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1. 发明授权

US07106416B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07106416B2
公开(公告)日：2006-09-12
申请号：US10731428
申请日：2003-12-10
申请人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
发明人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70875
摘要： A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。卡盘至少与框架隔离。

2. 发明授权

US07978306B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07978306B2
公开(公告)日：2011-07-12
申请号：US12216441
申请日：2008-07-03
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

3. 发明申请

US20080278697A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080278697A1
公开(公告)日：2008-11-13
申请号：US12216441
申请日：2008-07-03
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
IPC分类号： G03B27/52
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

4. 发明授权

US07119884B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07119884B2
公开(公告)日：2006-10-10
申请号：US10744088
申请日：2003-12-24
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Jeroen Starreveld
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Jeroen Starreveld
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/70783
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck for supporting the object, a frame for supporting the chuck, and a chuck support structure for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element, which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.
摘要翻译：光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。光刻设备包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。该装置具有用于在光刻设备中支撑诸如基板或图案形成装置的物体的卡盘系统。卡盘系统包括用于支撑物体的卡盘，用于支撑卡盘的框架和用于相对于框架支撑卡盘的卡盘支撑结构。卡盘支撑结构包括至少一个挠曲元件，该挠曲元件在至少一个自由度上是柔性的并且联接到卡盘和框架。

5. 发明授权

US07411657B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07411657B2
公开(公告)日：2008-08-12
申请号：US10990323
申请日：2004-11-17
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

6. 发明授权

US09188882B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09188882B2
公开(公告)日：2015-11-17
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/42 , G03B27/52 , G03F9/00 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

7. 发明授权

US07064808B1 Substrate carrier and method for making a substrate carrier 有权
标题翻译：基板载体和制造基板载体的方法
公开(公告)号：US07064808B1
公开(公告)日：2006-06-20
申请号：US10829462
申请日：2004-04-22
申请人： Noud Jan Gilissen , Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Noud Jan Gilissen , Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70716
摘要： A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.
摘要翻译：用于承载光刻基板或平版印刷图案形成装置的载体。载体包括设置有开口中空结构的第一构件，其向构件的至少一侧开口。载体还包括连接到第一构件的第二构件，使得在载体构件之间形成封闭的中空内部结构。

8. 发明授权

US07630060B2 Device manufacturing method, lithographic apparatus and device manufactured thereby 失效
标题翻译：装置制造方法，由此制造的光刻设备和装置
公开(公告)号：US07630060B2
公开(公告)日：2009-12-08
申请号：US10962744
申请日：2004-10-13
申请人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
发明人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
IPC分类号： G03B27/32
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , H01J37/3026 , H01J2237/31764
摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.
摘要翻译：公开了一种器件制造方法。该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投影到所述衬底的内部目标部分上。

9. 发明申请

US20080212053A1 Device manufacturing method, lithographic apparatus and device manufactured thereby 失效
标题翻译：装置制造方法，由此制造的光刻设备和装置
公开(公告)号：US20080212053A1
公开(公告)日：2008-09-04
申请号：US10962744
申请日：2004-10-13
申请人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
发明人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
IPC分类号： G03B27/42 , G03F7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , H01J37/3026 , H01J2237/31764
摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.
摘要翻译：公开了一种装置制造方法。该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

10. 发明授权

US10551752B2 Lithographic apparatus and method 有权
公开(公告)号：US10551752B2
公开(公告)日：2020-02-04
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03F7/20
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

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