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1. 发明申请

US20100084023A1 FLOW CONTROL MODULE FOR A FLUID DELIVERY SYSTEM 审中-公开
标题翻译：流体输送系统的流量控制模块
公开(公告)号：US20100084023A1
公开(公告)日：2010-04-08
申请号：US12247013
申请日：2008-10-07
申请人： Chris Melcer , Thuy Britcher , Avi Tepman , Simon Y. Yavelberg , Sheshraj L. Tulshibagwale
发明人： Chris Melcer , Thuy Britcher , Avi Tepman , Simon Y. Yavelberg , Sheshraj L. Tulshibagwale
IPC分类号： F16K11/00
CPC分类号： H01L21/67219 , B24B37/04 , B24B57/02 , H01L21/67017 , Y10T137/0396 , Y10T137/877
摘要： Embodiments described herein provide an application for delivery of fluids within substrate processing systems. More particularly, embodiments described herein provide applications for delivery of processing chemicals within substrate processing systems. In one embodiment, a fluid delivery system is provided. The fluid delivery system comprises a bulk fluid source for supplying fluids, a fluid delivery module for controlling and monitoring a ratio of fluids flowing from the bulk fluid source, a first stream line positioned downstream from the fluid delivery module, a first switch positioned along the first stream line, a second stream line positioned downstream from the fluid delivery module, and a second switch positioned along the second stream line, wherein the fluid delivery module splits the fluids from the bulk fluid source into two streams flowing through the first stream line and the second stream line according to a pre-defined ratio.
摘要翻译：本文所述的实施例提供了在衬底处理系统内输送流体的应用。更具体地，本文描述的实施例提供了在衬底处理系统内递送处理化学品的应用。在一个实施例中，提供流体输送系统。流体输送系统包括用于供应流体的体液源，流体输送模块，用于控制和监测从大量流体源流出的流体的比例，位于流体输送模块下游的第一流线，沿着流体输送模块定位的第一开关第一流线，位于流体输送模块下游的第二流线和沿着第二流线定位的第二开关，其中流体输送模块将流体从本体流体源分流成流过第一流线的两股流，第二条流线根据预定义的比例。

2. 发明授权

US07437944B2 Method and apparatus for pressure and mix ratio control 有权
标题翻译：压力和混合比控制的方法和装置
公开(公告)号：US07437944B2
公开(公告)日：2008-10-21
申请号：US11684888
申请日：2007-03-12
申请人： Chris Melcer , John Lane
发明人： Chris Melcer , John Lane
IPC分类号： G01F1/00
CPC分类号： G01F15/043 , G05D11/132 , G05D16/2046
摘要： The present invention provides apparatus and method for controlling mix ratio of gas supplied to a processing chamber integrated with chamber pressure. In one embodiment, an integrated controller is used to adjust mix ratio and chamber pressure. In one embodiment, the mix ratio and chamber pressure may be adjusted using a flow sensor and a control valve disposed in each gas supply line. In one embodiment, the flow sensor used in each gas supply line is insensitive to upstream pressure perturbations.
摘要翻译：本发明提供了用于控制供应到与腔室压力一体化的处理室的气体混合比的装置和方法。在一个实施例中，使用集成控制器来调节混合比和室压力。在一个实施例中，可以使用设置在每个气体供应管线中的流量传感器和控制阀来调节混合比和室压力。在一个实施例中，在每个气体供应管线中使用的流量传感器对上游压力扰动不敏感。

3. 发明申请

US20070226973A1 Diffusion bonded fluid flow manifold with partially integrated inter-active component 失效
标题翻译：具有部分集成的相互作用部件的扩散粘合流体流动歧管
公开(公告)号：US20070226973A1
公开(公告)日：2007-10-04
申请号：US11788428
申请日：2007-04-19
申请人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
发明人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
IPC分类号： B23K20/00 , H01L21/00
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The fluid delivery system includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译：一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。流体输送系统包括集成的流体流动网络结构，除了含有流体流动通道的分层基底之外，还可以包括各种流体处理和监测部件。分层基板是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。

4. 发明申请

US20070200082A1 Manufacture of an integrated fluid delivery system for semiconductor processing apparatus 失效
标题翻译：一种用于半导体处理装置的集成流体输送系统的制造
公开(公告)号：US20070200082A1
公开(公告)日：2007-08-30
申请号：US11788427
申请日：2007-04-20
申请人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
发明人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
IPC分类号： F16K21/00
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： The disclosure pertains to a space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The present invention also pertains to an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译：本公开涉及一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。本发明还涉及一种集成流体流网络结构，除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。分层基板是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。

5. 发明授权

US07204155B2 Method and apparatus for pressure control and flow measurement 有权
标题翻译：用于压力控制和流量测量的方法和装置
公开(公告)号：US07204155B2
公开(公告)日：2007-04-17
申请号：US11475805
申请日：2006-06-27
申请人： John Lane , Ralph H. M. Straube , Chris Melcer
发明人： John Lane , Ralph H. M. Straube , Chris Melcer
IPC分类号： G01F1/00
CPC分类号： H01J37/32449 , C23C16/45557 , C23C16/466 , H01J37/3244
摘要： A method and apparatus for gas control is provided. The apparatus may be used for controlling gases delivered to a chamber, controlling the chamber pressure, controlling the delivery of backside gas between a substrate and substrate support and the like. In one embodiment, an apparatus for controlling gas control includes at least a first flow sensor having a control valve, a first pressure sensor and at least a second pressure sensor. An inlet of the first flow sensor is adapted for coupling to a gas supply. A control valve is coupled to an outlet of the flow sensor. The first pressure sensor is adapted to sense a metric indicative of the pressure upstream of the first flow sensor. The second pressure sensor is adapted to sense a metric indicative of the pressure downstream of the control valve.
摘要翻译：提供了一种用于气体控制的方法和装置。该装置可以用于控制输送到室的气体，控制室压力，控制衬底和衬底支撑件之间的背面气体的传送等。在一个实施例中，用于控制气体控制的装置包括至少第一流量传感器，其具有控制阀，第一压力传感器和至少第二压力传感器。第一流量传感器的入口适于联接到气体供应。控制阀联接到流量传感器的出口。第一压力传感器适于感测指示第一流量传感器上游的压力的度量。第二压力传感器适于感测指示控制阀下游的压力的量度。

6. 发明申请

US20070051080A1 In-line filter in a diffusion bonded layered substrate 失效
标题翻译：扩散接合层叠基板中的在线滤波器
公开(公告)号：US20070051080A1
公开(公告)日：2007-03-08
申请号：US11542829
申请日：2006-10-03
申请人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
发明人： Mark Crockett , John Lane , Michael DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe Mohammed
IPC分类号： B01D50/00
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention pertains to a diffusion bonded integrated fluid flow network architecture, which includes, in addition to a layered substrate containing fluid flow channels, an in-line filter and may include various fluid handling and monitoring components. The integrated fluid delivery system that is formed from a layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
摘要翻译：一种节省空间的集成流体输送系统，其特别适用于半导体加工设备中的气体分配。本发明涉及一种扩散结合的集成流体流动网络结构，其包括除含有流体流动通道的层状基底之外的在线过滤器，并且可以包括各种流体处理和监测部件。由分层基板形成的集成流体输送系统是扩散接合的，并且根据设计和材料要求，各种流体处理和监测部件可以部分地集成或完全集成到基板中。

7. 发明授权

US07850786B2 Method of improving corrosion resistance of stainless steel surfaces by a process of passivation 有权
标题翻译：通过钝化工艺提高不锈钢表面的耐腐蚀性的方法
公开(公告)号：US07850786B2
公开(公告)日：2010-12-14
申请号：US11582748
申请日：2006-10-17
申请人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
发明人： Mark Crockett , John W. Lane , Micahel DeChellis , Chris Melcer , Erica Porras , Aneesh Khullar , Balarabe N. Mohammed
IPC分类号： C23G1/00 , C23G1/08 , C23G1/14 , C23G1/19 , B08B3/08 , B08B3/10
CPC分类号： F16K27/003 , C22C19/055 , C22C19/07 , C22C38/001 , C22C38/02 , C22C38/04 , C22C38/44 , C22C38/58 , F15C5/00 , F16K99/0001 , Y10T29/41 , Y10T29/49144 , Y10T29/49405 , Y10T29/49425 , Y10T29/49906
摘要： Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.
摘要翻译：描述了对于半导体加工设备中的气体分布特别有用的节省空间的集成流体输送系统。该系统包括集成流体流网络结构，并且除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。层状衬底是扩散接合的。在扩散接合之后，可以使用一系列设计成将更多的铬带到钢的表面的步骤，可以有利地处理不锈钢扩散接合部分以增强耐腐蚀性。

8. 发明申请

US20070204702A1 METHOD AND APPARATUS FOR PRESSURE AND MIX RATIO CONTROL 有权
标题翻译：压力和混合比控制的方法和装置
公开(公告)号：US20070204702A1
公开(公告)日：2007-09-06
申请号：US11684888
申请日：2007-03-12
申请人： Chris Melcer , John Lane
发明人： Chris Melcer , John Lane
IPC分类号： G01F1/00
CPC分类号： G01F15/043 , G05D11/132 , G05D16/2046
摘要： The present invention provides apparatus and method for controlling mix ratio of gas supplied to a processing chamber integrated with chamber pressure. In one embodiment, an integrated controller is used to adjust mix ratio and chamber pressure. In one embodiment, the mix ratio and chamber pressure may be adjusted using a flow sensor and a control valve disposed in each gas supply line. In one embodiment, the flow sensor used in each gas supply line is insensitive to upstream pressure perturbations.
摘要翻译：本发明提供了用于控制供应到与腔室压力一体化的处理室的气体混合比的装置和方法。在一个实施例中，使用集成控制器来调节混合比和室压力。在一个实施例中，可以使用设置在每个气体供应管线中的流量传感器和控制阀来调节混合比和室压力。在一个实施例中，在每个气体供应管线中使用的流量传感器对上游压力扰动不敏感。

9. 发明申请

US20060243060A1 Method and apparatus for pressure control and flow measurement 有权
标题翻译：用于压力控制和流量测量的方法和装置
公开(公告)号：US20060243060A1
公开(公告)日：2006-11-02
申请号：US11475805
申请日：2006-06-27
申请人： John Lane , Ralph Straube , Chris Melcer
发明人： John Lane , Ralph Straube , Chris Melcer
IPC分类号： G01F1/00
CPC分类号： H01J37/32449 , C23C16/45557 , C23C16/466 , H01J37/3244
摘要： A method and apparatus for gas control is provided. The apparatus may be used for controlling gases delivered to a chamber, controlling the chamber pressure, controlling the delivery of backside gas between a substrate and substrate support and the like. In one embodiment, an apparatus for controlling gas control includes at least a first flow sensor having a control valve, a first pressure sensor and at least a second pressure sensor. An inlet of the first flow sensor is adapted for coupling to a gas supply. A control valve is coupled to an outlet of the flow sensor. The first pressure sensor is adapted to sense a metric indicative of the pressure upstream of the first flow sensor. The second pressure sensor is adapted to sense a metric indicative of the pressure downstream of the control valve.
摘要翻译：提供了一种用于气体控制的方法和装置。该装置可以用于控制输送到室的气体，控制室压力，控制衬底和衬底支撑件之间的背面气体的传送等。在一个实施例中，用于控制气体控制的装置包括至少第一流量传感器，其具有控制阀，第一压力传感器和至少第二压力传感器。第一流量传感器的入口适于联接到气体供应。控制阀联接到流量传感器的出口。第一压力传感器适于感测指示第一流量传感器上游的压力的度量。第二压力传感器适于感测指示控制阀下游的压力的量度。

10. 发明授权

US07089134B2 Method and apparatus for analyzing gas flow in a gas panel 有权
标题翻译：用于分析气体面板中气体流量的方法和装置
公开(公告)号：US07089134B2
公开(公告)日：2006-08-08
申请号：US10346515
申请日：2003-01-17
申请人： Philip R. Barros , Raul A. Martin , Russell T. Norman , Chris Melcer
发明人： Philip R. Barros , Raul A. Martin , Russell T. Norman , Chris Melcer
IPC分类号： G01F1/00 , G01F7/00
CPC分类号： G01F15/04 , G05B21/02
摘要： One embodiment of the present invention is a method for analyzing gas flow in a gas transmission unit of a gas panel that includes: (a) monitoring a measure of gas flow output from a mass flow controller included in the gas transmission unit; (b) monitoring a measure of gas pressure output from a pressure regulator included in the gas transmission unit; and (c) analyzing the measure of gas flow and the measure of gas pressure to determine whether gas flow is stable in the gas transmission unit.
摘要翻译：本发明的一个实施例是一种用于分析气体面板的气体传输单元中的气体流量的方法，包括：（a）监测从包括在气体传输单元中的质量流量控制器输出的气体流量的量度; （b）监测从包括在气体传输单元中的压力调节器输出的气体压力的量度; 和（c）分析气体流量的测量和气体压力的测量，以确定气体传输单元中气体流量是否稳定。

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