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    • 1. 发明申请
    • OXIDE THIN FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME
    • 氧化物薄膜晶体管及其制造方法
    • US20120146017A1
    • 2012-06-14
    • US13324751
    • 2011-12-13
    • Dae-Hwan KIMByung-Kook ChoiSul LeeHoon Yim
    • Dae-Hwan KIMByung-Kook ChoiSul LeeHoon Yim
    • H01L33/08H01L21/34
    • H01L29/7869H01L27/1225
    • A method for fabricating an oxide thin film transistor includes sequentially forming a gate insulating film, an oxide semiconductor layer, and a first insulating layer; selectively patterning the oxide semiconductor layer and the first insulating layer to form an active layer and an insulating layer pattern on the gate electrode; forming a second insulating layer on the substrate having the active layer and the insulating layer pattern formed thereon; and selectively patterning the insulating layer pattern and the second insulating layer to form first and second etch stoppers on the active layer. The oxide semiconductor layer may be a ternary system or quaternary system oxide semiconductor comprising a combination of AxByCzO (A, B, C═Zn, Cd, Ga, In, Sn, Hf, Zr; x, y, z≧0).
    • 一种制造氧化物薄膜晶体管的方法,包括顺序地形成栅极绝缘膜,氧化物半导体层和第一绝缘层; 选择性地图案化氧化物半导体层和第一绝缘层以在栅电极上形成有源层和绝缘层图案; 在其上形成有活性层和绝缘层图案的基板上形成第二绝缘层; 以及选择性地图案化所述绝缘层图案和所述第二绝缘层以在所述有源层上形成第一和第二蚀刻阻挡层。 氧化物半导体层可以是包含AxByCzO(A,B,C = Zn,Cd,Ga,In,Sn,Hf,Zr; x,y,z≥0)的组合的三元系或四元系氧化物半导体。
    • 2. 发明授权
    • Oxide thin film transistor and method of fabricating the same
    • 氧化物薄膜晶体管及其制造方法
    • US08735883B2
    • 2014-05-27
    • US13324751
    • 2011-12-13
    • Dae-Hwan KimByung-Kook ChoiSul LeeHoon Yim
    • Dae-Hwan KimByung-Kook ChoiSul LeeHoon Yim
    • H01L29/10H01L29/786H01L27/12
    • H01L29/7869H01L27/1225
    • A method for fabricating an oxide thin film transistor includes sequentially forming a gate insulating film, an oxide semiconductor layer, and a first insulating layer; selectively patterning the oxide semiconductor layer and the first insulating layer to form an active layer and an insulating layer pattern on the gate electrode; forming a second insulating layer on the substrate having the active layer and the insulating layer pattern formed thereon; and selectively patterning the insulating layer pattern and the second insulating layer to form first and second etch stoppers on the active layer. The oxide semiconductor layer may be a ternary system or quaternary system oxide semiconductor comprising a combination of AxByCzO (A, B, C=Zn, Cd, Ga, In, Sn, Hf, Zr; x, y, z≧0).
    • 一种制造氧化物薄膜晶体管的方法,包括顺序地形成栅极绝缘膜,氧化物半导体层和第一绝缘层; 选择性地图案化氧化物半导体层和第一绝缘层以在栅电极上形成有源层和绝缘层图案; 在其上形成有活性层和绝缘层图案的基板上形成第二绝缘层; 以及选择性地图案化所述绝缘层图案和所述第二绝缘层以在所述有源层上形成第一和第二蚀刻阻挡层。 氧化物半导体层可以是包含AxByCzO(A,B,C = Zn,Cd,Ga,In,Sn,Hf,Zr; x,y,z≥0)的组合的三元系或四元系氧化物半导体。
    • 3. 发明申请
    • OXIDE THIN FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME
    • 氧化物薄膜晶体管及其制造方法
    • US20110278565A1
    • 2011-11-17
    • US13106482
    • 2011-05-12
    • Hoon YimDae-Hwan Kim
    • Hoon YimDae-Hwan Kim
    • H01L29/786H01L21/336
    • H01L29/78693H01L27/1225H01L29/7869
    • An oxide thin film transistor (TFT) and a fabrication method thereof are provided. The method for fabricating an oxide thin film transistor (TFT) comprises: forming a gate electrode on a substrate; forming a gate insulating layer on the substrate with the gate electrode formed thereon; forming an active layer made of oxide semiconductor on the gate insulating layer; forming a contact layer on the substrate with the active layer formed thereon and forming source and drain electrodes, which are electrically connected with source and drain regions of the active layer through the contact layer, on the contact layer; forming a protective layer on the substrate with the source and drain electrodes formed thereon; forming a contact hole by removing the protective layer to expose the drain electrode; and forming a pixel electrode electrically connected with the drain electrode through the contact hole, wherein the contact layer is made of oxide including a different metal or conductivity with that of the source and drain electrodes, to adjust a threshold voltage according to the difference in a work function.
    • 提供一种氧化物薄膜晶体管(TFT)及其制造方法。 制造氧化物薄膜晶体管(TFT)的方法包括:在基板上形成栅电极; 在其上形成有栅电极的基板上形成栅极绝缘层; 在栅极绝缘层上形成由氧化物半导体制成的有源层; 在其上形成有源层的衬底上形成接触层,并形成在接触层上通过接触层与有源层的源极和漏极区域电连接的源极和漏极; 在其上形成有源电极和漏电极的衬底上形成保护层; 通过去除保护层来形成接触孔以露出漏电极; 以及形成通过所述接触孔与所述漏电极电连接的像素电极,其中,所述接触层由与所述源电极和漏电极不同的金属或导电性的氧化物构成,以根据所述漏极电极的差异来调整阈值电压 工作功能。
    • 4. 发明授权
    • Oxide thin film transistor and method of fabricating the same
    • 氧化物薄膜晶体管及其制造方法
    • US08604470B2
    • 2013-12-10
    • US13106482
    • 2011-05-12
    • Hoon YimDae-Hwan Kim
    • Hoon YimDae-Hwan Kim
    • H01L29/786
    • H01L29/78693H01L27/1225H01L29/7869
    • An oxide thin film transistor (TFT) and a fabrication method thereof are provided. The method for fabricating an oxide thin film transistor (TFT) comprises: forming a gate electrode on a substrate; forming a gate insulating layer on the substrate with the gate electrode formed thereon; forming an active layer made of oxide semiconductor on the gate insulating layer; forming a contact layer on the substrate with the active layer formed thereon and forming source and drain electrodes, which are electrically connected with source and drain regions of the active layer through the contact layer, on the contact layer; forming a protective layer on the substrate with the source and drain electrodes formed thereon; forming a contact hole by removing the protective layer to expose the drain electrode; and forming a pixel electrode electrically connected with the drain electrode through the contact hole, wherein the contact layer is made of oxide including a different metal or conductivity with that of the source and drain electrodes, to adjust a threshold voltage according to the difference in a work function.
    • 提供一种氧化物薄膜晶体管(TFT)及其制造方法。 制造氧化物薄膜晶体管(TFT)的方法包括:在基板上形成栅电极; 在其上形成有栅电极的基板上形成栅极绝缘层; 在栅极绝缘层上形成由氧化物半导体制成的有源层; 在其上形成有源层的衬底上形成接触层,并形成在接触层上通过接触层与有源层的源极和漏极区域电连接的源极和漏极; 在其上形成有源电极和漏电极的衬底上形成保护层; 通过去除保护层来形成接触孔以露出漏电极; 以及形成通过所述接触孔与所述漏电极电连接的像素电极,其中,所述接触层由与所述源电极和漏电极不同的金属或导电性的氧化物构成,以根据所述漏极电极的差异来调整阈值电压 工作功能。
    • 5. 发明授权
    • Thin film transistor susbtrate including oxide semiconductor
    • 薄膜晶体管包括氧化物半导体
    • US08803144B2
    • 2014-08-12
    • US13333720
    • 2011-12-21
    • Hoon YimDaehwan KimByungkook ChoiSul Lee
    • Hoon YimDaehwan KimByungkook ChoiSul Lee
    • H01L29/786H01L27/12H01L21/16
    • H01L29/786G02F1/13439G02F1/136209H01L21/16H01L27/1225
    • The present disclosure relates to a thin film transistor substrate for flat panel display device including oxide semiconductor. The present disclosure suggests a thin film transistor substrate for flat panel display device comprising: a transparent substrate; a thin film transistor layer having an oxide semiconductor material disposed on the transparent substrate; a passivation layer disposed on the whole surface of the thin film transistor layer; a pixel electrode formed on the passivation layer and contact the thin film transistor layer through a contact hole formed at the passivation layer; and a first ultra violet light absorbing layer disposed on the whole surface of the pixel electrode. Absorbing all of ultra violet light and passing all of the visible light, the photo-thermal characteristic is enhanced and the transparency property is not degraded.
    • 本公开涉及一种用于包括氧化物半导体的平板显示装置的薄膜晶体管基板。 本公开提出了一种用于平板显示装置的薄膜晶体管基板,包括:透明基板; 具有设置在所述透明基板上的氧化物半导体材料的薄膜晶体管层; 设置在所述薄膜晶体管层的整个表面上的钝化层; 形成在所述钝化层上并通过形成在所述钝化层处的接触孔与所述薄膜晶体管层接触的像素电极; 以及设置在像素电极的整个表面上的第一紫外光吸收层。 吸收所有的紫外光并通过所有可见光,光热特性得到提高,透明性不会降低。
    • 6. 发明申请
    • THIN FILM TRANSISTOR SUSBTRATE INCLUDING OXIDE SEMICONDUCTOR
    • 薄膜晶体管,包括氧化物半导体
    • US20120168746A1
    • 2012-07-05
    • US13333720
    • 2011-12-21
    • Hoon YimDaehwan KimByungkook ChoiSul Lee
    • Hoon YimDaehwan KimByungkook ChoiSul Lee
    • H01L29/786
    • H01L29/786G02F1/13439G02F1/136209H01L21/16H01L27/1225
    • The present disclosure relates to a thin film transistor substrate for flat panel display device including oxide semiconductor. The present disclosure suggests a thin film transistor substrate for flat panel display device comprising: a transparent substrate; a thin film transistor layer having an oxide semiconductor material disposed on the transparent substrate; a passivation layer disposed on the whole surface of the thin film transistor layer; a pixel electrode formed on the passivation layer and contact the thin film transistor layer through a contact hole formed at the passivation layer; and a first ultra violet light absorbing layer disposed on the whole surface of the pixel electrode. Absorbing all of ultra violet light and passing all of the visible light, the photo-thermal characteristic is enhanced and the transparency property is not degraded.
    • 本公开涉及一种用于包括氧化物半导体的平板显示装置的薄膜晶体管基板。 本公开提出了一种用于平板显示装置的薄膜晶体管基板,包括:透明基板; 具有设置在所述透明基板上的氧化物半导体材料的薄膜晶体管层; 设置在所述薄膜晶体管层的整个表面上的钝化层; 形成在所述钝化层上并通过形成在所述钝化层处的接触孔与所述薄膜晶体管层接触的像素电极; 以及设置在像素电极的整个表面上的第一紫外光吸收层。 吸收所有的紫外光并通过所有可见光,光热特性得到提高,透明性不会降低。