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    • 1. 发明授权
    • Method and apparatus for pressure control and flow measurement
    • 用于压力控制和流量测量的方法和装置
    • US07204155B2
    • 2007-04-17
    • US11475805
    • 2006-06-27
    • John LaneRalph H. M. StraubeChris Melcer
    • John LaneRalph H. M. StraubeChris Melcer
    • G01F1/00
    • H01J37/32449C23C16/45557C23C16/466H01J37/3244
    • A method and apparatus for gas control is provided. The apparatus may be used for controlling gases delivered to a chamber, controlling the chamber pressure, controlling the delivery of backside gas between a substrate and substrate support and the like. In one embodiment, an apparatus for controlling gas control includes at least a first flow sensor having a control valve, a first pressure sensor and at least a second pressure sensor. An inlet of the first flow sensor is adapted for coupling to a gas supply. A control valve is coupled to an outlet of the flow sensor. The first pressure sensor is adapted to sense a metric indicative of the pressure upstream of the first flow sensor. The second pressure sensor is adapted to sense a metric indicative of the pressure downstream of the control valve.
    • 提供了一种用于气体控制的方法和装置。 该装置可以用于控制输送到室的气体,控制室压力,控制衬底和衬底支撑件之间的背面气体的传送等。 在一个实施例中,用于控制气体控制的装置包括至少第一流量传感器,其具有控制阀,第一压力传感器和至少第二压力传感器。 第一流量传感器的入口适于联接到气体供应。 控制阀联接到流量传感器的出口。 第一压力传感器适于感测指示第一流量传感器上游的压力的度量。 第二压力传感器适于感测指示控制阀下游的压力的量度。