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1. 发明授权

US10408849B2 Method of determining consumption of decayed drug through drug taggants 有权
公开(公告)号：US10408849B2
公开(公告)日：2019-09-10
申请号：US15494089
申请日：2017-04-21
申请人： David R. Hall , Dan Allen , Conrad Rosenbrock , Daniel Hendricks , Andrew Nguyen , Steven J. M. Butala , Travis Niederhauser , Terrece Pearman , Joe Fox
发明人： David R. Hall , Dan Allen , Conrad Rosenbrock , Daniel Hendricks , Andrew Nguyen , Steven J. M. Butala , Travis Niederhauser , Terrece Pearman , Joe Fox
IPC分类号： G01N33/94 , G01N33/493 , G01N33/58 , G01N33/15 , G01N21/88 , A61B10/00 , A61B5/15
摘要： We disclose a method of using taggants to assess how and to what extent a drug in a drug composition that a user has consumed has decayed in response to storage conditions and time. The taggants may decay in response to environmental conditions which cause different drugs to lose their efficacy. These environmental conditions may include light, temperature, oxidation, and age. The taggants may be detected in biological samples, including urine and feces. By identifying the taggants, the drug composition and other information relating to the drug may be identified. Additionally, quantification of the different taggants may be used to determine whether the drug in the drug composition has been exposed to environmental conditions which may reduce its efficacy.

2. 发明申请

US20170232781A1 DEVICE FOR JOINING TWO WRITING INSTRUMENTS 审中-公开
公开(公告)号：US20170232781A1
公开(公告)日：2017-08-17
申请号：US15041680
申请日：2016-02-11
申请人： Andrew Nguyen
发明人： Andrew Nguyen
IPC分类号： B43K23/06 , F16B2/22
CPC分类号： B43K23/06 , F16B2/22
摘要： This invention provides a device for removably connecting two different styles of writing instruments, such as pens with different colored inks or different size nibs, pencils, markers, or crayons.

3. 发明申请

US20160367860A1 SWIMMING AID DEVICE 审中-公开
标题翻译：游泳设备
公开(公告)号：US20160367860A1
公开(公告)日：2016-12-22
申请号：US15257848
申请日：2016-09-06
申请人： Andrew Nguyen
发明人： Andrew Nguyen
IPC分类号： A63B31/11
CPC分类号： A63B31/11 , A63B2209/00 , A63B2210/50
摘要： A swimming aid device in the form of a monofi is contemplated. The swimming aid device may include first and second fins formed of a resilient material, each fin including an elongated internal space within a fin body, an opening leading to the elongated internal space, a fin blade coupled to and extending away from the elongated internal space, a first and second side heel connectors on opposing sides of the opening leading to the elongated internal space and sized and shaped to mate with each other, a fin blade connector and a fin blade connector receiver on the fin blade and sized and shaped to mate with each other, the combination of the first and second fins forming a monofin.
摘要翻译：考虑到单体形式的游泳辅助装置。游泳辅助装置可以包括由弹性材料形成的第一和第二鳍片，每个翼片包括翅片体内的细长内部空间，通向细长内部空间的开口，联接到并延伸远离细长内部空间的翅片叶片，在所述开口的相对侧上的通向所述细长内部空间的第一和第二侧跟部连接器，其尺寸和形状相互配合，翅片叶片连接器和鳍片连接器接收器，其尺寸和形状适于配合彼此之间形成单峰的第一和第二鳍片的组合。

4. 发明授权

US09267742B2 Apparatus for controlling the temperature uniformity of a substrate 有权
标题翻译：用于控制基板的温度均匀性的装置
公开(公告)号：US09267742B2
公开(公告)日：2016-02-23
申请号：US12886255
申请日：2010-09-20
申请人： Kallol Bera , Xiaoping Zhou , Douglas A. Buchberger, Jr. , Andrew Nguyen , Hamid Tavassoli , Surajit Kumar , Shahid Rauf
发明人： Kallol Bera , Xiaoping Zhou , Douglas A. Buchberger, Jr. , Andrew Nguyen , Hamid Tavassoli , Surajit Kumar , Shahid Rauf
IPC分类号： F25B29/00 , F28F3/12 , F28F13/00
CPC分类号： F28F3/12 , F28F2013/001
摘要： Apparatus for controlling the thermal uniformity of a substrate. In some embodiments, the thermal uniformity of the substrate is controlled to be more uniform. In some embodiments, the thermal uniformity of the substrate is controlled to be non-uniform in a desired pattern. In some embodiments, an apparatus for controlling thermal uniformity of a substrate includes a substrate support having a support surface to support a substrate thereon. A plurality of flow paths having a substantially equivalent fluid conductance are disposed within the substrate support to flow a heat transfer fluid beneath the support surface.
摘要翻译：用于控制基板的热均匀性的装置。在一些实施例中，将基板的热均匀性控制得更均匀。在一些实施例中，基板的热均匀性被控制为以期望的图案不均匀。在一些实施例中，用于控制衬底的热均匀性的装置包括具有用于在其上支撑衬底的支撑表面的衬底支撑件。具有基本相当的流体电导的多个流动路径设置在基板支撑件内，以使传热流体在支撑表面下方流动。

5. 发明申请

US20140262031A1 MULTI-MODE ETCH CHAMBER SOURCE ASSEMBLY 审中-公开
标题翻译：多模式蚀刻室源组件
公开(公告)号：US20140262031A1
公开(公告)日：2014-09-18
申请号：US13893199
申请日：2013-05-13
申请人： Sergey G. BELOSTOTSKIY , Alexander MARCACCI , Kartik RAMASWAMY , Srinivas D. NEMANI , Andrew NGUYEN , Yogananda SARODE
发明人： Sergey G. BELOSTOTSKIY , Alexander MARCACCI , Kartik RAMASWAMY , Srinivas D. NEMANI , Andrew NGUYEN , Yogananda SARODE
IPC分类号： H01J37/32
CPC分类号： H01J37/3244 , H01J37/32091
摘要： A multi-chambered processing platform includes one or more multi-mode plasma processing systems. In embodiments, a multi-mode plasma processing system includes a multi-mode source assembly having a primary source to drive an RF signal on a showerhead electrode within the process chamber and a secondary source to generate a plasma with by driving an RF signal on an electrode downstream of the process chamber. In embodiments, the primary 7 source utilizes RF energy of a first frequency, while the secondary source utilizes RF energy of second, different frequency. The showerhead electrode is coupled to ground through a frequency dependent filter that adequately discriminates between the first and second frequencies for the showerhead electrode to be RF powered during operation of the primary source, yet adequately grounded during operation of the secondary plasma source without electrical contact switching or reliance on physically moving parts.
摘要翻译：多室处理平台包括一个或多个多模式等离子体处理系统。在实施例中，多模式等离子体处理系统包括多模式源组件，该多模式源组件具有用于驱动处理室内的喷头电极上的RF信号的主要源，以及辅助源以通过在其上驱动RF信号来产生等离子体电极在处理室的下游。在实施例中，主7源使用第一频率的RF能量，而次级源利用第二频率的RF能量。淋浴头电极通过频率相关的滤波器耦合到地面，该滤波器在初级源的操作期间充分地辨别喷头电极的第一和第二频率以进行RF供电，而在没有电接触切换的二级等离子体源的操作期间充分地接地或依赖物理移动部件。

6. 发明申请

US20140202267A1 METHODS OF ATTACHING A MODULE ON WAFER SUBSTRATE 有权
标题翻译：连接晶片上的模块的方法
公开(公告)号：US20140202267A1
公开(公告)日：2014-07-24
申请号：US13797112
申请日：2013-03-12
申请人： Vaibhaw Vishal , Andrew Nguyen , Kristopher K. Hearn , Mei Sun
发明人： Vaibhaw Vishal , Andrew Nguyen , Kristopher K. Hearn , Mei Sun
IPC分类号： H05K7/00
CPC分类号： H01L21/67248 , Y10T29/53
摘要： Aspects of the present disclosure describe an attachment device for mounting a module to a substrate comprises a module leg with two ends and a module foot. One end of the module leg is configured to be attached to a bottom surface of the module and the other end of the module leg is configured to be attached to the module foot. At least a portion of the module foot is configured to be attached to the substrate. Also a portion of a surface area of the module foot is configured to be exposed outside of an area covered by the module. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：本公开的方面描述了用于将模块安装到基板的附接装置，包括具有两端的模块腿和模块脚。模块腿的一端构造成附接到模块的底表面，并且模块腿的另一端构造成附接到模块脚。模块脚的至少一部分被配置成附接到基底。模块脚的表面区域的一部分也被配置为暴露在由模块覆盖的区域的外部。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

7. 发明授权

US08633423B2 Methods and apparatus for controlling substrate temperature in a process chamber 有权
标题翻译：用于控制处理室中的衬底温度的方法和装置
公开(公告)号：US08633423B2
公开(公告)日：2014-01-21
申请号：US13097822
申请日：2011-04-29
申请人： Xing Lin , Douglas A. Buchberger, Jr. , Xiaoping Zhou , Valentin Todorow , Andrew Nguyen , Anchel Sheyner
发明人： Xing Lin , Douglas A. Buchberger, Jr. , Xiaoping Zhou , Valentin Todorow , Andrew Nguyen , Anchel Sheyner
IPC分类号： H05B1/00 , H01L21/683
CPC分类号： H05B6/105 , H01L21/67109 , H01L21/6831
摘要： Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.
摘要翻译：本文提供了在处理期间控制基板的温度的方法和装置。在一些实施例中，用于保持和控制衬底温度的装置可以包括电介质材料的圆盘; 设置在靠近所述圆盘的表面的所述圆盘中的电极，待保持基板的电极; 以及多个加热器元件，其布置在圆盘中并且布置成同心环以提供独立的温度控制区。

8. 发明申请

US20130224953A1 ABATEMENT AND STRIP PROCESS CHAMBER IN A LOAD LOCK CONFIGURATION 审中-公开
标题翻译：一个负载锁定配置中的消费和条带过程室
公开(公告)号：US20130224953A1
公开(公告)日：2013-08-29
申请号：US13746831
申请日：2013-01-22
申请人： Martin Jeffrey SALINAS , Paul B. REUTER , Andrew NGUYEN , Jared Ahmad LEE
发明人： Martin Jeffrey SALINAS , Paul B. REUTER , Andrew NGUYEN , Jared Ahmad LEE
IPC分类号： H01L21/306
摘要： Embodiments of the present invention a load lock chamber including two or more isolated chamber volumes, wherein one chamber volume is configured for processing a substrate and another chamber volume is configured to provide cooling to a substrate. One embodiment of the present invention provides a load lock chamber having at least two isolated chamber volumes formed in a chamber body assembly. The at least two isolated chamber volumes may be vertically stacked. A first chamber volume may be used to process a substrate disposed therein using reactive species. A second chamber volume may include a cooled substrate support.
摘要翻译：本发明的实施例是一种包括两个或多个隔离室容积的负载锁定室，其中一个室容积被配置用于处理衬底，另一个室体积被配置为向衬底提供冷却。本发明的一个实施例提供了一种装载锁定室，其具有形成在室主体组件中的至少两个隔离室容积。至少两个隔离室容积可以垂直堆叠。可以使用第一室容积来处理其中使用反应物种的衬底。第二室容积可以包括冷却的基底支撑件。

9. 发明授权

US08440019B2 Lower liner with integrated flow equalizer and improved conductance 有权
标题翻译：下层衬套具有集成流量均衡器和改进的电导率
公开(公告)号：US08440019B2
公开(公告)日：2013-05-14
申请号：US13607425
申请日：2012-09-07
申请人： James D. Carducci , Andrew Nguyen , Ajit Balakrishna , Michael C. Kutney
发明人： James D. Carducci , Andrew Nguyen , Ajit Balakrishna , Michael C. Kutney
IPC分类号： C23C16/455 , C23C16/52 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01L21/67069 , H01J37/32082 , H01J37/32495 , H01J37/32623 , Y10T428/13
摘要： A plasma processing chamber has a lower liner with an integrated flow equalizer. In an etching process, the processing gases may be unevenly drawn from the processing chamber which may cause an uneven etching of the substrate. The integrated flow equalizer is configured to equalize the flow of the processing gases evacuated from the chamber via the lower liner.
摘要翻译：等离子体处理室具有具有集成流量均衡器的下衬套。在蚀刻工艺中，处理气体可能不均匀地从处理室抽出，这可能导致基板的不均匀蚀刻。集成流量均衡器被配置为使从腔室经由下衬套排出的处理气体的流量相等。

10. 发明申请

US20120091108A1 METHODS AND APPARATUS FOR CONTROLLING SUBSTRATE TEMPERATURE IN A PROCESS CHAMBER 有权
标题翻译：用于控制过程室中衬底温度的方法和装置
公开(公告)号：US20120091108A1
公开(公告)日：2012-04-19
申请号：US13097822
申请日：2011-04-29
申请人： XING LIN , DOUGLAS A. BUCHBERGER, Jr. , XIAOPING ZHOU , VALENTIN TODOROW , ANDREW NGUYEN , ANCHEL SHEYNER
发明人： XING LIN , DOUGLAS A. BUCHBERGER, Jr. , XIAOPING ZHOU , VALENTIN TODOROW , ANDREW NGUYEN , ANCHEL SHEYNER
IPC分类号： H05B1/00
CPC分类号： H05B6/105 , H01L21/67109 , H01L21/6831
摘要： Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.
摘要翻译：本文提供了在处理期间控制基板的温度的方法和装置。在一些实施例中，用于保持和控制衬底温度的装置可以包括电介质材料的圆盘; 设置在靠近所述圆盘的表面的所述圆盘中的电极，待保持基板的电极; 以及多个加热器元件，其布置在圆盘中并且布置成同心环以提供独立的温度控制区。

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