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1. 发明授权

US4061540A Cholesterol oxidaze and process for preparing same 失效
标题翻译：胆固醇氧化物及其制备方法
公开(公告)号：US4061540A
公开(公告)日：1977-12-06
申请号：US700859
申请日：1976-06-29
申请人： Fumihiko Yoshida , Kiyoshi Mizusawa , Kazuo Nakamura
发明人： Fumihiko Yoshida , Kiyoshi Mizusawa , Kazuo Nakamura
IPC分类号： C12N9/04 , C12D13/10
CPC分类号： C12N9/0006 , Y10S435/815 , Y10S435/843
摘要： A novel cholesterol oxidase can be obtained by culturing a strain belonging to the Genus Corynebacterium and having an ability to produce cholesterol oxidase in a medium containing cholesterol.
摘要翻译：可以通过培养属于棒杆菌属的菌株并且具有在含有胆固醇的培养基中产生胆固醇氧化酶的能力来获得新的胆固醇氧化酶。

2. 发明申请

US20050173937A1 Door member opener apparatus for vehicle 有权
标题翻译：车门开启装置
公开(公告)号：US20050173937A1
公开(公告)日：2005-08-11
申请号：US10968164
申请日：2004-10-20
申请人： Fumihiko Yoshida , Toshiya Shimpo , Hidetaka Inagaki
发明人： Fumihiko Yoshida , Toshiya Shimpo , Hidetaka Inagaki
IPC分类号： E05B83/36 , B60J5/10 , B62D23/00 , E05B47/00 , E05B81/58 , E05B83/16 , E05B83/18
CPC分类号： E05B81/14 , E05B81/66 , E05B81/76 , Y10S292/23 , Y10T70/7006 , Y10T292/1047 , Y10T292/1082
摘要： A door member opener apparatus for a vehicle includes an engaging mechanism, a lock mechanism, a clearing mechanism, and an ECU. The engaging mechanism includes a striker and a claw member that rotatively moves to engage with the striker. The engaging mechanism engages a tailgate with a car body. The lock mechanism regulates rotative movement of the claw member. The clearing mechanism clears the regulation of the rotative movement of the claw member when a handle member is operated. The ECU sets the amount of time before the lock mechanism can regulate the rotative movement of the claw member equal to a normal driving time.
摘要翻译：用于车辆的门构件开启装置包括接合机构，锁定机构，清理机构和ECU。接合机构包括撞击器和爪部件，其旋转地移动以与撞针接合。接合机构将后挡板与车身接合。锁定机构调节爪构件的旋转运动。当手柄构件被操作时，清除机构清除爪构件的旋转运动的调节。 ECU设定锁定机构能够调节爪部件的旋转运动等于正常行驶时间的时间量。

3. 发明授权

US4596214A Combustion chamber system for kerosine internal combustion engine 失效
标题翻译：煤油内燃机燃烧室系统
公开(公告)号：US4596214A
公开(公告)日：1986-06-24
申请号：US692738
申请日：1985-01-18
申请人： Shizuo Yagi , Junji Ootani , Masafumi Araki , Fumihiko Yoshida
发明人： Shizuo Yagi , Junji Ootani , Masafumi Araki , Fumihiko Yoshida
IPC分类号： F02B1/04 , F02B19/12 , F02B19/18 , F02B75/02 , F02F1/24 , F02F1/42
CPC分类号： F02B19/12 , F02B19/18 , F02F1/4214 , F02B1/04 , F02B2075/027 , F02F2001/247 , Y02T10/125
摘要： A combustion chamber system of a kerosine internal combustion engine including a main combustion chamber and an auxiliary combustion chamber both of which are defined in a cylinder head and are spaced from each other by a partition. A plurality of communication holes through which these main and auxiliary combustion chambers communicate with each other are made in the partition. The main combustion chamber has a suction port and an exhaust port opened thereto which are adapted to be opened and closed by a suction valve and an exhaust valve, respectively. The open ends of the communication holes on the side of the main combustion chamber are pointed to the upper surface of a piston located in the vicinity of a top dead center thereof, and a mixture of a theoretical or richer fuel ratio is fed into the main combustion chamber.
摘要翻译：一种煤油内燃机的燃烧室系统，其包括主燃烧室和辅助燃烧室，它们都被限定在气缸盖中并且通过分隔件彼此间隔开。这些主燃烧室和辅助燃烧室相互连通的多个连通孔在隔板中形成。主燃烧室具有分别通过吸入阀和排气阀打开和关闭的吸入口和开口的排气口。主燃烧室一侧的连通孔的开口端指向位于其上死点附近的活塞的上表面，理论或更丰富的燃料比的混合物被供给到主燃烧室燃烧室。

4. 发明授权

US4865904A Laminated cloth 失效
标题翻译：层压布
公开(公告)号：US4865904A
公开(公告)日：1989-09-12
申请号：US094744
申请日：1987-09-09
申请人： Chikaaki Okamura , Akihito Fujita , Tamotu Nagao , Fumihiko Yoshida
发明人： Chikaaki Okamura , Akihito Fujita , Tamotu Nagao , Fumihiko Yoshida
IPC分类号： B29C51/14 , B29L31/58 , B32B27/02 , B32B27/04 , B32B27/12 , B60R13/00 , D06N3/06
CPC分类号： D06N3/06 , B32B27/12 , Y10T428/24967 , Y10T428/31928 , Y10T428/31935 , Y10T442/20
摘要： A laminated cloth which comprises (A) a cloth and (B) a crosslinking polyvinyl chloride skin layer, and optionally (C) a polyvinyl chloride layer as a primary coat for the layer (B), said laminated cloth having improved deep drawing properties and excellent tolerant to vacuum forming and being useful as a covering for interior trims of automobiles and other vacuum forming products and also as a surface decorating material for various products.
摘要翻译：一种叠层布，其包括（A）布和（B）交联聚氯乙烯表皮层，以及任选地（C）作为层（B）的主涂层的聚氯乙烯层，所述叠层布具有改进的深冲性能，优异的耐真空成型性，并且可用作汽车和其他真空成型产品的内饰件的覆盖物，以及用作各种产品的表面装饰材料。

5. 发明授权

US4781976A Skin covering for trims of automobiles 失效
标题翻译：汽车修剪皮肤覆盖物
公开(公告)号：US4781976A
公开(公告)日：1988-11-01
申请号：US127041
申请日：1987-11-27
申请人： Akihito Fujita , Tamotu Nagao , Chikaaki Okamura , Fumihiko Yoshida
发明人： Akihito Fujita , Tamotu Nagao , Chikaaki Okamura , Fumihiko Yoshida
IPC分类号： B32B5/18 , B32B27/30 , B60J5/00 , B60R13/02 , B32B3/26
CPC分类号： B32B27/30 , B60R13/02 , Y10T428/249988 , Y10T428/249992
摘要： A skin covering for trims of automobiles having three layer structure comprising(a) a surface layer comrising a PVC having a mean degree of polymerization (P) of 2,000 or more (high polymerization PVC),(b) a foam layer comprising a blend of a crosslinking PVC and a PVC having a P of less than 1,500 (low polymerization PVC) and a foaming agent, and(c) a back layer comprising a low polymerization PVC,said skin covering having excellent processability with the cloth by high frequency welding and excellent vacuum forming properties and being useful for the facing of trims of automobiles.
摘要翻译：一种具有三层结构的汽车修整物的皮肤覆盖物，包括（a）含有平均聚合度（＆amp;＆lt; P＆amp; P）为2,000或更高的PVC（高聚合PVC）的表面层，（b）包含共混物的泡沫层的交联PVC和具有小于1,500的（低聚合PVC）和发泡剂的上链＆P的PVC，和（c）包含低聚合PVC的背层，所述皮肤覆盖物与织物具有优异的加工性焊接和优异的真空成型性能，并且可用于汽车装饰面。

6. 发明授权

US07589023B2 Method of manufacturing semiconductor wafer 有权
标题翻译：制造半导体晶片的方法
公开(公告)号：US07589023B2
公开(公告)日：2009-09-15
申请号：US10258282
申请日：2001-04-23
申请人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
发明人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
IPC分类号： H01L21/302
CPC分类号： B24B37/08 , B24B37/042 , B24B37/24 , B24B37/28
摘要： A method of manufacturing a semiconductor wafer, comprising the step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by using an abrasive cloth with a semiconductor wafer sink rate different in polishing from that of the other abrasive cloth for one of a polishing cloth (14) on an upper surface plate (12) and a polishing cloth (15) on a lower surface plate (13) so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer (W), or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.
摘要翻译：一种半导体晶片的制造方法，其特征在于，通过使用具有与其它研磨布不同的半导体晶片沉降速率的研磨布，将前表面的光泽度与晶片的后表面的光泽度区分开的步骤，在上表面板（12）上的抛光布（14）和下表面板（13）上的抛光布（15）之一，以同时抛光半导体晶片（W）的前表面和后表面，或通过区分上表面板的转速与下表面板的转速来区分。

7. 发明授权

US07210713B2 Door member opener apparatus for vehicle 有权
标题翻译：车门开启装置
公开(公告)号：US07210713B2
公开(公告)日：2007-05-01
申请号：US10968164
申请日：2004-10-20
申请人： Fumihiko Yoshida , Toshiya Shimpo , Hidetaka Inagaki
发明人： Fumihiko Yoshida , Toshiya Shimpo , Hidetaka Inagaki
IPC分类号： E05C3/06 , E05C3/16
CPC分类号： E05B81/14 , E05B81/66 , E05B81/76 , Y10S292/23 , Y10T70/7006 , Y10T292/1047 , Y10T292/1082
摘要： A door member opener apparatus for a vehicle includes an engaging mechanism, a lock mechanism, a clearing mechanism, and an ECU (electronic control unit). The engaging mechanism includes a striker and a claw member that rotatively moves to engage with the striker. The engaging mechanism engages a tailgate with a car body. The lock mechanism regulates rotative movement of the claw member. The clearing mechanism clears the regulation of the rotative movement of the claw member when a handle member is operated. The ECU sets the amount of time before the lock mechanism can regulate the rotative movement of the claw member equal to a normal driving time.
摘要翻译：一种用于车辆的门构件开启装置，包括接合机构，锁定机构，清理机构和ECU（电子控制单元）。接合机构包括撞击器和爪部件，其旋转地移动以与撞针接合。接合机构将后挡板与车身接合。锁定机构调节爪构件的旋转运动。当手柄构件被操作时，清除机构清除爪构件的旋转运动的调节。 ECU设定锁定机构能够调节爪部件的旋转运动等于正常行驶时间的时间量。

8. 发明授权

US3941770A Method for purifying 3',5'-cyclic-adenylic acid or 3',5'-cyclic-deoxyadenylic acid 失效
标题翻译：纯化3 {40,5 {40-环 - 腺苷酸或3 {40,5 {40-环 - 脱氧腺苷酸
公开(公告)号：US3941770A
公开(公告)日：1976-03-02
申请号：US422566
申请日：1973-12-06
申请人： Jiro Ishiyama , Tamotsu Yokotsuka , Motohiko Kato , Nobuyuki Yamaji , Fumihiko Yoshida
发明人： Jiro Ishiyama , Tamotsu Yokotsuka , Motohiko Kato , Nobuyuki Yamaji , Fumihiko Yoshida
IPC分类号： C07H19/213 , C07H19/20 , C12P19/32
CPC分类号： C07H19/20
摘要： 3' ,5'-Cyclic-adenylic acid or 3' ,5'-cyclic-deoxadenylic acid can be obtained in a high purity and a high yield by adding a water-soluble organic solvent such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, tert-butyl alcohol, acetone, N,N'-dimethylformamide, dioxane, tetrahydrafuran, ethyleneglycolmonomethylether and the like singly or in combination to an aqueous solution containing as impurities one or more kinds of nucleotides other than 3' ,5'-cyclicadenylic acid and 3' ,5'-cyclic-deoxyadenylic acid, nucleosides, nucleobases, colored substances, proteins and the like in addition to 3' ,5'-cyclic-adenylic acid or 3', 5'-cyclic-deoxyadenylic acid.The said 3' ,5'-cyclic-adenylic acid or 3' ,5'-cyclic-deoxyadenylic acid are useful and valuable as a biochemical reagent.
摘要翻译： 3'，5'-环 - 腺苷酸或3'，5'-环脱羰腺苷酸可以通过加入水溶性有机溶剂如甲醇，乙醇，正己酸，丙醇，异丙醇，叔丁醇，丙酮，N，N'-二甲基甲酰胺，二恶烷，四氢呋喃，乙二醇单甲醚等单独或组合成含有作为杂质的一种或多种以外的3'以外的核苷酸的水溶液，除了3'，5'-环腺苷酸或3'，5'-环 - 腺苷酸，3'，5'-环腺苷酸和3'，5'-环脱氧腺苷酸，核苷，核碱基，着色物质，蛋白质等，脱氧腺苷酸。

9. 发明授权

US08283252B2 Method of manufacturing semiconductor wafer 有权
标题翻译：制造半导体晶片的方法
公开(公告)号：US08283252B2
公开(公告)日：2012-10-09
申请号：US12585400
申请日：2009-09-14
申请人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
发明人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
IPC分类号： H01L21/302
CPC分类号： B24B37/08 , B24B37/042 , B24B37/24 , B24B37/28
摘要： A method of manufacturing a semiconductor wafer, including a step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by holding the semiconductor wafer in a wafer holding hole formed in a carrier plate, and simultaneously polishing a front and back surface of said semiconductor wafer by driving said carrier plate to make a circular motion associated with no rotation on its own axis within a plane parallel with a surface of said carrier plate between a pair of polishing members disposed to face to each other, by using an abrasive body with a semiconductor wafer sink rate different in polishing from that of an abrasive body for one of a polishing member on an upper surface plate and a polishing member on a lower surface plate so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer, or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.
摘要翻译：一种制造半导体晶片的方法，包括通过将半导体晶片保持在形成在载板上的晶片保持孔中，将前表面的光泽度与晶片的后表面的光泽度区分开的步骤，所述半导体晶片的后表面通过驱动所述承载板而形成圆周运动，所述圆周运动与平行于所述承载板的表面的平面之间在其自身轴线上不旋转，所述平面布置在彼此面对的一对抛光构件之间，通过使用具有与用于上表面板上的抛光构件和下表面板上的抛光构件之一的研磨体的抛光不同的半导体晶片沉降速率的研磨体，以同时抛光前表面和后表面半导体晶片，或者通过区分上表面板的转速与下表面板的转速来区分。

10. 发明申请

US20100009605A1 Method of manufacturing semiconductor wafer 有权
标题翻译：制造半导体晶片的方法
公开(公告)号：US20100009605A1
公开(公告)日：2010-01-14
申请号：US12585400
申请日：2009-09-14
申请人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
发明人： Toru Taniguchi , Etsuro Morita , Satoshi Matagawa , Seiji Harada , Isoroku Ono , Mitsuhiro Endo , Fumihiko Yoshida
IPC分类号： H01L21/463
CPC分类号： B24B37/08 , B24B37/042 , B24B37/24 , B24B37/28
摘要： A method of manufacturing a semiconductor wafer, including a step of differentiating the glossiness of a front surface from that of a rear surface of the wafer by holding the semiconductor wafer in a wafer holding hole formed in a carrier plate, and simultaneously polishing a front and back surface of said semiconductor wafer by driving said carrier plate to make a circular motion associated with no rotation on its own axis within a plane parallel with a surface of said carrier plate between a pair of polishing members disposed to face to each other, by using an abrasive body with a semiconductor wafer sink rate different in polishing from that of an abrasive body for one of a polishing member on an upper surface plate and a polishing member on a lower surface plate so as to simultaneously polish both the front and rear surfaces of the semiconductor wafer, or differentiating by differentiating the rotating speed of the upper surface plate from that of the lower surface plate.
摘要翻译：一种制造半导体晶片的方法，包括通过将半导体晶片保持在形成在载板上的晶片保持孔中，将前表面的光泽度与晶片的后表面的光泽度区分开的步骤，所述半导体晶片的后表面通过驱动所述承载板而形成圆周运动，所述圆周运动与平行于所述承载板的表面的平面之间在其自身轴线上不旋转，所述平面布置在彼此面对的一对抛光构件之间，通过使用具有与用于上表面板上的抛光构件和下表面板上的抛光构件之一的研磨体的抛光不同的半导体晶片沉降速率的研磨体，以同时抛光前表面和后表面半导体晶片，或者通过区分上表面板的转速与下表面板的转速来区分。

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