专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060122301A1 Fluorinated divinyl ethers 审中-公开
标题翻译：氟化二乙烯基醚
公开(公告)号：US20060122301A1
公开(公告)日：2006-06-08
申请号：US11006879
申请日：2004-12-08
申请人： Haridasan Nair , David Nalewajek
发明人： Haridasan Nair , David Nalewajek
IPC分类号： C08K3/26
CPC分类号： C08F216/125 , C07C41/06 , C07C43/17 , C07C43/172 , C07C2601/14
摘要： Fluorinated divinyl ethers having structures according to Formula I or II: RfCX═CY—O—Z—O—CH═CH2 (I) RfCX═CY—O—M—O—CY═CXRf (II) wherein Rf is fluorine or a C1-C20 fluorinated alkyl; X and Y are independently hydrogen, a halogen, or a C1-C20 fluorinated alkylene; Z is a C1-C20 alkylene, C3-C10 cycloalkylene, four to ten ring member aromatic and non-aromatic heterocycloalkylene, C6-C15 arylene, or C7-C20 arylalkylene; and M is a C1-C20 alkylene, C3-C18 fluorinated alkylene provided that the chain does not terminate with -CHF- or -CF2-, or a C3-C18 diol having the formula —HO—CH2—(CF2)n—CH2—OH— wherein n is an integer from 1 to 16. Curable compositions, polymers, films, coatings, and optical devices comprising fluorinated divinyl ether compounds are also disclosed as well as processes for producing optical devices from the fluorinated divinyl ether compounds and processes for producing the fluorinated divinyl ethers.
摘要翻译：具有根据式I或II的结构的氟化二乙烯基醚：<？in-line-formula description =“In-line Formulas”end =“lead”？> R CX-CY-OZO-CH -CH 2（I）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas” end =“lead”？> R CX-CY-OMO-CY-CXR （II）<？in-line-formula description =“In-Line Formulas “end =”tail“？>其中R 1是氟或C 1 -C 20氟代烷基; X和Y独立地是氢，卤素或C 1 -C 20氟代亚烷基; Z是C 1 -C 20亚烷基，C 3 -C 10亚环烷基，4至10个环成员芳族和非芳族杂环亚烷基，C 6 -C 15亚芳基或C 7 -C 20芳基亚烷基; 并且M是C 1 -C 20亚烷基，C 3 -C 18氟化亚烷基，条件是链不用-CHF-或-CF 2 - 或具有式-HO-CH 2的C 3 -C 18二醇终止，其中n是1至16的整数。（2）其中n是1至16的整数。还公开了包含氟化二乙烯基醚化合物的可固化组合物，聚合物，膜，涂料和光学装置，以及从氟化二乙烯基醚化合物生产光学器件的方法和用于生产氟化二乙烯基醚的方法。

2. 发明申请

US20070161827A1 Method of synthesizing fluorinated diene alcohols 审中-公开
标题翻译：合成氟化二烯醇的方法
公开(公告)号：US20070161827A1
公开(公告)日：2007-07-12
申请号：US11328048
申请日：2006-01-09
申请人： Jingji Ma , Michael Van Der Puy , David Nalewajek , Haridasan Nair , Lawrence Ford
发明人： Jingji Ma , Michael Van Der Puy , David Nalewajek , Haridasan Nair , Lawrence Ford
IPC分类号： C07C33/42
CPC分类号： C07C33/423 , C07C29/40
摘要： Disclosed are fluorinated diene alcohols perferably having a fluorine content of at least about 45 weight percent and having a plurality of moieties of the formula CFx and a plurality of moieties of the formula CHx, where each x is independently 1, 2 or 3 and where each CFx moiety is not directly bonded to another CFx moiety. Methods of synthesizing fluorinated diene alcohol compounds are also disclosed comprising reacting at least one C2-C3 alkene halide with at least one reactant of the formula (II): where Z is OH, OR6, OC(O)R7, or a halogen, R6 is a C1-C6 branched or straight chain alkyl, and R7 is a C1-C6 branched or straight chain alkyl or fluoroalkyl,
摘要翻译：公开的氟化二烯醇优选具有至少约45重量％的氟含量并且具有多个式CF x X的部分和多个式CH x x的部分，其中每个x独立地为1,2或3，并且其中每个CF x X部分不直接键合到另一个CF x X部分。还公开了合成氟化二烯醇化合物的方法，包括使至少一种C 2 -C 3 -C 3烯烃卤化物与至少一种式（II）的反应物反应：其中Z 是OH，OR 6，OC（O）R 7或卤素，R 6是C 1 H 12 C 6 -C 6支链或直链烷基，R 7是C 1 -C 6 -C 6支链或直链烷基，直链烷基或氟烷基，

3. 发明申请

US20060058428A1 Fluorinated compounds having epoxy and vinyl ether functional groups 审中-公开
标题翻译：具有环氧和乙烯基醚官能团的氟化合物
公开(公告)号：US20060058428A1
公开(公告)日：2006-03-16
申请号：US10942759
申请日：2004-09-16
申请人： Haridasan Nair , David Nalewajek , Dennis Lavery
发明人： Haridasan Nair , David Nalewajek , Dennis Lavery
IPC分类号： C08L63/00 , C08G59/00 , B32B27/38
CPC分类号： C07D303/08 , C08F216/1408 , C08F216/1416
摘要： Fluorinated vinyl ether-epoxides which are fluorinated compounds containing both vinyl ether and epoxide functionalities, a process for making them and their uses. The fluorinated vinyl ether-epoxide compounds have the formula wherein X and Y are independently H, a halogen, or a linear or branched C1 to C12 fluoroalkyl group; and Rf is a linear or branched C1 to C12 fluoroalkyl group or a halogen.
摘要翻译：氟化乙烯基醚 - 环氧化物，其是含有乙烯基醚和环氧官能团的氟化化合物，其制备方法及其用途。氟化乙烯基醚 - 环氧化合物具有下式

4. 发明申请

US20060008730A1 Monomers for photoresists bearing acid-labile groups of reduced optical density 审中-公开
标题翻译：用于具有降低光密度的酸不稳定组的光致抗蚀剂单体
公开(公告)号：US20060008730A1
公开(公告)日：2006-01-12
申请号：US10888732
申请日：2004-07-09
申请人： Michael Puy , Haridasan Nair , Jingji Ma , David Nalewajek , Andrew Poss , Leonard Stachura , Lawrence Ford , Dennis Lavery
发明人： Michael Puy , Haridasan Nair , Jingji Ma , David Nalewajek , Andrew Poss , Leonard Stachura , Lawrence Ford , Dennis Lavery
IPC分类号： G03C1/492
CPC分类号： G03F7/0046 , C07C69/65 , C07C69/653 , C07C2602/42 , G03F7/0395
摘要： Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomeric unit which comprises an acid labile group of the formula —OC(CH3)2CF3 and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
摘要翻译：提供了可用于形成光致抗蚀剂的单体和聚合物。更具体地，光致抗蚀剂以及用于微光刻的光致抗蚀剂的单体和聚合物，特别是带有降低光密度的酸不稳定基团的单体。所得到的光致抗蚀剂显示出对157nm光的改善的透明度。光致抗蚀剂组合物由至少一种不溶于水的可酸分解聚合物的混合物组成，该聚合物由至少一个单体单元制备，所述单体单元包含式-COC（CH 3 CH 3）其对于大约157nm的波长的紫外线辐射基本上是透明的，并且至少一个光致酸发生器能够在暴露于足够的活化能的同时产生酸波长约157nm。

5. 发明申请

US20060008731A1 Novel photoresist monomers and polymers 审中-公开
标题翻译：新型光致抗蚀剂单体和聚合物
公开(公告)号：US20060008731A1
公开(公告)日：2006-01-12
申请号：US10888746
申请日：2004-07-09
申请人： Michael Van Der Puy , Jingji Ma , Dennis Lavery , Lawrence Ford , Haridasan Nair , David Nalewajek , Andrew Poss , Leonard Stachura
发明人： Michael Van Der Puy , Jingji Ma , Dennis Lavery , Lawrence Ford , Haridasan Nair , David Nalewajek , Andrew Poss , Leonard Stachura
IPC分类号： G03C1/492
CPC分类号： C07C23/27 , C07C17/30 , G03F7/0046 , G03F7/0395
摘要： Monomers and polymers useful for forming photoresists. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomer having a monomeric unit structure which comprises: where Hal=F, Cl or Br and X=H or F; and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm, and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
摘要翻译：用于形成光致抗蚀剂的单体和聚合物。更具体地，光致抗蚀剂以及用于微光刻的光致抗蚀剂的单体和聚合物，特别是带有降低光密度的酸不稳定基团的单体。所得到的光致抗蚀剂显示出对157nm光的改善的透明度。光致抗蚀剂组合物由至少一种不溶于水的可酸分解聚合物的混合物组成，该聚合物由至少一种具有单体单元结构的单体制备，其中Hal = F，Cl或Br，X = H或F; 并且其对于约157nm的波长的紫外线辐射是基本上透明的，以及至少一种能够在暴露于约157nm的波长的足够活化能时产生酸的光酸产生剂。

6. 发明授权

US08652244B2 Use of low global warming potential (LGWP) solvents for finger print development applications 有权
标题翻译：使用低全球变暖潜能（LGWP）溶剂进行指纹开发应用
公开(公告)号：US08652244B2
公开(公告)日：2014-02-18
申请号：US13078152
申请日：2011-04-01
申请人： David Nalewajek , Andrew Joseph Poss , Rajiv Ratna Singh , Cheryl Cantlon
发明人： David Nalewajek , Andrew Joseph Poss , Rajiv Ratna Singh , Cheryl Cantlon
IPC分类号： C09D13/00 , A61B5/103 , A61B5/117 , C09D11/00
CPC分类号： G03C1/73 , A61B5/117 , G06K2009/00946
摘要： Developing compositions are provided herein for use in producing a visibly detectable image of a latent physiological biometric. The developing compositions include a carrier solvent that includes at least one C3-C4 hydrofluorocarbon olefin or at least one hydrochlorofluorocarbon olefin.
摘要翻译：本文提供显影组合物用于产生潜在生理学的可见可检测图像。显影组合物包括载体溶剂，其包含至少一种C 3 -C 4氢氟烃烯烃或至少一种氢氯氟烃烯烃。

7. 发明授权

US08524955B2 Process for the preparation of hexafluoro-2-butyne 有权
标题翻译：制备六氟-2-丁炔的方法
公开(公告)号：US08524955B2
公开(公告)日：2013-09-03
申请号：US13110974
申请日：2011-05-19
申请人： Andrew Joseph Poss , David Nalewajek , Haridasan K. Nair , Michael Van Der Puy , Rajiv Ratna Singh
发明人： Andrew Joseph Poss , David Nalewajek , Haridasan K. Nair , Michael Van Der Puy , Rajiv Ratna Singh
IPC分类号： C07C17/093
CPC分类号： C07C17/354 , C07C17/23 , C07C17/37 , C07C21/22 , C07C21/18 , C07C21/09
摘要： Disclosed is a process for making hexafluoro-2-butyne comprising the steps of: (a) providing a composition comprising CF3CX═CXCF3, where X=halogen; and (b) treating CF3CX═CXCF3 with a dehalogenation catalyst in the presence of a halogen acceptor compound Y, where Y is not hydrogen. The halogen acceptor compound Y is a material capable of being halogenated, preferably a compound having a multiple bond, such as an alkyne, alkene, allene, or carbon monoxide. Another suitable material capable of being halogenated is a cyclopropane. A catalyst effectively transfers halogen from CF3CX═CXCF3 to the halogen acceptor compound. Since Y is not hydrogen, the formation of CF3CX═CHCF3 is greatly reduced or eliminated.
摘要翻译：公开了制备六氟-2-丁炔的方法，包括以下步骤：（a）提供包含CF 3 C X = CXCF 3的组合物，其中X =卤素; 和（b）在卤素受体化合物Y的存在下用脱卤催化剂处理CF 3 C X = CXCF 3，其中Y不是氢。卤素受体化合物Y是能够被卤化的物质，优选具有多重键的化合物，如炔烃，烯烃，烯烃或一氧化碳。能够被卤化的另一种合适的材料是环丙烷。催化剂有效地将卤素从CF 3 C X = CXCF 3转移到卤素受体化合物。由于Y不是氢，CF3CX = CHCF3的形成大大降低或消除。

8. 发明申请

US20090149681A1 METHOD FOR PREPARING 1,1,1,3,3-PENTAFLUOROPROPANE 有权
标题翻译：制备1,1,1,3,3-三氟硼酸的方法
公开(公告)号：US20090149681A1
公开(公告)日：2009-06-11
申请号：US12263848
申请日：2008-11-03
申请人： David E. Bradley , David Nalewajek , Robert L. Bell
发明人： David E. Bradley , David Nalewajek , Robert L. Bell
IPC分类号： C07C19/08
CPC分类号： C07C17/206 , C07C17/21 , C07C19/08
摘要： A process for the production of C2-C4 hydrofluorocarbon, such as 1,1,1,3,3-pentafluoropropane, by contacting a non-fluorinated hydrochlorocarbon with a fluorinating agent, such as hydrogen fluoride, in a liquid catalyst system preferably comprising fluorinated superacid catalyst prepared from SbF5, NbF5, TaF5 or TaF5/SnF4 and HF.
摘要翻译：通过使非氟化氢氯烃与氟化氢如氟化氢接触，在液体催化剂体系中将C2-C4氢氟烃如1,1,1,3,3-五氟丙烷生产的方法优选包括含氟化合物由SbF5，NbF5，TaF5或TaF5 / SnF4和HF制备的超强酸催化剂。

9. 发明授权

US07307137B2 Low dielectric constant materials and methods of preparation thereof 有权
标题翻译：低介电常数材料及其制备方法
公开(公告)号：US07307137B2
公开(公告)日：2007-12-11
申请号：US10466651
申请日：2001-10-18
申请人： Kreisler Lau , Feng Quan Liu , Paul Apen , Boris Korolev , Emma Brouk , Ruslan Zherebin , David Nalewajek , Roger Leung
发明人： Kreisler Lau , Feng Quan Liu , Paul Apen , Boris Korolev , Emma Brouk , Ruslan Zherebin , David Nalewajek , Roger Leung
IPC分类号： C08G63/78
CPC分类号： C08G61/12 , C07C13/615 , C07C13/64 , C07C15/54 , C07C17/10 , C07C17/269 , C07C2603/74 , C07C2603/90 , C07F7/0805 , C08F238/00 , C08G61/02 , H01L2924/0002 , C07C23/46 , C07C25/22 , H01L2924/00
摘要： The present invention is directed to low dielectric polymers and to methods of producing these low dielectric constant polymers, dielectric materials and layers, and electronic components. In one aspect of the present invention, an isomeric mixture of thermosetting monomers, wherein the monomers have a core structure and a plurality of arms, is provided, and the isomeric mixture of thermosetting monomers is polymerized, wherein polymerization comprises a reaction of an ethynyl group that is located in at least one arm of a monomer. In yet another aspect of the inventive subject matter, spin-on low dielectric constant materials are formed having a first backbone with an aromatic moiety and a first reactive group, and a second backbone with an aromatic moiety and a second reactive group, wherein the first and second backbone are crosslinked via the first and second reactive groups in a crosslinking reaction preferably without an additional crosslinker, and wherein a cage structure having at least eight (8) atoms is covalently bound to at least one of the first and second backbone.
摘要翻译：本发明涉及低介电聚合物以及生产这些低介电常数聚合物，介电材料和层以及电子元件的方法。在本发明的一个方面，提供其中单体具有核心结构和多个臂的热固性单体的异构体混合物，并且热固性单体的异构体混合物聚合，其中聚合包括乙炔基其位于单体的至少一个臂中。在本发明主题的另一方面，形成旋涂低介电常数材料，其具有具有芳族部分和第一反应性基团的第一主链和具有芳族部分和第二反应性基团的第二主链，其中第一并且第二主链在交联反应中通过第一和第二反应性基团交联，优选不含另外的交联剂，并且其中具有至少八个（8）原子的笼结构共价结合至第一和第二主链中的至少一个。

10. 发明申请

US20050107246A1 Supported catalyst systems 失效
公开(公告)号：US20050107246A1
公开(公告)日：2005-05-19
申请号：US10965576
申请日：2004-10-14
申请人： Raymond H. Thomas , Roy Robinson , David Nalewajek , Kane Cook
发明人： Raymond H. Thomas , Roy Robinson , David Nalewajek , Kane Cook
IPC分类号： C08F4/645 , B01J31/22 , B01J37/03 , C08F4/6592 , B01J31/00
CPC分类号： B01J31/14 , B01J21/04 , B01J21/08 , B01J31/146 , B01J31/1616 , B01J31/2295 , B01J37/031 , B01J2531/46 , B01J2531/48 , B01J2531/49 , B01J2531/842 , C08F4/025 , C08F4/65908 , C08F4/65925 , C08F4/65927 , C08F10/00 , Y02P20/544 , C08F4/65916
摘要： Disclosed are methods of producing supported organic catalyst systems which find particular use in polymerization reactions. The methods comprise generally, the steps of (a) providing an organic catalyst solution comprising an organic catalyst dissolved in a solvent; (b) contacting the organic catalyst solution with a solid support material; and (c) removing the solvent from the support material by using one or more supercritical-like solvents.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式