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1. 发明授权

US11823863B2 Ion implanter and model generation method 有权
公开(公告)号：US11823863B2
公开(公告)日：2023-11-21
申请号：US17973130
申请日：2022-10-25
申请人： SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
发明人： Kazuhisa Ishibashi , Tetsuya Kudo , Mikio Yamaguchi
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： H01J37/3171 , H01J37/304 , H01J2237/30416 , H01J2237/31703
摘要： An ion implanter including a beam generation device that generates an ion beam, based on an implantation recipe, a plurality of measurement devices that measure beam currents of the ion beam, and a control device. The control device acquires a data set including the beam currents and an implantation parameter in the implantation recipe, and evaluates measurement validity of the beam currents of the ion beam by using the model. The implantation parameter may be one of ion species, beam energy, a beam current, a beam size, a wafer tilt angle, a wafer twist angle and an average dose. The model may be built based on a plurality of past data sets acquired during a plurality of implantation process based on the implantation recipe.

2. 发明授权

US09875876B2 Charged particle beam writing apparatus and charged particle beam writing method 有权
公开(公告)号：US09875876B2
公开(公告)日：2018-01-23
申请号：US15384897
申请日：2016-12-20
申请人： NuFlare Technology, Inc.
发明人： Jun Yashima
IPC分类号： H01J37/147 , H01J37/317
CPC分类号： H01J37/1472 , H01J37/3026 , H01J37/3174 , H01J2237/30416 , H01J2237/3175 , H01J2237/31754 , H01J2237/31762 , H01J2237/31764 , H01J2237/31769
摘要： A charged particle beam writing apparatus according to an embodiment starts a wiring operation when the sum of the amount of shot data stored in a buffer memory of a transfer control calculator, the amount of shot data being transferred by a transfer unit, and the amount of shot data stored in a buffer memory of a deflection control circuit reaches the amount of data for one stripe region.

3. 发明申请

US20170200582A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
公开(公告)号：US20170200582A1
公开(公告)日：2017-07-13
申请号：US15384897
申请日：2016-12-20
申请人： NuFlare Technology, Inc.
发明人： Jun YASHIMA
IPC分类号： H01J37/147 , H01J37/317
CPC分类号： H01J37/1472 , H01J37/3026 , H01J37/3174 , H01J2237/30416 , H01J2237/3175 , H01J2237/31754 , H01J2237/31762 , H01J2237/31764 , H01J2237/31769
摘要： A charged particle beam writing apparatus according to an embodiment starts a wiring operation when the sum of the amount of shot data stored in a buffer memory of a transfer control calculator, the amount of shot data being transferred by a transfer unit, and the amount of shot data stored in a buffer memory of a deflection control circuit reaches the amount of data for one stripe region.

4. 发明申请

US20140237196A1 CHARGED PARTICLE BEAM WRITING APPARATUS, AND BUFFER MEMORY DATA STORAGE METHOD 有权
标题翻译：充电颗粒光束写入装置和缓冲存储器数据存储方法
公开(公告)号：US20140237196A1
公开(公告)日：2014-08-21
申请号：US14177489
申请日：2014-02-11
申请人： Nuflare Technology, Inc.
发明人： Jun Yashima , Yasuo Kato
IPC分类号： G06F3/06
CPC分类号： H01J37/3174 , G06F3/0631 , G06F3/0644 , H01J2237/30416
摘要： A charged particle beam writing apparatus includes a buffer memory including a memory region capable of contemporarily storing writing data for data processing regions, wherein writing data including data files is temporarily stored for each of the data processing regions, a dividing unit to divide the memory region of the buffer memory into a first region being large and a second region being small, a specifying unit to specify the memory region such that a data file being large is preferentially stored in the first region and a data file being small is stored at least in the second region, concerning the data files for each of the data processing regions included in the writing data, and a data processing unit to read data files corresponding to each of the data processing regions from the buffer memory, and to perform data processing using the read data files.
摘要翻译：一种带电粒子束写入装置，包括：缓冲存储器，包括能够同时存储用于数据处理区域的写入数据的存储区域，其中为每个数据处理区域临时存储包括数据文件的数据;划分单元，用于将存储区域所述缓冲存储器的第一区域较大，第二区域较小;指定单元，用于指定所述存储区域，使得较大数据文件被优先存储在所述第一区域中，并且数据文件小于至少第二区域，涉及包括在写入数据中的每个数据处理区域的数据文件，以及数据处理单元，用于从缓冲存储器读取与每个数据处理区域相对应的数据文件，并且使用读取数据文件。

5. 发明授权

US07917241B2 Method and system for increasing throughput during location specific processing of a plurality of substrates 有权
标题翻译：用于在多个基板的位置特定处理期间增加吞吐量的方法和系统
公开(公告)号：US07917241B2
公开(公告)日：2011-03-29
申请号：US11832198
申请日：2007-08-01
申请人： Nicolaus J. Hofmeester , Steven P. Caliendo
发明人： Nicolaus J. Hofmeester , Steven P. Caliendo
IPC分类号： G06F19/00 , C23F1/00
CPC分类号： H01J37/304 , C23C14/221 , C23C14/545 , C23C16/047 , C23C16/513 , C23C16/52 , H01J37/3023 , H01J37/3056 , H01J2237/0812 , H01J2237/30416 , H01J2237/30472 , H01J2237/3146 , H01J2237/3151
摘要： A method and system of location specific processing on a plurality of substrates is described. The method comprises measuring metrology data for the plurality of substrates. Thereafter, the method comprises computing correction data for a first substrate using the metrology data, followed by computing correction data for a second substrate using the metrology data. While computing the correction data for a second substrate, the method comprises applying the correction data for a first substrate to the first substrate using a gas cluster ion beam (GCIB).
摘要翻译：描述了在多个基板上的位置特定处理的方法和系统。该方法包括测量多个基板的测量数据。此后，该方法包括使用测量数据计算第一衬底的校正数据，随后使用度量数据计算第二衬底的校正数据。在计算第二衬底的校正数据的同时，该方法包括使用气体簇离子束（GCIB）将第一衬底的校正数据应用于第一衬底。

6. 发明授权

US07449898B2 Method and apparatus for reviewing defects by detecting images having voltage contrast 有权
标题翻译：通过检测具有电压对比度的图像来检查缺陷的方法和装置
公开(公告)号：US07449898B2
公开(公告)日：2008-11-11
申请号：US11704228
申请日：2007-02-09
申请人： Toshifumi Honda , Takehiro Hirai
发明人： Toshifumi Honda , Takehiro Hirai
IPC分类号： G01R31/00 , G01R31/305 , G01N23/00
CPC分类号： G01R31/307 , G01R31/2884 , H01J37/265 , H01J37/28 , H01J37/304 , H01J2237/221 , H01J2237/24564 , H01J2237/2487 , H01J2237/2594 , H01J2237/2817 , H01J2237/30416
摘要： In a traditional method for automatically obtaining high-magnification images of defects by using an electron microscope for defect-reviewing of a semiconductor wafer, high-magnification images of a voltage contrast changing part are obtained in the case of defects generating voltage contrast change, this made difficult to observe defects themselves generating voltage contrast change. In the present invention, based on energy of secondary electron to be detected, after obtaining two types of images, namely an image making voltage contrast conspicuous easily, and an image not making it easily, and acquiring a shape change area adjacent to a voltage contrast change area based on this area as a defect location, a high-magnification image can automatically be obtained.
摘要翻译：在通过使用电子显微镜自动获得高倍率图像的传统方法中，通过使用电子显微镜对半导体晶片进行缺陷检查，在产生电压对比度变化的缺陷的情况下，获得电压对比度变化部分的高倍率图像，难以观察缺陷本身产生电压对比度变化。在本发明中，基于被检测的二次电子的能量，在获得两种类型的图像之后，即容易形成明显的图像形成电压对比度，以及不容易进行图像的图像，并且获取与电压对比相邻的形状变化区域基于该区域的变化区域作为缺陷位置，可以自动获得高倍率图像。

7. 发明申请

US20050061975A1 Electron microscope observation system and observation method 有权
标题翻译：电子显微镜观察系统及观察方法
公开(公告)号：US20050061975A1
公开(公告)日：2005-03-24
申请号：US10963815
申请日：2004-10-14
申请人： Hideo Todokoro
发明人： Hideo Todokoro
IPC分类号： G01N23/04 , G01Q10/00 , G01Q30/02 , G01Q30/04 , H01J37/302 , H01J37/304 , G01N23/00
CPC分类号： H01J37/3023 , G01N23/04 , H01J37/304 , H01J2237/304 , H01J2237/30411 , H01J2237/30416
摘要： An electron microscope observation system and an observation method are provided. According to one aspect of the invention, an observation appointment and approval screen is displayed on the two image display units, and the sample preparation-processed in the observation center side based on an instruction given from the operation center is loaded, and observation of the sample is executed based on sample observation condition information to output image information, and the observation image is displayed on the two image display units, and charge processing is executed based on a content level of the observation including preparation processing of the sample and occupying hours of the electron microscope to display the charge processing result.
摘要翻译：提供电子显微镜观察系统和观察方法。根据本发明的一个方面，在两个图像显示单元上显示观察约会和批准屏幕，并且基于从操作中心给出的指令来加载在观察中心侧处理的样本，并且观察基于样本观察条件信息执行样本以输出图像信息，并且将观察图像显示在两个图像显示单元上，并且基于包括样本的准备处理和观察时间的观察的内容水平执行计费处理电子显微镜显示充电处理结果。

8. 发明申请

US20030067496A1 Graphical automated machine control and metrology 有权
标题翻译：图形自动化机器控制和计量
公开(公告)号：US20030067496A1
公开(公告)日：2003-04-10
申请号：US10227619
申请日：2002-08-23
发明人： David J. Tasker , Henri Lezec , David A. Head
IPC分类号： G09G005/00
CPC分类号： G05B19/40933 , G01N1/286 , G05B2219/36314 , G05B2219/36317 , G05B2219/36325 , H01J37/28 , H01J37/3023 , H01J37/3056 , H01J2237/2813 , H01J2237/30416 , H01J2237/30483 , H01J2237/31713 , H01J2237/31745 , H01J2237/31749 , Y02P90/265
摘要： A graphical programming system allows a user to place geometric shapes onto a scaled image, the shape having associated behavior that operates on the image or on the object of which the image is formed. In a preferred embodiment, the shapes are objects in the Visio program by Microsoft Corporation. The shapes are dragged from a stencil onto an image provided by ion beam or electron microscope image. The shape invokes software or hardware to locate and measure features on the image or to perform operations, such as ion beam milling, on the object that is imaged.
摘要翻译：图形编程系统允许用户将几何形状放置在缩放的图像上，该形状具有对图像或其形成图像的对象进行操作的相关联的行为。在优选实施例中，形状是Microsoft Corporation在Visio程序中的对象。将形状从模板拖到由离子束或电子显微镜图像提供的图像上。形状调用软件或硬件来定位和测量图像上的特征，或者对被成像的对象执行诸如离子束铣削的操作。

9. 发明授权

US06546544B1 Method of producing mask data for partial one-shot transfer exposure and exposure method 失效
标题翻译：产生局部一次转印曝光和曝光方法的掩模数据的方法
公开(公告)号：US06546544B1
公开(公告)日：2003-04-08
申请号：US09704468
申请日：2000-11-01
申请人： Kenichi Kawakami
发明人： Kenichi Kawakami
IPC分类号： G06F1750
CPC分类号： G03F1/20 , H01J37/3026 , H01J2237/30416 , H01J2237/31762
摘要： A method of producing mask data for partial one-shot transfer (block) exposure suitable for fabrication of an integrated circuit such as a system LSI in small numbers, in many models and with a short turnaround time (TAT) is disclosed, in which the ratio of the block mask fabrication cost to the total production cost and TAT are further reduced. In the partial one-shot transfer exposure method, at least a part of the pattern of the integrated circuit designed by at least partially combining a plurality of basic elements is passed through one of a plurality of block patterns of the block mask, and the radiation of the pattern shaped beams are combined for exposure. When producing the mask data related to the block mask used in this exposure method, a pattern group is generated in each layer of the integrated circuit including a plurality of basic elements, the degree of frequency at which each basic element in the integrated circuit is used is analyzed, and based on the analyzed degree of frequency at which each basic element is used, a plurality of block patterns to be used are selected from a pattern group, a mask layout is determined by determining the arrangement of the selected patterns in the block mask, each pattern of the mask layout is deformed based on the process conditions, and thus the mask data indicating the shape of a plurality of block patterns is generated, while at the same time generating auxiliary information containing the arrangement of a plurality of block patterns on the block mask.
摘要翻译：公开了一种用于制造少量，多种型和短周转时间（TAT）的诸如系统LSI的集成电路的部分一次转印（块）曝光的掩模数据的方法，其中块掩模制造成本与总生产成本和TAT的比率进一步降低。在部分一次转印曝光方法中，通过至少部分组合多个基本元素设计的集成电路的图案的至少一部分通过块掩模的多个块图案中的一个，并且辐射的图案形状的光束被组合用于曝光。当产生与该曝光方法中使用的块掩模相关的掩模数据时，在包括多个基本元素的集成电路的每个层中生成图案组，使用集成电路中的每个基本元素的频率并且基于分析的每个基本元素的频率程度，从图案组中选择要使用的多个块图案，通过确定块中所选择的图案的布置来确定掩模布局掩模，基于处理条件使掩模布局的每个图案变形，从而生成指示多个块图案的形状的掩码数据，同时生成包含多个块图案的排列的辅助信息在阻挡面具上。

10. 发明授权

US06200710B1 Methods for producing segmented reticles 失效
标题翻译：生产分段标线的方法
公开(公告)号：US06200710B1
公开(公告)日：2001-03-13
申请号：US09272930
申请日：1999-03-18
申请人： Kazunari Hada
发明人： Kazunari Hada
IPC分类号： G03F900
CPC分类号： G03F1/20 , H01J37/3026 , H01J2237/30416 , H01J2237/31762
摘要： Methods are disclosed for making reticles for charged-particle-beam (CPB) microlithography and for using such reticle for making CPB microlithographic exposures using divided-pattern exposure. The reticles are made using data, generated from corresponding LSI design data by a “data generator” (e.g., computer), and stored as a reticle-pattern data file in a memory. Corresponding data for controlling a CPB microlithographic exposure apparatus (using the reticle) are stored in an exposure data file. Of the data stored in these files, the reticle-pattern data is routed to a host computer for a reticle-writing device. The reticle writing device produces a pattern on a segmented reticle according to the data. Exposure data corresponding to the reticle-pattern data are routed to a host computer of a CPB microlithographic exposure apparatus. The host computer of the CPB exposure apparatus utilizes the data to drive the CPB exposure apparatus to perform transfer of the pattern from the reticle to the substrate.
摘要翻译：公开了用于制造用于带电粒子束（CPB）微光刻的掩模版和使用这种掩模版使用分割图案曝光进行CPB微光刻曝光的方法。使用由“数据发生器”（例如，计算机）从相应的LSI设计数据生成的数据制作标线，并作为标线图案数据文件存储在存储器中。用于控制CPB微光刻曝光设备（使用掩模版）的相应数据被存储在曝光数据文件中。在这些文件中存储的数据中，标线图案数据被路由到用于标线书写装置的主计算机。掩模版写入装置根据数据在分段掩模版上产生图案。对应于标线图案数据的曝光数据被路由到CPB微光刻曝光设备的主计算机。 CPB曝光装置的主计算机利用该数据驱动CPB曝光装置，以将图案从掩模版转移到基板。

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