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1. 发明授权

US08122798B1 Power cutting tool with proximity sensing system 有权
标题翻译：具有接近感应系统的电动切割工具
公开(公告)号：US08122798B1
公开(公告)日：2012-02-28
申请号：US12478559
申请日：2009-06-04
申请人： David Shafer , David Titzler , John Gilbert
发明人： David Shafer , David Titzler , John Gilbert
IPC分类号： B26D7/24 , B27B5/38 , G08B13/26 , G01R27/26
CPC分类号： B26D1/14 , B23D59/001 , B26D5/00 , B26D7/24 , B27G19/02 , F16P3/148 , Y10T83/081 , Y10T83/089 , Y10T83/606 , Y10T83/773
摘要： A power cutting tool includes a cutting surface, a conductive structure, and first electrode matrix comprising an array of electrical conductors. A moveable blade used to cut an object is located on the cutting surface. When at least one electrical conductor of the first electrode matrix is energized relative to the conductive structure, an electric field extends between the at least one electrical conductor and the conductive matrix to detect the presence of an object in proximity to the electric field.
摘要翻译：动力切割工具包括切割表面，导电结构和包括电导体阵列的第一电极矩阵。用于切割物体的可移动刀片位于切割表面上。当第一电极矩阵的至少一个电导体相对于导电结构通电时，电场在至少一个电导体和导电矩阵之间延伸，以检测在电场附近的物体的存在。

2. 发明授权

US08730572B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08730572B2
公开(公告)日：2014-05-20
申请号：US13470956
申请日：2012-05-14
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

3. 发明授权

US08416490B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08416490B2
公开(公告)日：2013-04-09
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

4. 发明申请

US20130050671A1 IMAGING OPTICSIIMAGING OPTICS, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING SAME AND RELATED METHODS 有权
标题翻译：成像光学光学，具有相同方法的微结构投影曝光装置
公开(公告)号：US20130050671A1
公开(公告)日：2013-02-28
申请号：US13602553
申请日：2012-09-04
申请人： Hans-Juergen Mann , David Shafer
发明人： Hans-Juergen Mann , David Shafer
IPC分类号： G03B27/54 , G02B17/06
CPC分类号： G03F7/702 , G02B17/0657 , G02B17/0663 , G03F7/70233
摘要： An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
摘要翻译：成像光学元件具有多个反射镜，用于将物平面中的物场映像成图像平面中的图像场。成像光学器件包括将对象场成像到中间图像上的第一部分目标，并且成像光学器件包括将中间图像成像到图像场上的第二部分目标。第二部分目标包括在物场和图像场之间的成像光束的光束路径中的倒数第二反射镜，并且第二部分物镜包括光束路径中的最后一个反射镜。倒数第二个镜像将中间图像映射到另一个中间图像上，最后一个镜像将另外的中间图像映像到图像场上。

5. 发明授权

US08289619B2 Catadioptric projection objective 有权
公开(公告)号：US08289619B2
公开(公告)日：2012-10-16
申请号：US13153544
申请日：2011-06-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

6. 发明授权

US08208198B2 Catadioptric projection objective 有权
公开(公告)号：US08208198B2
公开(公告)日：2012-06-26
申请号：US11653366
申请日：2007-01-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

7. 发明申请

US20110235167A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110235167A1
公开(公告)日：2011-09-29
申请号：US13153544
申请日：2011-06-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

8. 发明授权

US07573655B2 Unit magnification projection objective 有权
标题翻译：单位放大投影目标
公开(公告)号：US07573655B2
公开(公告)日：2009-08-11
申请号：US11870025
申请日：2007-10-10
申请人： David Shafer
发明人： David Shafer
IPC分类号： G02B17/00 , G03B27/52
CPC分类号： G03F7/70225
摘要： A catadioptric projection objective has, along an optical axis, a concave mirror; a positive lens group with positive refractive power arranged adjacent to the concave mirror and spaced apart therefrom; a first prism and a second prism each having respective first fiat surfaces and second flat surfaces, wherein the second flat surfaces are arranged adjacent to the positive lens group and on opposite sides of the optical axis, and wherein the first flat surfaces are arranged adjacent to an object plane and an image plane, respectively, of the projection objective. The projection objective has unit magnification and at least one focus at a wavelength in a design wavelength band that includes mercury g-, h- and i-lines. At least the thickest optical element of the positive lens group and the first and second prism are made from optical material having an absorption coefficient k
摘要翻译：反射折射投影物镜沿着光轴具有凹面镜; 具有正折射力的正透镜组布置成邻近凹面镜并与之隔开; 第一棱镜和第二棱镜，每个具有相应的第一平面和第二平面，其中所述第二平面布置成与所述正透镜组相邻并且位于所述光轴的相对侧上，并且其中所述第一平面布置成邻近投影物镜的物平面和像平面。投影物镜具有单位放大率和在包括汞g-，h-和i-线的设计波长带中的波长处的至少一个焦点。正透镜组和第一和第二棱镜中至少最厚的光学元件由设计波长带中吸收系数k <0.001cm-1的光学材料制成。

9. 发明申请

US20080310014A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：US20080310014A1
公开(公告)日：2008-12-18
申请号：US12196637
申请日：2008-08-22
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane;wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

10. 发明授权

US07457034B2 High NA system for multiple mode imaging 失效
标题翻译：高NA系统用于多模式成像
公开(公告)号：US07457034B2
公开(公告)日：2008-11-25
申请号：US11406138
申请日：2006-04-14
申请人： Yung-Ho Chuang , David Shafer , Bin-Ming B. Tsai , J. Joseph Armstrong
发明人： Yung-Ho Chuang , David Shafer , Bin-Ming B. Tsai , J. Joseph Armstrong
IPC分类号： G02B23/00 , G02B17/00
CPC分类号： G03F7/7065 , G02B13/12 , G02B13/22 , G02B17/08 , G02B17/0808 , G02B17/0812 , G02B17/0852 , G02B17/0856 , G02B17/0892 , G02B21/16 , G03F1/84 , G03F7/70225 , G03F7/70275 , G03F7/70616
摘要： A system for multiple mode imaging is disclosed. The catadioptric system has an NA greater than 0.65, and preferably greater than 0.9, highly corrected for low and high order monochromatic aberrations. The system employs unique illumination entrances and optics to collect reflected, diffracted, and scattered light over a range of angles. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric elements at any angle from 0 to 85 degrees from vertical. The system may employ a relayed pupil plane, used to select different imaging modes, provide simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.
摘要翻译：公开了一种用于多模式成像的系统。反折射系统对于低阶和高阶单色像差具有高于0.65，优选大于0.9的NA。该系统采用独特的照明入口和光学器件在一定范围的角度收集反射，衍射和散射光。通过改变光瞳面上的照明几何形状和孔径，可以实现多种成像模式。照明可以使用辅助分光镜或镜子进入反折射光学系统，或者通过反射折射元件以垂直方向从0到85度的角度进入反折射光学系统。该系统可以采用中继的光瞳平面，用于选择不同的成像模式，提供不同成像模式，傅立叶滤波和其他光瞳成形操作的同时操作。

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