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    • 5. 发明申请
    • CIRCUIT SUBSTRATE AND METHOD OF MANUFACTURING SAME
    • 电路基板及其制造方法
    • US20150201489A1
    • 2015-07-16
    • US14151828
    • 2014-01-10
    • Chee Seng FoongLan Chu Tan
    • Chee Seng FoongLan Chu Tan
    • H05K1/02H05K3/46H05K3/00H05K1/11
    • H05K3/007H05K1/097H05K2203/107
    • A circuit interconnecting substrate manufacturing method includes depositing a first layer of metallic powder on top of a carrier, and then forming a first layer of electrically conductive traces from the first layer of metallic powder. A second layer of metallic powder is then deposited onto at least one region of the first layer of electrically conductive traces. Then a second layer of electrically conductive traces is formed from the second layer of metallic powder and each trace of the second layer is electrically coupled to a trace of the first layer. An insulating material is deposited onto the carrier to provide an insulating substrate that supports the traces. The method does not require the use of any wet chemicals or chemical etching steps.
    • 电路互连衬底制造方法包括在载体的顶部上沉积第一层金属粉末,然后从第一层金属粉末形成第一层导电迹线。 然后将第二层金属粉末沉积到第一层导电迹线的至少一个区域上。 然后从第二层金属粉末形成第二层导电迹线,并且第二层的每个迹线电耦合到第一层的迹线。 将绝缘材料沉积到载体上以提供支撑迹线的绝缘基板。 该方法不需要使用任何湿化学品或化学蚀刻步骤。
    • 8. 发明授权
    • Circuit substrate and method of manufacturing same
    • 电路基板及其制造方法
    • US09474162B2
    • 2016-10-18
    • US14151828
    • 2014-01-10
    • Chee Seng FoongLan Chu Tan
    • Chee Seng FoongLan Chu Tan
    • H01L21/00H05K3/00H05K1/09
    • H05K3/007H05K1/097H05K2203/107
    • A circuit interconnecting substrate manufacturing method includes depositing a first layer of metallic powder on top of a carrier, and then forming a first layer of electrically conductive traces from the first layer of metallic powder. A second layer of metallic powder is then deposited onto at least one region of the first layer of electrically conductive traces. Then a second layer of electrically conductive traces is formed from the second layer of metallic powder and each trace of the second layer is electrically coupled to a trace of the first layer. An insulating material is deposited onto the carrier to provide an insulating substrate that supports the traces. The method does not require the use of any wet chemicals or chemical etching steps.
    • 电路互连衬底制造方法包括在载体的顶部上沉积第一层金属粉末,然后从第一层金属粉末形成第一层导电迹线。 然后将第二层金属粉末沉积到第一层导电迹线的至少一个区域上。 然后从第二层金属粉末形成第二层导电迹线,并且第二层的每个迹线电耦合到第一层的迹线。 将绝缘材料沉积到载体上以提供支撑迹线的绝缘基板。 该方法不需要使用任何湿化学品或化学蚀刻步骤。