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    • 1. 发明授权
    • Wall mounted shelving system
    • 壁挂架系统
    • US06644609B1
    • 2003-11-11
    • US10242239
    • 2002-09-11
    • Gene Scott
    • Gene Scott
    • A47G2902
    • A47B57/42A47B96/1458Y10S248/909
    • A wall mounted shelf system comprises plural elongate bracket standards adapted for securement on a wall surface, and engaged in slots on faces of the bracket standards, plural shelf brackets support at least one shelf. Standard covers are positioned as an outer skin, in contact with opposing surfaces of the bracket standards. Apertures in the standard covers each are sized and positioned for tight-fitting around one of the shelf brackets and are open to an end edge so that the standard covers can be installed onto the bracket standards, without disassembling the brackets from the standards. In this manner, an inexpensive cover can be installed on existing shelf systems without disassembly. The butting edges of each of the covers are hidden behind the shelves so that the final appearance of the wall mounted standards may be changed in color, texture and other designer effects.
    • 壁挂式货架系统包括多个细长支架标准,其适用于固定在墙壁表面上,并且与托架标准面上的狭槽接合,多个搁板托架支撑至少一个货架。 标准盖被定位为外壳,与支架标准的相对表面接触。 标准盖中的孔径各自的尺寸和位置适于围绕其中一个搁架支架紧密配合,并且通向端边缘,使得标准盖可以安装在支架标准上,而不需要将标准架拆下。 以这种方式,可以在现有的货架系统上安装廉价的盖子而不拆卸。 每个盖子的对接边缘隐藏在货架后面,使得壁挂式标准品的最终外观可能会因颜色,质地和其他设计师的影响而改变。
    • 4. 发明授权
    • Multiple ion source method and apparatus for fabricating multilayer
optical films
    • 用于制造多层光学膜的多离子源方法和装置
    • US4793908A
    • 1988-12-27
    • US947141
    • 1986-12-29
    • Gene ScottCharles W. KohlenbergerDavid M. Warren
    • Gene ScottCharles W. KohlenbergerDavid M. Warren
    • C23C14/22C23C14/46
    • C23C14/46C23C14/221
    • A method of fabricating multiple layer, solid, thin films on a substrate having a surface to be coated, the method providing control over the thickness, stoichiometry, and morphology of each separate layer formed by a method comprising steps: A. forming a first ion beam from an inert gas; B, bombarding a target surface with said first ion beam in a vacuum chamber to generate a vapor cloud composed of the target material atoms by the process of sputtering; C. adjusting the respective positions of the substrate surface for coating and the target surface to promote the condensation of the vapor upon the substrate surface for coating; D. forming a second ion beam, the second ion beam's ions being formed from a mixture of inert and reactive gases; E. bombarding the substrate surface simultaneously with the second ion beam to promote a chemical reaction between the target vapor atoms and the chemically reactive gas ions as the target atoms and the chemically reactive gas ions impinge upon the substrate surface for coating, the resulting chemical compound building up in thickness as a homogeneous thin solid film layer; F. positioning an alternative target material in the place occupied by the previous one; G. repeating the above method steps to produce each successive thin solid film layer of different material formed upon each previous layer.
    • 一种在具有待涂覆表面的基底上制造多层固体薄膜的方法,所述方法提供对通过包括以下步骤的方法形成的每个分离层的厚度,化学计量和形态的控制:A.形成第一离子 来自惰性气体的光束; B,用真空室中的所述第一离子束轰击目标表面,通过溅射过程产生由靶材料原子组成的蒸气云; C.调整用于涂覆的基材表面和目标表面的各自位置,以促进蒸气在基材表面上的冷凝以进行涂布; D.形成第二离子束,第二离子束的离子由惰性和反应性气体的混合物形成; E.与第二离子束同时轰击衬底表面以促进目标蒸汽原子和化学反应气体离子之间的化学反应,因为靶原子和化学反应气体离子撞击在衬底表面上用于涂覆,所得到的化合物 作为均匀薄的固体薄膜层的厚度增加; F.将替代目标材料定位在前一个占用的地方; G.重复上述方法步骤以产生形成在每个先前层上的不同材料的每个连续薄的固体薄膜层。