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1. 发明授权

US06878248B2 Method of manufacturing an object in a vacuum recipient 失效
标题翻译：在真空接收器中制造物体的方法
公开(公告)号：US06878248B2
公开(公告)日：2005-04-12
申请号：US10388542
申请日：2003-03-17
申请人： Hans Signer , Eduard Kügler , Klaus Wellerdieck , Helmut Rudigier , Walter Haag
发明人： Hans Signer , Eduard Kügler , Klaus Wellerdieck , Helmut Rudigier , Walter Haag
IPC分类号： C23C14/32 , C23C14/54 , C23C16/50 , C23C16/52 , C23F4/00 , H01J37/32 , C23C14/34
CPC分类号： H01J37/32431 , C23C14/32 , C23C14/54 , H01J2237/0206
摘要： A method of manufacturing an object in a vacuum treatment apparatus having a vacuum recipient for containing an atmosphere, includes the steps of supporting a substrate on a work piece carrier arrangement in the recipient and treating the substrate to manufacture the object in the vacuum recipient. The treating process includes generating electrical charge carriers in the atmosphere and in the recipient which are of the type that form electrically insulating material and providing at least two electroconductive surfaces in the recipient. Power, such as a DC signal, is supplied to at least one of the electroconductive surfaces so that at least one of the electroconductive surfaces receives the electrically insulating material for covering at least part of that electroconductive surface. This causes electrical isolation of that electroconductive surface which leads to arcing and damage to the object. A control signal is applied to the electroconductive surfaces during repeating and alternating first time spans and second time spans, for prevent arcing at the part of the electroconductive surfaces which is, or is becoming electrically isolated from the atmosphere by being covered by the electrical charge carriers.
摘要翻译：在具有用于容纳大气的真空接收器的真空处理装置中制造物体的方法包括以下步骤：将基板支撑在接收器中的工件载体装置上，并处理基板以在真空接收器中制造物体。处理方法包括在大气中和接收体中产生形成电绝缘材料并在接受体中提供至少两个导电表面的类型的电荷载体。诸如DC信号的功率被提供给至少一个导电表面，使得至少一个导电表面接收用于覆盖该导电表面的至少一部分的电绝缘材料。这导致该导电表面的电隔离，这导致对物体的电弧和损坏。在重复和交替的第一时间跨度和第二时间跨度期间，控制信号被施加到导电表面，以防止电导体表面的部分电弧通过被电荷载体覆盖或正在与大气电隔离。

2. 发明授权

US06506288B1 Optical film material especially TiO2 or Ta2O5 optical waveguide layer and method for producing such 失效
标题翻译：光学薄膜材料特别是TiO2或Ta2O5光波导层及其制造方法
公开(公告)号：US06506288B1
公开(公告)日：2003-01-14
申请号：US08702841
申请日：1996-08-26
申请人： Johannes Edlinger , Eduard Kügler , Helmut Rudigier
发明人： Johannes Edlinger , Eduard Kügler , Helmut Rudigier
IPC分类号： C23C1435
CPC分类号： G02B6/132 , G02B1/10
摘要： A method for producing a layer of a metal oxide with optical losses of 15 dB/cm, at most, for light with a wavelength of 633 nm, includes depositing the layer using magnetic field enhanced reactive DC-sputtering, from a metallic target.
摘要翻译：对于波长为633nm的光，最多使用15dB / cm的光学损失的金属氧化物层的制造方法包括使用来自金属靶的磁场强化反应型DC溅射来沉积该层。

3. 发明授权

US07718042B2 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source 有权
标题翻译：用于制造溅射涂覆的基板，具有这种源的磁控管源和溅射室的方法
公开(公告)号：US07718042B2
公开(公告)日：2010-05-18
申请号：US10798331
申请日：2004-03-12
申请人： Stanislav Kadlec , Eduard Kügler , Walter Haag
发明人： Stanislav Kadlec , Eduard Kügler , Walter Haag
IPC分类号： C23C14/00 , C23C14/32 , C25B11/00 , C25B13/00
CPC分类号： H01J37/3408
摘要： A magnetron source, a magnetron treatment chamber, and a method of manufacturing substrates with a vacuum plasma treated surface, generate and exploit on asymmetrically unbalanced long-range magnetron magnetic field pattern which is swept along the substrate surface for improving the ion density at a substrate surface being vacuum plasma treated. The long-range field reaches the substrate surface with a component of the magnetic field parallel to the substrate surface of at least 0.1, and preferably between 1 and 20, Gauss. The plasma treating can be sputter-coating, or etching, for example.
摘要翻译：磁控管源，磁控管处理室和利用真空等离子体处理表面制造衬底的方法，产生并利用沿着衬底表面扫过的非对称不平衡长程磁控管磁场图案，以改善衬底处的离子密度表面为真空等离子体处理。长距离场到达衬底表面，其中平均于衬底表面的磁场的分量至少为0.1，优选为1至20，高斯。等离子体处理可以是例如溅射涂覆或蚀刻。

4. 发明授权

US06893543B1 Information carrier and method for producing the same 失效
标题翻译：信息载体及其制造方法
公开(公告)号：US06893543B1
公开(公告)日：2005-05-17
申请号：US09362397
申请日：1999-07-28
申请人： Eduard Kügler
发明人： Eduard Kügler
IPC分类号： C23C14/00 , C23C14/06 , G11B7/24 , G11B7/254 , G11B7/257 , G11B7/26 , G11B11/105 , C23C14/35 , C23C16/00
CPC分类号： G11B11/10586 , C23C14/0021 , C23C14/0635 , C23C14/0647 , G11B7/24 , G11B7/2534 , G11B7/254 , G11B7/2578 , G11B7/2585 , G11B7/26 , G11B2007/25706 , G11B2007/2571 , G11B2007/25711 , G11B2007/25713
摘要： A method and apparatus for producing an information carrier which has at least two solid material interfaces at which information is, or may be applied and where the information is stored by local modulation of at least one characteristic of the solid material. Reflection of electromagnetic radiation at the interface depends on this characteristic. The method and apparatus applies at least one intermediate layer between the two solid material interfaces. The intermediate layer transmits the radiation and is at least predominantly made of either SixCy or SivNw, or both.
摘要翻译：一种用于生产信息载体的方法和装置，其具有至少两个固体材料界面，在该固体材料界面处信息是或可以应用的，并且通过固体材料的至少一个特征的局部调制来存储信息。界面上电磁辐射的反射取决于这一特性。该方法和装置在两个固体材料界面之间施加至少一个中间层。中间层透射辐射，并且至少主要由Si x N或N 2 O 3 >或两者。

5. 发明授权

US07429543B2 Method for the production of a substrate 有权
标题翻译：制造基材的方法
公开(公告)号：US07429543B2
公开(公告)日：2008-09-30
申请号：US11539218
申请日：2006-10-06
申请人： Stanislav Kadlec , Eduard Kügler , Thomas Halter
发明人： Stanislav Kadlec , Eduard Kügler , Thomas Halter
IPC分类号： H01L21/26
CPC分类号： H01J37/3455 , C23C14/3407 , C23C14/35 , C23C14/542 , C23C16/50 , C23C16/52
摘要： Method for producing a substrate includes establishing a plasma discharge with a locally inhomogeneous density distribution and exposing the substrate to the inhomogeneously density-distributed plasma discharge. The distribution is established by establishing a specified relative movement of the inhomogeneous density distribution and of the substrate and establishing a specified time variation of an electric power signal supplying the discharge and/or of an optionally provided further electric signal which connects the substrate to bias voltage. When the electric power signal or further electric signal is an AC signal, the specified time variation of the signal addresses its modulation and the method includes setting the variation and the movement.
摘要翻译：制造衬底的方法包括建立具有局部不均匀密度分布的等离子体放电，并将衬底暴露于非均匀密度分布的等离子体放电。通过建立不均匀密度分布和衬底的指定相对运动并建立提供放电的电功率信号和/或可选地提供的进一步电信号的规定时间变化来建立分布，所述另外的电信号将衬底连接到偏置电压。当电力信号或其他电信号是AC信号时，信号的指定时间变化解决其调制，并且该方法包括设置变化和移动。

6. 发明授权

US07138343B2 Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber 有权
标题翻译：通过真空处理工艺处理表面的基材的制造方法，使用所述制造涂层工件和等离子体处理室的方法
公开(公告)号：US07138343B2
公开(公告)日：2006-11-21
申请号：US10536204
申请日：2003-11-13
申请人： Stanislav Kadlec , Eduard Kügler , Thomas Halter
发明人： Stanislav Kadlec , Eduard Kügler , Thomas Halter
IPC分类号： H01L21/26
CPC分类号： H01J37/3455 , C23C14/3407 , C23C14/35 , C23C14/542 , C23C16/50 , C23C16/52
摘要： In order to produce substrate surfaces with a given two-dimensional surface distribution arising from a treatment using a vacuum treatment process, an inhomogeneous plasma (5) with a density distribution is generated and moved relative to the substrate (9) with a given movement.
摘要翻译：为了生产具有由使用真空处理过程的处理产生的给定二维表面分布的基底表面，产生具有密度分布的不均匀等离子体（5）并且以给定移动相对于基底（9）移动。

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