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    • 2. 发明授权
    • Apparatus and method for forming deposited film
    • 用于形成沉积膜的装置和方法
    • US07001640B2
    • 2006-02-21
    • US10627603
    • 2003-07-28
    • Hirokazu OtoshiHiroshi IzawaMasatoshi Tanaka
    • Hirokazu OtoshiHiroshi IzawaMasatoshi Tanaka
    • C23C16/00
    • C23C16/4402C23C16/545Y10T137/0452
    • The object of the present invention is to provide an apparatus and method for forming a deposited film which can repeatedly form a large amount of functional deposited films with good reproducibility without degradation in the characteristics of films formed even when gas leakage occurs in a shut-off valve, and without reducing the yield as a result when gas leakage occurs in the shut-off valve, by immediately detecting and repairing it. The deposited film forming apparatus according to the present invention comprises: a chamber capable of maintaining an interior thereof under vacuum; a source gas supply piping for supplying a source gas into the chamber; an evacuation system piping for evacuating the interior of the chamber; a gas supply piping for use in opening to atmosphere, for supplying a gas for returning a pressure within the chamber to atmospheric pressure, wherein a plurality of shut-off valves are provided in series between a gas source of the gas for returning the pressure within the chamber to the atmospheric pressure and the chamber, and a pressure-gauge and/or evacuating means are provided between the plurality of shut-off valves.
    • 本发明的目的是提供一种用于形成沉积膜的装置和方法,其可以重复地形成大量的具有良好重现性的功能性沉积膜,而不会在形成的膜的特性中劣化,即使在关闭时发生气体泄漏 阀,并且在通过立即检测和修理关闭阀时发生气体泄漏的结果而不降低产量。 根据本发明的沉积膜形成装置包括:能够将其内部保持在真空下的室; 用于将源气体供应到所述室中的源气体供应管道; 用于排空室内部的抽空系统管道; 用于向大气开放的气体供应管道,用于供应用于将所述室内的压力返回到大气压力的气体,其中多个截止阀串联设置在所述气体的气体源之间,用于使所述气体中的压力返回 所述室到大气压力和所述室,并且在所述多个截止阀之间设置有压力表和/或排气装置。