专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090275209A1 PLASMA PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：等离子体加工设备和方法
公开(公告)号：US20090275209A1
公开(公告)日：2009-11-05
申请号：US12139902
申请日：2008-06-16
申请人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
发明人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
IPC分类号： H01L21/46 , C23C16/511
CPC分类号： H01L21/28185 , H01J37/32192 , H01J37/32449 , H01J37/32623 , H01J37/32733 , H01L21/28202 , H01L29/518
摘要： Disclosed is a plasma processing apparatus and a plasma processing method, by which ions of plasma can be injected uniformly over the whole surface of a substrate to be processed, in a short time. Specifically, when the substrate is processed in a reaction container, the gas pressure inside the reaction container is increased. Alternatively, the distance between a plasma processing portion and the substrate is enlarged, or the substrate is temporally moved outwardly of the reaction container. As a further alternative, a shutter is disposed between the plasma producing zone and the substrate. With this procedure, incidence of ions of the plasma upon the substrate can be substantially intercepted for a predetermined time period from the start of plasma production.
摘要翻译：公开了一种等离子体处理装置和等离子体处理方法，通过该等离子体处理装置和等离子体处理方法能够在短时间内均匀地注入待处理基板的整个表面。具体地，当在反应容器中处理基板时，反应容器内部的气体压力增加。或者，等离子体处理部分和基板之间的距离增大，或者基板在时间上移动到反应容器的外部。作为另一替代方案，快门设置在等离子体产生区域和基板之间。利用该程序，从等离子体生产开始的预定时间段，可以基本上截断等离子体在基板上的离子的入射。

2. 发明申请

US20090273270A1 ELECTRON SOURCE AND IMAGE DISPLAY APPARATUS 失效
标题翻译：电子源和图像显示设备
公开(公告)号：US20090273270A1
公开(公告)日：2009-11-05
申请号：US12421365
申请日：2009-04-09
申请人： Nobumasa Suzuki
发明人： Nobumasa Suzuki
IPC分类号： H01J29/50
CPC分类号： H01J29/04 , H01J31/127
摘要： An electron source including: a plurality of electron-emitting devices connected to a matrix wiring of scan lines and modulation lines on a substrate, wherein each of the electron-emitting devices includes a cathode electrode connected to the scan line, a gate electrode connected to the modulation line and a plurality of electron-emitting members, the cathode electrode is configured in a first comb-like structure for applying an electric potential of the cathode to the plurality of electron-emitting members, the gate electrode is configured in a second comb-like structure for applying an electric potential of the gate to the plurality of electron-emitting members, and each of the first and second comb-like structures is provided with a plurality of comb-teeth, and a connecting electrode electrically connected to the plurality of teeth in at least one of the first and second comb-like structures.
摘要翻译：一种电子源，包括：连接到基板上的扫描线和调制线的矩阵布线的多个电子发射器件，其中每个电子发射器件包括连接到扫描线的阴极电极，连接到所述调制线和多个电子发射部件，所述阴极电极被构造成用于向所述多个电子发射部件施加所述阴极的电势的第一梳状结构，所述栅电极被配置在第二梳用于向多个电子发射部件施加栅极的电位，并且第一和第二梳状结构中的每一个设置有多个梳齿，并且连接电极与多个电子发射部件电连接在第一和第二梳状结构中的至少一个中的齿。

3. 发明申请

US20060021700A1 Plasma processing apparatus and method 审中-公开
标题翻译：等离子体处理装置及方法
公开(公告)号：US20060021700A1
公开(公告)日：2006-02-02
申请号：US11190794
申请日：2005-07-27
申请人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
发明人： Shinzo Uchiyama , Nobumasa Suzuki , Hideo Kitagawa , Yusuke Fukuchi
IPC分类号： C23F1/00
CPC分类号： H01L21/28185 , H01J37/32192 , H01J37/32449 , H01J37/32623 , H01J37/32733 , H01L21/28202 , H01L29/518
摘要： Disclosed is a plasma processing apparatus and a plasma processing method, by which ions of plasma can be injected uniformly over the whole surface of a substrate to be processed, in a short time. Specifically, when the substrate is processed in a reaction container, the gas pressure inside the reaction container is increased. Alternatively, the distance between a plasma processing portion and the substrate is enlarged, or the substrate is temporally moved outwardly of the reaction container. As a further alternative, a shutter is disposed between the plasma producing zone and the substrate. With this procedure, incidence of ions of the plasma upon the substrate can be substantially intercepted for a predetermined time period from the start of plasma production.
摘要翻译：公开了一种等离子体处理装置和等离子体处理方法，通过该等离子体处理装置和等离子体处理方法能够在短时间内均匀地注入待处理基板的整个表面。具体地，当在反应容器中处理基板时，反应容器内部的气体压力增加。或者，等离子体处理部分和基板之间的距离增大，或者基板在时间上移动到反应容器的外部。作为另一替代方案，快门设置在等离子体产生区域和基板之间。利用该程序，从等离子体生产开始的预定时间段，可以基本上截断等离子体在基板上的离子的入射。

4. 发明授权

US06870123B2 Microwave applicator, plasma processing apparatus having same, and plasma processing method 失效
标题翻译：微波施加器，等离子体处理装置及其等离子体处理方法
公开(公告)号：US06870123B2
公开(公告)日：2005-03-22
申请号：US09816359
申请日：2001-03-26
申请人： Nobumasa Suzuki , Shigenobu Yokoshima
发明人： Nobumasa Suzuki , Shigenobu Yokoshima
IPC分类号： H01J37/304 , H01J37/305 , H01Q21/00 , B23K10/00
CPC分类号： H01J37/304 , H01J37/3053 , H01J2237/0812 , H01Q21/0043 , H01Q21/005 , H01Q21/0056
摘要： In order to more accurately control the radiation characteristics of microwaves to improve the controllability of processing in radial and circumferential directions of an article, there are disclosed a microwave applicator and a plasma processing apparatus using the applicator, which comprise a circular waveguide having a surface provided with a plurality of slots for radiating microwaves, wherein the centers of the plurality of slots are offset in a direction parallel to the surface with respect to the center of the circular waveguide.
摘要翻译：为了更准确地控制微波的辐射特性以提高制品在径向和圆周方向上的加工的可控制性，公开了一种使用施加器的微波施加器和等离子体处理装置，该装置包括具有提供的表面的圆形波导具有用于辐射微波的多个槽，其中多个槽的中心相对于圆形波导的中心在平行于表面的方向上偏移。

5. 发明授权

US06829279B1 Laser oscillating apparatus, exposure apparatus using the same and device fabrication method 有权
标题翻译：激光振荡装置，使用其的曝光装置和装置制造方法
公开(公告)号：US06829279B1
公开(公告)日：2004-12-07
申请号：US09494945
申请日：2000-02-01
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： H01S500
CPC分类号： G03F7/70025 , H01S3/0315 , H01S3/0385 , H01S3/225
摘要： In a laser oscillating apparatus for exciting a laser gas in a laser tube by introducing an electromagnetic wave from a waveguide into the laser tube through a plurality of slots formed in a waveguide wall, and generating a laser beam by resonating light emitted from the laser gas, the slots are formed in a line such that their longitudinal direction is consistent with the longitudinal direction of the waveguide, and a metal wall is so formed as to surround these slots. This metal wall forms a gap as a microwave passage from the slots to a window in the laser tube wall, thereby spacing the laser tube wall apart from the slots by a predetermined distance.
摘要翻译：在激光振荡装置中，通过将形成在波导壁上的多个槽引入来自波导的电磁波向激光管激励激光器中的激光气体，通过使从激光气体发出的光共振而产生激光束槽形成为一条直线，使得它们的纵向与波导的纵向方向一致，并且金属壁形成为围绕这些槽。该金属壁形成从激光管壁中的狭缝到窗口的微波通道的间隙，从而将激光管壁与狭缝分开预定距离。

6. 发明授权

US06801554B1 Laser oscillating apparatus, exposure apparatus, and device fabrication method 有权
标题翻译：激光振荡装置，曝光装置和装置制造方法
公开(公告)号：US06801554B1
公开(公告)日：2004-10-05
申请号：US09531958
申请日：2000-03-21
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： H01S300
CPC分类号： H01S3/225 , H01S3/0975
摘要： An excimer laser gas in a laser tube 2 is excited by a microwave introduced from awaveguide 1, and electric field concentration occurs in a slit-shaped gap 3 provided in a plate member 11c, causing plasma discharge. Then the phase of plasma light is regulated and the light is resonated, to cause excimer laser light. This construction realizes plasma excitation entirely uniform along a lengthwise direction of laser light emission, and enables uniform laser light emission with minimum energy loss.
摘要翻译：激光管2中的准分子激光气体被从波导管1引入的微波激发，并且在设置在板构件11c中的狭缝状间隙3中发生电场浓度，引起等离子体放电。然后等离子体光的相位被调节并且光被共振，以引起准分子激光。这种结构实现了沿着激光发射的长度方向的等离子体激发完全均匀，并且以最小的能量损失实现均匀的激光发射。

7. 发明授权

US06744802B1 Laser oscillating apparatus with slotted waveguide 有权
标题翻译：具有开槽波导的激光振荡装置
公开(公告)号：US06744802B1
公开(公告)日：2004-06-01
申请号：US09512074
申请日：2000-02-24
申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
发明人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
IPC分类号： H01S3097
CPC分类号： G03F7/70025 , H01S3/0315 , H01S3/0975 , H01S3/225
摘要： In a slot array structure, electromagnetic wave emission which is uniform as a whole over the length of a laser tube is realized to allow uniform laser emission with minimum energy loss. Slots (10) are formed at a predetermined pitch in a long end face (H plane) of each waveguide (1) along a central line (m) in the longitudinal direction of the H plane to be alternately located on the left and right sides of the central line (m) and spaced apart from the central line (m) by a distance (d).
摘要翻译：在时隙阵列结构中，实现了在激光管的长度上整体上均匀的电磁波发射，以允许具有最小能量损失的均匀的激光发射。在每个波导（1）的长边（H平面）上沿着H平面的纵向方向上的中心线（m）以预定间距形成狭槽（10），以交替地位于左侧和右侧的中心线（m）并与中心线（m）间隔开距离（d）。

8. 发明授权

US5975012A Deposition apparatus 失效
标题翻译：沉积装置
公开(公告)号：US5975012A
公开(公告)日：1999-11-02
申请号：US736681
申请日：1996-10-25
申请人： Senichi Hayashi , Nobumasa Suzuki
发明人： Senichi Hayashi , Nobumasa Suzuki
IPC分类号： C23C14/06 , C23C14/08 , C23C14/10 , C23C14/18 , C23C14/20 , C23C14/34 , C23C14/35 , C23C14/38 , C23C14/40 , H01J37/32 , H01J37/34 , H01L21/203 , H01L21/285 , H01L21/302 , H01L21/3065 , H01L21/31 , H05H1/00
CPC分类号： C23C14/086 , C23C14/06 , C23C14/10 , C23C14/185 , C23C14/205 , C23C14/3471 , H01J37/32192 , H01J37/34
摘要： A deposition apparatus including a deposition chamber containing therein a holder for holding a substrate and an electrode holding a sputtering target, a device for applying electrical power to the electrode, a gas supplying device for supplying gas to the deposition chamber, a evacuating device for evacuating the deposition chamber, and a microwave supplying device disposed around the deposition chamber. By virtue of such a construction, the deposition apparatus allows the target to be used with high efficiency and the ions to be maintained at a high density and low energy.
摘要翻译：一种沉积设备，包括其中包含用于保持基板的保持器和保持溅射靶的电极的沉积室，用于向所述电极施加电力的装置，用于向所述沉积室供应气体的气体供给装置，用于排空的排气装置沉积室和设置在沉积室周围的微波供应装置。通过这样的结构，沉积装置允许高效率地使用靶，并且将离子保持在高密度和低能量。

9. 发明授权

US5892136A Process for producing iodotrifluoromethane 失效
标题翻译：生产三氟甲苯的方法
公开(公告)号：US5892136A
公开(公告)日：1999-04-06
申请号：US966149
申请日：1997-11-07
申请人： Noritaka Nagasaki , Nobumasa Suzuki , Satohiro Nakano , Nobuyuki Kunihiro
发明人： Noritaka Nagasaki , Nobumasa Suzuki , Satohiro Nakano , Nobuyuki Kunihiro
IPC分类号： B01J27/10 , B01J23/58 , B01J27/12 , B01J27/25 , C01B7/14 , C07B61/00 , C07C17/158 , C07C19/16 , C07C19/07
CPC分类号： C01B7/14 , B01J23/58 , C07C17/158
摘要： A novel process for producing iodotrifluoromethane is provided which comprises reacting trifluoromethane with iodine in the presence of oxygen by use of a catalyst containing a salt of a metal supported by a carbonaceous carrier. In this process, the catalyst life is lengthened greatly, the by-product is decreased, and the unreacted iodine can be recovered efficiently as high-purity iodine to be recycled without purification.
摘要翻译：提供一种生产碘三氟甲烷的新方法，其包括在氧存在下使三氟甲烷与碘反应，使用含有由碳质载体担载的金属盐的催化剂。在这个过程中，催化剂寿命大大延长，副产物减少，未反应的碘可以作为高纯度碘被有效地回收再循环而不需要净化。

10. 发明授权

US5433787A Apparatus for forming deposited film including light transmissive diffusion plate 失效
标题翻译：用于形成包括透光扩散板的沉积膜的装置
公开(公告)号：US5433787A
公开(公告)日：1995-07-18
申请号：US987786
申请日：1992-12-09
申请人： Nobumasa Suzuki , Senichi Hayashi
发明人： Nobumasa Suzuki , Senichi Hayashi
IPC分类号： C23C16/50 , C23C16/44 , C23C16/455 , C23C16/48 , C23C16/511 , C23C16/517 , H01L21/31 , H01L21/316 , C23C16/30
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/482 , C23C16/517
摘要： A deposited film-forming apparatus comprises a reaction chamber, a supporting member provided in the reaction chamber for holding a substrate, a plasma generating chamber adjacent to the reaction chamber with interposition of a light-transmissive perforated diffusion plate wherein at least a part of the plasma generating chamber is made of a light-transmissive member, a plasma-generation means for generating plasma in the plasma generating chamber, a first gas-introduction means for introducing a gas into the reaction chamber, a second gas-introduction means for introducing another gas into the plasma generating chamber, an evacuation means for evacuating the reaction chamber and the plasma generating chamber, and a light source provided outside the plasma generating chamber for irradiating light to the substrate held on the supporting member through the plasma generating chamber and the perforated diffusion plate, wherein the perforated diffusion plate has a light-scattering diffusion face at least at the side of the reaction chamber.
摘要翻译：沉积膜形成装置包括反应室，设置在用于保持基板的反应室中的支撑构件，邻近反应室的等离子体产生室，插入透光多孔扩散板，其中至少部分等离子体发生室由透光构件制成，等离子体产生装置，用于在等离子体发生室中产生等离子体;第一气体引入装置，用于将气体引入反应室;第二气体引入装置，用于引入另一个气体进入等离子体发生室，用于抽空反应室和等离子体产生室的抽空装置，以及设置在等离子体发生室外部的光源，用于通过等离子体产生室向被保持在支撑构件上的基板照射光，并且穿孔扩散板，其中所述多孔扩散板具有光散射扩散至少在反应室侧面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式