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1. 发明授权

US07662763B2 Composition and method for removing copper-compatible resist 有权
标题翻译：去除铜兼容抗蚀剂的组成和方法
公开(公告)号：US07662763B2
公开(公告)日：2010-02-16
申请号：US11185856
申请日：2005-07-21
申请人： Gee-Sung Chae , Yong-Sup Hwang , Cyoo-Chul Jo , Oh-Nam Kwon , Kyoung-Mook Lee , Byung-Uk Kim , Sang-Dai Lee , Jong-Soon Yoo
发明人： Gee-Sung Chae , Yong-Sup Hwang , Cyoo-Chul Jo , Oh-Nam Kwon , Kyoung-Mook Lee , Byung-Uk Kim , Sang-Dai Lee , Jong-Soon Yoo
IPC分类号： C11D7/50
CPC分类号： C11D11/0047 , C11D7/263 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , G03F7/425 , Y10S134/902
摘要： A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
摘要翻译：用于除去铜相容抗蚀剂的组合物包括约10％至约30％重量的胺化合物，约10％至约80％重量的乙二醇醚化合物和约10％至约80％重量的极性溶剂。

2. 发明授权

US06958312B2 Composition and method for removing copper-compatible resist 有权
标题翻译：去除铜兼容抗蚀剂的组成和方法
公开(公告)号：US06958312B2
公开(公告)日：2005-10-25
申请号：US10267047
申请日：2002-10-09
申请人： Gee-Sung Chae , Yong-Sup Hwang , Cyoo-Chul Jo , Oh-Nam Kwon , Kyoung-Mook Lee , Byung-Uk Kim , Sang-Dai Lee , Jong-Soon Yoo
发明人： Gee-Sung Chae , Yong-Sup Hwang , Cyoo-Chul Jo , Oh-Nam Kwon , Kyoung-Mook Lee , Byung-Uk Kim , Sang-Dai Lee , Jong-Soon Yoo
IPC分类号： C23F1/10 , C11D7/26 , C11D7/32 , C11D7/50 , C11D11/00 , G03F7/42
CPC分类号： C11D11/0047 , C11D7/263 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , G03F7/425 , Y10S134/902
摘要： A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
摘要翻译：用于除去铜相容抗蚀剂的组合物包括约10％至约30％重量的胺化合物，约10％至约80％重量的乙二醇醚化合物和约10％至约80％重量的极性溶剂。

3. 发明申请

US20050272621A1 Composition and method for removing copper-compatible resist 有权
公开(公告)号：US20050272621A1
公开(公告)日：2005-12-08
申请号：US11185856
申请日：2005-07-21
申请人： Geo-Sung Chae , Yong-Sup Hwang , Cyoo-Chul Jo , Oh-Nam Kwon , Kyoung-Mook Lee , Byung-Uk Kim , Sang-Dai Lee , Jong-Soon Yoo
发明人： Geo-Sung Chae , Yong-Sup Hwang , Cyoo-Chul Jo , Oh-Nam Kwon , Kyoung-Mook Lee , Byung-Uk Kim , Sang-Dai Lee , Jong-Soon Yoo
IPC分类号： C23F1/10 , C11D7/26 , C11D7/32 , C11D7/50 , C11D11/00 , G03F7/42 , C11D1/00
CPC分类号： C11D11/0047 , C11D7/263 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/5013 , G03F7/425 , Y10S134/902
摘要： A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.

4. 发明授权

US06183942B2 Thinner composition for removing spin-on-glass and photoresist 有权
标题翻译：用于去除旋涂玻璃和光致抗蚀剂的较薄组合物
公开(公告)号：US06183942B2
公开(公告)日：2001-02-06
申请号：US09429535
申请日：1999-10-28
申请人： Byung-Uk Kim , Ji-Hum Baik , Chang-Il Oh , Sang-Dai Lee , Won-Lae Kim , Chong-Soon Yoo
发明人： Byung-Uk Kim , Ji-Hum Baik , Chang-Il Oh , Sang-Dai Lee , Won-Lae Kim , Chong-Soon Yoo
IPC分类号： G03F742
CPC分类号： G03F7/422 , G03F7/168
摘要： The present invention relates to a thinner composition for removing a spin-on-glass coating and a photoresist which are used in the semiconductor components manufacturing process. The present invention provides a mixed thinner composition which is mixed propylene glycol monoalkyl ether with monooxycarbonic acid ester, alkyl ethanoate, and alkyl lactate in a thinner composition for cleaning and photoresist removal applications in the semiconductor components manufacturing process. A thinner composition according to the present invention has the beneficial effects that the production yield can be improved during semiconductor component manufacturing since when the thinner composition is applied after the spin coating process, the undesired coating of the edge or the backside of the substrate can be removed promptly, completely, and effectively, and residual materials adhering to the surface of a substrate which must be reuse can be completely removed so that the substrate can be economically used.
摘要翻译：本发明涉及用于去除半导体元件制造方法中的旋涂玻璃涂层和光致抗蚀剂的较薄组合物。本发明提供了混合的丙稀二醇单烷基醚与单氧碳酸酯的混合稀释剂组合物，烷基乙酸烷基酯和乳酸烷基酯用于半导体组件制造方法中的清洁和光致抗蚀剂去除应用的较薄组合物。根据本发明的较薄组合物具有在半导体部件制造期间可以提高生产产量的有益效果，因为当薄膜组合物在旋转涂布过程之后施加，可以迅速，完全和有效地去除衬底的边缘或背面的不期望的涂层，并且可以完全去除粘附到必须重新使用的衬底表面的残留材料，因此基材可以是经济的被使用。

5. 发明授权

US08687266B2 Display device driven by electric field 有权
标题翻译：显示设备由电场驱动
公开(公告)号：US08687266B2
公开(公告)日：2014-04-01
申请号：US13503937
申请日：2010-10-29
申请人： Chun-Hyuk Lee , Byung-Uk Kim , Mun-Pyo Hong , Hong Choi , Byung-Seong Bae
发明人： Chun-Hyuk Lee , Byung-Uk Kim , Mun-Pyo Hong , Hong Choi , Byung-Seong Bae
IPC分类号： G02B26/00
CPC分类号： G02F1/167 , G02F1/133512 , G02F2001/1676
摘要： The present invention relates to an electric-field drive display device. According to one embodiment of the present invention, the electric-field drive display device comprises: a first substrate; a first electrode which is formed on the first substrate; a second electrode which is formed on the first substrate and is disposed in parallel with the first electrode; a drive partition wall which is formed on the first electrode and the second electrode and has a plurality of opening and closing holes; and a plurality of drive bodies which are disposed inside each of the opening and closing holes. Consequently, the electric-field drive display device according to one embodiment of the present invention can adjust the amount of light transmitted and so display the desired image by adjusting the positions of the drive bodies in the horizontal direction through the use of electrical force.
摘要翻译：电场驱动显示装置技术领域本发明涉及电场驱动显示装置。根据本发明的一个实施例，电场驱动显示装置包括：第一基板; 形成在第一基板上的第一电极; 第二电极，形成在第一基板上并与第一电极平行设置; 驱动分隔壁，其形成在所述第一电极和所述第二电极上，并且具有多个开闭孔; 以及设置在每个所述开闭孔内的多个驱动体。因此，根据本发明的一个实施例的电场驱动显示装置可以通过使用电力调节驱动体在水平方向上的位置来调节透光量并从而显示所需图像。

6. 发明授权

US08603867B2 Composition for removing a photoresist and method of manufacturing a thin-film transistor substrate using the composition 有权
标题翻译：用于除去光致抗蚀剂的组合物和使用该组合物制造薄膜晶体管基板的方法
公开(公告)号：US08603867B2
公开(公告)日：2013-12-10
申请号：US13439418
申请日：2012-04-04
申请人： Bong-Kyun Kim , Shin-Il Choi , Hong-Sick Park , Wang-Woo Lee , Seok-Jun Jang , Byung-Uk Kim , Sun-Joo Park , Suk-Il Yoon , Jong-Hyun Jeong , Soon-Beom Hur
发明人： Bong-Kyun Kim , Shin-Il Choi , Hong-Sick Park , Wang-Woo Lee , Seok-Jun Jang , Byung-Uk Kim , Sun-Joo Park , Suk-Il Yoon , Jong-Hyun Jeong , Soon-Beom Hur
IPC分类号： H01L21/312
CPC分类号： G03F7/425 , H01L21/31133 , H01L27/1288 , H01L29/66765
摘要： A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide (“TMAH”), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.
摘要翻译：用于除去光致抗蚀剂的组合物，该组合物包含约1重量％至约10重量％的四甲基氢氧化铵（“TMAH”），约1重量％至约10重量％的烷醇胺，约50重量％约70重量％的二醇醚化合物，约0.01重量％至约1重量％的三唑化合物，约20重量％至约40重量％的极性溶剂和水，各自基于组合物的总重量。

7. 发明授权

US08012921B2 Composition for stripping photoresist and method for manufacturing thin transistor array panel using the same 有权
标题翻译：用于剥离光刻胶的组合物和使用其制造薄晶体管阵列面板的方法
公开(公告)号：US08012921B2
公开(公告)日：2011-09-06
申请号：US11865795
申请日：2007-10-02
申请人： Hong-Sick Park , Jong-Hyun Jeong , Suk-Il Yoon , Seong-Bae Kim , Wy-Yong Kim , Soon-Beom Huh , Byung-Uk Kim
发明人： Hong-Sick Park , Jong-Hyun Jeong , Suk-Il Yoon , Seong-Bae Kim , Wy-Yong Kim , Soon-Beom Huh , Byung-Uk Kim
IPC分类号： C11D7/50
CPC分类号： G03F7/425 , H01L21/31133 , H01L27/124 , H01L27/1288 , H01L29/458
摘要： The present invention provides a photoresist stripper including about 5 wt % to about 20 wt % alcohol amine, about 40 wt % to about 70 wt % glycol ether, about 20 wt % to about 40 wt % N-methyl pyrrolidone, and about 0.2 wt % to about 6 wt % chelating agent.
摘要翻译：本发明提供了一种光致抗蚀剂剥离器，其包括约5重量％至约20重量％的醇胺，约40重量％至约70重量％的二醇醚，约20重量％至约40重量％的N-甲基吡咯烷酮，以及约0.2重量％％至约6重量％的螯合剂。

8. 发明申请

US20100203449A1 METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE AND NEGATIVE PHOTORESIST COMPOSITION USED THEREIN 有权
标题翻译：制造薄膜晶体管基板的方法及其使用的负极光电组合物
公开(公告)号：US20100203449A1
公开(公告)日：2010-08-12
申请号：US12685545
申请日：2010-01-11
申请人： Yeong-Beom Lee , Hi-Kuk Lee , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo
发明人： Yeong-Beom Lee , Hi-Kuk Lee , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： H01L27/1288 , G03F7/0045 , G03F7/0382 , G03F7/40 , H01L27/1214
摘要： A method of fabricating a thin film transistor substrate and a negative photoresist composition used therein are provided, which can reduce pattern inferiority. The method of fabricating a thin film transistor substrate includes forming a conductive film composed of a conductive material on a substrate, forming an etch pattern composed of a negative photoresist composition on the conductive film, and forming a conductive pattern by etching the conductive film using the etch pattern as an etching mask, wherein the negative photoresist composition includes 10-50 parts by weight of novolak resin including a hydroxyl group that is soluble in an alkali developing solution, 0.5-10 parts by weight of a first photo acid generator represented by the following formula (1), 0.5-10 parts by weight of a second photo acid generator represented by the following formula (2), 1-20 parts by weight of a cross-linking agent, and 10-90 parts by weight of a solvent:
摘要翻译：提供了制造其中使用的薄膜晶体管基板和负型光致抗蚀剂组合物的方法，其可以降低图案劣化。制造薄膜晶体管基板的方法包括在基板上形成由导电材料构成的导电膜，在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案，并使用该导电膜蚀刻导电膜形成导电图案蚀刻图案作为蚀刻掩模，其中负性光致抗蚀剂组合物包含10-50重量份的包含可溶于碱显影液的羟基的酚醛清漆树脂，0.5-10重量份由按照下式（1），将0.5-10重量份由下式（2）表示的第二光酸反应产物，1-20重量份的交联剂和10-90重量份的溶剂：

9. 发明申请

US20100120181A1 INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME 有权
标题翻译：油墨组合物及使用其制造液晶显示装置的方法
公开(公告)号：US20100120181A1
公开(公告)日：2010-05-13
申请号：US12613961
申请日：2009-11-06
申请人： Sung-Hee KIM , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Youg Song , Myoung-Soo Lee
发明人： Sung-Hee KIM , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Youg Song , Myoung-Soo Lee
IPC分类号： H01L21/50 , C09D11/10
CPC分类号： C09D11/02 , B82Y10/00 , B82Y40/00 , C09D11/033 , G03F7/0002
摘要： Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.
摘要翻译：公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

10. 发明申请

US20110224335A1 INK COMPOSITION AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME 审中-公开
标题翻译：油墨组合物及使用其制造液晶显示装置的方法
公开(公告)号：US20110224335A1
公开(公告)日：2011-09-15
申请号：US13090895
申请日：2011-04-20
申请人： Sung-Hee Kim , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Young Song , Myoung-Soo Lee
发明人： Sung-Hee Kim , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Young Song , Myoung-Soo Lee
IPC分类号： C09D11/10
CPC分类号： C09D11/02 , B82Y10/00 , B82Y40/00 , C09D11/033 , G03F7/0002
摘要： Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.
摘要翻译：公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

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