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1. 发明授权

US06614005B1 Device and method for thermally treating substrates 有权
标题翻译：用于基材热处理的装置和方法
公开(公告)号：US06614005B1
公开(公告)日：2003-09-02
申请号：US09979646
申请日：2001-12-13
申请人： Heinrich Walk , Roland Mader , Werner Blersch , Markus Hauf
发明人： Heinrich Walk , Roland Mader , Werner Blersch , Markus Hauf
IPC分类号： F27B514
CPC分类号： H01L21/2686 , H01L21/67115 , H05B3/0047
摘要： The aim of the invention is to provide an economical and homogenous thermal treatment for substrate. To this end, the inventive device and method for thermally treating substrates, especially semiconductor wafers, comprise at least one heating device for heating at least one substrate by electromagnetic radiation. Said heating device comprises at least two arc lamps, the radiation characteristics for each arc lamp being controlled individually, and the electromagnetic radiation of the arc lamps contributing essentially to the power density of the electromagnetic radiation of the heating device.
摘要翻译：本发明的目的是为基材提供经济和均匀的热处理。为此，用于热处理基板，特别是半导体晶片的本发明的装置和方法包括用于通过电磁辐射加热至少一个基板的至少一个加热装置。所述加热装置包括至少两个弧光灯，每个弧光灯的辐射特性被单独控制，并且电弧灯的电磁辐射基本上有助于加热装置的电磁辐射的功率密度。

2. 发明授权

US06775471B2 Method and device for thermally treating objects 失效
标题翻译：用于热处理物体的方法和装置
公开(公告)号：US06775471B2
公开(公告)日：2004-08-10
申请号：US10332119
申请日：2003-03-05
申请人： Werner Blersch , Jochen Urban , Silke Paul , Uwe Ruby , Markus Hauf
发明人： Werner Blersch , Jochen Urban , Silke Paul , Uwe Ruby , Markus Hauf
IPC分类号： F26B330
CPC分类号： G05D23/1904 , G05D23/1917
摘要： The invention relates to a method and to a device for thermally treating objects. The aim of the invention is to facilitate a better control of the temperature profile of an object to be thermally treated. To this end, the invention provides a method and a device for thermally treating an object in a heating system, especially for treating semiconductor wafers (2) in a rapid heating system (1). The objects are thermally treated at a predetermined temperature progression and the temperature of the object is controlled via a PID control and a feedforward control that are based on a simulation model of the heating system and the object. Said model consists of individual models of components of the heating system and/or the object. The parameters of at least one of the individual models are monitored during the thermal treatment and the model is adapted to the monitored parameters.
摘要翻译：本发明涉及一种用于热处理物体的方法和装置。本发明的目的是有助于更好地控制待热处理的物体的温度分布。为此，本发明提供了一种用于热处理加热系统中的物体的方法和装置，特别是用于处理快速加热系统（1）中的半导体晶片（2）。物体以预定的温度进行热处理，并且通过基于加热系统和物体的模拟模型的PID控制和前馈控制来控制物体的温度。所述模型由加热系统和/或物体的各个部件组成。在热处理期间监测至少一个单独模型的参数，并且模型适应于所监测的参数。

3. 发明授权

US06191392B1 Method of measuring electromagnetic radiation 有权
标题翻译：电磁辐射测量方法
公开(公告)号：US06191392B1
公开(公告)日：2001-02-20
申请号：US09208955
申请日：1998-12-08
申请人： Markus Hauf , Thomas Knarr , Heinrich Walk , Horst Balthasar , Uwe Müller
发明人： Markus Hauf , Thomas Knarr , Heinrich Walk , Horst Balthasar , Uwe Müller
IPC分类号： A21B100
CPC分类号： G01J5/0003
摘要： A method is provide for measuring electromagnetic radiation radiated from a surface of an object that is irradiated by electromagnetic radiation given off by at least one radiation source. The radiation given off by the radiation source is determined by at least one first detector, and the radiation given off by the irradiated object is determined by at least one second detector that measures the radiation. The radiation from the at least one radiation source is actively modulated with at least one characteristic parameter. The radiation determined by the second detector is corrected with the radiation determined by the first detector to compensate for the radiation of the radiation source reflected from the object.
摘要翻译：提供一种测量从被至少一个辐射源发出的电磁辐射照射的物体表面辐射的电磁辐射的方法。由辐射源发出的辐射由至少一个第一检测器确定，由照射物体放出的辐射由至少一个测量辐射的第二检测器确定。来自至少一个辐射源的辐射被至少一个特征参数主动调制。用由第一检测器确定的辐射来校正由第二检测器确定的辐射，以补偿从物体反射的辐射源的辐射。

4. 发明授权

US06369363B2 Method of measuring electromagnetic radiation 有权
标题翻译：电磁辐射测量方法
公开(公告)号：US06369363B2
公开(公告)日：2002-04-09
申请号：US09789942
申请日：2001-02-16
申请人： Markus Hauf , Thomas Knarr , Heinrich Walk , Horst Balthasar , Uwe Müller
发明人： Markus Hauf , Thomas Knarr , Heinrich Walk , Horst Balthasar , Uwe Müller
IPC分类号： F27D1100
CPC分类号： G01J5/0003
摘要： A method is provide for measuring electromagnetic radiation radiated from a surface of an object that is irradiated by electromagnetic radiation given off by at least one radiation source. The radiation given off by the radiation source is determined by at least one first detector, and the radiation given off by the irradiated object is determined by at least one second detector that measures the radiation. The radiation from the at least one radiation source is actively modulated with at least one characteristic pyrometer. The radiation determined by the second detector is corrected with the radiation determined by the first detector to compensate for the radiation of the radiation source reflected from the object.
摘要翻译：提供一种测量从被至少一个辐射源发出的电磁辐射照射的物体表面辐射的电磁辐射的方法。由辐射源发出的辐射由至少一个第一检测器确定，由照射物体放出的辐射由至少一个测量辐射的第二检测器确定。来自至少一个辐射源的辐射用至少一个特征性高温计主动调制。用由第一检测器确定的辐射来校正由第二检测器确定的辐射，以补偿从物体反射的辐射源的辐射。

5. 发明授权

US08861102B2 Lithographic apparatus and thermal optical manipulator control method 有权
标题翻译：平版印刷设备和热光机械手控制方法
公开(公告)号：US08861102B2
公开(公告)日：2014-10-14
申请号：US13187751
申请日：2011-07-21
申请人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
IPC分类号： G02B7/02 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

6. 发明申请

US20130176544A1 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus 有权
公开(公告)号：US20130176544A1
公开(公告)日：2013-07-11
申请号：US13784979
申请日：2013-03-05
申请人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
发明人： Markus Hauf , Norman Baer , Holger Walter , Joachim Hartjes
IPC分类号： G03F7/20 , G01J5/02
CPC分类号： G03F7/70058 , G01J5/02 , G02B7/181 , G02B7/1815 , G03F7/70266 , G03F7/70891
摘要： The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

7. 发明授权

US08325322B2 Optical correction device 有权
标题翻译：光学校正装置
公开(公告)号：US08325322B2
公开(公告)日：2012-12-04
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
IPC分类号： G03B27/68 , G03B27/52
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译：本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。此外，本公开涉及影响光学元件中的温度分布的方法。

8. 发明申请

US20120044474A1 OPTICAL MODULE FOR GUIDING A RADIATION BEAM 审中-公开
标题翻译：用于引导辐射束的光学模块
公开(公告)号：US20120044474A1
公开(公告)日：2012-02-23
申请号：US13075929
申请日：2011-03-30
申请人： Markus Hauf , Severin Waldis , Wilfried Noell , Yves Petremend , Marco Jassman , Lothar Kulzer , Caglar Ataman
发明人： Markus Hauf , Severin Waldis , Wilfried Noell , Yves Petremend , Marco Jassman , Lothar Kulzer , Caglar Ataman
IPC分类号： G03B27/54 , G03B27/32 , G02B7/182
CPC分类号： G03F7/7015 , G02B7/1815 , G02B26/0816 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/70291 , G03F7/70891
摘要： An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of individual mirrors, the reflection faces of which complement one another to form an overall mirror reflection face. A support structure is in each case mechanically connected via a thermally conductive portion to a mirror body of the respective individual mirror. At least some of the mirror bodies have an associated actuator for the predetermined displacement of the mirror body relative to the support structure in at least one degree of freedom. The thermally conductive portions are configured to dissipate a thermal power density of at least 1 kW/m2 absorbed by the mirror bodies to the support structure. In one aspect of the optical module, an integrated electronic displacement circuit is associated with each of the displaceable individual mirrors in spatial proximity, and a central control device has a signal connection with the integrated electronic displacement circuits of the displaceable individual mirrors. The result is an optical module, with which an illumination optical system can be constructed, which, even with a non-negligible thermal load on the individual mirrors, ensures a high EUV radiation throughput.
摘要翻译：光学模块用于引导EUV辐射束。光学模块具有能够抽真空的腔室和容纳在腔室中的至少一个反射镜。反射镜具有多个单独的反射镜，其反射面相互补充以形成整体的镜面反射面。在每种情况下，支撑结构通过导热部分机械连接到各个反射镜的镜体。至少一些镜体具有相关联的致动器，用于在至少一个自由度中相对于支撑结构预定位移镜体。导热部分被配置为将由镜体吸收的至少1kW / m 2的热功率密度消散到支撑结构。在光学模块的一个方面，集成电子位移电路与空间接近的每个可移动的独立反射镜相关联，并且中央控制装置具有与可移动的各个反射镜的集成电子位移电路的信号连接。结果是可以构造照明光学系统的光学模块，其甚至在各个反射镜上具有不可忽视的热负载，确保高的EUV辐射通量。

9. 发明申请

US20120026476A1 DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT 有权
标题翻译：用于控制光学元件温度的装置
公开(公告)号：US20120026476A1
公开(公告)日：2012-02-02
申请号：US13268303
申请日：2011-10-07
申请人： Markus Hauf
发明人： Markus Hauf
IPC分类号： G03B27/52 , G02B5/08
CPC分类号： G03F7/70891 , G02B5/08 , G02B5/0891 , G02B7/008 , G02B7/1815 , G03B27/26 , G03F7/70008 , G03F7/70825 , G05D23/1919 , G21K1/067 , H01L2924/0002 , H01L2924/00
摘要： A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.
摘要翻译：该装置用于控制在真空气氛中提供的光学元件的温度。该装置具有冷却装置，该冷却装置具有与该光学元件隔开的辐射冷却部，用于通过辐射热传递来冷却该光学元件。控制器用于控制辐射冷却部件的温度。此外，该装置包括用于加热光学元件的加热部件。加热部连接到控制器，用于控制加热部件的温度。用于特别控制温度的所得装置可以与EUV微光刻工具中的光学元件一起使用，导致其光学器件的稳定性能。

10. 发明授权

US08064151B2 Lithographic apparatus and thermal optical manipulator control method 有权
标题翻译：平版印刷设备和热光机械手控制方法
公开(公告)号：US08064151B2
公开(公告)日：2011-11-22
申请号：US11889583
申请日：2007-08-14
申请人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
发明人： Bastiaan Stephanus Hendricus Jansen , Ulrich Schönhoff , Markus Hauf
IPC分类号： G02B7/02 , H05B1/02
CPC分类号： G03F7/70891 , G03F7/70533 , Y10S359/90
摘要： A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.
摘要翻译：提供了一种用于控制热光学元件的加热的控制方法，所述热光学元件具有加热器元件的矩阵。该方法包括用反馈回路来稳定热光学元件的标称温度，以控制加热元件的加热; 通过设定点信号提供所述热光学元件的期望温度曲线; 从所述设定点信号确定所述加热器元件的前馈控制; 并将前馈控制的输出向前馈送到反馈回路中。

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