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    • 1. 发明申请
    • SUBSTRATE SURFACE DEFECT INSPECTION METHOD AND INSPECTION DEVICE
    • 基板表面缺陷检查方法和检查装置
    • US20130077092A1
    • 2013-03-28
    • US13565833
    • 2012-08-03
    • Hideaki SASAZAWAShigeru SERIKAWAKiyotaka HORIEYu YANAKA
    • Hideaki SASAZAWAShigeru SERIKAWAKiyotaka HORIEYu YANAKA
    • G01N21/956
    • G01N21/94G01N21/95
    • A substrate surface inspection device includes an inspection optical system irradiating at least one light onto a substrate, which is an inspection target and carried on a turnable stage, and having at least one detector detecting reflected or scattered light from the substrate, a detector processing the signals, which are outputted from the at least one detector and A/D converted, and detecting a defect on the substrate, an output calculator performing scattered light simulation on a defect detection model and estimating a plurality of detector outputs; and a classifier constructor constructing a classifier by mechanical learning of a rule base, wherein the classifier constructor is adapted to present collection of a necessary actual defect sample on the basis of the classifier obtained by scattered light simulation, and construct the classifier under necessary and sufficient conditions.
    • 基板表面检查装置包括检查光学系统,其将至少一个光照射到作为检查对象的基板上并承载在可转动台上,并且具有至少一个检测器,其检测来自基板的反射或散射光,检测器处理 信号,其从所述至少一个检测器输出并进行A / D转换,并检测所述基板上的缺陷;输出计算器,对缺陷检测模型执行散射光模拟并估计多个检测器输出; 以及通过规则库的机械学习构建分类器的分类器构造器,其中分类器构造器适于基于通过散射光模拟获得的分类器来呈现必要的实际缺陷样本的收集,并且在必要且足够的情况下构建分类器 条件。
    • 2. 发明申请
    • PATTERN SHAPE INSPECTION INSTRUMENT AND PATTERN SHAPE INSPECTION METHOD, INSTRUMENT FOR INSPECTING STAMPER FOR PATTERNED MEDIA AND METHOD OF INSPECTING STAMPER FOR PATTERNED MEDIA, AND PATTERNED MEDIA DISK MANUFACTURING LINE
    • 图案形状检查仪器和图案形状检查方法,用于检查图案印刷机的仪器和检查图案印刷机的方法和图形媒体制造线
    • US20110272096A1
    • 2011-11-10
    • US13103635
    • 2011-05-09
    • Shigeru SERIKAWARyuta SUZUKIToshiaki SUGITAKiyotaka HORIE
    • Shigeru SERIKAWARyuta SUZUKIToshiaki SUGITAKiyotaka HORIE
    • C23F1/08G01N21/88
    • G01N21/956
    • The present invention specifies a stamper that causes a defect at an early stage by inspecting a surface of a patterned medium and failure in molding of a pattern shape of a stamper at high speed or extracting a defect resulting from the stamper based upon a defect of a pattern on a disk so as to prevent the occurrence of a large quantity of failure beforehand. In the present invention, in order to inspect a pattern shape, wide-band light including a deep ultraviolet ray is radiated onto an inspected object, reflected light generated from the inspected object irradiated by an radiating optical system is detected, and it is judged whether the channel spectral data having fixed wavelength width of the detected reflected light exists within set limit or not. Similarly, the stamper is judged defective when the reflected light is diffracted and detected, detected spectral reflectance waveform data is compared with reference data, a defective area of a pattern of a resist film is extracted and the defective area acquired in the inspection data of the current inspection is the same as defective areas acquired in the inspection data of plural substrates inspected using the same stamper.
    • 本发明通过检查图案化介质的表面和高速成型压模的图案形状的失败或提取由于压模产生的缺陷而在早期引起缺陷的压模 以防止事故发生大量故障。 在本发明中,为了检查图案形状,将包含深紫外线的宽带光照射到检查对象物上,检测由被检查物体产生的被辐射光学系统照射的反射光,并判断是否 检测到的反射光的固定波长宽度的通道光谱数据存在于设定的限制内。 类似地,当反射光被衍射和检测时,压模被判定为有缺陷,检测到的光谱反射率波形数据与参考数据进行比较,提取抗蚀剂膜的图案的缺陷区域以及在检测数据中获取的缺陷区域 当前检查与使用同一压模检查的多个基板的检查数据中获取的缺陷区域相同。
    • 4. 发明申请
    • OPTICAL INSPECTION METHOD AND ITS APPARATUS
    • 光学检测方法及其设备
    • US20120046885A1
    • 2012-02-23
    • US13209555
    • 2011-08-15
    • Shigeru SERIKAWABin Abdulrashid FARIZKeiji KATO
    • Shigeru SERIKAWABin Abdulrashid FARIZKeiji KATO
    • G01N21/88G06F19/00
    • G11B19/048G01N21/89G01N21/95
    • The present invention provides an optical inspection method capable of detecting a finer defect in the surface of a substrate, including the steps of: irradiating a surface of a sample which is rotating and continuously moving in one direction with illumination light which is incident in a direction obliquely to the sample surface; detecting an image of light formed by a forward scattering light around an optical axis of regular-reflection light while excluding the regular-reflection light from the sample surface irradiated with the illumination light; condensing and detecting lateral scattering light which scatters laterally from the sample surface with respect to an incidence direction of the illumination light; and processing a signal obtained by detecting the image of light formed by the forward scattering light and a signal obtained by condensing and detecting the lateral scattering light to extract a defect including a scratch defect.
    • 本发明提供一种能够检测基板表面更细的缺陷的光学检查方法,包括以下步骤:照射沿一个方向入射的照明光沿一个方向旋转并连续移动的样品的表面 倾斜于样品表面; 检测由正射反射光的光轴周围的前向散射光形成的光的图像,同时排除来自照射光的样品表面的正反射光; 冷凝和检测相对于照明光的入射方向从样品表面横向散射的横向散射光; 并且处理通过检测由前向散射光形成的光的图像获得的信号和通过聚焦和检测横向散射光而获得的信号,以提取包括划痕缺陷的缺陷。
    • 5. 发明申请
    • DETECTION METHOD OF PERIPHERAL SURFACE DEFECT OF DISK AND DETECTION DEVICE THEREOF
    • 碟片外周表面缺陷检测方法及其检测装置
    • US20080080346A1
    • 2008-04-03
    • US11865346
    • 2007-10-01
    • Shigeru SERIKAWATakayuki ISHIGURO
    • Shigeru SERIKAWATakayuki ISHIGURO
    • G11B5/58
    • G11B19/12
    • A regularly reflected light made incident with an incident angle in a range of 45°±5° with respect to a surface of a chamfered portion of a disk is received by a light receiver The level reduction in the received light signal due to a flaw caused by the chuck traces is increased greatly to enlarge the level difference between the detection signals due to foreign matter and due to the flaw. Thereafter, the variation of signal reference level in the received light signal due to shifting in the up and down direction of the outer peripheral surface of the disk caused by rotation thereof is suppressed or canceled out. Thereby, the detection signal of the outer peripheral defect of which level in the received light signal is greatly reduced can be easily obtained.
    • 通过光接收器相对于盘的倒角部分的表面以45°±5°的入射角入射的规则反射光由于缺陷而被接收的光信号的电平降低 通过卡盘轨迹大大增加,由于异物和由于缺陷而增大检测信号之间的水平差。 此后,由于旋转引起的盘的外周面的上下方向的移动,接收到的光信号中的信号基准电平的变动被抑制或抵消。 因此,可以容易地获得接收光信号中的电平的外围缺陷的检测信号大大降低。