wafer by a plurality of shots, a shot arranging method in which, in the case of a so-called multichip shot in which a plurality of chips are exposed at a time at each shot, the special chip area of the wafer is not exposed, but the wafer is effectively exposed so that the creation of unusable chips is minimized.
摘要翻译：在一种分割印刷装置中，其中掩模的图案被减小并投影以印刷到晶片上，并且掩模和晶片在每次拍摄时相对于彼此移动，使得其曝光区域彼此不重叠，并且由此通过多次拍摄将与集体印刷相同的图案印刷在晶片的有效区域上，其中，在一次所谓的多芯片拍摄的情况下，其中多个芯片被曝光，在每次拍摄时，晶片的特殊芯片面积都不会露出，但是晶片被有效地暴露，使得不可用的芯片的产生被最小化。

6. 发明授权

US4937618A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US4937618A
公开(公告)日：1990-06-26
申请号：US368881
申请日：1989-06-20
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057
摘要： An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
摘要翻译：一种对准装置，包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准模式使用第二离轴对准光学系统。在另一方面，提供了一种对准装置，其包括具有倍率的第一离轴对准光学系统，具有比第一离轴对准光学系统的放大率高的倍率的第二离轴对准光学系统，以及 TTL对准光学系统，其中对准装置可以使用第二离轴对准光学系统以全局对准模式操作，并且可以使用TTL光学对准系统以另一全局对准模式操作。

7. 发明授权

US4843563A Step-and-repeat alignment and exposure method and apparatus 失效
标题翻译：步进重复校准和曝光方法和装置
公开(公告)号：US4843563A
公开(公告)日：1989-06-27
申请号：US237620
申请日：1988-08-24
申请人： Kazuo Takahashi , Masao Kosugi
发明人： Kazuo Takahashi , Masao Kosugi
IPC分类号： G03F9/00 , H01L21/30
CPC分类号： G03F9/70 , G03F9/00 , H01L21/30
摘要： An exposure apparatus usable in the manufacture of semiconductor devices, for transferring a pattern of a reticle onto each of discrete areas of a semiconductor wafer in a step-and-repeat manner. The apparatus has a laser interferometer for precisely measuring the amount of displacement of the wafer and a memory for storing positional errors of the shot areas, relative to respective target positions, established at the time of completion of the stepwise movements of the wafer. In accordance with the stored positional errors and with the result of measurement by the laser interferometer, the amount of stepwise movement of the wafer is corrected, whereby the accuracy of step-feed for the wafer is improved without decreasing the throughput. In another aspect, the exposure apparatus is provided with a TTL detection system for detecting the positional error of each of the shot areas relative to a target or reference shot area established at the time of completion of stepwise movement of the wafer. If a variation component of the positional error detected by way of the TTL detecting system is not less than a predetermined level, the positioning of the wafer is effected for each of the shot areas, by use of the TTL detecting system. If the variation component is less than the predetermined level, the positioning of the wafer or each shot area is effected on the basis of the measurement by the laser interferometer.
摘要翻译：一种可用于制造半导体器件的曝光装置，用于以分步重复的方式将半导体晶片的图案转印到半导体晶片的离散区域中。该装置具有用于精确测量晶片的位移量的激光干涉仪和用于存储在晶片的逐步移动完成时建立的相对于各个目标位置的拍摄区域的位置误差的存储器。根据存储的位置误差和激光干涉仪的测量结果，校正晶片的逐步移动量，从而提高晶片的分步进给精度，而不降低生产量。在另一方面，曝光装置设置有TTL检测系统，用于检测每个拍摄区域相对于在晶片的逐步移动完成时建立的目标或参考拍摄区域的位置误差。如果通过TTL检测系统检测到的位置误差的变化分量不小于预定水平，则通过使用TTL检测系统对每个拍摄区域进行晶片的定位。如果变化分量小于预定水平，则基于激光干涉仪的测量来实现晶片或每个照射区域的定位。

8. 发明授权

US4757355A Mask storing mechanism 失效
标题翻译：面具存储机制
公开(公告)号：US4757355A
公开(公告)日：1988-07-12
申请号：US923856
申请日：1986-10-28
申请人： Kazuo Iizuka , Yukio Tokuda , Masao Kosugi
发明人： Kazuo Iizuka , Yukio Tokuda , Masao Kosugi
IPC分类号： G03B23/00 , G03F7/20 , G03B27/62
CPC分类号： G03F1/66 , G03B23/00 , G03F7/70741
摘要： A device for supplying masks to be used in a chamber having a wall, comprises an opening formed in the wall of the chamber, and a rotatable shelf disposed in the opening and for carrying thereon the masks. The rotatable shelf is coupled, by way of a rotational shaft, to a portion of the wall adjacent to the opening and the rotational shelf has a mask carrying portion which is rotationally movable, about the rotational shaft, through the opening to and from the inside of the chamber and from and to the outside of the chamber.
摘要翻译：一种用于提供在具有壁的腔室中使用的掩模的装置，包括形成在腔室的壁中的开口以及设置在开口中并用于在其上承载掩模的可旋转搁架。旋转架通过旋转轴连接到与开口相邻的壁的一部分，并且旋转架具有掩模承载部分，该面罩承载部分可围绕旋转轴旋转移动，穿过开口至内部的室和从室的外部。

9. 发明授权

US4441853A Disc orienting device 失效
标题翻译：光盘取向装置
公开(公告)号：US4441853A
公开(公告)日：1984-04-10
申请号：US487414
申请日：1983-04-28
申请人： Masao Kosugi
发明人： Masao Kosugi
IPC分类号： G05D3/00 , H01L21/027 , H01L21/30 , H01L21/677 , H01L21/68 , B65G47/24
CPC分类号： H01L21/67787 , H01L21/30
摘要： A device for orienting a disc having a flat portion formed on the outer periphery thereof, for example, a wafer for the manufacture of a semiconductor circuit element. The disc is guided and rotated by a rotatable roller and a drive roller which point-contact the outer periphery of the disc. The rotation of the disc is stopped when the disc has come to a predetermined rotational position. By this, rough orientation of the disc is accomplished. Subsequently, the disc is urged toward the rotatable roller and the drive roller. At this time, the drive roller is disconnected from a drive source and becomes a low torque rotating roller. Accordingly, precise orientation is accomplished without hampering the rotation of the disc.
摘要翻译：用于定向具有形成在其外周上的平坦部分的盘的装置，例如用于制造半导体电路元件的晶片。盘被可旋转的辊和与盘的外周接触的驱动辊引导和旋转。当盘已经到达预定旋转位置时，盘的旋转停止。由此，完成了光盘的粗略取向。随后，盘被推向可旋转辊和驱动辊。此时，驱动辊与驱动源断开，成为低转矩旋转辊。因此，在不妨碍盘的旋转的情况下实现精确的取向。

10. 发明授权

US5053670A Precision actuator 失效
标题翻译：精密执行器
公开(公告)号：US5053670A
公开(公告)日：1991-10-01
申请号：US616063
申请日：1990-11-20
申请人： Masao Kosugi
发明人： Masao Kosugi
IPC分类号： H01L41/09 , H02N2/16
CPC分类号： H02N2/163 , H02N2/126
摘要： A precision actuator includes a housing; an ultrasonic motor disposed in the housing and having a ring-like rotor and a stator; an output shaft; a rotation-restraint rectilinear motion guide for coupling the output shaft to the housing, slidably in an axial direction but unrotatably relative to it; and a screw mechanism for coupling the output shaft to the rotor.
摘要翻译：精密致动器包括壳体; 设置在壳体中并具有环状转子和定子的超声波马达; 输出轴; 旋转限制直线运动引导件，用于将输出轴联接到壳体，其可沿轴向可滑动地但相对于壳体不可旋转; 以及用于将输出轴联接到转子的螺杆机构。

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