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    • 2. 发明授权
    • Method for treating metal surfaces with a polymer solution
    • 用聚合物溶液处理金属表面的方法
    • US5112413A
    • 1992-05-12
    • US543642
    • 1990-06-26
    • William S. CareyFu ChenDavid W. Reichgott
    • William S. CareyFu ChenDavid W. Reichgott
    • C09D125/18C23C22/83
    • C09D125/18C23C22/83
    • Methods for treating metal surfaces including contacting the surface with a water soluble or water dispersible polymer comprising a repeat unit (a) having the structure ##STR1## or salt form of said repeat unit, wherein R and R.sub.1 are the same or different and are independently chosen from C.sub.1 -C.sub.3 lower alkylene and wherein z is an integer of from 1-3. The methods also include use of copolymers having in addition to repeat unit (a) above, a repeat unit (b) having the structure ##STR2## from wherein X is OH, NH.sub.2, or OM wherein M is a cation, the molar ration of (a.sub.1):(b) being present in said copolymer being from about 20:1 to 1:20. The methods provide chromium free rinse solutions for use in rinsing phosphate-based conversion coated metal surfaces.
    • 用于处理金属表面的方法,包括使表面与水溶性或水分散性聚合物接触,所述聚合物包含具有所述重复单元结构(I)或盐形式的重复单元(a),其中R和R 1相同或不同 并且独立地选自C 1 -C 3低级亚烷基,并且其中z是1-3的整数。 所述方法还包括使用具有上述重复单元(a)的共聚物,具有结构式(II)的重复单元(b),其中X是OH,NH 2或OM,其中M是阳离子, 所述共聚物中存在的(a1)(b)的摩尔比为约20:1至1:20。 该方法提供无铬漂洗溶液,用于冲洗基于磷酸盐的转化涂层金属表面。
    • 6. 发明授权
    • Method for controlling scale formation and deposition in aqueous systems
    • 用于控制水系统中水垢形成和沉积的方法
    • US06641754B2
    • 2003-11-04
    • US09878646
    • 2001-06-11
    • Kristin E. BuentelloStephen M. KesslerRoger C. MayJulie A. KaechelinFu ChenNatalie A. Kolson
    • Kristin E. BuentelloStephen M. KesslerRoger C. MayJulie A. KaechelinFu ChenNatalie A. Kolson
    • C08F510
    • C08F216/14C02F5/10C02F5/12C02F5/14C02F2103/16C02F2103/28C23F11/10C23F11/173C23F14/02
    • A method of inhibiting the formation and deposition of scale forming moieties in aqueous systems by adding water-soluble or water-dispersible polymers is disclosed. The method comprises adding to an aqueous system a polymer having repeat units characterized by the Formula I: Wherein E is the repeat unit remaining after polymerization of an ethylenically unsaturated compound; preferably, a carboxylic acid, sulfonic acid, phosphonic acid, or amide form thereof or mixtures thereof. R1 is H or lower (C1-C4)alkyl. G is —CH2— or —CHCH3—; R2 is &Parenopenst;CH2—CH2—O&Parenclosest;n or &Parenopenst;CH2—CHCH3—O&Parenclosest;n where n ranges from about 1 to 100, preferably about 1 to 20. X is an anionic radical selected from the group consisting of SO3, PO3, or COO; Z is H or hydrogens or any water soluble cationic moiety which counterbalances the valence of the anionic radical X, including but not limited to Na, K, Ca, or NH4. F, when present, is a repeat unit having the structure of Formula II: wherein X and Z are the same as in Formula I. R4 is H or lower (C1-C4)alkyl. R5 is hydroxy substituted alkyl or alkylene having from about 1 to 6 of carbon atoms.
    • 公开了通过添加水溶性或水分散性聚合物来抑制水性体系中水垢形成部分的形成和沉积的方法。 该方法包括向水性体系中加入具有由式I表征的重复单元的聚合物:其中E是烯键式不饱和化合物聚合后剩余的重复单元; 优选羧酸,磺酸,膦酸或其酰胺形式或其混合物。 R1是H或低级(C1-C4)烷基。 G是-CH 2 - 或-CHCH 3 - ; R2是&Parenopenst; CH2-CH2-O和Parenclosest; n或&Parenopenst; CH2-CHCH3-O和Parenclosest; n,其中n为约1至100,优选约1至20.X为选自SO 3,PO 3 ,或COO; Z是H或氢或任何水溶性阳离子部分,其使阴离子基团X的价态平衡,包括但不限于Na,K,Ca或NH 4。 当存在时,F为具有式II结构的重复单元:其中X和Z与式I中相同.R4为H或低级(C1-C4)烷基。 R5是具有约1-6个碳原子的羟基取代的烷基或亚烷基。