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    • 2. 发明申请
    • System and Method for Determining Image Focus by Sampling the Image at Multiple Focal Planes Simultaneously
    • 用于通过在多重焦点平面上采样图像来确定图像聚焦的系统和方法
    • US20110228070A1
    • 2011-09-22
    • US12941054
    • 2010-11-06
    • Courosh MehanianYuval Ben-DovAndrew V. Hill
    • Courosh MehanianYuval Ben-DovAndrew V. Hill
    • H04N7/18H04N5/232
    • H04N5/23248
    • A system and method for maintaining focus in an imaging device; the imaging device having an objective lens with an optical axis, a stage for supporting a specimen, and a controller for controlling the stage-to-objective distance; the system comprising: one or more image sensors placed at a plurality of substantially different axial focal positions, and at least one computing device executing computer-readable instructions stored in its memory and configured to acquire images from each of the image sensors; the method comprising: computing a quantitative image characteristic for each of the images acquired by the computing device, computing an axial stage-to-objective distance correction based on the computed quantitative image characteristics and the plurality of axial focal positions, and causing the controller to adjust the axial stage-to-objective distance according to the computed axial stage-to-objective distance correction.
    • 一种用于在成像装置中保持焦点的系统和方法; 所述成像装置具有带有光轴的物镜,用于支撑样本的台,以及用于控制所述阶段对目标距离的控制器; 所述系统包括:放置在多个基本上不同的轴向焦点位置的一个或多个图像传感器,以及执行存储在其存储器中并被配置为从每个图像传感器获取图像的计算机可读指令的至少一个计算设备; 所述方法包括:计算由所述计算设备获取的每个图像的定量图像特征,基于所计算的定量图像特征和所述多个轴向焦点位置计算轴向阶段到目标距离校正,并且使所述控制器 根据计算的轴向阶段到目标的距离校正来调整轴向阶段到目标的距离。
    • 4. 发明授权
    • Detection of process endpoint through monitoring fluctuation of output data
    • 通过监测输出数据的波动来检测过程终点
    • US06745095B1
    • 2004-06-01
    • US09686656
    • 2000-10-04
    • Yuval Ben-DovMoshe SarfatyAlexander Viktorovich Garachtchenko
    • Yuval Ben-DovMoshe SarfatyAlexander Viktorovich Garachtchenko
    • G06F1900
    • H01L22/26
    • Progress of a semiconductor fabrication process is monitored by detecting data output by the process, and then correlating a specific process event to fluctuations in the output data over a time period of 10 milliseconds or less. In one embodiment, endpoint of a plasma chamber cleaning process may be identified by calculating standard deviation of intensity of optical chamber emissions based upon a local time period. The time at which standard deviation of optical emissions attains a steady state indicates endpoint of the cleaning process. Another approach to characterizing fluctuation is to perform a Fast Fourier Transform (FFT) on the output emissions data, and then to plot over time the total power of the emissions over a relevant frequency range. The time at which total power attains a steady state also reveals endpoint of the process. Other techniques for characterizing fluctuation for process monitoring include calculation of the root-mean-square or entropy of an output signal.
    • 通过检测由该过程输出的数据,然后在10毫秒或更短的时间段内将特定的处理事件与输出数据的波动相关联来监视半导体制造过程的进展。 在一个实施例中,可以通过基于本地时间段计算光学室排放的强度的标准偏差来识别等离子体室清洁过程的端点。 光发射的标准偏差达到稳定状态的时间表示清洁过程的终点。 表征波动的另一种方法是对输出发射数据执行快速傅里叶变换(FFT),然后随时间绘制在相关频率范围内的排放总功率。 总功率达到稳定状态的时间也揭示了过程的终点。 用于表征过程监测的波动的其他技术包括计算输出信号的均方根或熵。