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1. 发明授权

US4757355A Mask storing mechanism 失效
标题翻译：面具存储机制
公开(公告)号：US4757355A
公开(公告)日：1988-07-12
申请号：US923856
申请日：1986-10-28
申请人： Kazuo Iizuka , Yukio Tokuda , Masao Kosugi
发明人： Kazuo Iizuka , Yukio Tokuda , Masao Kosugi
IPC分类号： G03B23/00 , G03F7/20 , G03B27/62
CPC分类号： G03F1/66 , G03B23/00 , G03F7/70741
摘要： A device for supplying masks to be used in a chamber having a wall, comprises an opening formed in the wall of the chamber, and a rotatable shelf disposed in the opening and for carrying thereon the masks. The rotatable shelf is coupled, by way of a rotational shaft, to a portion of the wall adjacent to the opening and the rotational shelf has a mask carrying portion which is rotationally movable, about the rotational shaft, through the opening to and from the inside of the chamber and from and to the outside of the chamber.
摘要翻译：一种用于提供在具有壁的腔室中使用的掩模的装置，包括形成在腔室的壁中的开口以及设置在开口中并用于在其上承载掩模的可旋转搁架。旋转架通过旋转轴连接到与开口相邻的壁的一部分，并且旋转架具有掩模承载部分，该面罩承载部分可围绕旋转轴旋转移动，穿过开口至内部的室和从室的外部。

2. 发明授权

US4776462A Container for a sheet-like article 失效
标题翻译：容器用于片状物品
公开(公告)号：US4776462A
公开(公告)日：1988-10-11
申请号：US911414
申请日：1986-09-25
申请人： Masao Kosugi , Kazuo Iizuka
发明人： Masao Kosugi , Kazuo Iizuka
IPC分类号： G03F7/20 , B65D73/02
CPC分类号： G03F1/66 , G03F7/20 , G03F7/70741
摘要： A container for a sheet-like article, comprising a tray member for substantially accommodating therein the article, the tray member having an opening, a cover member for substantially sealingly covering the opening of the tray member, supporting elements provided in the tray member for supporting the article when it is accommodated in the tray member, wherein a portion of the article is protruded out of the container and through the opening of the tray member, when the article is supported by the supporting elements and the cover member is opened.
摘要翻译：一种用于片状制品的容器，包括用于基本上容纳物品的托盘构件，所述托盘构件具有开口，用于基本上密封地覆盖所述托盘构件的开口的盖构件，设置在所述托盘构件中用于支撑的支撑元件所述物品容纳在所述托盘构件中时，其中，当所述物品被所述支撑元件支撑并且所述盖构件打开时，所述物品的一部分从所述容器突出并通过所述托盘构件的开口。

3. 发明授权

US4530587A Step type mask aligner 失效
标题翻译：步进型掩模对准器
公开(公告)号：US4530587A
公开(公告)日：1985-07-23
申请号：US555525
申请日：1983-11-28
申请人： Masao Kosugi , Tadashi Konuki , Kazuo Iizuka
发明人： Masao Kosugi , Tadashi Konuki , Kazuo Iizuka
IPC分类号： G03B27/32 , G03F7/20 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/70425 , G03F7/70433
摘要： A mask aligner for stepping and exposing a wafer in accordance with a shot arrangement, including an input device to which wafer dimension, chip dimension and a chip pattern for one shot are inputted, a selector for selecting a shot arrangement mode from plural shot arrangement modes based on the above input signals, a controller for effecting the shots in accordance with the selected modes to minimize the time required for exposing the one entire wafer or to maximize the number of chips exposed per unit.
摘要翻译：一种掩模对准器，用于根据投射装置进行步进和曝光晶片，包括输入装置，晶片尺寸，芯片尺寸和用于一次镜头的芯片图案被输入到所述输入装置中，用于从多个拍摄装置模式中选择拍摄装置模式的选择器基于上述输入信号，控制器根据所选择的模式进行拍摄，以最小化暴露一个整个晶片所需的时间或者使每单位曝光的芯片数量最大化。

4. 发明授权

US07566515B2 Flat non-aqueous electrolyte secondary cell 有权
标题翻译：扁平非水电解质二次电池
公开(公告)号：US07566515B2
公开(公告)日：2009-07-28
申请号：US11176400
申请日：2005-07-08
申请人： Masami Suzuki , Muneto Hayami , Kazuo Udagawa , Kazuo Iizuka , Naomi Ishihara , Satoshi Hirahara , Hirotaka Sakai , Kiyoto Yoda , Masataka Shikota
发明人： Masami Suzuki , Muneto Hayami , Kazuo Udagawa , Kazuo Iizuka , Naomi Ishihara , Satoshi Hirahara , Hirotaka Sakai , Kiyoto Yoda , Masataka Shikota
IPC分类号： H01M2/02 , H01M2/08 , H01M4/58 , H01M10/40
CPC分类号： H01M10/0583 , H01M2/0222 , H01M2/027 , H01M2/0275 , H01M2/1241 , H01M4/13 , H01M4/587 , H01M4/669 , H01M6/10 , H01M6/103 , H01M6/164 , H01M10/0427 , H01M10/0431 , H01M10/052 , H01M10/0525 , H01M10/0568 , H01M10/0569 , H01M10/0585 , H01M10/0587 , H01M2004/021 , H01M2006/106
摘要： A non-aqueous electrolyte secondary cell containing an electricity-generating element with at least a cathode, a separator and an anode and a non-aqueous electrolyte inside a cathode case, electrode units each consisting of the cathode and the anode opposite to each another via the separator laminated to form an electrode group, or an electrode unit in a sheet form consisting of the cathode and the anode opposite to each another via the separator wound to form an electrode group, or a sheet-shape cathode wrapped with the separator except for a part contacting at inner face of cathode case and a sheet-shaped anode set on the sheet-shaped cathode in a right angled position each other and bent alternately to form an electrode group, and the total sum of the areas of the opposing cathode and anode in the electrode group larger than the area of the opening of an insulating gasket in a sealed portion in the cathode case or than the area of an opening in a sealed plate in a sealed portion in the cathode case.
摘要翻译：一种非水电解质二次电池，其含有至少具有阴极的发电元件，隔膜和阳极以及阴极外壳内的非水电解质，每个由阴极和阳极彼此相对的通孔构成的电极单元层叠以形成电极组的隔板或由阴极和阳极组成的片状形式的电极单元经由卷绕形成电极组的隔膜或由隔膜包裹的片状阴极除了在阴极壳体的内表面上接触的部分和在片状阴极上设置成彼此成直角的位置的片状阳极交替地弯曲以形成电极组，并且相对的阴极和电极组中的阳极大于阴极壳体的密封部分中的绝缘垫圈的开口面积，或密封部分中的密封板中的开口面积阴极外壳。

5. 发明申请

US20050041938A1 Optical fiber fusion splicer 有权
标题翻译：光纤熔接机
公开(公告)号：US20050041938A1
公开(公告)日：2005-02-24
申请号：US10854794
申请日：2004-05-27
申请人： Kazunari Hattori , Ryuichiro Sato , Kazuo Iizuka
发明人： Kazunari Hattori , Ryuichiro Sato , Kazuo Iizuka
IPC分类号： G02B6/255
CPC分类号： G02B6/2551
摘要： The optical fiber fusion-splice device comprises a pair of electric discharge electrodes provided opposed to each other along a predetermined axis, a conductor electrode disposed on one side with respect to a plane with the predetermined axis contained therein, and section for generating electrostatic attraction in the direction tending from the above-described plane toward the one side, between the conductor electrode and the electric discharge path produced between the electric discharge electrodes. The means for generating electrostatic attraction is connected to the conductor electrode. This fusion splicer fusion-splices together the end portions of optical fibers disposed on the other side with respect to the above plane by electric discharge produced between the electric discharge electrodes.
摘要翻译：光纤熔接装置包括沿预定轴线彼此相对设置的一对放电电极，相对于其中包含预定轴线的平面设置在一侧的导体电极和用于产生静电吸引的部分导体电极与放电电极之间产生的放电路径之间从上述平面向一侧倾斜的方向。用于产生静电吸引的装置连接到导体电极。这种熔接机通过在放电电极之间产生的放电而将布置在另一侧的光纤的端部熔接在一起。

6. 发明授权

US5777867A Electric discharge method and apparatus 失效
标题翻译：放电方法和装置
公开(公告)号：US5777867A
公开(公告)日：1998-07-07
申请号：US694494
申请日：1996-08-07
申请人： Hidetoshi Hongu , Masahiro Hamada , Masumi Fukai , Kazuo Iizuka
发明人： Hidetoshi Hongu , Masahiro Hamada , Masumi Fukai , Kazuo Iizuka
IPC分类号： F02P23/04 , G02B6/255 , H02M7/538
CPC分类号： F02P23/04 , G02B6/2551 , F02P15/10 , F02P3/053
摘要： Herein disclosed are a method and an apparatus for supplying an electrical energy to a pair of discharge electrodes spaced apart from each other to cause an electric discharge in a gap between the discharge electrodes. There are firstly provided an alternating voltage generator for generating, as the electrical energy, an alternating voltage having a frequency, and a capacitor connected to the discharge electrodes in series. The alternating voltage generator has a series resonant frequency. The alternating voltage of the alternating voltage generator is applied to the discharge electrodes through the capacitor. The frequency of the alternating voltage is set approximately to the series resonant frequency of the alternating voltage generator to cause a dielectric breakdown in and allow an electric discharge current to flow through the gap between the discharge electrodes. Alternatively, the frequency of the alternating voltage may be approximated to the series resonant frequency of the alternating voltage generator, for example, from a frequency higher than the series resonant frequency.
摘要翻译：这里公开了一种用于向彼此间隔开的一对放电电极提供电能以在放电电极之间的间隙中放电的方法和装置。首先提供一种交流电压发生器，用于产生具有频率的交流电压和连接到放电电极的电容器作为电能。交流电压发生器具有串联谐振频率。交流电压发生器的交流电压通过电容器施加到放电电极。交流电压的频率大致设定为交流电压发生器的串联谐振频率，导致电介质击穿，并允许放电电流流过放电电极之间的间隙。或者，交流电压的频率可以例如从高于串联谐振频率的频率近似为交流发电机的串联谐振频率。

7. 发明授权

US4714383A Insert rotary cutter 失效
标题翻译：插入旋转切割机
公开(公告)号：US4714383A
公开(公告)日：1987-12-22
申请号：US887626
申请日：1986-07-21
申请人： Hiroshi Shimomura , Kazuo Iizuka , Makoto Harano , Akifumi Hamada
发明人： Hiroshi Shimomura , Kazuo Iizuka , Makoto Harano , Akifumi Hamada
IPC分类号： B23C5/08 , B23C5/22 , B23C5/20
CPC分类号： B23C5/1072 , B23C5/08 , B23C5/2221 , B23C2200/0416 , B23C2200/0433 , B23C2200/123 , B23C2200/203 , B23C2200/367 , Y10S408/713 , Y10T407/1924 , Y10T407/1958 , Y10T407/1964 , Y10T407/23 , Y10T408/906
摘要： An insert rotary cutter for processing a metal workpiece includes a cutter body of a generally circular cross-section having an axis of rotation therethrough. The cutter includes one or more cutter inserts releasably mounted on a periphery of the cutter body. The insert includes a generally quadrilateral plate defined by a front face, a rear face disposed generally parallel to the front face and four side faces. The insert has a pair of main cutting edges defined by the front face and one pair of the opposite side faces. The pair of opposite side faces serve as respective rake surfaces for the main cutting edges. Each of the rake surfaces is convexly curved in such a manner that the width of the insert between the rake surfaces is larger at a central portion of each main cutting edge than at opposite ends of the main cutting edge.
摘要翻译：用于处理金属工件的插入式旋转切割器包括具有通过其旋转的轴线的大致圆形横截面的刀具本体。切割器包括可释放地安装在切割器主体的周边上的一个或多个切割器刀片。插入件包括由前表面限定的大致四边形板，大体上平行于前表面设置的后表面和四个侧面。刀片具有由前表面和一对相对侧面限定的一对主切削刃。一对相对的侧面用作主切削刃的相应的前刀面。每个前刀面以这样的方式凸出地弯曲，使得前刀面之间的刀片的宽度在每个主切削刃的中心部分比在主切削刃的相对端处更大。

8. 发明授权

US07158210B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US07158210B2
公开(公告)日：2007-01-02
申请号：US10762481
申请日：2004-01-23
申请人： Kazuo Iizuka , Junji Isohata , Nobuyoshi Tanaka
发明人： Kazuo Iizuka , Junji Isohata , Nobuyoshi Tanaka
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70791 , G03F7/70066 , G03F7/70291 , G03F7/70425 , G03F7/70466 , G03F7/70475
摘要： A projection exposure apparatus with a small size and low cost suitable for repeated pattern exposure. The apparatus includes an illumination system which irradiates light to a mask including plural columns of a mask pattern for repeated exposure to a member to form plural columns of an exposure pattern, a projection system which projects light from the mask onto the member, an exposure stage which moves the member, and a mask stage which moves the mask. The light irradiation and step driving of the exposure stage for moving the member by a movement amount equal to n times a pitch of the columns of the exposure pattern are alternately performed. The mask is moved by a movement amount equal to n times a pitch of the columns of the mask pattern with step driving of the exposure stage in early and later phases of the repeated exposure.
摘要翻译：具有小尺寸和低成本的投影曝光装置，适用于重复图案曝光。该装置包括照射系统，其将光照射到包括多个掩模图案列的掩模，用于反复暴露于构件以形成多列曝光图案;投影系统，其将来自掩模的光投射到构件上;曝光台移动该构件，以及移动面罩的掩模台。交替执行用于使构件移动移动量等于曝光图案的列的间距的n倍的曝光台的光照射和阶跃驱动。通过在反复曝光的早期阶段和稍后阶段中曝光阶段的步进驱动，将掩模移动等于掩模图案的列的间距的n倍的移动量。

9. 发明授权

US07030962B2 Projection exposure mask, projection exposure apparatus, and projection exposure method 失效
标题翻译：投影曝光掩模，投影曝光装置和投影曝光方法
公开(公告)号：US07030962B2
公开(公告)日：2006-04-18
申请号：US10762468
申请日：2004-01-23
申请人： Kazuo Iizuka , Junji Isohata , Nobuyoshi Tanaka
发明人： Kazuo Iizuka , Junji Isohata , Nobuyoshi Tanaka
IPC分类号： G03B27/42 , G03B27/32 , G03F9/00
CPC分类号： G03F7/7005 , G03F7/70208 , G03F7/70283 , G03F7/70308 , G03F7/70358 , G03F7/70466 , G03F7/70791
摘要： A projection exposure apparatus includes a projection exposure mask. The projection exposure mask includes a first mask pattern for exposing a member to form a continuous pattern thereon and a second mask pattern for exposing the member to form a discontinuous pattern thereon, one of the first and second mask patterns being a reflecting type mask and the other mask pattern being a transmitting type mask pattern, a projection system which projects light from the reflecting type mask pattern and light from the transmitting type mask pattern onto the member, a first illumination system which irradiates light to the reflecting type mask pattern from one side of the projection exposure mask, a second illumination system which irradiates light to the transmitting type mask pattern from the opposite side of the one side of the projection exposure mask, and a substrate stage which moves the member in a direction substantially orthogonal to a projection light axis of the projection system.
摘要翻译：投影曝光装置包括投影曝光掩模。投影曝光掩模包括用于曝光构件以形成其上的连续图案的第一掩模图案和用于使构件暴露以在其上形成不连续图案的第二掩模图案，第一和第二掩模图案中的一个是反射型掩模，其他掩模图案是透射型掩模图案，将来自反射型掩模图案的光和来自透射型掩模图案的光投射到构件上的投影系统，从一侧向反射型掩模图案照射光的第一照明系统投影曝光掩模的第二照明系统，从投影曝光掩模的一侧的相对侧向发射型掩模图案照射光的第二照明系统;以及基板台，该基板台沿与投影光线大致正交的方向移动投影系统的轴。

10. 发明授权

US06280306B1 Wafer polishing apparatus and wafer manufacturing method 有权
标题翻译：晶圆抛光装置及晶圆制造方法
公开(公告)号：US06280306B1
公开(公告)日：2001-08-28
申请号：US09497854
申请日：2000-02-04
申请人： Kanji Hosoki , Hiroshi Shibaya , Masahito Komasaki , Jiro Sano , Kazuo Iizuka
发明人： Kanji Hosoki , Hiroshi Shibaya , Masahito Komasaki , Jiro Sano , Kazuo Iizuka
IPC分类号： B24B2900
CPC分类号： B24B37/30 , B24B37/32
摘要： The invention provides a wafer polishing apparatus and a wafer manufacturing method which can improve uniformity in polishing wafer surfaces. A wafer holding head comprises a head body; a diaphragm stretched inside the head body; a carrier fixed to the diaphragm to be displaceable in the direction of a head axis while holding the wafer; a retainer ring disposed around the carrier in concentric relation and fixed to the diaphragm to be displaceable in the direction of the head axis; and a thin plate disposed so as to project from the head body along a surface of the diaphragm. With the provision of the thin plate, an excessive pressing force acting upon the retainer ring from the diaphragm is suppressed, and the wafer surface can be prevented from being excessively polished at an outer peripheral edge.
摘要翻译：本发明提供一种可以提高抛光晶片表面的均匀性的晶片抛光装置和晶片制造方法。晶片保持头包括头体; 头部主体内部的隔膜; 固定在所述隔膜上的载体，以便在保持所述晶片的同时在头轴线的方向上移动; 保持环，其以同心关系设置在所述载体周围，并且固定到所述隔膜以能够沿所述头部轴线的方向移位; 以及薄板，其设置成沿着所述隔膜的表面从所述头本体突出。通过设置薄板，可以抑制从隔膜作用在保持环上的过大的按压力，并且可以防止晶片表面在外周缘处被过度抛光。

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