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1. 发明授权

US08542275B2 Method and apparatus for cross-section processing and observation 有权
标题翻译：横截面加工和观察的方法和装置
公开(公告)号：US08542275B2
公开(公告)日：2013-09-24
申请号：US12880626
申请日：2010-09-13
申请人： Masahiro Kiyohara , Makoto Sato , Haruo Takahashi , Junichi Tashiro
发明人： Masahiro Kiyohara , Makoto Sato , Haruo Takahashi , Junichi Tashiro
IPC分类号： H04N7/18
CPC分类号： G01N23/2255
摘要： A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample.
摘要翻译：截面处理和观察方法包括：通过使用聚焦离子束的蚀刻处理在样品中形成第一横截面; 通过将聚焦的离子束照射到第一横截面来获得第一横截面的图像信息; 通过对所述第一横截面进行蚀刻处理形成第二横截面; 通过将聚焦离子束照射到包括第二横截面的照射区域来获得第二横截面的图像信息; 从第二横截面的图像信息中显示照射区域的显示区域的一部分的图像信息; 通过将第一横截面的图像信息叠加在正在显示的图像信息上来显示图像信息; 并且在照射区域内移动显示区域。可以获得显示区域对准的观察图像，同时减少对样品的损伤。

2. 发明申请

US20110052044A1 METHOD AND APPARATUS FOR CROSS-SECTION PROCESSING AND OBSERVATION 审中-公开
标题翻译：交叉处理和观察的方法和装置
公开(公告)号：US20110052044A1
公开(公告)日：2011-03-03
申请号：US12873886
申请日：2010-09-01
申请人： Haruo Takahashi , Masahiro Kiyohara , Makoto Sato , Junichi Tashiro
发明人： Haruo Takahashi , Masahiro Kiyohara , Makoto Sato , Junichi Tashiro
IPC分类号： G06T7/00
CPC分类号： G01N23/2255 , H01J2237/221
摘要： A cross-section processing and observation method includes: forming a cross section in a sample by a focused ion beam through etching processing; obtaining a cross-section observation image through cross-section observation by the focused ion beam; and forming a new cross section by performing etching processing in a region including the cross section and obtaining a cross-section observation image of the new cross section. A surface observation image of a region including a mark on the sample and the cross section is obtained. A position of the mark is recognized in the surface observation image and etching processing is performed on the cross section by setting, in reference to the position of the mark, a focused ion beam irradiation region in which to form the new cross section. Cross-section processing and observation is thus enabled continuously and efficiently using a focused ion beam apparatus having no SEM apparatus.
摘要翻译：截面处理和观察方法包括：通过蚀刻处理通过聚焦离子束在样品中形成横截面; 通过聚焦离子束的横截面观察获得横截面观察图像; 并且通过在包括横截面的区域中进行蚀刻处理并获得新横截面的横截面观察图像来形成新的横截面。获得包括样品上的标记和横截面的区域的表面观察图像。在表面观察图像中识别标记的位置，并且通过关于标记的位置设置形成新横截面的聚焦离子束照射区域来对截面进行蚀刻处理。因此，使用不具有SEM装置的聚焦离子束装置，能够连续有效地进行横截面加工和观察。

3. 发明授权

US08426830B2 Focused ion beam apparatus, sample processing method using the same, and computer program for focused ion beam processing 有权
标题翻译：聚焦离子束装置，使用其的样品处理方法和用于聚焦离子束处理的计算机程序
公开(公告)号：US08426830B2
公开(公告)日：2013-04-23
申请号：US12613107
申请日：2009-11-05
申请人： Makoto Sato , Masahiro Kiyohara , Junichi Tashiro
发明人： Makoto Sato , Masahiro Kiyohara , Junichi Tashiro
IPC分类号： G21G4/00
CPC分类号： H01J37/3056 , H01J37/222 , H01J37/304 , H01J2237/221 , H01J2237/24507 , H01J2237/30416 , H01J2237/31745 , H01J2237/31749
摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.
摘要翻译：聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

4. 发明申请

US20100155624A1 FOCUSED ION BEAM APPARATUS, SAMPLE PROCESSING METHOD USING THE SAME, AND COMPUTER PROGRAM FOR FOCUSED ION BEAM PROCESSING 有权
标题翻译：聚焦离子束装置，使用该方法的样品处理方法和用于聚焦离子束处理的计算机程序
公开(公告)号：US20100155624A1
公开(公告)日：2010-06-24
申请号：US12613107
申请日：2009-11-05
申请人： Makoto Sato , Masahiro Kiyohara , Junichi Tashiro
发明人： Makoto Sato , Masahiro Kiyohara , Junichi Tashiro
IPC分类号： H01J37/08 , G21K5/04
CPC分类号： H01J37/3056 , H01J37/222 , H01J37/304 , H01J2237/221 , H01J2237/24507 , H01J2237/30416 , H01J2237/31745 , H01J2237/31749
摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.
摘要翻译：聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

5. 发明申请

US20060118733A1 Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method 有权
标题翻译：确定带电粒子束装置的加工位置的方法和该方法中使用的红外显微镜
公开(公告)号：US20060118733A1
公开(公告)日：2006-06-08
申请号：US11286684
申请日：2005-11-23
申请人： Masahiro Kiyohara , Makoto Sato , Tatsuya Asahata
发明人： Masahiro Kiyohara , Makoto Sato , Tatsuya Asahata
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J2237/317
摘要： A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while performing an observation by an infrared microscope, and by a using a laser optical system disposed coaxially with an optical observation system, the mark made at the periphery of the processing/observation object area. Next, by a superposition of an infrared transmission image and a CAD data, the processing/observation object area and the laser mark are registered onto the CAD data. And, by a correlation of the registered data read from the charged particle beam apparatus and the secondary charged particle image, it is possible to accurately and easily determine the processing position.
摘要翻译：作为带电粒子束装置中的二次带电粒子图像的定位标记的激光标记是通过移动带电粒子束装置中的样品处理/观察区域进行观察的场所，同时进行观察通过使用与光学观察系统同轴设置的激光光学系统，在处理/观察对象区域的周围形成标记。接下来，通过红外透射图像和CAD数据的叠加，将处理/观察对象区域和激光标记登记在CAD数据上。并且，通过从带电粒子束装置读取的登录数据与二次带电粒子图像的相关性，可以准确且容易地确定处理位置。

6. 发明授权

US07459699B2 Method of determining processing position in charged particle beam apparatus, and infrared microscope used in the method 有权
标题翻译：确定带电粒子束装置的加工位置的方法和该方法中使用的红外显微镜
公开(公告)号：US07459699B2
公开(公告)日：2008-12-02
申请号：US11286684
申请日：2005-11-23
申请人： Masahiro Kiyohara , Makoto Sato , Tatsuya Asahata
发明人： Masahiro Kiyohara , Makoto Sato , Tatsuya Asahata
IPC分类号： G01J1/00 , G01N21/00 , G01N23/00
CPC分类号： G01N23/225 , H01J2237/317
摘要： A laser mark which will be the positioning mark for a secondary charged particle image in the charged particle beam apparatus is applied by moving the sample processing/observation area in the charged particle beam apparatus so as to come into the view field while performing an observation by an infrared microscope, and by a using a laser optical system disposed coaxially with an optical observation system, the mark made at the periphery of the processing/observation object area. Next, by a superposition of an infrared transmission image and a CAD data, the processing/observation object area and the laser mark are registered onto the CAD data. And, by a correlation of the registered data read from the charged particle beam apparatus and the secondary charged particle image, it is possible to accurately and easily determine the processing position.
摘要翻译：作为带电粒子束装置中的二次带电粒子图像的定位标记的激光标记是通过移动带电粒子束装置中的样品处理/观察区域进行观察的场所，同时进行观察通过使用与光学观察系统同轴设置的激光光学系统，在处理/观察对象区域的周围形成标记。接下来，通过红外透射图像和CAD数据的叠加，将处理/观察对象区域和激光标记登记在CAD数据上。并且，通过从带电粒子束装置读取的登录数据与二次带电粒子图像的相关性，可以准确且容易地确定处理位置。

7. 发明申请

US20090134327A1 Defect recognizing method, defect observing method, and charged particle beam apparatus 审中-公开
标题翻译：缺陷识别方法，缺陷观察方法和带电粒子束装置
公开(公告)号：US20090134327A1
公开(公告)日：2009-05-28
申请号：US12290619
申请日：2008-10-31
申请人： Yutaka Ikku , Junichi Tashiro , Makoto Sato
发明人： Yutaka Ikku , Junichi Tashiro , Makoto Sato
IPC分类号： G01N23/00 , H01J3/14
CPC分类号： H01J37/3056 , H01J37/244 , H01J37/304 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01J2237/304 , H01J2237/31713 , H01J2237/3174 , H01J2237/31749
摘要： There are provided a detecting step of detecting secondary charged particles generated from an observation area of a sample when an electron beam or a focused ion beam is emitted onto the observation area under a certain irradiation condition; an image forming step of forming a plurality of observation images acquired by dividing the observation area and having an equal periodic pattern, from the secondary charged particles detected in the detecting step; and a defect recognizing step of recognizing a defect in the observation area from information on a difference acquired by comparing the plurality of observation images formed in the image forming step. Additionally, the detecting step, the image forming step, and the defect recognizing step are performed even when the electron beam or the focused ion beam is emitted onto the observation area under an irradiation condition different from the certain irradiation condition.
摘要翻译：提供了当在一定的照射条件下将电子束或聚焦离子束发射到观察区域时，检测从样本的观察区域产生的二次带电粒子的检测步骤; 图像形成步骤，从在检测步骤中检测到的二次带电粒子形成通过划分观察区域并具有相同的周期性图案而获得的多个观察图像; 以及从通过比较在图像形成步骤中形成的多个观察图像而获得的差异的信息，识别观察区域中的缺陷的缺陷识别步骤。此外，即使当电子束或聚焦离子束在与特定照射条件不同的照射条件下发射到观察区域上时，也执行检测步骤，图像形成步骤和缺陷识别步骤。

8. 发明申请

US20060192118A1 Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus 有权
标题翻译：样品高度调节方法，样品观察方法，样品处理方法和带电粒子束装置
公开(公告)号：US20060192118A1
公开(公告)日：2006-08-31
申请号：US11360948
申请日：2006-02-23
申请人： Junichi Tashiro , Yutaka Ikku , Makoto Sato
发明人： Junichi Tashiro , Yutaka Ikku , Makoto Sato
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： G01N23/2251 , H01J37/20 , H01J37/28 , H01J37/304 , H01J37/3056 , H01J2237/20235 , H01J2237/216 , H01J2237/221 , H01J2237/31745
摘要： Calculation means calculates a sample height for focusing an ion beam and an electron beam onto a same observation point, based on magnifications of a secondary electron image obtained by an irradiation with the ion beam and a secondary electron image obtained by an irradiation with the electron beam, and a distance between an observation point in the secondary electron image obtained by the irradiation with the ion beam and the observation point in the secondary electron image obtained by the irradiation with the electron beam.
摘要翻译：计算装置基于通过用离子束照射获得的二次电子图像的放大率和通过用电子束照射获得的二次电子图像计算用于将离子束和电子束聚焦在同一观察点上的样本高度以及通过用离子束照射获得的二次电子图像中的观察点与通过用电子束照射获得的二次电子图像中的观察点之间的距离。

9. 发明授权

US07423266B2 Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus 有权
标题翻译：样品高度调节方法，样品观察方法，样品处理方法和带电粒子束装置
公开(公告)号：US07423266B2
公开(公告)日：2008-09-09
申请号：US11360948
申请日：2006-02-23
申请人： Junichi Tashiro , Yutaka Ikku , Makoto Sato
发明人： Junichi Tashiro , Yutaka Ikku , Makoto Sato
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： G01N23/2251 , H01J37/20 , H01J37/28 , H01J37/304 , H01J37/3056 , H01J2237/20235 , H01J2237/216 , H01J2237/221 , H01J2237/31745
摘要： In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image including the observation point. An area including the observation point on the sample is then scan-irradiated with a second charged particle beam to obtain a second secondary electron image including the observation point. Thereafter, based on magnifications of the first secondary electron image and the second secondary electron image and a distance between the observation point in the first secondary electron image and the observation point in the second secondary electron image, a height of the sample required for focusing the first charged particle beam and the second charged particle beam on the observation point is calculated. A sample stage supporting the sample is then displaced so as to position the sample at the calculated sample height.
摘要翻译：在样品高度调节方法中，利用第一带电粒子束对包含样品上的观察点的区域进行扫描照射，以获得包括该观察点的第一二次电子图像。然后利用第二带电粒子束对样品上的观察点进行扫描照射，得到包含该观察点的第二二次电子像。此后，基于第一二次电子图像和第二二次电子图像的放大率和第一二次电子图像中的观察点与第二二次电子图像中的观察点之间的距离，聚焦所需的样本的高度计算观测点上的第一带电粒子束和第二带电粒子束。然后移动支撑样品的样品台，以将样品定位在计算的样品高度。

10. 发明申请

US20060138341A1 Method for specifying observing or working position and apparatus thereof, and method for working sample and apparatus thereof 有权
标题翻译：用于指定观察或工作位置的方法及其装置，及其作业方法及其装置
公开(公告)号：US20060138341A1
公开(公告)日：2006-06-29
申请号：US11313326
申请日：2005-12-21
申请人： Junichi Tashiro , Yutaka Ikku , Makoto Sato
发明人： Junichi Tashiro , Yutaka Ikku , Makoto Sato
IPC分类号： H01J3/14
CPC分类号： H01J37/222 , H01J37/28 , H01J37/3056 , H01J2237/24592 , H01J2237/2487 , Y10S707/99943 , Y10S707/99945
摘要： By indicating a desired position in any one image plane of a 1st image plane and a 2nd image plane and specifying a corresponding position in the other image plane by using a conversion function for mutually converting an coordinate system of the 1st image plane and that of the 2nd image plane, it is possible to specify a position, in the other image plane, corresponding to the desired position indicated in the any one image plane.
摘要翻译：通过使用用于相互转换第一图像平面和第二图像平面的坐标系的转换函数来指示第一图像平面和第二图像平面的任何一个图像平面中的期望位置并指定另一图像平面中的对应位置第二图像平面，可以在另一个图像平面中指定对应于任何一个图像平面中指示的期望位置的位置。

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