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1. 发明申请

US20110272709A1 RADIATION HEATING EFFICIENCY BY INCREASING OPTICAL ABSORPTION OF A SILICON CONTAINING MATERIAL 有权
标题翻译：通过增加光学吸收含硅材料的辐射加热效率
公开(公告)号：US20110272709A1
公开(公告)日：2011-11-10
申请号：US13093584
申请日：2011-04-25
申请人： HIROJI HANAWA , Kyawwin Jason Maung
发明人： HIROJI HANAWA , Kyawwin Jason Maung
IPC分类号： H01L33/60
CPC分类号： H01L21/67115 , H01L21/68771
摘要： Embodiments of the present invention generally provide a process and apparatus for increasing the absorption coefficient of a chamber component disposed in a thermal process chamber. In one embodiment, a method generally includes providing a substrate carrier having a first surface and a second surface, the first surface is configured to support a substrate and being parallel and opposite to the second surface, subjecting the second surface of the substrate carrier to a surface treatment process to roughen the second surface of the substrate carrier, wherein the substrate carrier contains a material comprising silicon carbide, and forming an oxide-containing layer on the roughened second surface of the substrate carrier. The formed oxide-containing layer has optical absorption properties at wavelengths close to the radiation delivered from one or more energy sources used to heat the chamber component.
摘要翻译：本发明的实施例通常提供一种用于增加设置在热处理室中的腔室部件的吸收系数的方法和装置。在一个实施例中，一种方法通常包括提供具有第一表面和第二表面的衬底载体，所述第一表面被配置为支撑衬底并且与第二表面平行且相对，使衬底载体的第二表面经受使基底载体的第二表面粗糙化的表面处理工艺，其中基底载体含有包含碳化硅的材料，并在基底载体的粗糙化的第二表面上形成含氧化物层。形成的含氧化物层在接近从用于加热室部件的一个或多个能量源递送的辐射的波长处具有光学吸收特性。

2. 发明申请

US20090257927A1 FOLDED COAXIAL RESONATORS 审中-公开
标题翻译：折叠同轴共振器
公开(公告)号：US20090257927A1
公开(公告)日：2009-10-15
申请号：US12371864
申请日：2009-02-16
申请人： KARTIK RAMASWAMY , HIROJI HANAWA , KENNETH S. COLLINS , LAWRENCE WONG , ANDREW NGUYEN , STEVEN LANE
发明人： KARTIK RAMASWAMY , HIROJI HANAWA , KENNETH S. COLLINS , LAWRENCE WONG , ANDREW NGUYEN , STEVEN LANE
IPC分类号： H01P1/20 , H01P7/04 , H05H1/24
CPC分类号： H01P7/04
摘要： A method for constructing a distributed element coaxial resonator includes folding a coaxial resonator to provide a structure having a decreased physical length compared to its electrical length. In various embodiments, the resonator is tuned to affect a standing wave when excited by a signal of a specific wavelength. The coaxial resonator includes inner, middle and outer conductor sections, wherein the characteristic impedance is maintained throughout the resonator.
摘要翻译：一种用于构造分布式元件同轴谐振器的方法包括折叠同轴谐振器以提供与其电长度相比具有减小的物理长度的结构。在各种实施例中，当由特定波长的信号激发时，谐振器被调谐以影响驻波。同轴谐振器包括内部，中部和外部导体部分，其中在整个谐振器中保持特征阻抗。

3. 发明申请

US20110023780A1 APPARATUS FOR VHF IMPEDANCE MATCH TUNING 失效
标题翻译：甚高频阻抗匹配调谐装置
公开(公告)号：US20110023780A1
公开(公告)日：2011-02-03
申请号：US12511377
申请日：2009-07-29
申请人： KARTIK RAMASWAMY , HIROJI HANAWA , KENNETH S. COLLINS , LAWRENCE WONG , SAMER BANNA , ANDREW NGUYEN
发明人： KARTIK RAMASWAMY , HIROJI HANAWA , KENNETH S. COLLINS , LAWRENCE WONG , SAMER BANNA , ANDREW NGUYEN
IPC分类号： H03H7/38 , B05C13/00
CPC分类号： H01P7/04
摘要： Embodiments of impedance matching networks are provided herein. In some embodiments, an impedance matching network may include a coaxial resonator having an inner and an outer conductor. A tuning capacitor may be provided for variably controlling a resonance frequency of the coaxial resonator. The tuning capacitor may be formed by a first tuning electrode and a second tuning electrode and an intervening dielectric, wherein the first tuning electrode is formed by a portion of the inner conductor. A load capacitor may be provided for variably coupling energy from the inner conductor to a load. The load capacitor may be formed by the inner conductor, an adjustable load electrode, and an intervening dielectric.
摘要翻译：本文提供了阻抗匹配网络的实施例。在一些实施例中，阻抗匹配网络可以包括具有内部和外部导体的同轴谐振器。可以提供调谐电容器以可变地控制同轴谐振器的谐振频率。调谐电容器可以由第一调谐电极和第二调谐电极和中间电介质形成，其中第一调谐电极由内部导体的一部分形成。可以提供负载电容器，用于可变地耦合从内部导体到负载的能量。负载电容器可以由内部导体，可调负载电极和中间电介质形成。

4. 发明申请

US20100188077A1 APPARATUS FOR CHARACTERIZING A MAGNETIC FIELD IN A MAGNETICALLY ENHANCED SUBSTRATE PROCESSING SYSTEM 失效
标题翻译：用于表征磁场增强基板处理系统中的磁场的装置
公开(公告)号：US20100188077A1
公开(公告)日：2010-07-29
申请号：US12360664
申请日：2009-01-27
申请人： KARTIK RAMASWAMY , HIROJI HANAWA , LAWRENCE WONG , CHINH DINH
发明人： KARTIK RAMASWAMY , HIROJI HANAWA , LAWRENCE WONG , CHINH DINH
IPC分类号： G01R33/02
CPC分类号： G01R33/0206 , G01R33/0023
摘要： Embodiments of sensor devices for characterizing magnetic fields formed in substrate processing systems and methods of use thereof are provided herein. In some embodiments, an apparatus for characterizing a magnetic field in a substrate processing system may include a carrier having a form substantially similar to a substrate to be processed in the substrate processing system. One or more magnetic sensors are disposed on the carrier for measuring a magnitude of a magnetic field formed in the processing system in an x-, y-, and z-direction. A microprocessor is coupled to the one or more magnetic sensors to sample data representative of the magnitude of the magnetic field in the x-, y-, and z-directions proximate a position of each sensor. A memory device is coupled to the microprocessor for storing the sampled data. A power source is provided to supply power to each magnetic sensor and the microprocessor.
摘要翻译：本文提供了用于表征在基板处理系统中形成的磁场的传感器装置的实施例及其使用方法。在一些实施例中，用于表征衬底处理系统中的磁场的装置可以包括具有基本上类似于在衬底处理系统中要处理的衬底的形式的载体。一个或多个磁传感器设置在载体上，用于测量在x，y和z方向上在处理系统中形成的磁场的大小。微处理器耦合到一个或多个磁性传感器以对表示在每个传感器的位置附近的x，y和z方向上的磁场的大小的数据进行采样。存储器件耦合到微处理器以存储采样数据。提供电源以向每个磁传感器和微处理器供电。

5. 发明申请

US20090203197A1 NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTED BY ATOMIC LAYER DEPOSITION 审中-公开
标题翻译：由原子层沉积辅助的等离子体等离子体离子注入的新方法
公开(公告)号：US20090203197A1
公开(公告)日：2009-08-13
申请号：US12028423
申请日：2008-02-08
申请人： HIROJI HANAWA , Seon-Mee Cho , Majeed A. Foad
发明人： HIROJI HANAWA , Seon-Mee Cho , Majeed A. Foad
IPC分类号： C23C14/12 , H01L21/42
CPC分类号： H01L21/2236 , C23C16/45536 , C23C16/505 , C23C16/56
摘要： Embodiments of the invention provide a novel apparatus and methods for forming a conformal doped layer on the surface of a substrate. A substrate is provided to a process chamber, and a layer of dopant source material is deposited by plasma deposition, atomic layer deposition, or plasma-assisted atomic layer deposition. The substrate is then subjected to thermal processing to activate and diffuse dopants into the substrate surface.
摘要翻译：本发明的实施例提供了一种用于在衬底的表面上形成共形掺杂层的新型设备和方法。将衬底提供到处理室，并且通过等离子体沉积，原子层沉积或等离子体辅助原子层沉积沉积掺杂剂源材料层。然后对衬底进行热处理以激活并将掺杂剂扩散到衬底表面中。

6. 发明申请

US20110052833A1 GAS DISTRIBUTION SHOWERHEAD AND METHOD OF CLEANING 有权
标题翻译：气体分配淋浴和清洁方法
公开(公告)号：US20110052833A1
公开(公告)日：2011-03-03
申请号：US12870465
申请日：2010-08-27
申请人： HIROJI HANAWA , Kyawwin Maung , Hua Chung
发明人： HIROJI HANAWA , Kyawwin Maung , Hua Chung
IPC分类号： C23C16/00 , C23C16/513 , B08B7/00
CPC分类号： C23C16/4405 , C23C16/4404 , C23C16/45574 , H01L21/67115
摘要： During a deposition process, material may deposit not only on the substrate, but also on other chamber components. In a MOCVD chamber, one of those components is the gas distribution showerhead. The showerhead may be cleaned by bombarding the showerhead with radicals generated by a plasma that includes an inert gas and chlorine. In order to generate the plasma, the showerhead may be negatively biased or floating relative to the substrate support. The showerhead may comprise stainless steel and be coated with a ceramic coating.
摘要翻译：在沉积过程中，材料不仅可以沉积在基底上，而且沉积在其它腔室部件上。在MOCVD室中，其中一个部件是气体分配喷头。可以通过用包括惰性气体和氯的等离子体产生的自由基轰击喷头来清洁喷头。为了产生等离子体，喷头可以相对于基板支撑物被负偏置或浮动。喷头可以包括不锈钢并涂覆有陶瓷涂层。

7. 发明申请

US20110005679A1 PLASMA UNIFORMITY CONTROL THROUGH VHF CATHODE GROUND RETURN WITH FEEDBACK STABILIZATION OF VHF CATHODE IMPEDANCE 审中-公开
标题翻译：通过VHF阴极接地回路等离子体均匀控制，具有反馈稳定甚高频阴极阻抗
公开(公告)号：US20110005679A1
公开(公告)日：2011-01-13
申请号：US12502005
申请日：2009-07-13
申请人： HIROJI HANAWA , Kartik Ramaswamy , Satoru Kobayashi
发明人： HIROJI HANAWA , Kartik Ramaswamy , Satoru Kobayashi
IPC分类号： H01L21/3065 , H05K3/07
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32165 , H01J37/32183
摘要： Plasma process uniformity is controlled by maintaining near an optimum value an impedance of a ground return path for VHF source power from an overhead electrode through a workpiece support. A feedback control loop controls a variable reactance element of a reactive circuit that provides isolation between the VHF source power and a lower frequency bias power match circuit.
摘要翻译：等离子体工艺均匀性通过保持靠近最佳值的方式来控制，该距离来自顶置电极通过工件支撑件的VHF源功率的接地返回路径的阻抗。反馈控制回路控制提供VHF源功率与较低频偏置功率匹配电路之间的隔离的无功电路的可变电抗元件。

8. 发明申请

US20090230089A1 ELECTRICAL CONTROL OF PLASMA UNIFORMITY USING EXTERNAL CIRCUIT 审中-公开
标题翻译：使用外部电路的等离子体均匀性的电气控制
公开(公告)号：US20090230089A1
公开(公告)日：2009-09-17
申请号：US12047492
申请日：2008-03-13
申请人： KALLOL BERA , SHAHID RAUF , AJIT BALAKRISHNA , KENNETH S. COLLINS , KARTIK RAMASWAMY , HIROJI HANAWA
发明人： KALLOL BERA , SHAHID RAUF , AJIT BALAKRISHNA , KENNETH S. COLLINS , KARTIK RAMASWAMY , HIROJI HANAWA
IPC分类号： B01J19/08 , C23F1/00
CPC分类号： H01J37/32174 , H01J37/32009 , H01J37/32045 , H01J37/32091
摘要： A method and apparatus for controlling plasma uniformity is disclosed. When etching a substrate, a non-uniform plasma may lead to uneven etching of the substrate. Impedance circuits may alleviate the uneven plasma to permit more uniform etching. The impedance circuits may be disposed between the chamber wall and ground, the showerhead and ground, and the cathode can and ground. The impedance circuits may comprise one or more of an inductor and a capacitor. The inductance of the inductor and the capacitance of the capacitor may be predetermined to ensure the plasma is uniform. Additionally, the inductance and capacitance may be adjusted during processing or between processing steps to suit the needs of the particular process.
摘要翻译：公开了一种用于控制等离子体均匀性的方法和装置。当蚀刻基板时，不均匀的等离子体可能导致基板的不均匀蚀刻。阻抗电路可以减轻不均匀的等离子体以允许更均匀的蚀刻。阻抗电路可以设置在室壁和地面之间，淋浴头和地面以及阴极罐和地面之间。阻抗电路可以包括电感器和电容器中的一个或多个。电感器的电感和电容器的电容可以被预先确定，以确保等离子体是均匀的。此外，可以在处理期间或在处理步骤之间调整电感和电容以适应特定工艺的需要。

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