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    • 4. 发明授权
    • Method of manufacturing silicon monocrystal by continuously charged
Czochralski method
    • 通过连续充电的Czochralski法制造单晶硅的方法
    • US5900055A
    • 1999-05-04
    • US829894
    • 1997-03-25
    • Naoki NagaiKoji MizuishiMichiaki Oda
    • Naoki NagaiKoji MizuishiMichiaki Oda
    • C30B15/04C30B29/06H01L21/208C30B15/02
    • C30B15/04Y10T117/1052Y10T117/1056
    • A silicon monocrystal is manufactured according to the continuously charged Czochralski method in which a double crucible is used which includes an outer crucible and an inner crucible which communicate with each other through pores. A dopant is charged to the silicon melt stored in the double crucible before commencing pulling of a silicon monocrystal such that the ratio of the dopant concentration of the silicon melt stored in the outer crucible to the dopant concentration of the silicon melt stored in the inner crucible becomes greater than an effective segregation coefficient of the dopant. The silicon monocrystal is then pulled while silicon material is charged to the silicon melt within the outer crucible, during which the dopant concentration ratio becomes equal to the effective segregation coefficient and then becomes smaller than the effective segregation coefficient. When the dopant concentration ratio becomes smaller than the effective segregation coefficient, the dopant is charged to the silicon melt stored in the outer crucible. The above operation is repeated, so that the specific resistance of the silicon monocrystal pulled from the double crucible can be controlled within a desired range using commonly-employed dopant.
    • 根据连续充电的Czochralski法制造硅单晶,其中使用包括通过孔彼此连通的外坩埚和内坩埚的双坩埚。 在开始拉制硅单晶之前,将掺杂剂充入存储在双坩埚中的硅熔体,使得存储在外坩埚中的硅熔体的掺杂剂浓度与存储在内坩埚中的硅熔体的掺杂剂浓度之比 变得大于掺杂剂的有效偏析系数。 然后拉伸硅单晶,同时将硅材料充入外坩埚内的硅熔体,在此期间掺杂剂浓度比变得等于有效偏析系数,然后变得小于有效偏析系数。 当掺杂剂浓度比变得小于有效偏析系数时,掺杂剂被加到存储在外坩埚中的硅熔体中。 重复上述操作,使得从双坩埚拉出的单晶硅的电阻率可以使用常用的掺杂剂控制在期望的范围内。
    • 9. 发明授权
    • Isolation valve for single crystal pulling apparatus
    • 单晶拉拔装置隔离阀
    • US5356113A
    • 1994-10-18
    • US125187
    • 1993-09-23
    • Koji MizuishiKouzou YokotaKatsuhiko Ogino
    • Koji MizuishiKouzou YokotaKatsuhiko Ogino
    • F16K25/00C30B15/00F16K51/02F16K3/16
    • C30B15/00F16K51/02
    • An isolation valve for a single crystal pulling apparatus providing a good sealing performance is disclosed. The apparatus comprises a casing having two opposite valve seats, a first valve seat having a first opening communicable with the main chamber of the apparatus, a second valve seat having a second opening communicable with the pull chamber of the apparatus. The body of the isolation valve includes a first plate movable in and out of contact with the first valve seat to open and shut the first opening, a second plate movable in and out of contact with the second valve seat to open and shut the second opening, and a bellows connecting the first and second plates. The isolation valve also comprises a holder holding the first plate out of contact with the first valve seat when the first plate is opposite to the first valve seat, a passage communicable with a fluid supply and the interior of the valve body, and a controller controlling the pressure of a working fluid supplied from the fluid supply into the interior of the valve body. The controller has a first set pressure at which the first and second plates are in contact with the first and second valve seats and a second set pressure at which the first and second plates are out of contact with the first and second valve seats.
    • 公开了一种提供良好密封性能的单晶拉制装置的隔离阀。 该装置包括具有两个相对的阀座的壳体,具有可与该装置的主室连通的第一开口的第一阀座,具有可与该装置的拉腔连通的第二开口的第二阀座。 隔离阀的主体包括可与第一阀座接触并与第一阀座接触以打开和关闭第一开口的第一板,与第二阀座可移动和脱离接触的第二板,以打开和关闭第二开口 以及连接第一和第二板的波纹管。 隔离阀还包括保持器,当第一板与第一阀座相对时,保持第一板与第一阀座不接触,可与流体供应和阀体内部通信的通道,以及控制器 从液体供给到阀体内部的工作流体的压力。 控制器具有第一和第二板与第一和第二阀座接触的第一设定压力和第一和第二板与第一和第二阀座不接触的第二设定压力。