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1. 发明授权

US07286207B2 Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration 有权
标题翻译：使用两种不同的光谱波长展现半导体晶片并调整色差
公开(公告)号：US07286207B2
公开(公告)日：2007-10-23
申请号：US11116439
申请日：2005-04-28
申请人： Christoph Nölscher , Andreas Jahnke
发明人： Christoph Nölscher , Andreas Jahnke
IPC分类号： G03B27/68
CPC分类号： G03F7/70575 , G03F7/70241 , G03F7/70333
摘要： A semiconductor wafer is exposed with a pattern from a mask or reticle in an exposure tool. The exposure tool has an adjustable lens system and a light source, which is tunable in wavelength. A first exposure is performed with a tuned first wavelength and a first setting of the lenses. Prior to performing a second exposure onto the same wafer and into the same resist layer, the wavelength of the light source is varied to a second wavelength in order to mimic a focus offset. A resulting image shift at the slit edges of the scanning system due to chromatic aberration is then corrected for by setting the lens system in dependence of the difference between the tuned first and second wavelength. Having tuned second wavelength of the light source and having set the lens system, the second exposure is performed. A continuous adjustment of the lens system based upon a continuously varying light source wavelength can be accomplished.
摘要翻译：半导体晶片在曝光工具中以掩模或掩模版的图案曝光。曝光工具具有可调透镜系统和可调波长的光源。第一曝光是通过调节的第一波长和透镜的第一设置来执行的。在对相同的晶片和相同的抗蚀剂层进行第二次曝光之前，为了模拟聚焦偏移，光源的波长变化到第二波长。然后通过根据调谐的第一和第二波长之间的差设置透镜系统来校正由于色差导致的扫描系统的狭缝边缘处的所得到的图像偏移。调整光源的第二波长并设置透镜系统后，进行第二次曝光。可以实现基于连续变化的光源波长的透镜系统的连续调节。

2. 发明申请

US20090075178A1 Mask with Registration Marks and Method of Fabricating Integrated Circuits 有权
标题翻译：具有注册标记的面具和制造集成电路的方法
公开(公告)号：US20090075178A1
公开(公告)日：2009-03-19
申请号：US11855234
申请日：2007-09-14
申请人： Andreas Jahnke , Ralf Ziebold , Torsten Maehr
发明人： Andreas Jahnke , Ralf Ziebold , Torsten Maehr
IPC分类号： G03F1/00
CPC分类号： G03F9/7076 , G03F1/44
摘要： A photomask for a lithography apparatus includes a chip pattern configured to be transferred into a resist layer on a workpiece and at least one registration mark that is configured not to be transferred into the resist layer. Mask qualification may be improved without impacting wafer level processes.
摘要翻译：用于光刻设备的光掩模包括被配置为转移到工件上的抗蚀剂层中的芯片图案和被配置为不被转移到抗蚀剂层中的至少一个配准标记。可以改善掩模鉴定，而不影响晶片级处理。

3. 发明授权

US4769623A Magnetic device with curved superconducting coil windings 失效
标题翻译：具有弯曲超导线圈绕组的磁性装置
公开(公告)号：US4769623A
公开(公告)日：1988-09-06
申请号：US86973
申请日：1987-08-19
申请人： Helmut Marsing , Konrad Meier , Andreas Jahnke
发明人： Helmut Marsing , Konrad Meier , Andreas Jahnke
IPC分类号： H01F6/00 , H01F6/06 , H05H7/04 , H05H7/06 , H01F7/22
CPC分类号： H05H7/04 , H01F6/06 , H05H7/06
摘要： A magnetic device is arranged in a curved section of the path of electrically charged particles of an acceleration installation around a beam guiding chamber. The magnetic device contains curved coil windings built up of superconducting rectangular conductors, which have convex outsides, concave insides as well as transition regions at the coil ends between these sides. The superconducting coil windings (4a) according to the invention are arranged at least with their winding parts (57, 58) forming the convex outsides (53) and concave insides (54) in grooves of correspondingly formed coil formers of the magnetic device, with the grooves extending downward at least approximately perpendicular to the plane (x-y plane) determined by the particle path. In addition, the superconducting coil windings (4a') in the region of their coil ends (55') are bent up saddle-shaped. With these measures the effect of undesirable conductor motions on the exactitude of the magnetic fields generated by the coil windings can at least largely be excluded.
摘要翻译：磁性装置布置在围绕光束引导室的加速装置的带电粒子的路径的弯曲部分中。磁性装置包含由超导矩形导体构成的弯曲线圈绕组，其具有凸出的外侧，凹陷内部以及在这些侧之间的线圈端的过渡区域。根据本发明的超导线圈绕组（4a）至少布置成它们的绕组部分（57,58）在磁性装置的相应形成的线圈形成器的凹槽中形成凸形外侧（53）和凹入内部（54），凹槽至少大致垂直于由粒子路径确定的平面（xy平面）向下延伸。此外，其线圈端部（55'）的区域中的超导线圈绕组（4a'）弯曲成鞍形。通过这些措施，不利的导体运动对由线圈绕组产生的磁场的精确度的影响可以至少在很大程度上被排除。

4. 发明授权

US4680565A Magnetic field device for a system for the acceleration and/or storage of electrically charged particles 失效
标题翻译：用于加速和/或储存带电粒子的系统的磁场装置
公开(公告)号：US4680565A
公开(公告)日：1987-07-14
申请号：US874495
申请日：1986-06-16
申请人： Andreas Jahnke
发明人： Andreas Jahnke
IPC分类号： H05H13/04 , G21K1/093 , H05H7/04 , H01F7/22
CPC分类号： H05H7/04 , Y10S505/879
摘要： A magnetic field device for a system for acceleration and/or storage of electrically charged particles, particularly electrons, comprises curved sections in the particle trajectory, in which an accordingly curved dipole magnet is arranged, which contains superconducting windings and a supplemental winding and with which a magnetic guidance field for the particle beam can be generated which has a weakly focusing effect due to corresponding field gradients. It should be possible to bring about these field gradients in a relatively simple manner also for a high magnetic flux density. Accordingly, it is provided for this purpose that with each dipole magnet which is at least free of iron, a superconducting supplemental winding is associated which is curved accordingly, adjoins at least with its convex outside the region of the concave inside of the curved dipole windings, and with which the necessary field gradients can be brought about in substance.
摘要翻译：用于加速和/或存储带电粒子，特别是电子的系统的磁场装置包括粒子轨迹中的弯曲部分，其中布置相应弯曲的偶极子磁体，其包含超导绕组和补充绕组可以产生用于粒子束的磁引导场，其由于相应的场梯度而具有弱聚焦效应。对于高磁通密度，应该可以以相对简单的方式实现这些场梯度。因此，为此目的，为了使每个至少不含铁的偶极子磁铁，相关联的超导辅助绕组相应地弯曲，至少与弯曲的偶极子绕组的凹入内部的凸起之外至少凸起，实质上可以带来必要的场梯度。

5. 发明申请

US20130098453A1 METHOD AND DEVICE FOR REFILLING AN EVAPORATOR CHAMBER 审中-公开
标题翻译：用于重新喷射蒸发器室的方法和装置
公开(公告)号：US20130098453A1
公开(公告)日：2013-04-25
申请号：US13576388
申请日：2011-03-23
申请人： Raimund Boger , Andreas Jahnke , Thomas Götze
发明人： Raimund Boger , Andreas Jahnke , Thomas Götze
IPC分类号： F16L53/00
CPC分类号： F17D1/00 , C23C14/246 , C23C14/56 , F16L53/00 , Y10T137/0318 , Y10T137/6416 , Y10T137/86083
摘要： Devices and methods for continuously refilling an evaporator chamber are described. The evaporator chamber includes a vacuum chamber having a partition that is permeable only to liquid material. The solid material can be heated in the vacuum chamber by a heating jacket of the vacuum chamber to liquefaction, and transferred via a drain and a connecting channel into a basin inside an evaporator chamber.
摘要翻译：描述了用于连续重新填充蒸发器室的装置和方法。蒸发器室包括具有只能用于液体材料的隔板的真空室。固体材料可以通过真空室的加热套在真空室中加热以液化，并通过排水管和连接通道转移到蒸发器室内的盆中。

6. 发明申请

US20060290919A1 Method for testing the generation of scattered light by photolithographic imaging devices 审中-公开
标题翻译：通过光刻成像装置测试散射光的产生的方法
公开(公告)号：US20060290919A1
公开(公告)日：2006-12-28
申请号：US11360272
申请日：2006-02-23
申请人： Andreas Jahnke , Patrick Klingbeil , Ralf Ziebold , Lars Voelkel , Alberto Lopez-Gomez , Thomas Marschner
发明人： Andreas Jahnke , Patrick Klingbeil , Ralf Ziebold , Lars Voelkel , Alberto Lopez-Gomez , Thomas Marschner
IPC分类号： G01M11/00
CPC分类号： G03F7/70591 , G03F7/70625
摘要： A method for testing the generation of scattered light by photolithographic imaging devices is disclosed. In one embodiment, measuring structures that are to be imaged in a photoresist are provided in the vicinity of deliberately structured sections that cause scattered light in the imaging device to be tested, in a photomask. The scattered light which is caused as a function of the configuration of the sections acts on the measurement structures in the photoresist and leads to changes in their CD, which is measured in the photoresist, and allows conclusions to be drawn about the scattered-light behavior of the imaging device. The method is suitable for specifically testing the lens system of the imaging device.
摘要翻译：公开了一种通过光刻成像装置测试散射光的产生的方法。在一个实施例中，将在光致抗蚀剂中成像的测量结构设置在光掩模中被测试的导致成像装置中的散射光的故意构造的部分附近。作为这些部分的结构的函数引起的散射光作用在光致抗蚀剂中的测量结构上，并导致其在光致抗蚀剂中测量的CD的变化，并且可以得出关于散射光行为的结论的成像装置。该方法适用于专门测试成像装置的透镜系统。

7. 发明申请

US20060244937A1 Method for exposing a semiconductor wafer 有权
标题翻译：曝光半导体晶片的方法
公开(公告)号：US20060244937A1
公开(公告)日：2006-11-02
申请号：US11116439
申请日：2005-04-28
申请人： Christoph Nolscher , Andreas Jahnke
发明人： Christoph Nolscher , Andreas Jahnke
IPC分类号： G03B27/68
CPC分类号： G03F7/70575 , G03F7/70241 , G03F7/70333
摘要： A semiconductor wafer is exposed with a pattern from a mask or reticle in an exposure tool. The exposure tool has an adjustable lens system and a light source, which is tunable in wavelength. A first exposure is performed with a tuned first wavelength and a first setting of the lenses. Prior to performing a second exposure onto the same wafer and into the same resist layer, the wavelength of the light source is varied to a second wavelength in order to mimic a focus offset. A resulting image shift at the slit edges of the scanning system due to chromatic aberration is then corrected for by setting the lens system in dependence of the difference between the tuned first and second wavelength. Having tuned second wavelength of the light source and having set the lens system, the second exposure is performed. A continuous adjustment of the lens system based upon a continuously varying light source wavelength can be accomplished.
摘要翻译：半导体晶片在曝光工具中以掩模或掩模版的图案曝光。曝光工具具有可调透镜系统和可调波长的光源。第一曝光是通过调节的第一波长和透镜的第一设置来执行的。在对相同的晶片和相同的抗蚀剂层进行第二次曝光之前，为了模拟聚焦偏移，光源的波长变化到第二波长。然后通过根据调谐的第一和第二波长之间的差设置透镜系统来校正由于色差导致的扫描系统的狭缝边缘处的所得到的图像偏移。调整光源的第二波长并设置透镜系统后，进行第二次曝光。可以实现基于连续变化的光源波长的透镜系统的连续调节。

8. 发明授权

US5995586A X-ray generator 失效
标题翻译： X光发生器
公开(公告)号：US5995586A
公开(公告)日：1999-11-30
申请号：US41814
申请日：1998-03-12
申请人： Andreas Jahnke
发明人： Andreas Jahnke
IPC分类号： G21K5/04 , H01J35/00 , H05G2/00 , H01J35/30
CPC分类号： H01J35/00 , H05G2/00
摘要： An x-ray generator has a beam guidance system including an air coil and a toroidal solenoid coil, a ring anode surrounding the patient to be examined and arranged axially offset relative to the beam guidance, and individually driveable electron-optical components couple the electrons, which orbit on a circular specified path in the magnetic dipole field of the air coil, out of that path, deflect them in the axial direction, and focus them onto a segment of the ring anode allocated to the respectively activated out-coupling element.
摘要翻译： X射线发生器具有射束引导系统，其包括空气线圈和环形螺线管线圈，围绕要检查的患者的环形阳极和相对于束引导轴向偏移地布置，以及单独驱动的电子 - 光学部件耦合电子，其在空气线圈的磁偶极子场中的圆形指定路径上轨道，在该路径之外，在轴向方向上偏转它们，并将它们聚焦到分配给分别被激活的外耦合元件的环形阳极的段上。

9. 发明授权

US4710722A Apparatus generating a magnetic field for a particle accelerator 失效
标题翻译：为粒子加速器产生磁场的装置
公开(公告)号：US4710722A
公开(公告)日：1987-12-01
申请号：US833726
申请日：1986-02-26
申请人： Andreas Jahnke
发明人： Andreas Jahnke
IPC分类号： G21K1/093 , H05H7/04 , H05H13/04 , H05H13/10 , H05H7/00 , H05H13/00
CPC分类号： H05H7/04 , G21K1/093
摘要： Magnetic field-generating apparatus for an installation for accelerating electrically charged particles, the particle track of which comprises curved and straight sections, contains main magnetic field generating windings and at least one supplemental winding which is provided for focusing the particles on the particle track. It should be possible to accelerate relatively large particle streams to relatively high energy levels without the need for separate preaccelerators. In the region of at least one of the curved sections of the particle track the supplemental winding is designed as a conductor arrangement forming a quadrupole triplet for focusing the particles during their acceleration phase, the turns of the supplemental winding being arranged on both sides of the plane in which the particle track lies. In particular, a conductor arrangement forming a quadrupole triplet can be provided in both regions of the curved sections of the particle track wherein these conductor arrangements together form a double-telescope system for focusing the particles.
摘要翻译：用于加速带电粒子的装置的磁场产生装置，其粒子轨迹包括弯曲和直的部分，包含主磁场产生绕组和至少一个用于将颗粒聚焦在颗粒轨道上的补充绕组。应该可以将相对较大的颗粒流加速到相对高的能级，而不需要单独的预加速器。在颗粒轨道的至少一个弯曲部分的区域中，补充绕组被设计为形成四极三极管的导体装置，用于在其加速阶段期间聚焦颗粒，辅助绕组的匝被布置在飞机中的粒子轨道所在。特别地，形成四极三线态的导体装置可以在颗粒轨道的弯曲部分的两个区域中提供，其中这些导体装置一起形成用于聚焦颗粒的双望远镜系统。

10. 发明授权

US07939224B2 Mask with registration marks and method of fabricating integrated circuits 有权
标题翻译：具有配准标记的掩模和制造集成电路的方法
公开(公告)号：US07939224B2
公开(公告)日：2011-05-10
申请号：US11855234
申请日：2007-09-14
申请人： Andreas Jahnke , Ralf Ziebold , Torsten Maehr
发明人： Andreas Jahnke , Ralf Ziebold , Torsten Maehr
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F9/7076 , G03F1/44
摘要： A photomask for a lithography apparatus includes a chip pattern configured to be transferred into a resist layer on a workpiece and at least one registration mark that is configured not to be transferred into the resist layer. Mask qualification may be improved without impacting wafer level processes.
摘要翻译：用于光刻设备的光掩模包括被配置为转移到工件上的抗蚀剂层中的芯片图案和被配置为不被转移到抗蚀剂层中的至少一个配准标记。可以改善掩模鉴定，而不影响晶片级处理。

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