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    • 7. 发明授权
    • Process for a passivating postrinsing of conversion layers
    • 转化层的钝化方法
    • US5294266A
    • 1994-03-15
    • US978193
    • 1992-11-18
    • Dieter HauffeThomas KolbergGerhard MullerHorst GehmeckerWerner RauschPeter SchubachThomas Wendel
    • Dieter HauffeThomas KolbergGerhard MullerHorst GehmeckerWerner RauschPeter SchubachThomas Wendel
    • C23C22/34C23C22/36C23C22/60C23C22/83
    • C23C22/73C23C22/34C23C22/361C23C22/60C23C22/83
    • The invention is in a composition and process for the chromium free passivating postrinsing of conversion layers on metals before the application of a paint or adhesive. The conversion layers can be on the bases of phosphate layers, at least two polyvalent metal ions with complex formers, titanium, zirconium and/or hafnium. The postrinsing agent is an aqueous solution which has been adjusted to a pH value of up to 5 and which contains an aluminum fluorozirconate having an Al:Zr:F mole ratio of (0.15 to 8.0):1:(5 to 52), and in which solutions the total concentration of Al+Zr+F is 0.1 to 8.0 g/l. The postrinsing solutions may additionally contain at least one of the anions benzoate, caprylate, ethyl hexoate, salicylate in a total concentration of 0.05 to 0.5 g/1 and may preferably be adjusted to the required pH value with cations of volatile bases, such as ammonium, ethanolammonium and di- and triethanolammonium. The paint is subsequently applied suitably by cathodic electrocoating or powder coating or from a low-solvent high-solids paint.The rinsing treatment is over a period of 1 to 120 seconds at temperatures of 20.degree. to 80.degree. C. The invention is used as a pretreatment to the application of a paint coating, film coating or adhesive coating.
    • 本发明是用于在施加涂料或粘合剂之前的金属上的转化层的无铬钝化的组合物和方法。 转化层可以在磷酸盐层,至少两种具有复合成型剂的多价金属离子,钛,锆和/或铪的基础上。 postrinsing剂是一种水溶液,其pH值调至5以下,并含有Al:Zr:F摩尔比为(0.15〜8.0):1:(5〜52)的氟锆酸铝, 其中Al + Zr + F的总浓度为0.1〜8.0g / l。 postrinsing溶液还可以含有至少一种阴离子苯甲酸酯,辛酸酯,己酸乙酯,水杨酸酯,总浓度为0.05至0.5g / l,并​​且可优选用挥发性碱如铵的阳离子调节至所需的pH值 ,乙醇铵和二乙醇胺和三乙醇铵。 随后通过阴极电涂或粉末涂料或低溶剂高固体涂料适当地施涂涂料。 在20〜80℃的温度下,漂洗处理时间为1〜120秒。本发明用作涂料涂料,薄膜包衣或粘合剂涂料的预处理。
    • 9. 发明授权
    • Phosphating process
    • 磷化工艺
    • US5135583A
    • 1992-08-04
    • US749191
    • 1991-08-23
    • Horst GehmeckerThomas KolbergDirk MeyerGerhard Muller
    • Horst GehmeckerThomas KolbergDirk MeyerGerhard Muller
    • C23C22/36C23C22/86
    • C23C22/362C23C22/86
    • For phosphating metal surfaces which consist at least in part of aluminum, by means of phosphating solutions which contain zinc, phosphate and fluoride, any titanium which has entered the phosphating solution and would disturb the formation of the layer is precipitated by an addition of SiO-containing compounds and after the precipitate has been removed, the content of free fluoride is readjusted to the required concentration. Particularly suitable compounds which contain SiO, consist of alkali metasilicate, alkali orthosilicate and/or alkali disilicate, preferably used in an amount of 0.05 to 1 g/l of the phosphating solution, or of silica, which is preferably used in an amount of 0.5 to 10 g per liter of the phosphating solution (calc. as Si).
    • 对于至少部分由铝组成的磷化金属表面,通过含有锌,磷酸盐和氟化物的磷化溶液,已经进入磷化溶液并且将扰乱层的形成的任何钛通过加入SiO- 在除去沉淀物之后,将游离氟化物的含量重新调节至所需浓度。 含有SiO的特别合适的化合物由偏硅酸碱,原硅酸碱和/或碱二硅酸盐组成,优选以0.05至1g / l的磷酸盐溶液或二氧化硅的量使用,其优选以0.5的量使用 至10g每升磷酸盐溶液(计算为Si)。
    • 10. 发明授权
    • Dough-rounding apparatus
    • 面团装置
    • US4793789A
    • 1988-12-27
    • US121479
    • 1987-11-17
    • Gerhard Muller
    • Gerhard Muller
    • A21C7/00A21C7/04
    • A21C7/00
    • A dough-rounding apparatus in which first and second groups of elements undergo relative revolving movements to round pieces of dough. The elements of one group have chambers for receiving the pieces of dough, the elements of the other group being formed by circular recesses in a working surface which are opposite the chambers. The working surface has a limited region immediately adjacent to and surrounding each circular recess which is of broken, irregular formation to achieve a roughening of the working surface different from the circular recess. The limited region can be circular and concentric with the associated circular recess, the limited region having a diameter between 1.6 and 2.2 times the diameter of the circular recess.
    • 一种面团圆形装置,其中第一和第二组元件经历相对旋转运动以圆形面团片。 一组的元件具有用于容纳面团片的腔室,另一组件的元件由与腔室相对的工作表面中的圆形凹槽形成。 工作表面具有紧邻并围绕每个圆形凹槽的有限区域,该圆形凹槽具有破碎的不规则形状,以实现与圆形凹部不同的工作表面的粗糙化。 有限区域可以是与相关联的圆形凹槽圆形和同心的,有限区域具有直径为圆形凹部直径的1.6到2.2倍之间的直径。