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1. 发明授权

US06451178B2 Interference layer system 失效
公开(公告)号：US06451178B2
公开(公告)日：2002-09-17
申请号：US08959633
申请日：1997-10-28
申请人： Joachim Szczyrbowski , Günter Bräuer
发明人： Joachim Szczyrbowski , Günter Bräuer
IPC分类号： C23C1435
CPC分类号： C03C17/366 , C03C17/2456 , C03C17/36 , C03C2217/212 , C03C2217/734 , C03C2218/155 , C03C2218/156 , C23C14/0036 , C23C14/083 , C23C14/10 , C23C14/3471
摘要： A process is provided for sputter-induced precipitation of metal oxide layers on substrates by means of a reactive sputter process. The plasma charge acting upon the target to be evaporated is provided with electric power selected such that the metal oxide layers precipitated on the substrates to be coated are deposited at a precipitation rate of ≧4 nm/s. During the coating process the substrate to be coated is arranged stationary in relation to the target material to be evaporated. The electrodes are connected in a conductive manner to the outputs of an alternating current source whereby the alternating frequency of the alternating current provided for the electrical supply of the plasma discharge is selected between 10 kHz and 80 kHz. Particularly preferred is that the precipitated oxide layer is a TiO2 layer or an SiO2 layer.

2. 发明授权

US5968328A Device for sputter deposition of thin layers on flat substrates 失效
标题翻译：用于在平坦基板上溅射沉积薄层的装置
公开(公告)号：US5968328A
公开(公告)日：1999-10-19
申请号：US988811
申请日：1997-12-11
申请人： Gotz Teschner , Joachim Szczyrbowski , Karl-Heinz Grosse
发明人： Gotz Teschner , Joachim Szczyrbowski , Karl-Heinz Grosse
IPC分类号： C23C14/35 , C23C14/56 , H01J37/34 , C23C14/34
CPC分类号： H01J37/3405 , C23C14/35 , C23C14/568
摘要： In an apparatus for the sputter deposition of thin electrically insulating layers on substrates (33, 33', . . . ) there is provided in an evacuable chamber which is connected to a treatment gas source, a first pair of tubular magnetron cathodes (5, 5' or 31) and at least one additional pair of magnetron cathodes (6, 6' or 25, 26 or 30, 32), a medium frequency generator (10) connected in series with a transformer (9), where the two secondary winding outputs (11, 12) of said transformer are each connected with the cathodes of a second pair (6, 6' or 25, 26 or 30, 32) and where direct current can be fed into the supply lines for the first cathode pair (31) via a center tap (15) of the transformer (9) and a network (17 or 13, 14).
摘要翻译：在用于在衬底（33,33'...）上溅射沉积薄电绝缘层的设备中，设置在可抽气室中，该可抽出室连接到处理气体源，第一对管状磁控阴极（5， 5“或31”）和至少一个额外的一对磁控阴极（6,6'或25,26或30,32），与变压器（9）串联连接的中频发生器（10），其中两个次级所述变压器的绕组输出端（11,12）各自与第二对（6,6'或25,26或30,32）的阴极连接，并且其中可将直流电流馈送到用于第一阴极对的电源线（31）经由变压器（9）的中心抽头（15）和网络（17或13,14）。

3. 发明授权

US5616226A Cathode assembly 失效
标题翻译：阴极组件
公开(公告)号：US5616226A
公开(公告)日：1997-04-01
申请号：US554751
申请日：1995-11-07
申请人： Hans Kunz , Andreas Sauer , Manfred Schuhmacher , Joachim Szczyrbowski , Dietmar Marquardt
发明人： Hans Kunz , Andreas Sauer , Manfred Schuhmacher , Joachim Szczyrbowski , Dietmar Marquardt
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/3408 , H01J37/3426 , H01J37/3497
摘要： A pair of parallel elongate targets are fixed with respect to respective plates mounted in a vacuum chamber by means of clamps arranged along the longitudinal sides of each target, and an expandable wedge system between the rear plate and magnetic yokes on the backs of the targets. The wedge system for each target includes a wedge block having ramped surfaces which face outward, a pair of wedge jaws having ramped surfaces which slide against the ramped surfaces of the block, and a screw which draws the jaws together against the ramped surfaces of the block to expand the system and force the plate away from the yoke and fix the entire assembly in the clamps.
摘要翻译：一对平行的细长靶相对于安装在真空室中的相应板通过沿着每个靶的纵向侧面布置的夹具而固定，并且在后板和磁轭之间的可扩展的楔形系统位于靶的背部上。用于每个目标的楔形系统包括楔形块，其具有面向外的斜面，一对具有斜面的楔形爪，其具有抵靠该块的倾斜表面滑动的斜面;以及将夹爪拉在一起抵靠该块的倾斜表面的螺钉以扩展系统并迫使板远离轭并将整个组件固定在夹具中。

4. 发明授权

US5264099A Method for producing an opaque substrate 失效
标题翻译：不透明基材的制造方法
公开(公告)号：US5264099A
公开(公告)日：1993-11-23
申请号：US664790
申请日：1991-03-05
申请人： Joachim Szczyrbowski , Anton Dietrich , Albert Kastner , Klaus Hartig
发明人： Joachim Szczyrbowski , Anton Dietrich , Albert Kastner , Klaus Hartig
IPC分类号： C03C17/34 , C03C17/36 , C23C14/06 , C23C14/08 , G02B1/10 , C23C14/34
CPC分类号： C03C17/3615 , C03C17/3423 , C03C17/3435 , C03C17/36 , C03C17/3642 , C03C17/366 , C23C14/0641 , C23C14/08 , G02B1/10 , C03C2217/23 , C03C2218/154
摘要： A transparent substrate, such as glass, having a solar control coating consisting of a CrN layer between two SnO, layers. The solar control coating is arranged on the back side of the substrate which will face away from an observer when in place. A sub-oxidic alloy, such as NiCrO is then applied to the solar control coating.
摘要翻译：具有由两个SnO层之间的CrN层组成的太阳能控制涂层的透明基板，例如玻璃。太阳能控制涂层布置在基板的背面，当其就位时将远离观察者。然后将诸如NiCrO的亚氧化合金施加到太阳能控制涂层。

5. 发明授权

US5071535A Cathode sputtering device 失效
标题翻译：阴极溅射装置
公开(公告)号：US5071535A
公开(公告)日：1991-12-10
申请号：US567946
申请日：1990-08-15
申请人： Klaus Hartig , Joachim Szczyrbowski
发明人： Klaus Hartig , Joachim Szczyrbowski
IPC分类号： C23C14/34
CPC分类号： C23C14/3407
摘要： Cathode sputtering apparatus with a high sputtering rate, including a cathode having a cathode base 1 and a target 6 disposed parallel thereto and being provided with a channel 5 in the cathode base which is passed through by a cooling agent 12. With respect to the target 6, 10 to be cooled, this channel 5 is bounded by a thin wall 2 configured as a membrane. The wall 2 has large contact surfaces exhibiting a good heat transfer to the target surface. The contact surface between the target 6 and the wall 2 is coated with a material, e.g. a graphite layer, which has a low sputtering rate in order to delay a sputtering through as long as possible.
摘要翻译：具有高溅射速率的阴极溅射装置，包括具有阴极基体1和平行设置的靶6的阴极，并且在阴极基体中设置有通过冷却剂12通过的通道5.相对于靶 6,10被冷却，该通道5被配置为膜的薄壁2界定。壁2具有表现出对目标表面的良好热传递的大的接触表面。目标6和壁2之间的接触表面涂覆有材料，例如，石墨层，其溅射速率低，以便尽可能地延长溅射。

6. 发明授权

US06511584B1 Configuration for coating a substrate by means of a sputtering device 失效
标题翻译：用于通过溅射装置涂覆基板的构造
公开(公告)号：US06511584B1
公开(公告)日：2003-01-28
申请号：US08813689
申请日：1997-03-07
申请人： Joachim Szczyrbowski , Götz Teschner , Anton Zmelty , Jürgen Bruch , Dietmar Marquardt
发明人： Joachim Szczyrbowski , Götz Teschner , Anton Zmelty , Jürgen Bruch , Dietmar Marquardt
IPC分类号： C23C1434
CPC分类号： H01J37/3444 , C23C14/0036 , H01J37/3402
摘要： A sputtering electrode is switched between two power values at a constant reactive gas flow rate which is selected so that the target of the sputtering electrode is in the metallic mode at the first power value while in the oxide mode at a second power value.
摘要翻译：溅射电极以恒定的反应性气体流量在两个功率值之间切换，所述恒定反应气体流速选择为使得溅射电极的目标处于处于第一功率值的金属模式，而在氧化物模式下处于第二功率值。

7. 发明授权

US6096174A Apparatus for coating a substrate with thin layers 失效
标题翻译：用于涂覆薄层的基材的设备
公开(公告)号：US6096174A
公开(公告)日：2000-08-01
申请号：US990953
申请日：1997-12-15
申请人： Gotz Teschner , Joachim Szczyrbowski
发明人： Gotz Teschner , Joachim Szczyrbowski
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34 , H01L21/316 , H01L21/318 , C23C14/32 , C23C14/54
CPC分类号： H01J37/3444 , C23C14/3464 , C23C14/352 , H01J37/3408 , H01L21/31604 , H01L21/318
摘要： An apparatus is provided for coating a substrate (24) with thin layers from targets (12, 13) between which a gas discharge plasma is sustained in order to produce the ions necessary for the bombardment of the targets (12, 13) connected to alternating current. The process chamber (6) contains a gas under a specific partial pressure. The targets (12, 13) are connected to a power source in such a circuit so that they alternately form the cathode and anode of the gas discharge. The reversal of the current direction is performed through an H bridge (4) formed of four switches (16 to 19), the conductor (14) connecting the H bridge (4) to a first power source (3) being connected through a branch line (21) to a second power source which can be connected by a switch (20) to ground. All switches (19 to 20) are operated by a control circuit in a regular and variable mode, the ion energy being controlled by the level of the potential difference between the cathode and the coating and the number of ions through the duration of this potential
摘要翻译：提供了一种用于从其上维持气体放电等离子体的目标（12,13）的薄层涂覆基底（24）的装置，以产生用于轰击连接到交替的靶（12,13）所必需的离子当前。处理室（6）含有特定分压下的气体。目标（12,13）在这种电路中连接到电源，使得它们交替地形成气体放电的阴极和阳极。通过由四个开关（16至19）形成的H桥（4）进行电流方向的反转，将H桥（4）连接到第一电源（3）的导体（14）通过分支线路（21）连接到能够通过开关（20）连接到地的第二电源。所有的开关（19到20）由一个常规和可变模式的控制电路操作，离子能量由阴极和涂层之间的电位差水平控制，并且在该电位的持续时间内离子的数量

8. 发明授权

US5944967A Dual target cathode assembly with shielding 失效
标题翻译：双目标阴极组件与屏蔽
公开(公告)号：US5944967A
公开(公告)日：1999-08-31
申请号：US554750
申请日：1995-11-07
申请人： Hans Kunz , Andreas Sauer , Manfred Schuhmacher , Joachim Szczyrbowski , Dietmar Marquardt
发明人： Hans Kunz , Andreas Sauer , Manfred Schuhmacher , Joachim Szczyrbowski , Dietmar Marquardt
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/3408
摘要： A dual magnetron cathode assembly includes a pair of elongate, parallel targets in coplanar relationship fixed to respective magnetic yokes with associated rows of permanent magnets for producing a magnetic field over the targets. A common back plate is provided for both cathodes, a center shield plate extending from the back plate to between the targets, side shield plates and end shield plates likewise extending from the back plate to form side-by-side rectangular shielding enclosures which expose only the sputtering surface of the targets. The yokes are fixed with respect to the vacuum chamber by insulative holders which extend through openings in the back plate.
摘要翻译：双磁控管阴极组件包括一对共面关系的细长的平行靶，固定到相应的磁轭上，该磁轭具有相关的永磁体排，用于在靶上产生磁场。为两个阴极提供常见的背板，中央屏蔽板从后板延伸到目标之间，侧面屏蔽板和端部屏蔽板，同样从背板延伸，形成仅仅暴露的并排矩形屏蔽外壳靶的溅射表面。轭体通过延伸穿过背板中的开口的绝缘保持器相对于真空室固定。

9. 发明授权

US5427665A Process and apparatus for reactive coating of a substrate 失效
标题翻译：用于基材的反应性涂布的方法和装置
公开(公告)号：US5427665A
公开(公告)日：1995-06-27
申请号：US728562
申请日：1991-07-11
申请人： Klaus Hartig , Joachim Szczyrbowski
发明人： Klaus Hartig , Joachim Szczyrbowski
IPC分类号： C23C14/00 , C23C14/34 , H01J37/34
CPC分类号： C23C14/0089 , C23C14/0068 , C23C14/3407 , C23C14/3414 , H01J37/3405 , H01J37/3408 , H01J37/3429 , H01J37/3438 , H01J37/3452
摘要： An apparatus for the reactive coating of a substrate 1, with silicon dioxide (SiO.sub.2) for example, comprises a power source 10, 37 connected to an electrode 5 which is disposed in an evacuable coating chamber 15, 15a and interacts with a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1, wherein argon and oxygen, for example, are supplied to the coating chamber 15, 15a. The target to be sputtered is composed of several parts, for example. A center part 3a of the target 3 opposite the substrate 1 is made of silicon (Si) and the part 3b surrounding this center portion is made of zinc (Sn), for example. Provision is made for a diaphragm 24 between the substrate 1 on the one hand, and the target 3, on the other hand. The shape of the magnetic field of the electrode 5 during the sputtering generates a sputtering of the more reactive target material 3a in the oxidic mode and of the less reactive target material 3b in the metallic mode.
摘要翻译：用于二氧化硅（SiO 2）的基体1的反应性涂覆的装置包括连接到电极5的电源10,37，电极5设置在可抽出的涂覆室15,15a中并与靶3相互作用被溅射并且其溅射的颗粒沉积在基底1上，其中例如氩和氧被提供给涂覆室15,15a。例如，溅射的目标由几个部分组成。靶3的与基板1相对的中心部3a由硅（Si）构成，围绕该中心部的部分3b例如由锌（Sn）构成。另一方面，为了在一方面在基板1和目标3之间设置隔膜24。在溅射期间电极5的磁场的形状在金属模式中产生更具反应性的目标材料3a在氧化模式中的溅射和较少反应性的目标材料3b的溅射。

10. 发明授权

US5216542A Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating 失效
标题翻译：涂层，组合有光学有效层系统，用于基板，由于层系具有高抗反射效应，以及制造涂层的方法
公开(公告)号：US5216542A
公开(公告)日：1993-06-01
申请号：US599988
申请日：1990-10-19
申请人： Joachim Szczyrbowski , Klaus Hartig , Stephan Roegels , Anton Zmelty
发明人： Joachim Szczyrbowski , Klaus Hartig , Stephan Roegels , Anton Zmelty
IPC分类号： C03C17/34 , G02B1/10
CPC分类号： G02B1/10 , C03C17/3423 , C03C17/3435 , C03C17/3452
摘要： A coating, composed of an optically effective layer system for substrates, whereby the layer system has a high antireflective effect. On a front side of the substrate, facing the observer, in sequence from the front side to the observer, a first layer is arranged on the substrate, functioning as dielectric and comprising metal oxide. Thereupon follows a second layer comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A third layer follows functioning as dielectric and comprising metal oxide. Thereupon a fourth layer follows comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A fifth layer follows functioning as dielectric comprising metal oxide. On a backside of the substrate a TiN.sub.x -layer (x.gtoreq.1, preferably x=1.05) is arranged. The adequate selection of certain materials for the individual layers, of certain layer thicknesses and of a certain sequence of the individual layers results in a surprisingly good antireflective coating, contrast increase and antistatic effect. These good optical features of the layer system are reached with a small number of layers and with thin layer thicknesses. This, in turn, leads to an extremely cost saving manufacturing of the coating.
摘要翻译：一种由用于基底的光学有效层系统组成的涂层，由此该层系统具有高的抗反射效果。在基板的正面上，从观察者的正面向观察者方向依次排列有第一层，作为电介质并且包含金属氧化物而被布置在基板上。因此，随后是包含氮化物的第二层，优选TiN x（x等于或大于1，优选x = 1.05）。第三层的功能是电介质并包含金属氧化物。因此，第四层包括氮化物，优选TiN x（x等于或大于1，优选x = 1.05）。第五层的功能是包含金属氧化物的电介质。在衬底的背面，布置TiNx层（x> / = 1，优选x = 1.05）。对于各层，某些层厚度和各层的某个顺序的某些材料的适当选择导致出人意料的良好的抗反射涂层，对比度增加和抗静电效果。层系统的这些良好的光学特征达到少量层和薄层厚度。这又导致了涂层极其节省成本的制造。

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