专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07524768B2 Method using monolayer etch masks in combination with printed masks 失效
标题翻译：使用单层蚀刻掩模与印刷掩模组合的方法
公开(公告)号：US07524768B2
公开(公告)日：2009-04-28
申请号：US11388718
申请日：2006-03-24
申请人： Eugene M. Chow , William S. Wong , Michael Chabinyc , Jeng Ping Lu , Ana Claudia Arias
发明人： Eugene M. Chow , William S. Wong , Michael Chabinyc , Jeng Ping Lu , Ana Claudia Arias
IPC分类号： H01L21/302
CPC分类号： H01L21/302 , H01L21/0271 , H01L21/0273 , H01L27/124 , H01L27/1288 , H01L27/1292 , H01L29/66765
摘要： A method to pattern films into dimensions smaller than the printed pixel mask size. A printed mask is deposited on a thin film on a substrate. The second mask layer is selectively deposited onto the film, but not to the printed mask. A third mask is then printed onto the substrate to pattern a portion of the second mask. Certain solvents are then used to remove the printed mask but not the mask layer on the thin film. The mask layer is then used to form a pattern on the thin film in combination with etching. The features formed in the thin film are smaller than the smallest dimension of the printed mask. The coated mask layer can be a self-assembled mono-layer or other material that selectively binds to the thin film.
摘要翻译：将薄膜图案尺寸小于印刷像素掩模尺寸的方法。印刷的掩模沉积在基底上的薄膜上。第二掩模层选择性地沉积在膜上，而不是印刷在掩模上。然后将第三掩模印刷到基底上以对第二掩模的一部分进行图案化。然后使用某些溶剂去除印刷的掩模，而不是薄膜上的掩模层。然后将掩模层与蚀刻结合在薄膜上形成图案。形成在薄膜中的特征小于印刷掩模的最小尺寸。涂覆的掩模层可以是选择性地结合薄膜的自组装单层或其它材料。

2. 发明授权

US07749396B2 Method of manufacturing fine features for thin film transistors 有权
标题翻译：制造薄膜晶体管精细特征的方法
公开(公告)号：US07749396B2
公开(公告)日：2010-07-06
申请号：US11388731
申请日：2006-03-24
申请人： Eugene M. Chow , William S. Wong , Michael Chabinyc , Ana Claudia Arias
发明人： Eugene M. Chow , William S. Wong , Michael Chabinyc , Ana Claudia Arias
IPC分类号： H01B13/00 , C23F1/00
CPC分类号： H01L29/4908 , H01L27/124 , H01L27/1292
摘要： A process for fabricating fine features such as small gate electrodes on a transistor. The process involves the jet-printing of a mask and the plating of a metal to fabricate sub-pixel and standard pixel size features in one layer. Printing creates a small sub-pixel size gap mask for plating a fine feature. A second printed mask may be used to protect the newly formed gate and etch standard pixel size lines connecting the small gates.
摘要翻译：一种在晶体管上制造诸如小栅电极的精细特征的工艺。该方法涉及一种掩模的喷墨印刷和金属镀层，以在一层中制造亚像素和标准像素尺寸特征。打印创建一个小的子像素大小的间隙掩模，用于电镀精细特征。可以使用第二印刷掩模来保护新形成的栅极并蚀刻连接小栅极的标准像素尺寸线。

3. 发明授权

US07861405B2 System for forming a micro-assembler 有权
标题翻译：用于形成微型汇编器的系统
公开(公告)号：US07861405B2
公开(公告)日：2011-01-04
申请号：US12041375
申请日：2008-03-03
申请人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K. Biegelsen
发明人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K. Biegelsen
IPC分类号： B23P19/00
CPC分类号： B81C99/002 , H01L24/95 , H01L2224/95085 , H01L2224/95145 , H01L2924/14 , H01L2924/1461 , Y10T29/4913 , Y10T29/5313 , Y10T29/53174 , Y10T29/53178 , H01L2924/00
摘要： A xerographic micro-assembler system, method and apparatus that includes a sorting unit that is adapted to receive a plurality of micro-objects. The micro-objects can also be sorted and oriented on the sorting unit and then transferred to a substrate. The system, method and apparatus can also include a device for detecting errors in at least one of the micro-objects on the sorting unit and a protection means for preventing an improper micro-object from being transferred to the substrate. The system, method and apparatus can also include an organized micro-object feeder assembly that can transfer at least one of a plurality of micro-objects to the sorting unit or directly to the substrate.
摘要翻译：一种静电复印微组装系统，方法和装置，其包括适于接收多个微物体的分类单元。微物体也可以在分选单元上分类和定向，然后转移到基底。系统，方法和装置还可以包括用于检测分类单元中的至少一个微物体中的错误的装置和用于防止不适当的微物体被转移到基板的保护装置。系统，方法和装置还可以包括有组织的微物体馈送器组件，其可以将多个微物体中的至少一个传送到分类单元或直接传送到衬底。

4. 发明授权

US08312619B2 Micro-assembler 有权
公开(公告)号：US08312619B2
公开(公告)日：2012-11-20
申请号：US12754254
申请日：2010-04-05
申请人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K. Biegelsen
发明人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K. Biegelsen
IPC分类号： B23P19/00
CPC分类号： B81C99/002 , H01L24/95 , H01L2224/95085 , H01L2224/95145 , H01L2924/14 , H01L2924/1461 , Y10T29/4913 , Y10T29/5313 , Y10T29/53174 , Y10T29/53178 , H01L2924/00
摘要： A xerographic micro-assembler system, method and apparatus that includes a sorting unit that is adapted to receive a plurality of micro-objects. The micro-objects can also be sorted and oriented on the sorting unit and then transferred to a substrate. The system, method and apparatus can also include a device for detecting errors in at least one of the micro-objects on the sorting unit and a protection means for preventing an improper micro-object from being transferred to the substrate. The system, method and apparatus can also include an organized micro-object feeder assembly that can transfer at least one of a plurality of micro-objects to the sorting unit or directly to the substrate.

5. 发明授权

US08181336B2 Micro-assembler 有权
标题翻译：微型汇编器
公开(公告)号：US08181336B2
公开(公告)日：2012-05-22
申请号：US12754230
申请日：2010-04-05
申请人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K. Biegelsen
发明人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K. Biegelsen
IPC分类号： B23P19/00
CPC分类号： B81C99/002 , H01L24/95 , H01L2224/95085 , H01L2224/95145 , H01L2924/14 , H01L2924/1461 , Y10T29/4913 , Y10T29/5313 , Y10T29/53174 , Y10T29/53178 , H01L2924/00
摘要： A xerographic micro-assembler system, method and apparatus that includes a sorting unit that is adapted to receive a plurality of micro-objects. The micro-objects can also be sorted and oriented on the sorting unit and then transferred to a substrate. The system, method and apparatus can also include a device for detecting errors in at least one of the micro-objects on the sorting unit and a protection means for preventing an improper micro-object from being transferred to the substrate. The system, method and apparatus can also include an organized micro-object feeder assembly that can transfer at least one of a plurality of micro-objects to the sorting unit or directly to the substrate.
摘要翻译：一种静电复印微组装系统，方法和装置，其包括适于接收多个微物体的分类单元。微物体也可以在分选单元上分类和定向，然后转移到基底。系统，方法和装置还可以包括用于检测分类单元中的至少一个微物体中的错误的装置和用于防止不适当的微物体被转移到基板的保护装置。系统，方法和装置还可以包括有组织的微物体馈送器组件，其可以将多个微物体中的至少一个传送到分类单元或直接传送到衬底。

6. 发明授权

US08082660B2 Xerographic micro-assembler 有权
标题翻译：静电复印机
公开(公告)号：US08082660B2
公开(公告)日：2011-12-27
申请号：US11959030
申请日：2007-12-18
申请人： Jeng Ping Lu , Eugene M. Chow
发明人： Jeng Ping Lu , Eugene M. Chow
IPC分类号： B23P19/00
CPC分类号： H01L25/50 , H01L21/67271 , H01L21/67282 , H01L21/67294 , H01L24/95 , H01L2224/95085 , H01L2224/95144 , H01L2224/95145 , H01L2924/14 , H01L2924/1461 , Y10T29/4913 , Y10T29/49133 , Y10T29/53004 , Y10T29/5313 , Y10T29/53174 , Y10T29/53178 , Y10T29/53278 , H01L2924/00
摘要： Xerographic micro-assembler systems and methods are disclosed. The systems and methods involve manipulating charge-encoded micro-objects. The charge encoding identifies each micro-object and specifies its orientation for sorting. The micro-objects are sorted in a sorting unit so that they have defined positions and orientations. The sorting unit has the capability of electrostatically and magnetically manipulating the micro-objects based on their select charge encoding. The sorted micro-objects are provided to an image transfer unit. The image transfer unit is adapted to receive the sorted micro-objects, maintain them in their sorted order and orientation, and deliver them to a substrate. Maintaining the sorted order as the micro-objects are delivered to the substrate may be accomplished through the use of an electrostatic image, as is done in xerography. The substrate with the micro-objects is further processed to interconnect the micro-objects—through electrical wiring, for example—to form the final micro-assembly.
摘要翻译：公开了静电印刷微组装系统和方法。系统和方法涉及操纵电荷编码的微物体。电荷编码识别每个微物体并指定其排列方向。微物体在分类单元中排序，使得它们具有定义的位置和取向。分选单元具有基于其选择电荷编码的静电和磁性操纵微物体的能力。分类的微物体被提供给图像传送单元。图像传送单元适于接收分类的微物体，将它们保持在排列顺序和方位，并将其传送到基底。将排序的顺序作为微物体传送到基底可以通过使用静电图像来实现，如在静电复印中所做的那样。具有微物体的衬底被进一步处理以使例如微通孔电线互连，以形成最终的微组件。

7. 发明授权

US07332361B2 Xerographic micro-assembler 有权
标题翻译：静电复印机
公开(公告)号：US07332361B2
公开(公告)日：2008-02-19
申请号：US11011652
申请日：2004-12-14
申请人： Jeng Ping Lu , Eugene M. Chow
发明人： Jeng Ping Lu , Eugene M. Chow
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： H01L25/50 , H01L21/67271 , H01L21/67282 , H01L21/67294 , H01L24/95 , H01L2224/95085 , H01L2224/95144 , H01L2224/95145 , H01L2924/14 , H01L2924/1461 , Y10T29/4913 , Y10T29/49133 , Y10T29/53004 , Y10T29/5313 , Y10T29/53174 , Y10T29/53178 , Y10T29/53278 , H01L2924/00
摘要： Xerographic micro-assembler systems and methods are disclosed. The systems and methods involve manipulating charge-encoded micro-objects. The charge encoding identifies each micro-object and specifies its orientation for sorting. The micro-objects are sorted in a sorting unit so that they have defined positions and orientations. The sorting unit has the capability of electrostatically and magnetically manipulating the micro-objects based on their select charge encoding. The sorted micro-objects are provided to an image transfer unit. The image transfer unit is adapted to receive the sorted micro-objects, maintain them in their sorted order and orientation, and deliver them to a substrate. Maintaining the sorted order as the micro-objects are delivered to the substrate may be accomplished through the use of an electrostatic image, as is done in xerography. The substrate with the micro-objects is further processed to interconnect the micro-objects—through electrical wiring, for example—to form the final micro-assembly.
摘要翻译：公开了静电印刷微组装系统和方法。系统和方法涉及操纵电荷编码的微物体。电荷编码识别每个微物体并指定其排列方向。微物体在分类单元中排序，使得它们具有定义的位置和取向。分选单元具有基于其选择电荷编码的静电和磁性操纵微物体的能力。分类的微物体被提供给图像传送单元。图像传送单元适于接收分类的微物体，将它们保持在排列顺序和方位，并将其传送到基底。将排序的顺序作为微物体传送到基底可以通过使用静电图像来实现，如在静电复印中所做的那样。具有微物体的衬底被进一步处理以使例如微通孔电线互连，以形成最终的微组件。

8. 发明授权

US08850694B2 Systems and methods for forming micro-object assemblies 有权
标题翻译：用于形成微型物体组件的系统和方法
公开(公告)号：US08850694B2
公开(公告)日：2014-10-07
申请号：US12754245
申请日：2010-04-05
申请人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K Biegelsen
发明人： Eugene M. Chow , Jeng Ping Lu , Meng H. Lean , David K Biegelsen
IPC分类号： B23P19/00 , H01L23/00 , B81C99/00
CPC分类号： B81C99/002 , H01L24/95 , H01L2224/95085 , H01L2224/95145 , H01L2924/14 , H01L2924/1461 , Y10T29/4913 , Y10T29/5313 , Y10T29/53174 , Y10T29/53178 , H01L2924/00
摘要： A xerographic micro-assembler system, method and apparatus that includes a sorting unit that is adapted to receive a plurality of micro-objects. The micro-objects can also be sorted and oriented on the sorting unit and then transferred to a substrate. The system, method and apparatus can also include a device for detecting errors in at least one of the micro-objects on the sorting unit and a protection means for preventing an improper micro-object from being transferred to the substrate. The system, method and apparatus can also include an organized micro-object feeder assembly that can transfer at least one of a plurality of micro-objects to the sorting unit or directly to the substrate.
摘要翻译：一种静电复印微组装系统，方法和装置，其包括适于接收多个微物体的分类单元。微物体也可以在分选单元上分类和定向，然后转移到基底。系统，方法和装置还可以包括用于检测分类单元中的至少一个微物体中的错误的装置和用于防止不适当的微物体被转移到基板的保护装置。系统，方法和装置还可以包括有组织的微物体馈送器组件，其可以将多个微物体中的至少一个传送到分类单元或直接传送到衬底。

9. 发明申请

US20100252927A1 Pattern-Print Thin-Film Transistors with Top Gate Geometry 有权
标题翻译：带顶栅几何图案印刷薄膜晶体管
公开(公告)号：US20100252927A1
公开(公告)日：2010-10-07
申请号：US12817127
申请日：2010-06-16
申请人： William S. Wong , Rene A. Lujan , Eugene M. Chow
发明人： William S. Wong , Rene A. Lujan , Eugene M. Chow
IPC分类号： H01L29/45
CPC分类号： H01L29/41733 , H01L27/124 , H01L27/1285 , H01L27/1288 , H01L27/1292 , H01L29/42384 , H01L29/4908 , H01L29/66757
摘要： A self-aligned, thin-film, top-gate transistor and method of manufacturing same are disclosed. A first print-patterned mask is formed over a metal layer by digital lithography, for example by printing with a phase change material using a droplet ejector. The metal layer is then etched using the first print-patterned mask to form source and drain electrodes. A semiconductive layer and an insulative layer are formed thereover. A layer of photosensitive material is then deposited and exposed through the substrate, with the source and drain electrodes acting as masks for the exposure. Following development of the photosensitive material, a gate metal layer is deposited. A second print-patterned mask is then formed over the device, again by digital lithography. Etching and removal of the photosensitive material leaves the self-aligned top-gate electrode.
摘要翻译：公开了一种自对准薄膜顶栅晶体管及其制造方法。通过数字光刻在金属层上形成第一印刷图案掩模，例如通过使用液滴喷射器用相变材料进行印刷。然后使用第一印刷图案化掩模蚀刻金属层以形成源极和漏极。在其上形成半导体层和绝缘层。然后将一层感光材料沉积并暴露通过基底，源极和漏极用作曝光的掩模。在感光材料的显影之后，沉积栅极金属层。然后再次通过数字光刻法在器件上形成第二印刷图案掩模。蚀刻和去除感光材料离开自对准顶栅电极。

10. 发明授权

US07344928B2 Patterned-print thin-film transistors with top gate geometry 有权
标题翻译：具有顶栅几何形状的图案印刷薄膜晶体管
公开(公告)号：US07344928B2
公开(公告)日：2008-03-18
申请号：US11193847
申请日：2005-07-28
申请人： William S. Wong , Rene A. Lujan , Eugene M. Chow
发明人： William S. Wong , Rene A. Lujan , Eugene M. Chow
IPC分类号： H01L21/84
CPC分类号： H01L29/41733 , H01L27/124 , H01L27/1285 , H01L27/1288 , H01L27/1292 , H01L29/42384 , H01L29/4908 , H01L29/66757
摘要： A self-aligned, thin-film, top-gate transistor and method of manufacturing same are disclosed. A first print-patterned mask is formed over a metal layer by digital lithography, for example by printing with a phase change material using a droplet ejector. The metal layer is then etched using the first print-patterned mask to form source and drain electrodes. A semiconductive layer and an insulative layer are formed thereover. A layer of photosensitive material is then deposited and exposed through the substrate, with the source and drain electrodes acting as masks for the exposure. Following development of the photosensitive material, a gate metal layer is deposited. A second print-patterned mask is then formed over the device, again by digital lithography. Etching and removal of the photosensitive material leaves the self-aligned top-gate electrode.
摘要翻译：公开了一种自对准薄膜顶栅晶体管及其制造方法。通过数字光刻在金属层上形成第一印刷图案掩模，例如通过使用液滴喷射器用相变材料进行印刷。然后使用第一印刷图案化掩模蚀刻金属层以形成源极和漏极。在其上形成半导体层和绝缘层。然后将一层感光材料沉积并暴露通过基底，源极和漏极用作曝光的掩模。在感光材料的显影之后，沉积栅极金属层。然后再次通过数字光刻法在器件上形成第二印刷图案掩模。蚀刻和去除感光材料离开自对准顶栅电极。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式