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1. 发明授权

US5709988A Tabular grain emulsions exhibiting relatively constant high sensitivities 失效
标题翻译：具有相对恒定的高灵敏度的片状颗粒乳剂
公开(公告)号：US5709988A
公开(公告)日：1998-01-20
申请号：US399798
申请日：1995-03-07
申请人： Donald Lee Black , Roger Anthony Bryant , Mark Edward Irving
发明人： Donald Lee Black , Roger Anthony Bryant , Mark Edward Irving
IPC分类号： G03C1/005 , G03C1/035
CPC分类号： G03C1/0051
摘要： Radiation-sensitive emulsions are disclosed comprised of high bromide tabular grains containing a peripheral band of increased iodide concentration. The tabular grains exhibit an average equivalent circular diameter of at least 2.0 .mu.m and are of a face centered cubic crystal lattice structure of the rock salt type. The tabular grains include central and peripheral regions extending between their major faces. The peripheral region is up to 0.2 .mu.m in width and contains an iodide concentration at least 2 mole percent higher than that of the central region measured at a location adjacent the peripheral region. Dislocations are present in the peripheral region to increase sensitivity and are minimized in the central region to maintain relatively constant sensitivities when pressure is applied locally.
摘要翻译：公开了辐射敏感性乳剂，其包含含有碘化物浓度增加的周边带的高溴化物片状颗粒。片状颗粒的平均当量圆直径至少为2.0μm，为岩盐类型的面心立方晶格结构。片状颗粒包括在其主要面之间延伸的中心区域和周边区域。周边区域的宽度最大为0.2μm，并且含有比邻近周边区域的位置测量的中心区域的碘浓度高至少2摩尔％的碘化物浓度。在周边区域存在位错以提高灵敏度，并且在中心区域被最小化以在局部施加压力时保持相对恒定的灵敏度。

2. 发明授权

US5695923A Radiation-sensitive silver halide grains internally containing a discontinuous crystal phase 失效
标题翻译：内部含有不连续结晶相的辐射敏感卤化银颗粒
公开(公告)号：US5695923A
公开(公告)日：1997-12-09
申请号：US707814
申请日：1996-08-30
申请人： Mark Edward Irving , Donald Lee Black
发明人： Mark Edward Irving , Donald Lee Black
IPC分类号： G03C1/035
CPC分类号： G03C1/035
摘要： A photographic emulsion is disclosed in which radiation-sensitive silver halide grains are present containing (a) a continuous silver halide phase of a face centered cubic rock salt crystal lattice structure and (b) a discontinuous phase in the form of discrete islands separated by and surrounded by the continuous phase, each of the islands exhibiting a silver iodide crystal lattice structure.
摘要翻译：公开了一种照相乳剂，其中存在辐射敏感卤化银颗粒，其包含（a）面心立方岩盐晶格结构的连续卤化银相和（b）以离散岛形式分离的不连续相，被连续相包围，每个岛呈现碘化银晶格结构。

3. 发明授权

US5667954A Photographic emulsions of enhanced sensitivity and reduced contrast 失效
标题翻译：增强灵敏度和降低对比度的照相乳剂
公开(公告)号：US5667954A
公开(公告)日：1997-09-16
申请号：US653855
申请日：1996-05-28
申请人： Mark Edward Irving , Donald Lee Black
发明人： Mark Edward Irving , Donald Lee Black
IPC分类号： G03C1/005 , G03C1/035
CPC分类号： G03C1/0051
摘要： An emulsion of enhanced photographic sensitivity and reduced contrast is disclosed containing high bromide tabular grains having a non-uniform iodide distribution, including (a) a peripheral zone extending inwardly from edges and corners of the tabular grains and providing (i) a maximum iodide concentration along the edges and (ii) a lower iodide concentration at the corners than elsewhere along the edges, (b) a central zone providing a minimum iodide concentration and accounting for at least 35 percent of total silver forming the tabular grains and, (c) extending from the central zone to the peripheral zone, an intermediate zone (i) containing a higher iodide concentration than the central zone, ranging from greater than 2 to 10 mole percent, based on silver forming the intermediate zone, and (ii) accounting for from 5 to 35 percent of total silver forming the tabular grains.
摘要翻译：公开了具有增强的照相感光度和降低的对比度的乳液，其含有具有不均匀碘分布的高溴化物片状颗粒，包括（a）从片状颗粒的边缘和角落向内延伸的周边区域，并提供（i）最大碘化物浓度（b）中心区域提供最小的碘化物浓度，占总形成片状颗粒的总银的至少35％，（c）从中心区延伸到周边区域，基于形成中间区域的银，含有比中心区域更高的碘化物浓度的中间区域（i），其范围为大于2至10摩尔％，和（ii）考虑形成片状颗粒的总银的5％至35％。

4. 发明申请

US20160091793A1 FORMING CONDUCTIVE METAL PATTERNS USING WATER-SOLUBLE POLYMERS 有权
标题翻译：使用水溶性聚合物形成导电金属图案
公开(公告)号：US20160091793A1
公开(公告)日：2016-03-31
申请号：US14501206
申请日：2014-09-30
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： G03F7/16 , G03F7/20
CPC分类号： G03F7/031 , G03F7/0388 , G03F7/32 , G03F7/38 , G03F7/40
摘要： A conductive pattern can be formed using a polymeric layer that contains a reactive composition having a reactive polymer. This reactive polymer comprises pendant photosensitive 1,2-diarylethylene groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced, followed by electrolessly plating with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要翻译：可以使用含有具有反应性聚合物的反应性组合物的聚合物层形成导电图案。该反应性聚合物包括侧光敏1,2-二亚乙基。反应性组合物可以图案化地暴露于合适的辐射以诱导反应性聚合物内的交联。非暴露区域中的反应性组合物和反应性聚合物可以由于其水溶性而被除去，但聚合物层的暴露区域与无电子种子金属离子接触，然后将其还原，然后用合适的金属进行无电镀以形成所需的导电图案。在该过程中可以制备各种物品，并且产品可以并入各种电子设备中。

5. 发明申请

US20150125667A1 FORMING CONDUCTIVE METAL PATTERNS WITH REACTIVE POLYMERS 有权
标题翻译：形成具有反应性聚合物的导电金属图案
公开(公告)号：US20150125667A1
公开(公告)日：2015-05-07
申请号：US14071765
申请日：2013-11-05
申请人： Thomas B. Brust , Mark Edward Irving , Catherine A. Falkner
发明人： Thomas B. Brust , Mark Edward Irving , Catherine A. Falkner
IPC分类号： G03F7/20 , G03F7/40 , C23C18/16 , G03F7/029 , C23C18/40 , C23C18/20 , G03F7/30 , G03F7/004
CPC分类号： C23C18/1603 , C23C18/1608 , C23C18/1612 , C23C18/1641 , C23C18/204 , C23C18/208 , C23C18/30 , C23C18/38 , C23C18/40 , G03F7/0045 , G03F7/0392 , G03F7/265 , G03F7/38 , Y10T428/24802
摘要： A pattern is formed in a polymeric layer comprising a reactive composition that comprises: (a) a polymer comprising pendant—arylene-X—C(═O)—O— t-alkyl groups that comprise a blocking group that is cleavable to provide pendant—arylene-XH groups, (b) a compound that provides a cleaving acid upon exposure to radiation having a λmax of 150 nm and to 450 nm, which cleaving acid has a pKa of 2 or less as measured in water, and (c) optionally, a photosensitizer. The polymeric layer is imagewise exposed to suitable radiation to provide non-exposed regions and exposed regions comprising a de-blocked and crosslinked polymer with pendant—arylene-XH groups. The exposed regions are contacted with electroless seed metal ions in the de-blocked and crosslinked polymer. After reduction, the corresponding electroless seed metal nuclei are electrolessly plated using a suitable metal that is the same as or different from the corresponding electroless seed metal nuclei.
摘要翻译：在包含反应性组合物的聚合物层中形成图案，所述聚合物层包含：（a）包含侧基亚芳基-X-C（= O）-O- t-烷基的聚合物，其包含可切割以提供侧基的封闭基团 - 亚芳基-XH基团，（b）在暴露于λmax为150nm至450nm的辐射下提供裂解酸的化合物，该切割酸在水中测得的pKa为2或更小，和（c）任选地，光敏剂。将聚合物层成像暴露于合适的辐射以提供非暴露区域和包含具有侧链亚芳基-XH基团的去封闭和交联的聚合物的暴露区域。暴露的区域与去封闭和交联的聚合物中的无电子种子金属离子接触。还原后，使用与相应的无电子种子金属核相同或不同的合适金属对相应的无电子晶种金属核进行无电镀。

6. 发明申请

US20160046748A1 CROSSLINKABLE POLYMERS 有权
标题翻译：可交联聚合物
公开(公告)号：US20160046748A1
公开(公告)日：2016-02-18
申请号：US14457477
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： C08F220/68
CPC分类号： C08F220/68 , C08F20/38 , C08F28/02 , C08F120/38 , C08F122/24 , C08F128/02 , C08F220/38 , C08F2220/382 , C08F2220/385 , C08F2220/387
摘要： Crosslinkable polymers comprise recurring units represented by: wherein R, R′, and R″ are independently hydrogen or an alkyl, cyano, or halo group; R1 is hydrogen or a halo, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, cyano, hydroxy, alkoxy, carboxy, or ester group; L is an organic linking group; EWG represents an electron withdrawing group having a Hammett-sigma value greater than or equal to 0.35 such that the oxygen-carbon bond in O—C(EWG)(R1) is cleavable in the presence of a cleaving acid having a pKa of 2 or less as measured in water; Ar is a substituted or unsubstituted arylene group; X is NR2 or oxygen; R2 is hydrogen or an alkyl group; t-alkyl represents a tertiary alkyl group having 4 to 6 carbon atoms, and m represents at least 1 mol % and up to and including 100 mol %, based on the total recurring units in the polymer.
摘要翻译：可交联聚合物包含由下式表示的重复单元：其中R，R'和R“独立地为氢或烷基，氰基或卤代基; R 1是氢或卤素，取代或未取代的烷基，取代或未取代的环烷基，氰基，羟基，烷氧基，羧基或酯基; L是有机连接基团; EWG表示具有大于或等于0.35的哈米特 - 西格玛值的吸电子基团，使得O-C（EWG）（R1）中的氧 - 碳键可在pKa为2的裂解酸存在下裂解，或较少在水中测量; Ar是取代或未取代的亚芳基; X为NR2或氧; R2是氢或烷基; 基于聚合物中的总重复单元，t-烷基表示具有4-6个碳原子的叔烷基，m表示至少1mol％且至多且包括100mol％。

7. 发明授权

US09249248B1 Crosslinkable polymers 有权
标题翻译：可交联聚合物
公开(公告)号：US09249248B1
公开(公告)日：2016-02-02
申请号：US14457477
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： C08F220/38 , C08F220/68 , C08F222/24 , C08F20/38 , C08F28/02 , C08F120/38 , C08F122/24 , C08F128/02
CPC分类号： C08F220/68 , C08F20/38 , C08F28/02 , C08F120/38 , C08F122/24 , C08F128/02 , C08F220/38 , C08F2220/382 , C08F2220/385 , C08F2220/387
摘要： Crosslinkable polymers comprise recurring units represented by: wherein R, R′, and R″ are independently hydrogen or an alkyl, cyano, or halo group; R1 is hydrogen or a halo, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, cyano, hydroxy, alkoxy, carboxy, or ester group; L is an organic linking group; EWG represents an electron withdrawing group having a Hammett-sigma value greater than or equal to 0.35 such that the oxygen-carbon bond in O—C(EWG)(R1) is cleavable in the presence of a cleaving acid having a pKa of 2 or less as measured in water; Ar is a substituted or unsubstituted arylene group; X is NR2 or oxygen; R2 is hydrogen or an alkyl group; t-alkyl represents a tertiary alkyl group having 4 to 6 carbon atoms, and m represents at least 1 mol % and up to and including 100 mol %, based on the total recurring units in the polymer.
摘要翻译：可交联聚合物包含由下式表示的重复单元：其中R，R'和R“独立地为氢或烷基，氰基或卤代基; R 1是氢或卤素，取代或未取代的烷基，取代或未取代的环烷基，氰基，羟基，烷氧基，羧基或酯基; L是有机连接基团; EWG表示具有大于或等于0.35的哈米特 - 西格玛值的吸电子基团，使得O-C（EWG）（R1）中的氧 - 碳键可在pKa为2的裂解酸存在下裂解，或较少在水中测量; Ar是取代或未取代的亚芳基; X为NR2或氧; R2是氢或烷基; 基于聚合物中的总重复单元，t-烷基表示具有4-6个碳原子的叔烷基，m表示至少1mol％且至多且包括100mol％。

8. 发明授权

US09081281B2 Electroless plating method 有权
标题翻译：无电镀法
公开(公告)号：US09081281B2
公开(公告)日：2015-07-14
申请号：US14084732
申请日：2013-11-20
申请人： Mark Edward Irving
发明人： Mark Edward Irving
IPC分类号： G03F7/26 , G03F7/16 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/26 , G03F7/265
摘要： A conductive metal pattern is formed in a polymeric layer that has a polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to provide crosslinking. The polymeric layer is patternwise exposed to form non-exposed regions and exposed regions, which are contacted with a reducing agent to incorporate reducing agent therein. These exposed regions are then contacted with electroless seed metal ions to oxidize the reducing agent to form corresponding electroless seed metal nuclei that can be then electrolessly plated with a conductive metal.
摘要翻译：在具有聚合物的聚合物层中形成导电金属图案，所述聚合物包含（1）当将反应性聚合物暴露于辐射时能够提供侧链磺酸基的侧基，和（2）能够反应的侧基在磺酸基存在下提供交联。聚合物层被图案化地暴露以形成非暴露区域和暴露区域，其与还原剂接触以在其中引入还原剂。然后将这些暴露的区域与无电子种子金属离子接触以氧化还原剂，以形成相应的无电子种子金属核，然后可以用导电金属进行无电镀。

9. 发明申请

US20150140495A1 ELECTROLESS PLATING METHOD USING HALIDE 有权
标题翻译：使用半导体的电镀方法
公开(公告)号：US20150140495A1
公开(公告)日：2015-05-21
申请号：US14084969
申请日：2013-11-20
申请人： Mark Edward Irving
发明人： Mark Edward Irving
IPC分类号： G03F7/16 , G03F7/11 , G03F7/20
CPC分类号： G03F7/16 , G03F7/0045 , G03F7/038 , G03F7/11 , G03F7/20 , G03F7/26 , G03F7/265 , Y10T428/24802
摘要： A conductive metal pattern is formed using a reactive polymer that can provide pendant sulfonic acid groups upon exposure to radiation, and (2) pendant groups that are capable of providing crosslinking. The polymeric layer is patternwise exposed to radiation to provide first exposed regions that are then contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, followed by contact with a halide. At least some of the electroless seed metal halide can be exposed to form second exposed regions. The polymeric layer can be contacted with a reducing agent either: (i) to develop the electroless seed metal image in the second exposed regions, or (ii) to develop all of the electroless seed metal halide in the first exposed regions, and optionally contacted with a fixing agent. The electroless seed metal nuclei in the first exposed regions can be electrolessly plated with a conductive metal.
摘要翻译：使用可以在暴露于辐射时提供侧链磺酸基团的反应性聚合物形成导电金属图案，和（2）能够提供交联的侧基。将聚合物层图案地暴露于辐射以提供第一暴露区域，然后与无电晶种金属离子接触以形成无电子种子金属离子的图案，然后与卤化物接触。至少一些无电子种子金属卤化物可以暴露以形成第二暴露区域。聚合物层可以与还原剂接触，即：（i）在第二暴露区域中显影无电子种子金属图像，或（ii）在第一曝光区域中显影所有无电子种子金属卤化物，并任选地接触用固定剂。第一暴露区域中的无电晶种金属核可以用导电金属无电镀。

10. 发明授权

US09023560B1 Electroless plating method using non-reducing agent 有权
标题翻译：无电镀法使用非还原剂
公开(公告)号：US09023560B1
公开(公告)日：2015-05-05
申请号：US14072049
申请日：2013-11-05
申请人： Mark Edward Irving , Thomas B. Brust
发明人： Mark Edward Irving , Thomas B. Brust
IPC分类号： C23C18/20 , G03F7/26 , G03F7/40
CPC分类号： C23C18/204 , C23C18/1608 , C23C18/1612 , C23C18/1641 , C23C18/2033 , C23C18/206 , C23C18/285 , C23C18/30 , G03F7/038 , G03F7/0392 , G03F7/265 , G03F7/38 , G03F7/40 , G03F7/405 , Y10T428/24802
摘要： A conductive pattern is formed in a polymeric layer that has (a) a reactive polymer comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon exposure to radiation, and (c) a crosslinking agent. The polymeric layer is patternwise exposed to radiation to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising carboxylic acid groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions. This pattern of electroless seed metal ions can be contacted with a non-reducing reagent that reacts with the electroless seed metal ions to form an electroless seed metal compound that has a pKsp of less than 40. This bound electroless seed metal compound is then electrolessly plated with a suitable conductive metal.
摘要翻译：导电图案形成在聚合物层中，该聚合物层具有（a）包含叔烷基酯基侧基的反应性聚合物，（b）暴露于辐射时提供酸的化合物，和（c）交联剂。将聚合物层图案地暴露于辐射以提供包含非暴露区域的聚合物层和包含包含羧酸基团的聚合物的暴露区域。暴露的区域与无电子种子金属离子接触以形成无电子种子金属离子的图案。无电子种子金属离子的这种图案可以与非还原试剂接触，其与无电子种子金属离子反应形成pKsp小于40的化学金属化合物。然后将该结合的无电子种子金属化合物无电镀具有合适的导电金属。

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