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1. 发明授权

US5920454A Capacitor-mounted circuit board 失效
标题翻译：电容式电路板
公开(公告)号：US5920454A
公开(公告)日：1999-07-06
申请号：US798650
申请日：1997-02-11
申请人： Kazuo Nomura , Nobutsugu Nakanuma , Ichiro Ishiyama , Koji Higashi , Masaki Kato , Ichiro Nagare , Hiroyuki Kurokawa , Yozo Ohara
发明人： Kazuo Nomura , Nobutsugu Nakanuma , Ichiro Ishiyama , Koji Higashi , Masaki Kato , Ichiro Nagare , Hiroyuki Kurokawa , Yozo Ohara
IPC分类号： H05K1/16 , H05K1/18 , H01K4/06 , H01K4/002
CPC分类号： H05K1/162 , H05K1/183 , H05K2201/0209 , H05K2201/09763
摘要： A printed capacitor-mounted circuit board capable of increasing a capacity of each of printed capacitors formed on a printed board. A copper-clad laminate is arranged so as to act as an insulating substrate. The printed capacitors each include a first electrode made of a copper foil and arranged on a front surface of the copper-clad laminate. Then, a dielectric layer made of a dielectric paste is arranged on the first electrode and a second electrode made of a conductive paint is arranged on the dielectric layer.
摘要翻译：一种印刷电容器安装的电路板，其能够增加形成在印刷电路板上的每个印刷电容器的容量。覆铜层压板被布置成用作绝缘基板。印刷电容器各自包括由铜箔制成的第一电极并布置在覆铜层压板的前表面上。然后，在第一电极上布置由电介质浆料构成的电介质层，并且在电介质层上设置由导电涂料制成的第二电极。

2. 发明授权

US06225570B1 Circuit board having electric component and its manufacturing method 失效
标题翻译：具有电气元件的电路板及其制造方法
公开(公告)号：US06225570B1
公开(公告)日：2001-05-01
申请号：US09125260
申请日：1998-08-10
申请人： Ichiro Ishiyama , Ichiro Nagare , Morikatsu Yamazaki , Yozo Ohara , Koji Higashi
发明人： Ichiro Ishiyama , Ichiro Nagare , Morikatsu Yamazaki , Yozo Ohara , Koji Higashi
IPC分类号： H05K116
CPC分类号： H05K1/162 , H05K1/095 , H05K1/165 , H05K1/167 , H05K3/0023 , H05K3/4623 , H05K3/4644 , H05K2201/0187 , H05K2201/0209 , H05K2203/0568 , H05K2203/171
摘要： This invention provides a circuit board having an electric component which has an electric element smaller than a conventional element. A circuit pattern (5) which includes a pair of contact electrodes (3, 3) is formed on the surface of a board (1) made of an insulating material. A photoresist film (7) is formed on the surface of the board (1). At least one electric element forming hole (9) is formed in the photoresist film (7) by a lithography technology so as to expose at least part of the pair of the contact electrodes (3, 3). The electric element forming hole (9) is filled with an electric element forming paste material to form an electric element (13). A protective film (15) made of a synthetic resin is so formed as to cover the electric element forming hole (9).
摘要翻译：本发明提供一种电路板，其具有比常规元件小的电气元件的电气部件。在由绝缘材料制成的板（1）的表面上形成包括一对接触电极（3,3）的电路图案（5）。在板（1）的表面上形成光致抗蚀剂膜（7）。通过光刻技术在光致抗蚀剂膜（7）中形成至少一个电子元件形成孔（9），以暴露所述一对接触电极（3,3）的至少一部分。电元件形成孔（9）填充有电子元件形成膏材以形成电元件（13）。由合成树脂制成的保护膜（15）形成为覆盖电气元件形成孔（9）。

3. 发明授权

US4630922A Pattern transfer apparatus 失效
标题翻译：图案转印装置
公开(公告)号：US4630922A
公开(公告)日：1986-12-23
申请号：US707235
申请日：1985-03-01
申请人： Shunzo Imai , Ichiro Ishiyama
发明人： Shunzo Imai , Ichiro Ishiyama
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An apparatus for irradiating a first object so as to achieve at least one of alignment between the first object and a second object and transfer of a pattern of the first object onto the second object. The apparatus includes an optical device disposed in the path of the irradiating beam to correct or prevent any change in the optical path length depending on the thickness of the first object.
摘要翻译：一种用于照射第一物体以便实现第一物体和第二物体之间的对准中的至少一种并将第一物体的图案转移到第二物体上的装置。该装置包括设置在照射光束的路径中的光学装置，以根据第一物体的厚度校正或防止光路长度的任何变化。

4. 发明授权

US6083340A Process for manufacturing a multi-layer circuit board 失效
标题翻译：制造多层电路板的工艺
公开(公告)号：US6083340A
公开(公告)日：2000-07-04
申请号：US124692
申请日：1998-07-29
申请人： Kazuo Nomura , Ichiro Ishiyama , Koji Higashi , Masaki Kato , Ichiro Nagare , Hiroyuki Kurokawa , Yozo Ohara
发明人： Kazuo Nomura , Ichiro Ishiyama , Koji Higashi , Masaki Kato , Ichiro Nagare , Hiroyuki Kurokawa , Yozo Ohara
IPC分类号： H05K3/40 , H05K3/42 , H05K3/46 , B32B31/20
CPC分类号： H05K3/4069 , H05K3/429 , B32B2457/08 , H05K2201/0257 , H05K2201/035 , H05K2201/09454 , H05K2201/09981 , H05K2203/1476 , H05K3/4611 , Y10T156/1057 , Y10T29/49165
摘要： A multi-layer circuit board capable of reducing an electrical resistance between circuit patterns positioned inside the circuit board and a through-hole connection conductor. A plurality of circuit patterns are superposed on each other with a plurality of insulating layers being alternately interposed therebetween in turn. A solution in which ultrafine metal particles of the independent dispersion type such as silver, gold, palladium or the like are contained in a colloid-like manner is applied so as to extend from one of lands through an inner surface of a through-hole to the other land. Then, the solution is calcined to form a metal particle film, The metal particle film is coated thereon with a conductive paste such as a resin/silver paste or the like, which is then calcined to form a conductive paste layer.
摘要翻译：一种能够减小位于电路板内部的电路图案与通孔连接导体之间的电阻的多层电路板。多个电路图案彼此重叠，并且依次交替插入多个绝缘层。以胶体状包含诸如银，金，钯等独立分散型的超细金属颗粒的溶液，以从一个区域延伸穿过通孔的内表面到另一块土地。然后，将溶液煅烧以形成金属颗粒膜。用诸如树脂/银浆等的导电浆料涂覆金属颗粒膜，然后将其煅烧以形成导电浆料层。

5. 发明授权

US4717257A Alignment device 失效
标题翻译：对准装置
公开(公告)号：US4717257A
公开(公告)日：1988-01-05
申请号：US763710
申请日：1985-08-08
申请人： Minoru Kaneta , Ichiro Ishiyama
发明人： Minoru Kaneta , Ichiro Ishiyama
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F9/70
摘要： An alignment device for aligning a reticle and a wafer with the aid of a projection lens system for projecting an integrated circuit pattern of the reticle onto the wafer, wherein a light beam from the wafer is passed throught the projection lens and is directed by way of an objective lens to a spatial filter to detect a positional relation between the reticle and the wafer. According to the position of an optical axis of the objective lens relative to an optical axis of the projection lens and according to the telecentricity of the projection lens, the spatial filter is displaced relative to the optical axis of the objective lens, whereby a particular component of the light beam from the wafer is positively extracted out, without being affected against by displacement of the objective lens for the alignment operation.
摘要翻译：一种用于借助于投影透镜系统对准标线片和晶片的对准装置，用于将光罩的集成电路图案投影到晶片上，其中来自晶片的光束穿过投影透镜并被引导通过用于检测掩模版和晶片之间的位置关系的空间滤光器的物镜。根据物镜的光轴相对于投影透镜的光轴的位置，并且根据投影透镜的远心度，空间滤光器相对于物镜的光轴移位，由此特定的部件来自晶片的光束被肯定地抽出，而不受用于对准操作的物镜的位移的影响。

6. 发明授权

US4620785A Sheet-like member having alignment marks and an alignment apparatus for the same 失效
标题翻译：具有对准标记的片状构件和用于其的对准装置
公开(公告)号：US4620785A
公开(公告)日：1986-11-04
申请号：US553814
申请日：1983-11-21
申请人： Akiyoshi Suzuki , Hiroshi Sato , Ichiro Ishiyama
发明人： Akiyoshi Suzuki , Hiroshi Sato , Ichiro Ishiyama
IPC分类号： G03F9/00 , G03B27/42
CPC分类号： G03F9/7084
摘要： A sheet-like member, such as a reticle, mask or wafer, has alignment marks, which are staggered about a pattern area thereof. The arrangement of the alignment marks is effective to enhance the degree of alignment and also to avoid undesirable overlapping of the reticle mark and the wafer mark.
摘要翻译：诸如掩模版，掩模或晶片的片状构件具有相对于其图案区域交错的对准标记。对准标记的布置对于提高对准程度也是有效的，并且还避免了标线标记和晶片标记的不期望的重叠。

7. 发明授权

US06626046B2 Pressure-sensitive resistor sensor having electrodes with reduced contact resistance deviation 有权
标题翻译：压敏电阻传感器具有接触电阻偏差降低的电极
公开(公告)号：US06626046B2
公开(公告)日：2003-09-30
申请号：US09962265
申请日：2001-09-26
申请人： Masahiro Taguchi , Eiichi Nishio , Ichiro Ishiyama
发明人： Masahiro Taguchi , Eiichi Nishio , Ichiro Ishiyama
IPC分类号： G01L900
CPC分类号： G01L1/205
摘要： It is the objective of this invention to reduce deviation in contact resistance variation between electrodes among pressure-sensitive resistor sensors. The sensor is composed of a pair of films. One film has a plurality of electrode portions extending in a certain direction and the other film has at least one electrode portion that is arranged in a transverse relation with a plural of the electrode portions on the other film. Contact points generated by applied pressure are limited to crossing points between the electrode portions of the pair of films. As a result, variation in contact resistance due to applied pressure shift becomes more constant. Thus, it is possible to reduce deviation of contact resistance between the electrodes among sensors.
摘要翻译：本发明的目的是减少压敏电阻传感器中电极之间的接触电阻变化的偏差。传感器由一对薄膜组成。一个膜具有沿一定方向延伸的多个电极部分，另一个膜具有至少一个与另一个膜上的多个电极部分呈横向关系的电极部分。通过施加的压力产生的接触点被限制在该对电极的电极部分之间的交叉点。结果，由于施加的压力偏移引起的接触电阻的变化变得更加恒定。因此，可以减少传感器之间的电极之间的接触电阻的偏差。

8. 发明授权

US6121870A Pressure sensitive transducer with pressure sensitive layer including semi-conductive particles 失效
标题翻译：带有敏感层的压敏传感器，包括半导体颗粒
公开(公告)号：US6121870A
公开(公告)日：2000-09-19
申请号：US343048
申请日：1999-06-29
申请人： Katsuhiko Ariga , Masayasu Teraoka , Yoshimitsu Motoki , Ichiro Ishiyama
发明人： Katsuhiko Ariga , Masayasu Teraoka , Yoshimitsu Motoki , Ichiro Ishiyama
IPC分类号： G01L1/20 , H01C10/12 , H01C10/10
CPC分类号： H01C10/12
摘要： Pressure sensitive layers are disposed on respective resin films through electrodes to face each other, and include high conductivity flaky carbon particles and low conductivity amorphous-based carbon particles. The two kinds of carbon particles are bound together by a resin-system binder. Accordingly, when a pushing force is applied to the resin films, an average distance between the carbon particles is decreased to cause a tunnel conduction phenomenon, resulting in a decrease in conductive resistance between the electrodes. As a result, a pressure sensing property can be made gentle.
摘要翻译：压敏层通过电极相对设置在相应的树脂膜上，并且包括高导电性片状碳颗粒和低导电性无定形碳颗粒。两种碳颗粒通过树脂系粘合剂结合在一起。因此，当向树脂膜施加推力时，碳粒子之间的平均距离减小，导致隧道传导现象，导致电极之间的导电电阻降低。结果，可以使压力感测特性变得平缓。

9. 发明授权

US4479711A Mask aligner 失效
标题翻译：面罩对齐器
公开(公告)号：US4479711A
公开(公告)日：1984-10-30
申请号：US446366
申请日：1982-12-02
申请人： Masao Kosugi , Hiroshi Sato , Kazuo Takahashi , Ichiro Ishiyama , Shuichi Yabu
发明人： Masao Kosugi , Hiroshi Sato , Kazuo Takahashi , Ichiro Ishiyama , Shuichi Yabu
IPC分类号： G03F9/00 , G03B27/52
CPC分类号： G03F9/7076
摘要： In a mask aligner, the actual element pattern of a mask is transferred onto a resist applied to the surface of a wafer, while the alignment pattern of the mask is not transferred onto said resist. That is, the line width of the alignment pattern of the mask is a line width which is not transferred to the wafer. If the pattern of the mask is formed so that the line width of the alignment pattern is thin as compared with that of the actual element pattern, the exposure amount in the alignment pattern portion on the resist applied to the surface of the wafer becomes excessive due to the diffraction phenomenon and thus, the alignment pattern of the mask is not transferred onto the wafer.
摘要翻译：在掩模对准器中，掩模的实际元件图案被转移到施加到晶片表面的抗蚀剂上，同时掩模的对准图案不被转印到所述抗蚀剂上。也就是说，掩模的对准图案的线宽是不传送到晶片的线宽。如果掩模的图案形成为使得对准图案的线宽与实际元件图案相比较薄，则施加到晶片表面的抗蚀剂上的对准图案部分中的曝光量变得过大因此，掩模的对准图案不会转印到晶片上。

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