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1. 发明申请

US20090320875A1 DUAL CHAMBER MEGASONIC CLEANER 审中-公开
标题翻译：双室MEGASONIC CLEANER
公开(公告)号：US20090320875A1
公开(公告)日：2009-12-31
申请号：US12490114
申请日：2009-06-23
申请人： RICARDO MARTINEZ , Allen L. D'Ambra , Adrian Blank , Thuy Britcher , Hui Chen
发明人： RICARDO MARTINEZ , Allen L. D'Ambra , Adrian Blank , Thuy Britcher , Hui Chen
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , H01L21/67051
摘要： Embodiments described herein relate to semiconductor device manufacturing, and more particularly to a vertically oriented dual megasonic module for simultaneously cleaning multiple substrates. In one embodiment, an apparatus for cleaning multiple substrates is provided. The apparatus comprises an outer tank for collecting overflow processing fluid comprising at least one sidewall and a bottom. A first inner module adapted to contain a processing fluid is positioned partially within the outer tank. The first inner module comprises one or more roller assemblies to hold a substrate in a substantially vertical orientation. A second inner module adapted to contain a processing fluid is positioned partially within the outer tank. The second inner module comprises one or more roller assemblies adapted to hold a substrate in a substantially vertical orientation. Each inner module contains a transducer adapted to direct vibrational energy through the processing fluid toward the substrates.
摘要翻译：本文所述的实施例涉及半导体器件制造，更具体地，涉及用于同时清洁多个基板的垂直取向的双兆赫模块。在一个实施例中，提供了一种用于清洁多个基板的装置。该装置包括用于收集包括至少一个侧壁和底部的溢流处理流体的外槽。适于容纳处理流体的第一内部模块部分地位于外部容器内。第一内部模块包括一个或多个辊组件以将基板保持在基本垂直的方向。适于容纳处理流体的第二内部模块部分地位于外部罐中。第二内部模块包括适于将基板保持在基本垂直取向的一个或多个辊组件。每个内部模块包含适于将振动能量通过处理流体引向基板的换能器。

2. 发明申请

US20100084023A1 FLOW CONTROL MODULE FOR A FLUID DELIVERY SYSTEM 审中-公开
标题翻译：流体输送系统的流量控制模块
公开(公告)号：US20100084023A1
公开(公告)日：2010-04-08
申请号：US12247013
申请日：2008-10-07
申请人： Chris Melcer , Thuy Britcher , Avi Tepman , Simon Y. Yavelberg , Sheshraj L. Tulshibagwale
发明人： Chris Melcer , Thuy Britcher , Avi Tepman , Simon Y. Yavelberg , Sheshraj L. Tulshibagwale
IPC分类号： F16K11/00
CPC分类号： H01L21/67219 , B24B37/04 , B24B57/02 , H01L21/67017 , Y10T137/0396 , Y10T137/877
摘要： Embodiments described herein provide an application for delivery of fluids within substrate processing systems. More particularly, embodiments described herein provide applications for delivery of processing chemicals within substrate processing systems. In one embodiment, a fluid delivery system is provided. The fluid delivery system comprises a bulk fluid source for supplying fluids, a fluid delivery module for controlling and monitoring a ratio of fluids flowing from the bulk fluid source, a first stream line positioned downstream from the fluid delivery module, a first switch positioned along the first stream line, a second stream line positioned downstream from the fluid delivery module, and a second switch positioned along the second stream line, wherein the fluid delivery module splits the fluids from the bulk fluid source into two streams flowing through the first stream line and the second stream line according to a pre-defined ratio.
摘要翻译：本文所述的实施例提供了在衬底处理系统内输送流体的应用。更具体地，本文描述的实施例提供了在衬底处理系统内递送处理化学品的应用。在一个实施例中，提供流体输送系统。流体输送系统包括用于供应流体的体液源，流体输送模块，用于控制和监测从大量流体源流出的流体的比例，位于流体输送模块下游的第一流线，沿着流体输送模块定位的第一开关第一流线，位于流体输送模块下游的第二流线和沿着第二流线定位的第二开关，其中流体输送模块将流体从本体流体源分流成流过第一流线的两股流，第二条流线根据预定义的比例。

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