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1. 发明申请

US20160046748A1 CROSSLINKABLE POLYMERS 有权
标题翻译：可交联聚合物
公开(公告)号：US20160046748A1
公开(公告)日：2016-02-18
申请号：US14457477
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： C08F220/68
CPC分类号： C08F220/68 , C08F20/38 , C08F28/02 , C08F120/38 , C08F122/24 , C08F128/02 , C08F220/38 , C08F2220/382 , C08F2220/385 , C08F2220/387
摘要： Crosslinkable polymers comprise recurring units represented by: wherein R, R′, and R″ are independently hydrogen or an alkyl, cyano, or halo group; R1 is hydrogen or a halo, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, cyano, hydroxy, alkoxy, carboxy, or ester group; L is an organic linking group; EWG represents an electron withdrawing group having a Hammett-sigma value greater than or equal to 0.35 such that the oxygen-carbon bond in O—C(EWG)(R1) is cleavable in the presence of a cleaving acid having a pKa of 2 or less as measured in water; Ar is a substituted or unsubstituted arylene group; X is NR2 or oxygen; R2 is hydrogen or an alkyl group; t-alkyl represents a tertiary alkyl group having 4 to 6 carbon atoms, and m represents at least 1 mol % and up to and including 100 mol %, based on the total recurring units in the polymer.
摘要翻译：可交联聚合物包含由下式表示的重复单元：其中R，R'和R“独立地为氢或烷基，氰基或卤代基; R 1是氢或卤素，取代或未取代的烷基，取代或未取代的环烷基，氰基，羟基，烷氧基，羧基或酯基; L是有机连接基团; EWG表示具有大于或等于0.35的哈米特 - 西格玛值的吸电子基团，使得O-C（EWG）（R1）中的氧 - 碳键可在pKa为2的裂解酸存在下裂解，或较少在水中测量; Ar是取代或未取代的亚芳基; X为NR2或氧; R2是氢或烷基; 基于聚合物中的总重复单元，t-烷基表示具有4-6个碳原子的叔烷基，m表示至少1mol％且至多且包括100mol％。

2. 发明授权

US09249248B1 Crosslinkable polymers 有权
标题翻译：可交联聚合物
公开(公告)号：US09249248B1
公开(公告)日：2016-02-02
申请号：US14457477
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： C08F220/38 , C08F220/68 , C08F222/24 , C08F20/38 , C08F28/02 , C08F120/38 , C08F122/24 , C08F128/02
CPC分类号： C08F220/68 , C08F20/38 , C08F28/02 , C08F120/38 , C08F122/24 , C08F128/02 , C08F220/38 , C08F2220/382 , C08F2220/385 , C08F2220/387
摘要： Crosslinkable polymers comprise recurring units represented by: wherein R, R′, and R″ are independently hydrogen or an alkyl, cyano, or halo group; R1 is hydrogen or a halo, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl, cyano, hydroxy, alkoxy, carboxy, or ester group; L is an organic linking group; EWG represents an electron withdrawing group having a Hammett-sigma value greater than or equal to 0.35 such that the oxygen-carbon bond in O—C(EWG)(R1) is cleavable in the presence of a cleaving acid having a pKa of 2 or less as measured in water; Ar is a substituted or unsubstituted arylene group; X is NR2 or oxygen; R2 is hydrogen or an alkyl group; t-alkyl represents a tertiary alkyl group having 4 to 6 carbon atoms, and m represents at least 1 mol % and up to and including 100 mol %, based on the total recurring units in the polymer.
摘要翻译：可交联聚合物包含由下式表示的重复单元：其中R，R'和R“独立地为氢或烷基，氰基或卤代基; R 1是氢或卤素，取代或未取代的烷基，取代或未取代的环烷基，氰基，羟基，烷氧基，羧基或酯基; L是有机连接基团; EWG表示具有大于或等于0.35的哈米特 - 西格玛值的吸电子基团，使得O-C（EWG）（R1）中的氧 - 碳键可在pKa为2的裂解酸存在下裂解，或较少在水中测量; Ar是取代或未取代的亚芳基; X为NR2或氧; R2是氢或烷基; 基于聚合物中的总重复单元，t-烷基表示具有4-6个碳原子的叔烷基，m表示至少1mol％且至多且包括100mol％。

3. 发明申请

US20160091793A1 FORMING CONDUCTIVE METAL PATTERNS USING WATER-SOLUBLE POLYMERS 有权
标题翻译：使用水溶性聚合物形成导电金属图案
公开(公告)号：US20160091793A1
公开(公告)日：2016-03-31
申请号：US14501206
申请日：2014-09-30
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： G03F7/16 , G03F7/20
CPC分类号： G03F7/031 , G03F7/0388 , G03F7/32 , G03F7/38 , G03F7/40
摘要： A conductive pattern can be formed using a polymeric layer that contains a reactive composition having a reactive polymer. This reactive polymer comprises pendant photosensitive 1,2-diarylethylene groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced, followed by electrolessly plating with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要翻译：可以使用含有具有反应性聚合物的反应性组合物的聚合物层形成导电图案。该反应性聚合物包括侧光敏1,2-二亚乙基。反应性组合物可以图案化地暴露于合适的辐射以诱导反应性聚合物内的交联。非暴露区域中的反应性组合物和反应性聚合物可以由于其水溶性而被除去，但聚合物层的暴露区域与无电子种子金属离子接触，然后将其还原，然后用合适的金属进行无电镀以形成所需的导电图案。在该过程中可以制备各种物品，并且产品可以并入各种电子设备中。

4. 发明授权

US09709889B2 Forming conductive metal patterns using thiosulfate copolymers 有权
公开(公告)号：US09709889B2
公开(公告)日：2017-07-18
申请号：US15012959
申请日：2016-02-02
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/40 , G03F7/11
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer.

5. 发明授权

US09366965B2 Forming electrically-conductive patterns using crosslinkable reactive polymers 有权
标题翻译：使用可交联反应性聚合物形成导电图案
公开(公告)号：US09366965B2
公开(公告)日：2016-06-14
申请号：US14457396
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： G03F7/20 , G03F7/16 , G03F7/038 , G03F7/004
CPC分类号： G03F7/16 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/26
摘要： An electrically-conductive pattern is prepared using a reactive composition having: (1) a reactive polymer; (2) a compound that provides a cleaving acid upon exposure to radiation; and (3) a crosslinking agent that reacts in the presence of the cleaving acid, to provide crosslinking in the reactive polymer. A polymeric layer of the reactive composition is patternwise exposed to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising sulfonic acid or sulfonate groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, which pattern is reduced to provide a pattern of corresponding electroless seed metal particles. Electrolessly plating is then carried out in the exposed regions. The unique reactive comprises (a) recurring units represented Structure (A) as described in the disclosure, and can also include other recurring units that are crosslinkable or provide other properties.
摘要翻译：使用具有以下物质的反应性组合物制备导电图案：（1）反应性聚合物; （2）暴露于辐射时提供裂解酸的化合物; 和（3）在裂解酸存在下反应以在反应性聚合物中提供交联的交联剂。将反应性组合物的聚合物层图案地暴露以提供包含非暴露区域的聚合物层和包含包含磺酸或磺酸盐基团的聚合物的暴露区域。暴露的区域与无电子种子金属离子接触以形成无电晶种金属离子的图案，该图案被还原以提供相应的无电子种子金属颗粒的图案。然后在暴露的区域进行无电镀。独特的反应性包括（a）如本公开所述的结构（A）所示的重复单元，并且还可以包括可交联或提供其它性质的其它重复单元。

6. 发明申请

US20160147148A1 FORMING CONDUCTIVE METAL PATTERNS USING THIOSULFATE COPOLYMERS 有权
标题翻译：使用硫代脂肪族共聚物形成导电金属图案
公开(公告)号：US20160147148A1
公开(公告)日：2016-05-26
申请号：US15012959
申请日：2016-02-02
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/038 , G03F7/11
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer.
摘要翻译：前体制品具有底物和具有反应性组合物的聚合物层，其含有非交联硫代硫酸盐共聚物，其包含：（a）包含硫代硫酸盐基团的重复单元，和（b）包含侧羧基，羧酸根，磷酸根，膦酸根，磷酸盐，磺基，磺酸盐或亚硫酸盐基团。（a）重复单元的存在量为1〜30摩尔％，（b）重复单元的存在量为70〜99摩尔％。该前体制品可用于提供包含基材的产品制品，其中聚合物层具有两个暴露区域和非曝光区域。曝光区域包含在非交联硫代硫酸盐共聚物衍生的至少部分交联的聚合物的表面内或沉积在其表面上的无电镀金属的图案。未曝光区域不具有无电镀金属或非交联硫代硫酸盐聚合物。

7. 发明授权

US09329482B2 Forming conductive metal patterns using thiosulfate copolymers 有权
标题翻译：使用硫代硫酸盐共聚物形成导电金属图案
公开(公告)号：US09329482B2
公开(公告)日：2016-05-03
申请号：US14249390
申请日：2014-04-10
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/004 , G03F7/16 , G03F7/20 , G03F7/038
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises pendant thiosulfate groups as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要翻译：可以使用包含反应性组合物的聚合物层形成导电图案，所述反应性组合物包含金属离子络合，水溶性和可交联的反应性聚合物。该反应性聚合物包括硫代硫酸根基团以及金属离子络合和水溶性基团。反应性组合物可以图案化地暴露于合适的辐射以诱导反应性聚合物内的交联。非暴露区域中的反应性组合物和反应性聚合物可以由于其水溶性而被去除，但是聚合物层的暴露区域与无电晶种金属离子接触，然后将其还原。所得无电子种子金属核用无电镀的合适金属镀以形成所需的导电图案。在该过程中可以制备各种物品，并且产品可以并入各种电子设备中。

8. 发明授权

US09389512B2 Forming conductive metal patterns using water-soluble polymers 有权
标题翻译：使用水溶性聚合物形成导电金属图案
公开(公告)号：US09389512B2
公开(公告)日：2016-07-12
申请号：US14501206
申请日：2014-09-30
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： G03C5/58 , G03F7/16 , G03F7/20
CPC分类号： G03F7/031 , G03F7/0388 , G03F7/32 , G03F7/38 , G03F7/40
摘要： A conductive pattern can be formed using a polymeric layer that contains a reactive composition having a reactive polymer. This reactive polymer comprises pendant photosensitive 1,2-diarylethylene groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced, followed by electrolessly plating with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要翻译：可以使用含有具有反应性聚合物的反应性组合物的聚合物层形成导电图案。该反应性聚合物包括侧光敏1,2-二亚乙基。反应性组合物可以图案化地暴露于合适的辐射以诱导反应性聚合物内的交联。非暴露区域中的反应性组合物和反应性聚合物可以由于其水溶性而被除去，但聚合物层的暴露区域与无电子种子金属离子接触，然后将其还原，然后用合适的金属进行无电镀以形成所需的导电图案。在该过程中可以制备各种物品，并且产品可以并入各种电子设备中。

9. 发明申请

US20160048078A1 FORMING ELECTRICALLY-CONDUCTIVE PATTERNS USING CROSSLINKABLE REACTIVE POLYMERS 有权
标题翻译：使用可交联反应聚合物形成电导体图案
公开(公告)号：US20160048078A1
公开(公告)日：2016-02-18
申请号：US14457396
申请日：2014-08-12
申请人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
发明人： Thomas B. Brust , Grace Ann Bennett , Mark Edward Irving
IPC分类号： G03F7/16 , G03F7/038
CPC分类号： G03F7/16 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0388 , G03F7/26
摘要： An electrically-conductive pattern is prepared using a reactive composition having: (1) a reactive polymer; (2) a compound that provides a cleaving acid upon exposure to radiation; and (3) a crosslinking agent that reacts in the presence of the cleaving acid, to provide crosslinking in the reactive polymer. A polymeric layer of the reactive composition is patternwise exposed to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising sulfonic acid or sulfonate groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, which pattern is reduced to provide a pattern of corresponding electroless seed metal particles. Electrolessly plating is then carried out in the exposed regions. The unique reactive comprises (a) recurring units represented Structure (A) as described in the disclosure, and can also include other recurring units that are crosslinkable or provide other properties.
摘要翻译：使用具有以下物质的反应性组合物制备导电图案：（1）反应性聚合物; （2）暴露于辐射时提供裂解酸的化合物; 和（3）在裂解酸存在下反应以在反应性聚合物中提供交联的交联剂。将反应性组合物的聚合物层图案地暴露以提供包含非暴露区域的聚合物层和包含包含磺酸或磺酸盐基团的聚合物的暴露区域。暴露的区域与无电子种子金属离子接触以形成无电晶种金属离子的图案，该图案被还原以提供相应的无电子种子金属颗粒的图案。然后在暴露的区域进行无电镀。独特的反应性包括（a）如本公开所述的结构（A）所示的重复单元，并且还可以包括可交联或提供其它性质的其它重复单元。

10. 发明申请

US20150293451A1 FORMING CONDUCTIVE METAL PATTERNS USING THIOSULFATE COPOLYMERS 有权
标题翻译：使用硫代脂肪族共聚物形成导电金属图案
公开(公告)号：US20150293451A1
公开(公告)日：2015-10-15
申请号：US14249390
申请日：2014-04-10
申请人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
发明人： Mark Edward Irving , Thomas B. Brust , Grace Ann Bennett
IPC分类号： G03F7/16 , G03F7/038 , G03F7/20
CPC分类号： G03F7/038 , G03F7/0384 , G03F7/11 , G03F7/16 , G03F7/2002 , G03F7/40 , G03F7/405
摘要： A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises pendant thiosulfate groups as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices.
摘要翻译：可以使用包含反应性组合物的聚合物层形成导电图案，所述反应性组合物包含金属离子络合，水溶性和可交联的反应性聚合物。该反应性聚合物包括硫代硫酸根基团以及金属离子络合和水溶性基团。反应性组合物可以图案化地暴露于合适的辐射以诱导反应性聚合物内的交联。非暴露区域中的反应性组合物和反应性聚合物可以由于其水溶性而被去除，但是聚合物层的暴露区域与无电晶种金属离子接触，然后将其还原。所得无电子种子金属核用无电镀的合适金属镀以形成所需的导电图案。在该过程中可以制备各种物品，并且产品可以并入各种电子设备中。

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