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1. 发明授权

US4633511A Signal transmission and reception system 失效
标题翻译：信号发射和接收系统
公开(公告)号：US4633511A
公开(公告)日：1986-12-30
申请号：US643834
申请日：1984-08-23
申请人： Daisuke Koga , Masahide Tamura , Yukio Naito
发明人： Daisuke Koga , Masahide Tamura , Yukio Naito
IPC分类号： H04B1/40 , H04B1/50
CPC分类号： H04B1/50 , H04B1/408
摘要： A duplex transmission and reception system wherein a local oscillator of the receiver is dispensed with by using the output of a modulated transmission oscillator, with its modulation cancelled, in lieu of a receiver local oscillator. The transmitter modulation signal is adjusted by appropriate level correction and phase inversion. The modulated output of the transmission oscillator is itself applied to a modulator, where it is modulated by the adjusted modulation signal. This results in substantially cancelling out the modulation component of the transmission oscillator output. This modulation-cancelled signal is supplied to the mixer of a superheterodyne receiver as a local oscillator signal.
摘要翻译：一种双工发送和接收系统，其中通过使用调制的发送振荡器的输出来取消接收机的本地振荡器，其调制被取消，代替接收机本地振荡器。通过适当的电平校正和相位反转调整发射机调制信号。传输振荡器的调制输出本身被应用于调制器，在调制器中调制输出被调制后的调制信号调制。这导致基本上消除了发送振荡器输出的调制分量。该调制解除信号作为本地振荡器信号提供给超外差接收机的混频器。

2. 发明授权

US4395776A Transmitter having a phase synchronizing system 失效
标题翻译：具有相位同步系统的变送器
公开(公告)号：US4395776A
公开(公告)日：1983-07-26
申请号：US269029
申请日：1981-05-27
申请人： Yukio Naito , Masahide Tamura , Shigeo Takahashi
发明人： Yukio Naito , Masahide Tamura , Shigeo Takahashi
IPC分类号： H03C3/09 , H04B1/04
CPC分类号： H03C3/0966 , H04B1/0475 , H04B2001/0491
摘要： A transmitter having a transmitting phase synchronizing system. To one input of a frequency mixer is applied the output of a phase synchronizing type digital frequency synthesizer, through a first frequency divider. A modulating signal is applied to another input of the frequency mixer. The output from the mixer is connected via a bandpass filter to a phase synchronizing system having in series, along a main route, a phase detector, a lowpass filter, and a voltage controlled oscillator, and thence to an amplifier system. In a feedback route from another outlet of the voltage controlled oscillator to the phase detector is a second fixed frequency divider. The digital frequency synthesizer itself may have a reference oscillator connected in series to a third fixed frequency divider, a second phase detector, a second lowpass filter and a second voltage controlled oscillator, from which a feedback circuit leads back to the phase detector via the first fixed frequency divider and a variable frequency divider.
摘要翻译： PCT No.PCT / JP80 / 00224 Sec。 371日期：1981年5月27日 102（e）日期1981年5月22日PCT提交1980年9月26日PCT公布。出版物WO81 / 00942 日期：1981年4月2日。具有发射相位同步系统的发射机。通过第一分频器对相位同步型数字频率合成器的输出施加到混频器的一个输入端。调制信号被施加到混频器的另一输入端。来自混频器的输出通过带通滤波器连接到相位同步系统，该相位同步系统沿着主路线，相位检测器，低通滤波器和压控振荡器串联，从而连接到放大器系统。在从压控振荡器的另一个出口到相位检测器的反馈路径中是第二固定分频器。数字频率合成器本身可以具有与第三固定分频器，第二相位检测器，第二低通滤波器和第二压控振荡器串联连接的参考振荡器，反馈电路从该第二固定分频器，第二低通滤波器和第二压控振荡器经由第一固定分频器固定分频器和可变分频器。

3. 发明申请

US20120230757A1 BOLT-LOCKING APPARATUS, MOUNTING METHOD THEREOF AND MOUNTING JIG 有权
标题翻译：螺栓锁紧装置，安装方式及安装方式
公开(公告)号：US20120230757A1
公开(公告)日：2012-09-13
申请号：US13413821
申请日：2012-03-07
申请人： Norihiko Amikura , Satoshi Kagatsume , Masahiko Satoh , Yukio Naito , Satoshi Muto , Tomohiro Nakata , Tsutomu Shinohara , Michio Yamaji
发明人： Norihiko Amikura , Satoshi Kagatsume , Masahiko Satoh , Yukio Naito , Satoshi Muto , Tomohiro Nakata , Tsutomu Shinohara , Michio Yamaji
IPC分类号： F16B1/00 , B23P19/00 , B23P11/00
CPC分类号： F16B39/101 , F16B39/103 , Y10T29/49826 , Y10T29/53 , Y10T403/50
摘要： A bolt-locking apparatus includes a plurality of fitting members 2 and 3 which are relatively non-rotatably fitted to heads of a plurality of bolts 5, and an engaging member 4 fitted to the plurality of fitting members 2 and 3 such that the engaging member 4 straddles the fitting members 2 and 3. Outer peripheral surfaces 2b and 3b of the fitting members 2 and 3 are non-circular in shape. The engaging member 4 includes a plurality of engaging holes (non-circular engaging portions) 8a and 8b which correspond to the non-circular outer peripheral surfaces 2b and 3b of the plurality of fitting members 2 and 3.
摘要翻译：螺栓锁定装置包括多个相对不可旋转地装配到多个螺栓5的头部的装配构件2和3以及装配到多个配件构件2和3的接合构件4，使得接合构件 4跨过配合构件2和3.装配构件2和3的外围表面2b和3b的形状是非圆形的。接合构件4包括与多个安装构件2,3的非圆形外周面2b和3b对应的多个接合孔（非圆形接合部）8a和8b。

4. 发明授权

US4562738A Automatic flaw detection device 失效
标题翻译：自动探伤装置
公开(公告)号：US4562738A
公开(公告)日：1986-01-07
申请号：US596700
申请日：1984-04-04
申请人： Kazuo Nakayama , Yukio Naito , Eiji Munesue
发明人： Kazuo Nakayama , Yukio Naito , Eiji Munesue
IPC分类号： G01N29/26 , G01N29/04
CPC分类号： G01N29/26
摘要： An automatic flaw detection apparatus comprises a supporting frame; a rotational frame supported inside the supporting frame in a freely rotatable manner by means of bearings; a hollow shaft which is supported by and inside the rotational frame, through the interior of which passes a material to be inspected; a holder which is disposed within the hollow shaft extending in the longitudinal direction of the axis of the hollow shaft and rotates in association with the hollow shaft, the a sensor incorporated in the holder to detect any defect in the material to be probed; and a signal transmission device which is placed between the hollow shaft and the rotational frame and comprises a stator section supported by the supporting frame and a rotor section supported by the hollow shaft or the rotational frame to be electrically in association with the stator section, and which transmits flaw detection signal from the sensor to the outside.
摘要翻译：一种自动探伤装置，包括支撑框架; 旋转框架，其通过轴承以可自由旋转的方式支撑在所述支撑框架内; 一个空心轴，由旋转框架支撑并在旋转框架的内部，通过其内部通过待检查的材料; 所述保持器设置在所述中空轴内，所述保持器沿所述中空轴的轴线的长度方向延伸，并且与所述中空轴相关联地旋转，所述传感器并入所述保持器中，以检测待探测材料中的任何缺陷; 以及信号传输装置，其设置在所述中空轴与所述旋转框架之间，并且包括由所述支撑框架支撑的定子部分和由所述中空轴或所述旋转框架支撑的与所述定子部分电连接的转子部分，以及其将探测信号从传感器传送到外部。

5. 发明申请

US20170097034A1 BOLT-LOCKING APPARATUS, MOUNTING METHOD THEREOF AND MOUNTING JIG 审中-公开
公开(公告)号：US20170097034A1
公开(公告)日：2017-04-06
申请号：US15289438
申请日：2016-10-10
申请人： Norihiko Amikura , Satoshi Kagatsume , Masahiko Satoh , Yukio Naito , Satoshi Muto , Tomohiro Nakata , Tsutomu Shinohara , Michio Yamaji
发明人： Norihiko AMIKURA , Satoshi KAGATSUME , Masahiko Satoh , Yukio Naito , Satoshi Muto , Tomohiro Nakata , Tsutomu Shinohara , Michio Yamaji
IPC分类号： F16B39/10
CPC分类号： F16B39/101 , F16B39/103 , Y10T29/49826 , Y10T29/53 , Y10T403/50
摘要： A bolt-locking apparatus includes a plurality of fitting members 2 and 3 which are relatively non-rotatably fitted to heads of a plurality of bolts 5, and an engaging member 4 fitted to the plurality of fitting members 2 and 3 such that the engaging member 4 straddles the fitting members 2 and 3. Outer peripheral surfaces 2b and 3b of the fitting members 2 and 3 are non-circular in shape. The engaging member 4 includes a plurality of engaging holes (non-circular engaging portions) 8a and 8b which correspond to the non-circular outer peripheral surfaces 2b and 3b of the plurality of fitting members 2 and 3.

6. 发明授权

US06544380B2 Plasma treatment method and apparatus 失效
标题翻译：等离子体处理方法和装置
公开(公告)号：US06544380B2
公开(公告)日：2003-04-08
申请号：US10079600
申请日：2002-02-19
申请人： Masayuki Tomoyasu , Akira Koshiishi , Kosuke Imafuku , Shosuke Endo , Kazuhiro Tahara , Yukio Naito , Kazuya Nagaseki , Keizo Hirose , Mitsuaki Komino , Hiroto Takenaka , Hiroshi Nishikawa , Yoshio Sakamoto
发明人： Masayuki Tomoyasu , Akira Koshiishi , Kosuke Imafuku , Shosuke Endo , Kazuhiro Tahara , Yukio Naito , Kazuya Nagaseki , Keizo Hirose , Mitsuaki Komino , Hiroto Takenaka , Hiroshi Nishikawa , Yoshio Sakamoto
IPC分类号： H05H100
CPC分类号： C23C16/45565 , C23C16/4405 , C23C16/4407 , C23C16/4483 , C23C16/4485 , C23C16/4557 , C23C16/5096 , C23C16/517 , H01J37/32082 , H01J37/32146 , H01J37/32155 , H01J37/32165 , H01J37/3244 , H01J37/32935 , H01J37/32963 , Y10S156/916
摘要： An apparatus for treating a substrate which includes a chamber and an opening formed in the chamber allowing the substrate to be conveyed into the chamber or taken out thereof. The chamber, also, includes a detachable baffle plate that fits around an electrode. For treatment to commence, the substrate is placed on the electrode and the chamber is exhausted of or supplied with gases. The electrode is then vertically lifted together with the baffle plate and the baffle plate is moved either to a position that is higher in level than an upper end of the opening of the chamber or to a position that is lower in level than a lower end of the opening of the chamber. This allows the baffle plate to shield a region near the opening of the chamber from a treatment region and allows reaction products to be adhered to the baffle plate.
摘要翻译：一种用于处理基板的设备，其包括室和形成在所述室中的开口，使得所述基板被输送到所述室中或从其中取出。该腔室还包括一个可拆卸的挡板，其围绕电极配合。为了开始处理，将基板放置在电极上，并且室被排出或供应气体。然后将电极与挡板一起垂直提升，并且挡板移动到比室的开口的上端更高的位置，或者移动到比下端更低的位置房间的开放。这允许挡板将腔室开口附近的区域与处理区域隔离，并允许反应产物粘附到挡板。

7. 发明授权

US5716534A Plasma processing method and plasma etching method 失效
标题翻译：等离子体处理方法和等离子体蚀刻方法
公开(公告)号：US5716534A
公开(公告)日：1998-02-10
申请号：US564621
申请日：1995-11-29
申请人： Hiroshi Tsuchiya , Yoshio Fukasawa , Shuji Mochizuki , Yukio Naito , Kosuke Imafuku
发明人： Hiroshi Tsuchiya , Yoshio Fukasawa , Shuji Mochizuki , Yukio Naito , Kosuke Imafuku
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32082 , H01J37/32165 , H01J37/3299 , H01J2237/3343
摘要： A plasma etching apparatus includes a process chamber that can be set at a reduced pressure. A lower electrode on which a semiconductor wafer is placed and an upper electrode opposing the lower electrode are disposed in the process chamber. The lower and upper electrodes are connected to RF power supplies, respectively. First and second RF powers, the phases and power ratio of which are separately controlled, can be applied to the upper and lower electrodes. Parameters including the frequencies, power values, and relative phases of the first and second RF powers are selected in order to set the etching characteristics, e.g., an etching rate, the planar uniformity of the etching rate, the etching selectivity ratio and the like to predetermined values. During etching, the first and second RF powers are monitored by separate detectors, and are maintained at initial preset values through a controller.
摘要翻译：等离子体蚀刻装置包括能够减压设置的处理室。在其中放置半导体晶片的下电极和与下电极相对的上电极设置在处理室中。下电极和上电极分别连接到RF电源。第一和第二RF功率（其相位和功率比被单独控制）可以应用于上电极和下电极。选择包括第一和第二RF功率的频率，功率值和相对相位的参数，以便将蚀刻特性，例如蚀刻速率，蚀刻速率的平面均匀性，蚀刻选择比等设置为预定值。在蚀刻期间，第一和第二RF功率由分离的检测器监测，并通过控制器保持在初始预设值。

8. 发明授权

US5314603A Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber 失效
标题翻译：能够检测和调节室内电极的实际RF功率的等离子体处理装置
公开(公告)号：US5314603A
公开(公告)日：1994-05-24
申请号：US918045
申请日：1992-07-24
申请人： Kazuhiko Sugiyama , Masafumi Shimizu , Yukio Naito , Eiichi Nishimura , Kouichi Oshima
发明人： Kazuhiko Sugiyama , Masafumi Shimizu , Yukio Naito , Eiichi Nishimura , Kouichi Oshima
IPC分类号： H01J37/32 , C23C14/34 , C23F1/02
CPC分类号： H01J37/32082 , H01J37/32935 , H01J37/3299
摘要： A plasma processing apparatus has a process chamber and a pair of electrodes provided in the process chamber to oppose each other. An RF power supply outputs an RF power to be supplied to at least one of the pair of electrodes in the process chamber. A power detector detects an actual RF power to be applied to one of the electrodes in the process chamber. A controller controls the RF power output from the RF power supply to a predetermined value in accordance with the actual RF power detected by the power detector.
摘要翻译：等离子体处理装置具有处理室和设置在处理室中的彼此相对的一对电极。 RF电源输出要提供给处理室中的一对电极中的至少一个的RF功率。功率检测器检测要施加到处理室中的一个电极的实际RF功率。控制器根据由功率检测器检测到的实际RF功率，将从RF电源输出的RF功率控制到预定值。

9. 发明授权

US4283463A Molded products of polypropylene 失效
标题翻译：聚丙烯成型产品
公开(公告)号：US4283463A
公开(公告)日：1981-08-11
申请号：US103133
申请日：1979-12-13
申请人： Akinobu Shiga , Kiyoshi Matsuyama , Masahiro Kakugo , Yukio Naito , Seiichiro Ima
发明人： Akinobu Shiga , Kiyoshi Matsuyama , Masahiro Kakugo , Yukio Naito , Seiichiro Ima
IPC分类号： C08F10/06 , C08F110/06 , C08F210/06 , C08L23/10 , C08L23/12 , B32B27/32
CPC分类号： C08F10/06 , C08J5/18 , C08F110/06 , C08F210/06 , C08J2323/12 , C08L23/10 , Y10T428/31899
摘要： A molded product of polypropylene having an isotactic pentad fraction of the boiling heptane insoluble portion of at least about 0.955 and a boiling heptane solubles content of about 2.0 to 9.0% by weight. The molded products include a stretched film, insulating materials for electrical equipment, etc.
摘要翻译：沸腾庚烷不溶部分的全同立构五单元组分的聚丙烯的成型体至少约0.955，沸腾庚烷可溶物的含量为约2.0至9.0重量％。模制产品包括拉伸膜，电气设备绝缘材料等

10. 发明授权

US06734747B1 Piezoelectric oscillator 失效
标题翻译：压电振荡器
公开(公告)号：US06734747B1
公开(公告)日：2004-05-11
申请号：US09679984
申请日：2000-10-05
申请人： Masayuki Ishikawa , Hideaki Kohzu , Yukio Naito
发明人： Masayuki Ishikawa , Hideaki Kohzu , Yukio Naito
IPC分类号： H03B532
CPC分类号： H03B5/366 , H03B5/30
摘要： A piezoelectric oscillator is disclosed which falls under the category of an oscillator including a piezoelectric resonator, an amplifier, and a variable-capacitance element. The variable-capacitance element is a MOS construction type capacitance element, one terminal of that is fixed at a V voltage, and the other terminal of that is applied with a control voltage falling within a range whose intermediate value is the V voltage. As a result of this, a piezoelectric oscillator is realized which can vary its frequency over a wide range even without use of a minus power supply.
摘要翻译：公开了一种压电振荡器，其属于包括压电谐振器，放大器和可变电容元件的振荡器类别。可变电容元件是MOS构造型电容元件，其一端被固定在V电压，另一端被施加在中间值为V电压的范围内的控制电压。结果，实现了即使不使用负电源也可以在宽范围内改变其频率的压电振荡器。

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