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1. 发明授权

US06511575B1 Treatment apparatus and method utilizing negative hydrogen ion 失效
标题翻译：利用负氢离子的处理装置和方法
公开(公告)号：US06511575B1
公开(公告)日：2003-01-28
申请号：US09437336
申请日：1999-11-10
申请人： Haruo Shindo , Hideo Kitagawa , Masakazu Furukawa
发明人： Haruo Shindo , Hideo Kitagawa , Masakazu Furukawa
IPC分类号： H05H100
CPC分类号： H01L21/76843 , B08B7/0035 , C23C16/0227 , H01J37/32357 , H01L21/28518 , H01L21/67069 , H01L21/76814 , H01L21/76838 , H01L21/76862
摘要： In order to eliminate a contact hole of a semiconductor substrate, a polymer dreg after ashing of all inside of a via hole is conducted, or an oxide layer on a barrier metal surface, hydrogen gas is changed to a hydrogen radical, the radical is primarily changed to a negative hydrogen ion, and the ion is introduced onto a wafer arranged in a vacuum container. In this manner, cleaning is done by assisting a negative hydrogen ion having its less generated secondary electrons without imparting plasma damage to an element.
摘要翻译：为了消除半导体衬底的接触孔，在通孔全部内部进行灰化后的聚合物渣滓或阻挡金属表面上的氧化物层，氢气变为氢原子，基团主要变成负的氢离子，将离子引入布置在真空容器中的晶片上。以这种方式，通过辅助具有较少产生的二次电子的负氢离子而不对元件施加等离子体损伤来进行清洁。

2. 发明申请

US20060074074A1 Tricyclic triazolobenzazepine derivatives, process for producing the same, and antiallergic agents 失效
标题翻译：三环三氮代氮杂吖庚因衍生物，其制备方法和抗过敏剂
公开(公告)号：US20060074074A1
公开(公告)日：2006-04-06
申请号：US11269828
申请日：2005-11-09
申请人： Yasuo Ohtsuka , Toshio Nishizuka , Sohjiro Shiokawa , Seiji Tsutsumi , Mami Kawaguchi , Hideo Kitagawa , Hiromi Takata , Takashi Shishikura , Toyoaki Ishikura , Kenichi Fushihara , Yumiko Okada , Sachiko Miyamoto , Maki Shiobara
发明人： Yasuo Ohtsuka , Toshio Nishizuka , Sohjiro Shiokawa , Seiji Tsutsumi , Mami Kawaguchi , Hideo Kitagawa , Hiromi Takata , Takashi Shishikura , Toyoaki Ishikura , Kenichi Fushihara , Yumiko Okada , Sachiko Miyamoto , Maki Shiobara
IPC分类号： A61K31/55 , C07D487/02 , C07D249/16
CPC分类号： C07D487/04 , C07C59/76 , C07C69/738 , C07D249/04 , C07D401/12 , C07F9/6561
摘要： Tricyclic triazolobenzazepine derivatives in the form or a prodrug are provided. The compounds according to the present invention are those represented by formula (I) and pharmacologically acceptable salts and solvates thereon. The compounds are useful as antiallergic agents and exhibit excellent bioavailability. wherein R1 represents hydrogen, OH, alkyl or phenyl alkyl, R2, R3, R4, and R5 represent hydrogen, halogen, optionally protected hydroxyl, formyl, optionally substituted alkyl, alkenyl, alkoxy or the like, and Q represents a group selected from the following groups (i) to (iv), halogen, or alkoxy:
摘要翻译：提供了形式或前体药物的三环三唑并苯并吖嗪衍生物。根据本发明的化合物是由式（I）表示的化合物及其上的药理学上可接受的盐和溶剂合物。这些化合物可用作抗过敏剂并且表现出优异的生物利用度。其中R 1表示氢，OH，烷基或苯基烷基，R 2，R 3，R 4，和R 5表示氢，卤素，任意保护的羟基，甲酰基，任选取代的烷基，烯基，烷氧基等，Q表示选自以下组（i）至（iv）中的基团，卤素或烷氧基：

3. 发明授权

US07022860B2 Tricyclic triazolobenzazepine derivatives, process for producing the same, and antiallergic agents 失效
标题翻译：三环三氮代氮杂吖庚因衍生物，其制备方法和抗过敏剂
公开(公告)号：US07022860B2
公开(公告)日：2006-04-04
申请号：US10073326
申请日：2002-02-13
申请人： Yasuo Ohtsuka , Toshio Nishizuka , Sohjiro Shiokawa , Seiji Tsutsumi , Mami Kawaguchi , Hideo Kitagawa , Hiromi Takata , Takashi Shishikura , Toyoaki Ishikura , Kenichi Fushihara , Yumiko Okada , Sachiko Miyamoto , Maki Shiobara
发明人： Yasuo Ohtsuka , Toshio Nishizuka , Sohjiro Shiokawa , Seiji Tsutsumi , Mami Kawaguchi , Hideo Kitagawa , Hiromi Takata , Takashi Shishikura , Toyoaki Ishikura , Kenichi Fushihara , Yumiko Okada , Sachiko Miyamoto , Maki Shiobara
IPC分类号： C07D249/04
CPC分类号： C07D487/04 , C07C59/76 , C07C69/738 , C07D249/04 , C07D401/12 , C07F9/6561
摘要： A process for preparing a compound represented by formula (IIa′) wherein Q represents group (i) as defined in the specification and R2 to R5, R31, R32, and R52 are as defined in the specification, by (1) reacting a compound represented by formula (V) wherein R2 to R5 and R52 are as defined in the specification. with a compound represented by R31R32C═O wherein R31 and R32 are as defined in the specification; (2) reacting the compound prepared in (1) with a compound represented by R71—C(═O)—R72 wherein R71 and R72 each independently represent a chlorine atom, 4-nitrophenyl, or 1-imidazolyl; and (3) reacting the compound prepared in (2) with a compound represented by R33OH wherein R33 is as defined in the specification.
摘要翻译：制备由式（IIa'）表示的化合物的方法，其中Q表示如说明书中定义的基团（i），R 2，R 5，R 5，通式（1）使由式（Ⅴ）表示的化合物（其中R 32的化合物按照本说明书中所定义的化合物，其中R 31，R 32， ; （2）使（1）中制备的化合物与由R 71表示的化合物-C（-O）-R 72，其中R 71 = O >和R“72各自独立地表示氯原子，4-硝基苯基或1-咪唑基; 和（3）使（2）中制备的化合物与由R 33 OH表示的化合物反应，其中R 33是如说明书中所定义的。

4. 发明申请

US20050196973A1 Plasma nitriding method 审中-公开
标题翻译：等离子氮化方法
公开(公告)号：US20050196973A1
公开(公告)日：2005-09-08
申请号：US11071246
申请日：2005-03-04
申请人： Nobumasa Suzuki , Hideo Kitagawa
发明人： Nobumasa Suzuki , Hideo Kitagawa
IPC分类号： H01L21/318 , H01L21/4763
CPC分类号： H01L21/0214 , H01L21/02332 , H01L21/0234 , H01L21/3105 , H01L21/3115
摘要： Disclosed is a plasma nitriding method by which an ultra-thin oxide-nitride film having a half-value depth of not greater than 0.8 nm can be produced, overcoming various inconveniences involved in conventional plasma nitriding methods. In one preferred form of the present invention, the plasma nitriding method includes the steps of introducing a substrate to be processed, into a reaction chamber, evacuating the reaction chamber, supplying a gas containing nitrogen atoms, into the reaction chamber at a predetermined flow rate, adjusting an exhaust conductance to maintain a predetermined pressure inside the reaction chamber, and applying an electric voltage into the reaction chamber to produce plasma to thereby cause nitriding of the surface of the substrate, wherein the gas further contains hydrogen atoms, wherein the predetermined pressure is not less than 2 Torr, and wherein a spacing between the substrate and a densest portion of the plasma is not less than 75 nm.
摘要翻译：公开了一种等离子体氮化方法，其可以生产半值深度不大于0.8nm的超薄氧化物氮化物膜，以克服常规等离子体氮化方法中涉及的各种不便。在本发明的一个优选形式中，等离子体氮化方法包括以下步骤：将预处理的基材以预定的流速引入反应室，将反应室抽空，将含有氮原子的气体供给反应室调节排气电导以维持反应室内的预定压力，并向反应室施加电压以产生等离子体，从而导致衬底表面渗氮，其中气体还含有氢原子，其中预定压力不小于2Torr，并且其中衬底和等离子体最稠密部分之间的间隔不小于75nm。

5. 发明授权

US4592756A Dye solution composition 失效
标题翻译：染料溶液组成
公开(公告)号：US4592756A
公开(公告)日：1986-06-03
申请号：US698706
申请日：1985-02-06
申请人： Sinjiro Kawasaki , Hideo Kitagawa , Yutaka Nishii
发明人： Sinjiro Kawasaki , Hideo Kitagawa , Yutaka Nishii
IPC分类号： C09B67/22 , C09B67/26 , C09B67/44 , C09B69/06 , C09D11/00 , C09B67/00
CPC分类号： C09D11/328 , C09B67/0046 , C09B67/0073 , C09B67/0083 , C09B69/06 , Y10S8/917 , Y10S8/918 , Y10S8/919
摘要： A dye solution composition containing a black dye obtained by the action of at least one acid or its salt:HO(CH.sub.2).sub.n SO.sub.3 H, Cl(CH.sub.2).sub.n COOH, Br(CH.sub.2).sub.n COOH (n=1 or 2)on one or a mixture of dyes of the formula (I): ##STR1## wherein R is phenylene or naphthylene residue; X and X' are each H, sulfonic acid group or sulfonate group; Y and Y' are each H or alkali metal; R' is one of amino group-containing radicals: ##STR2## (the carboxyl group may be carboxylate group and the sulfonic acid group may be sulfonate group), except that when R' has not sulfonic acid group, X and X' are not the same and when R' has sulfonic acid group, X and X' are H. This is highly stable, preservative and water soluble, and is useful as ink composition for ball-point pen and ink jet recording.
摘要翻译：通过至少一种酸或其盐：HO（CH 2）n SO 3 H，Cl（CH 2）n COOH，Br（CH 2）n COOH（n = 1或2）的作用获得的含有黑色染料的染料溶液组合物，式（I）的染料混合物：其中R是亚苯基或亚萘基残基; X和X'分别为H，磺酸基或磺酸基; Y和Y'分别为H或碱金属; R'是含有氨基的基团之一，（R'不具有磺酸基，X和X除外），羧基可以是羧酸酯基，磺酸基可以是磺酸酯基。 “不相同，当R'具有磺酸基，X和X'为H.这是高度稳定，防腐和水溶性的，并且可用作圆珠笔和喷墨记录的油墨组合物。

6. 发明申请

US20090275209A1 PLASMA PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：等离子体加工设备和方法
公开(公告)号：US20090275209A1
公开(公告)日：2009-11-05
申请号：US12139902
申请日：2008-06-16
申请人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
发明人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
IPC分类号： H01L21/46 , C23C16/511
CPC分类号： H01L21/28185 , H01J37/32192 , H01J37/32449 , H01J37/32623 , H01J37/32733 , H01L21/28202 , H01L29/518
摘要： Disclosed is a plasma processing apparatus and a plasma processing method, by which ions of plasma can be injected uniformly over the whole surface of a substrate to be processed, in a short time. Specifically, when the substrate is processed in a reaction container, the gas pressure inside the reaction container is increased. Alternatively, the distance between a plasma processing portion and the substrate is enlarged, or the substrate is temporally moved outwardly of the reaction container. As a further alternative, a shutter is disposed between the plasma producing zone and the substrate. With this procedure, incidence of ions of the plasma upon the substrate can be substantially intercepted for a predetermined time period from the start of plasma production.
摘要翻译：公开了一种等离子体处理装置和等离子体处理方法，通过该等离子体处理装置和等离子体处理方法能够在短时间内均匀地注入待处理基板的整个表面。具体地，当在反应容器中处理基板时，反应容器内部的气体压力增加。或者，等离子体处理部分和基板之间的距离增大，或者基板在时间上移动到反应容器的外部。作为另一替代方案，快门设置在等离子体产生区域和基板之间。利用该程序，从等离子体生产开始的预定时间段，可以基本上截断等离子体在基板上的离子的入射。

7. 发明申请

US20060021700A1 Plasma processing apparatus and method 审中-公开
标题翻译：等离子体处理装置及方法
公开(公告)号：US20060021700A1
公开(公告)日：2006-02-02
申请号：US11190794
申请日：2005-07-27
申请人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
发明人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
IPC分类号： C23F1/00
CPC分类号： H01L21/28185 , H01J37/32192 , H01J37/32449 , H01J37/32623 , H01J37/32733 , H01L21/28202 , H01L29/518
摘要： Disclosed is a plasma processing apparatus and a plasma processing method, by which ions of plasma can be injected uniformly over the whole surface of a substrate to be processed, in a short time. Specifically, when the substrate is processed in a reaction container, the gas pressure inside the reaction container is increased. Alternatively, the distance between a plasma processing portion and the substrate is enlarged, or the substrate is temporally moved outwardly of the reaction container. As a further alternative, a shutter is disposed between the plasma producing zone and the substrate. With this procedure, incidence of ions of the plasma upon the substrate can be substantially intercepted for a predetermined time period from the start of plasma production.
摘要翻译：公开了一种等离子体处理装置和等离子体处理方法，通过该等离子体处理装置和等离子体处理方法能够在短时间内均匀地注入待处理基板的整个表面。具体地，当在反应容器中处理基板时，反应容器内部的气体压力增加。或者，等离子体处理部分和基板之间的距离增大，或者基板在时间上移动到反应容器的外部。作为另一替代方案，快门设置在等离子体产生区域和基板之间。利用该程序，从等离子体生产开始的预定时间段，可以基本上截断等离子体在基板上的离子的入射。

8. 发明授权

US06657711B1 Vehicle wheel alignment measuring apparatus 失效
标题翻译：车轮对准测量仪
公开(公告)号：US06657711B1
公开(公告)日：2003-12-02
申请号：US09603593
申请日：2000-06-26
申请人： Hideo Kitagawa , Hiroshi Takagi
发明人： Hideo Kitagawa , Hiroshi Takagi
IPC分类号： G01B1126
CPC分类号： G01B11/2755 , G01B2210/14 , G01B2210/22 , G01B2210/286
摘要： An apparatus for measuring the dynamic characteristics of the vehicle wheel alignment in non-contact fashion with high accuracy is disclosed. A laser light source (4) emits a laser beam of a predetermined geometric pattern toward the wheel side surface. A laser beam control device (6) controls the width of the laser beam in such a manner as to be radiated only in a predetermined range of the wheel side surface. Two laser light sources (120), (121) emit non-parallel laser beams. A photdetecting device (122) receives the two laser beams and converts them to two corresponding image data. A processing unit calculates the distance between the two images based on the two image data and calculates the wheel alignment based on the same distance.
摘要翻译：公开了一种用于以非接触方式高精度地测量车轮对准的动态特性的装置。激光光源（4）朝向轮侧表面发射预定几何图案的激光束。激光束控制装置（6）以仅在轮侧表面的预定范围内辐射的方式控制激光束的宽度。两个激光源（120），（121）发射非平行激光束。光检测装置（122）接收两个激光束并将其转换成两个对应的图像数据。处理单元基于两个图像数据计算两个图像之间的距离，并且基于相同的距离计算车轮对准。

9. 发明授权

US4786216A Printed circuit board drilling machine 失效
标题翻译：印刷电路板钻孔机
公开(公告)号：US4786216A
公开(公告)日：1988-11-22
申请号：US43388
申请日：1987-04-28
申请人： Hideo Kitagawa , Toshihiko Mizuno
发明人： Hideo Kitagawa , Toshihiko Mizuno
IPC分类号： B23B41/00 , H05K3/00 , B23Q1/18
CPC分类号： H05K3/0047 , B23B41/00 , H05K2203/0285 , Y10S408/70 , Y10T408/52 , Y10T408/561 , Y10T408/5617 , Y10T408/5623 , Y10T408/56253
摘要： A printed circuit board is supported at its peripheral portion and is moved and positioned by a drive mechanism. During the drilling of a hole in the circuit board, the thrust of the drill acting upon the circuit board is born by a sliding contact surface on a stand disposed on the side of the board opposite the drill. Ultrasonic vibration is applied to the printed circuit board via the stand during the drilling operation to prevent the occurrence of expoxy smearing.
摘要翻译：印刷电路板在其周边部分被支撑并由驱动机构移动和定位。在电路板钻孔过程中，作用在电路板上的钻头的推力由位于与钻头相对的板侧的支架上的滑动接触面产生。在钻孔操作期间通过支架对印刷电路板进行超声波振动，以防止出现氧化物污染。

10. 发明授权

US08604253B2 Method for producing polyhydric phenol 有权
标题翻译：多元酚的制造方法
公开(公告)号：US08604253B2
公开(公告)日：2013-12-10
申请号：US13266393
申请日：2010-04-27
申请人： Hideo Kitagawa , Junya Kiyosu , Susumu Saito , Takaomi Hayashi , Naritoshi Yoshimura , Aya Nakagawa
发明人： Hideo Kitagawa , Junya Kiyosu , Susumu Saito , Takaomi Hayashi , Naritoshi Yoshimura , Aya Nakagawa
IPC分类号： C07C37/07
CPC分类号： C07C37/07 , C07B2200/07 , C07C45/513 , C07C45/66 , C07C2601/16 , Y02P20/52 , C07C39/10 , C07C39/08 , C07C49/713
摘要： The present invention is a method for producing a polyhydric phenol, including the following steps (a) to (d): (a) a first step of producing (4S,5R,6S)-4,5,6-trihydroxy-2-cyclohexcene-1-one from 2-deoxy-scyllo-inosose by a dehydration reaction; (b) a second step of producing 1,2,4-trihydroxybenzene from the (4S,5R,6S)-4,5,6-trihydroxy-2-cyclohexene-1-one obtained in the first step by a dehydration reaction; (c) a third step of producing 4-hydroxycyclohexane-1,3-dione from the 1,2,4-trihydroxybenzene by a catalytic hydrogenation reaction with the use of a metal catalyst; and (d) a fourth step of producing hydroquinone by heating the 4-hydroxycyclohexane-1,3-dione.
摘要翻译：本发明是一种生产多元酚的方法，包括以下步骤（a）至（d）：（a）制备（4S，5R，6S）-4,5,6-三羟基-2- 环己烯-1-酮通过脱水反应从2-脱氧 - 十字糖 - （b）通过脱水反应从第一步获得的（4S，5R，6S）-4,5,6-三羟基-2-环己烯-1-酮生成1,2,4-三羟基苯的第二步骤; （c）通过使用金属催化剂的催化氢化反应从1,2,4-三羟基苯生产4-羟基环己烷-1,3-二酮的第三步骤; 和（d）通过加热4-羟基环己烷-1,3-二酮制备氢醌的第四步骤。

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