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1. 发明授权

US08823921B2 Programmable illuminator for a photolithography system 有权
标题翻译：用于光刻系统的可编程照明器
公开(公告)号：US08823921B2
公开(公告)日：2014-09-02
申请号：US13199112
申请日：2011-08-19
申请人： Borislav Zlatanov , Andrew M. Hawryluk
发明人： Borislav Zlatanov , Andrew M. Hawryluk
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70066 , G02B26/0833 , G03F7/70558
摘要： A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking functions that have previously required relatively large mechanical devices. Methods of improving illumination field uniformity using the programmable illuminator are also disclosed.
摘要翻译：用于光刻系统的可编程照明器包括光源，具有光均化元件的第一光学系统，可编程微镜器件以及形成照明光栅的照明场的第二光学系统。可编程微镜装置可以被配置为执行先前需要相对大的机械装置的快门和边缘曝光阻挡功能。还公开了使用可编程照明器改善照明场均匀性的方法。

2. 发明申请

US20130044301A1 Programmable illuminator for a photolithography system 有权
标题翻译：用于光刻系统的可编程照明器
公开(公告)号：US20130044301A1
公开(公告)日：2013-02-21
申请号：US13199112
申请日：2011-08-19
申请人： Borislav Zlatanov , Andrew M. Hawryluk
发明人： Borislav Zlatanov , Andrew M. Hawryluk
IPC分类号： G03B27/54
CPC分类号： G03F7/70066 , G02B26/0833 , G03F7/70558
摘要： A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking functions that have previously required relatively large mechanical devices. Methods of improving illumination field uniformity using the programmable illuminator are also disclosed.
摘要翻译：用于光刻系统的可编程照明器包括光源，具有光均化元件的第一光学系统，可编程微镜器件以及形成照明光栅的照明场的第二光学系统。可编程微镜装置可以被配置为执行先前需要相对大的机械装置的快门和边缘曝光阻挡功能。还公开了使用可编程照明器改善照明场均匀性的方法。

3. 发明授权

US06869155B1 Method and apparatus for masking a workpiece with ink 失效
标题翻译：用油墨掩蔽工件的方法和装置
公开(公告)号：US06869155B1
公开(公告)日：2005-03-22
申请号：US09923755
申请日：2001-08-06
申请人： Borislav Zlatanov
发明人： Borislav Zlatanov
IPC分类号： B41J3/00 , G03F1/00
CPC分类号： G03F7/2018 , G03F7/70941
摘要： A method and apparatus for masking a workpiece with a layer of ink from an inkjet head is disclosed. The masking prevents exposure of select regions of a photosensitive workpiece. The apparatus includes a workpiece pre-aligner for movably supporting and aligning the workpiece. The inkjet head is arranged to be in operable communication with the photosensitive layer of the workpiece when positioned on the pre-aligner and is adapted for providing a select mask of opaque ink on a photosensitive layer. Where the photosensitive layer is a negative tone photoresist, upon exposure the portion of the photosensitive layer that is not exposed because of the presence of the mask is removed upon developing. In this manner, select regions of the workpiece can be kept clear of photoresist or otherwise patterned with indicia such as alphanumeric symbols or barcodes.
摘要翻译：公开了一种用于利用来自喷墨头的墨水层掩蔽工件的方法和装置。掩模防止感光工件的选择区域的曝光。该装置包括用于可移动地支撑和对准工件的工件预对准器。喷墨头被布置成当定位在预对准器上时与工件的感光层可操作地连通，并且适于在感光层上提供不透明油墨的选择掩模。当感光层为负色调光致抗蚀剂时，曝光后由于存在掩模而未被曝光的感光层的部分在显影时被去除。以这种方式，工件的选择区域可以保持清除光致抗蚀剂或以其他方式用标记（如字母数字符号或条形码）图案化。

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