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1. 发明授权

US06979920B2 Circulation housing for a mover 失效
公开(公告)号：US06979920B2
公开(公告)日：2005-12-27
申请号：US10769307
申请日：2004-01-30
申请人： Ed Reynolds , Andrew J. Hazelton , Michael Binnard
发明人： Ed Reynolds , Andrew J. Hazelton , Michael Binnard
IPC分类号： H02K5/20 , H02K9/00 , H02K9/19 , H02K41/00 , H02K41/02 , H02K41/03
CPC分类号： H02K41/03 , H02K5/20 , H02K9/00
摘要： A mover (36) for an exposure apparatus (10) includes a conductor array (358) and a circulation housing (362) that defines at least a portion of a fluid passageway (364) near the conductor array (358). The circulation housing (362) includes a wall (366A) having a wall thickness. In one embodiment, the wall thickness at a first position on the wall (366A) is different than the wall thickness at a second position on the wall (366A). The wall (366A) can be curved and the shape of the curve is different at the first position than at the second position. Further, a cross-sectional shape of the wall (366A) at the first position is different from a cross-sectional shape of the wall (366A) at the second position.

2. 发明授权

US06750625B2 Wafer stage with magnetic bearings 失效
标题翻译：带磁轴承的晶圆台
公开(公告)号：US06750625B2
公开(公告)日：2004-06-15
申请号：US09929025
申请日：2001-08-15
申请人： Michael Binnard , Kazuya Ono , Andrew J. Hazelton
发明人： Michael Binnard , Kazuya Ono , Andrew J. Hazelton
IPC分类号： G05B1118
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70825 , H01L21/682 , H02K41/03 , H02K2201/18
摘要： A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are controlled by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuators disposed between the coarse stage and the high accuracy stage and aided by a supplemental vertical support disposed adjacent to the actuators. Preferably, the high accuracy stage is suspended from a bar supported by the supplemental vertical support, which is preferably air bellows.
摘要翻译：电磁轴承采用六自由度的高精度级。在舞台的水平面中的运动由可变磁阻致动器控制，该致动器安装在高精度级与粗级之间，以便在其运动期间不会使高精度级失真。高精度级通过设置在粗级和高精度级之间的电磁致动器在三个垂直自由度中得到支持，并且辅助于靠近致动器设置的辅助垂直支撑。优选地，高精度级从由辅助垂直支撑件支撑的杆悬挂，该杆优选为空气波纹管。

3. 发明授权

US06551045B2 Wafer stage chamber 失效
公开(公告)号：US06551045B2
公开(公告)日：2003-04-22
申请号：US09759218
申请日：2001-01-16
申请人： Michael Binnard , Andrew J. Hazelton
发明人： Michael Binnard , Andrew J. Hazelton
IPC分类号： G05D1900
CPC分类号： H01L21/67126 , G03F7/70691 , H01L21/6719
摘要： A wafer stage chamber assembly is provided to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber for sealing a wafer stage device from the atmosphere outside the wafer stage chamber, and at least one loader port for loading and unloading substrates into the wafer stage chamber. The wafer stage chamber is constructed of a chamber frame to enclose the wafer stage device, and a plurality of chamber walls including a front panel having the at least one loader port for loading and unloading a plurality of semiconductor substrates into the wafer stage chamber. The wafer stage chamber assembly also includes a top wall and a base frame. The chamber walls are layered with insulating materials, while the joint between the chamber frame with the top wall and base frame are sealed with sealing materials. The wafer stage chamber assembly is supported by an apparatus frame of an exposure device via a plurality of body supports.

4. 发明授权

US07869000B2 Stage assembly with lightweight fine stage and low transmissibility 有权
标题翻译：舞台装配轻巧细腻，传送率低
公开(公告)号：US07869000B2
公开(公告)日：2011-01-11
申请号：US11048405
申请日：2005-01-31
申请人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
发明人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70716
摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.
摘要翻译：沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。非接触轴承（257）支撑第二级（240）的质量。此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。

5. 发明授权

US06788385B2 Stage device, exposure apparatus and method 失效
标题翻译：舞台装置，曝光装置和方法
公开(公告)号：US06788385B2
公开(公告)日：2004-09-07
申请号：US10134607
申请日：2002-04-30
申请人： Keiichi Tanaka , Michael Binnard , Robert Martinek , Andrew J. Hazelton
发明人： Keiichi Tanaka , Michael Binnard , Robert Martinek , Andrew J. Hazelton
IPC分类号： G03B2742
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/70766 , G03F7/709
摘要： In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.
摘要翻译：在曝光装置的舞台装置中，第一级通过第一X轴电动机沿X轴方向驱动，同时由第一导杆一侧支撑，并且第二级在X轴上被驱动方向由第二X轴电机同时由第二引导杆一侧支撑。第一导杆和第二导杆通过Y轴线性电动机在Y轴方向上独立地驱动。在第一引导杆和第二引导杆彼此最靠近的状态下，与由第一引导杆支撑的一侧相对的第一级的端部设置在第二引导杆的上方，而第二引导杆的端部与由第二导杆支撑的一侧相对的台架放置在第一导杆的上方。第一和第二衬底台分别经由第一和第二微动驱动装置支撑在第一和第二级上方。舞台装置的上述构造允许并且抑制由于衬底台的驱动而引起的每一级的姿态变化。

6. 发明申请

US20050168075A1 Circulation housing for a mover 失效
标题翻译：移动器的循环住房
公开(公告)号：US20050168075A1
公开(公告)日：2005-08-04
申请号：US10769307
申请日：2004-01-30
申请人： Ed Reynolds , Andrew Hazelton , Michael Binnard
发明人： Ed Reynolds , Andrew Hazelton , Michael Binnard
IPC分类号： H02K5/20 , H02K9/00 , H02K9/19 , H02K41/00 , H02K41/02 , H02K41/03
CPC分类号： H02K41/03 , H02K5/20 , H02K9/00
摘要： A mover (36) for an exposure apparatus (10) includes a conductor array (358) and a circulation housing (362) that defines at least a portion of a fluid passageway (364) near the conductor array (358). The circulation housing (362) includes a wall (366A) having a wall thickness. In one embodiment, the wall thickness at a first position on the wall (366A) is different than the wall thickness at a second position on the wall (366A). The wall (366A) can be curved and the shape of the curve is different at the first position than at the second position. Further, a cross-sectional shape of the wall (366A) at the first position is different from a cross-sectional shape of the wall (366A) at the second position.
摘要翻译：用于曝光设备（10）的移动器（36）包括限定在导体阵列（358）附近的流体通道（364）的至少一部分的导体阵列（358）和循环壳体（362）。循环壳体（362）包括具有壁厚的壁（366A）。在一个实施例中，壁（366A）上的第一位置处的壁厚度不同于壁（366A）上的第二位置处的壁厚度。壁（366A）可以是弯曲的，并且曲线的形状在第一位置处比在第二位置处不同。此外，第一位置处的壁（366A）的横截面形状不同于第二位置处的壁（366A）的横截面形状。

7. 发明申请

US20050057102A1 Holding member, coolant, cooling method and cooling device, linear motor device, stage device, and exposure apparatus 审中-公开
标题翻译：保持构件，冷却剂，冷却方法和冷却装置，线性电动机装置，平台装置和曝光装置
公开(公告)号：US20050057102A1
公开(公告)日：2005-03-17
申请号：US10659401
申请日：2003-09-11
申请人： Masahiro Totsu , Andrew Hazelton , Ed Reynolds , Michael Binnard , Yoichi Arai
发明人： Masahiro Totsu , Andrew Hazelton , Ed Reynolds , Michael Binnard , Yoichi Arai
IPC分类号： B23Q11/14 , G03F7/20 , H01L21/027 , H02K9/19 , H02K9/20 , H02K41/02 , H02K41/00 , H02K9/00
CPC分类号： G03F7/70758 , G03F7/70858 , H02K9/19 , H02K9/20 , H02K41/031
摘要： A coolant cools an object (such as, for example, a coil of a linear motor that drives a stage of an exposure apparatus) while suppressing the generation of a temperature distribution in various parts of the object being cooled by using a coolant that includes a first component and a second component dispersed in the first component, the second component increases in temperature by a lesser amount than the first component when a predetermined amount of heat is absorbed by the first and second components, respectively. The second component may be a substance that changes phase (for example, from a solid to a liquid or from a liquid to a gas) in order to absorb the predetermined amount of heat. The second component may have a higher heat capacity than the first component, and may not change phase when it absorbs heat to cool the object.
摘要翻译：冷却剂冷却物体（例如，驱动曝光装置的阶段的线性电动机的线圈），同时通过使用包括冷却剂的冷却剂来抑制被冷却物体的各个部分中的温度分布的产生第一组分和第二组分分散在第一组分中，当预定量的热分别被第一组分和第二组分吸收时，第二组分的温度比第一组分的量少。第二组分可以是改变相（例如，从固体到液体或从液体到气体）的物质，以便吸收预定量的热量。第二组分可能具有比第一组分更高的热容量，并且当其吸收热量以冷却物体时可能不改变相。

8. 发明授权

US08582080B2 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US08582080B2
公开(公告)日：2013-11-12
申请号：US12178240
申请日：2008-07-23
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的平台组件（220）包括：第一阶段（238）;保持工件（200）的第二阶段（240）;第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

9. 发明申请

US20080128303A1 Device container assembly with adjustable retainers for a reticle 审中-公开
标题翻译：用于掩模版的带可调节保持器的装置容器组件
公开(公告)号：US20080128303A1
公开(公告)日：2008-06-05
申请号：US11634786
申请日：2006-12-05
申请人： Alton H. Phillips , Douglas C. Watson , Michael Binnard
发明人： Alton H. Phillips , Douglas C. Watson , Michael Binnard
IPC分类号： G03F9/00 , B65D85/38
CPC分类号： G03F7/70741 , G03F1/66
摘要： A device container assembly (30) for storing a reticle (26) includes a first container (246) and a device retainer assembly (248). The first container (246) encircles and encloses the reticle (26). The device retainer assembly (248) selectively couples the reticle to the first container (246). The device retainer assembly (248) can include an adjustable first device retainer (256) having a retainer section (280A) that is movable relative to the first container (246) between an engaged position (281A) in which the retainer section (280A) engages the reticle (26) and a disengaged position (281B) in which the retainer section (280A) does not engage the reticle (26). With this design, the device container assembly (30) can retain the reticle (26) in a secure fashion and the integrity of the reticle (26) is maintained by the device container assembly (30).
摘要翻译：一种用于存储掩模版（26）的装置容器组件（30）包括第一容器（246）和装置保持器组件（248）。第一容器（246）围绕并包围掩模版（26）。装置保持器组件（248）选择性地将掩模版连接到第一容器（246）。装置保持器组件（248）可以包括可调节的第一装置保持器（256），其具有保持器部分（280A），该保持器部分可相对于第一容器（246）移动在接合位置（281A）之间， 280A）接合所述掩模版（26）和所述保持器部分（280A）不接合所述掩模版（26）的分离位置（281B）。通过这种设计，装置容器组件30可以以安全的方式保持掩模版26，并且掩模版26的完整性由装置容器组件30保持。

10. 发明授权

US07372538B2 Apparatus and method for maintaining immerison fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
标题翻译：在浸没式光刻机中的晶片更换期间，在投影透镜下方的间隙内保持浸泡液的装置和方法
公开(公告)号：US07372538B2
公开(公告)日：2008-05-13
申请号：US11237721
申请日：2005-09-29
申请人： Michael Binnard
发明人： Michael Binnard
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70716 , G03F7/70725 , G03F7/70733
摘要： An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.
摘要翻译：在光刻机中的工件更换期间，将浸没流体保持在与投影透镜相邻的间隙中的装置和方法。该装置和方法包括将图像投影到工件上的光学组件和包括支撑邻近光学组件的工件的工件台的台架组件。提供了一种环境系统，用于从台架组件上的光学组件和工件之间的间隙提供和移除浸没流体。工件曝光完成后，交换系统将移除工件，并用第二个工件代替工件。浸没流体容纳系统在移除第一工件并用第二工件更换时将浸没液体保持在间隙中。

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