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1. 发明授权

US07459614B2 Method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule thereon and method for stimulating the crystallization of biomolecules 有权
标题翻译：用于产生用于刺激生物分子的结晶的人造图案化基底的方法及其刺激生物分子结晶的方法
公开(公告)号：US07459614B2
公开(公告)日：2008-12-02
申请号：US10916472
申请日：2004-08-12
申请人： Celestino Padeste , Christian Kambach , Jens Grobrecht , Harun Solak
发明人： Celestino Padeste , Christian Kambach , Jens Grobrecht , Harun Solak
IPC分类号： C30B7/00 , C30B19/00 , G02B27/00
CPC分类号： G03F7/00 , C07K1/306 , C30B7/00 , C30B29/58 , Y10S977/888
摘要： It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystal growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available.
摘要翻译：本发明的目的是提供一种用于刺激液体溶液中包含的生物分子的结晶的技术，其导致晶体生长过程的可靠性的显着改善，并缩短了生长某些生物分子的时间和次数晶体，也是在只有非常少量的生物分子可用的条件下。

2. 发明申请

US20070111256A1 Method for generating an artificially patterned substrate for stimulating the crystallation of a biomolecule thereon and method for stimulating the crystallization of biomolecules 有权
标题翻译：用于产生用于刺激生物分子的结晶的人造图案化基底的方法及其刺激生物分子结晶的方法
公开(公告)号：US20070111256A1
公开(公告)日：2007-05-17
申请号：US10916472
申请日：2004-08-12
申请人： Jens Grobrecht , Harun Solak , Celestino Padeste , Christian Kambach
发明人： Jens Grobrecht , Harun Solak , Celestino Padeste , Christian Kambach
IPC分类号： G01N33/53 , G01N33/552 , H01L21/00
CPC分类号： G03F7/00 , C07K1/306 , C30B7/00 , C30B29/58 , Y10S977/888
摘要： It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystall growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available.
摘要翻译：本发明的目的是提供一种用于刺激液体溶液中包含的生物分子的结晶的技术，其导致结晶生长过程的可靠性的显着改善，并缩短了生长某些生物分子的时间和次数晶体，也是在只有非常少量的生物分子可用的条件下。

3. 发明申请

US20060234062A1 Method for grafting a chemical compound to a support substrate 审中-公开
标题翻译：将化学化合物接枝到支撑基底上的方法
公开(公告)号：US20060234062A1
公开(公告)日：2006-10-19
申请号：US10563112
申请日：2004-06-12
申请人： Hans-Peter Brack , Celestino Padeste , Michal Slaski , Harun Solak
发明人： Hans-Peter Brack , Celestino Padeste , Michal Slaski , Harun Solak
IPC分类号： B05D3/00 , G11B5/64 , C23C16/00 , B32B27/00 , B32B27/30
CPC分类号： C08J7/18 , Y10T428/24355 , Y10T428/3154 , Y10T428/31544 , Y10T428/31855 , Y10T428/31935 , Y10T428/31938
摘要： According to the present invention a method for grafting a chemical compound to a predetermined region of a support substrate (4) is disclosed, comprising: a) irradiating selectively the support substrate with electromagnetic radiation and/or particle radiation in order to both define said predetermined region and to form at least one reactive functional group or a precursor thereof in said predetermined region of the support substrate; b) exposing the irradiated support substrate to said chemical compound or to a precursor thereof. Therefore, only these very few steps are needed to effectively grafting the desired chemical compound, such as an organic compound, to the predetermined regions of the support substrate. Moreover, the irradiation step can be carried out in a vastly flexible manner and allows to generate numerous distinct shapes of the predetermined regions. Further, micro- or nano-scale regions in the support substrate capable of forming reactive functional groups or precursors thereof upon exposure to particle or electromagnetic irradiation can be easily achieved.
摘要翻译：根据本发明，公开了一种用于将化学化合物接枝到支撑衬底（4）的预定区域的方法，包括：a）用电磁辐射和/或粒子辐射选择性地照射支撑衬底，以便将所述预定的并且在所述支撑衬底的所述预定区域中形成至少一个反应性官能团或其前体; b）将照射的支撑基底暴露于所述化合物或其前体。因此，为了有效地将期望的化合物（例如有机化合物）接枝到支撑基底的预定区域，仅需要这几个步骤。此外，照射步骤可以以非常灵活的方式进行，并且允许产生许多不同形状的预定区域。此外，可以容易地实现能够在暴露于粒子或电磁辐射时能够形成反应性官能团或其前体的支持基底中的微尺度或纳米级区域。

4. 发明授权

US07858268B2 Method for generating a circular periodic structure on a basic support material 有权
标题翻译：在基本支撑材料上产生圆周期结构的方法
公开(公告)号：US07858268B2
公开(公告)日：2010-12-28
申请号：US10540754
申请日：2005-06-24
申请人： Christian David , Harun Solak
发明人： Christian David , Harun Solak
IPC分类号： G03F1/00 , G03C5/00 , G02B5/18
CPC分类号： G03F7/70283 , G03F7/70341 , G03F7/7035 , G03F7/70408 , G03F7/70466
摘要： The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.
摘要翻译：本发明涉及一种用于在诸如用于磁存储装置的磁头单元的基础层的基本支撑材料中产生周期性弯曲结构的方法。该方法包括以下步骤：产生多个衍射掩模，使得每个掩模包括至少一个透射衍射光栅，其具有不同的周期性同心圆形图案，螺旋状周期性图案和周期性径向辐条图案中的至少一个; 将至少一个衍射掩模同时或连续地定位在待图案化的基础支撑材料的一定距离内，该距离取决于掩模; 通过将光束引导通过每个衍射掩模来暴露基本支撑材料; 并且在每个掩模上干扰由光栅衍射的不同光束，以便在基本支撑材料的表面上产生一致的光强度图案。

5. 发明申请

US20060098566A1 Method for generating a circular periodic structure on a basic support material 有权
标题翻译：在基本支撑材料上产生圆周期结构的方法
公开(公告)号：US20060098566A1
公开(公告)日：2006-05-11
申请号：US10540754
申请日：2003-09-15
申请人： Christian David , Harun Solak
发明人： Christian David , Harun Solak
IPC分类号： G11B3/70
CPC分类号： G03F7/70283 , G03F7/70341 , G03F7/7035 , G03F7/70408 , G03F7/70466
摘要： The present invention is directed to a method for the generation of periodic curved structures in a basic support material such as the basic layer for the magnetic bit cells of a magnetic storage device. The method includes the steps of generating a number of diffraction masks such that each mask comprises at least one transmission diffraction gratings having at least one of a different periodic concentric circular pattern, spiral-like periodic pattern and periodic radial spoke pattern; positioning at least one of the diffraction masks simultaneously or successively in a certain distance of the basic support material to be patterned, the distance being mask dependent; exposing the basic support material by directing light beams through each of the diffraction masks; and interfering the different light beams diffracted by the gratings on each mask in order to generate coincident light intensity patterns on the surface of the basic support material.
摘要翻译：本发明涉及一种用于在诸如用于磁存储装置的磁头单元的基础层的基本支撑材料中产生周期性弯曲结构的方法。该方法包括以下步骤：产生多个衍射掩模，使得每个掩模包括至少一个透射衍射光栅，其具有不同的周期性同心圆形图案，螺旋状周期性图案和周期性径向辐条图案中的至少一个; 将至少一个衍射掩模同时或连续地定位在待图案化的基础支撑材料的一定距离内，该距离取决于掩模; 通过将光束引导通过每个衍射掩模来暴露基本支撑材料; 并且在每个掩模上干扰由光栅衍射的不同光束，以便在基本支撑材料的表面上产生一致的光强度图案。

6. 发明授权

US09182672B2 System and method for production of nanostructures over large areas 有权
标题翻译：在大面积生产纳米结构的系统和方法
公开(公告)号：US09182672B2
公开(公告)日：2015-11-10
申请号：US13997335
申请日：2011-12-20
申请人： Harun Solak , Francis Clube
发明人： Harun Solak , Francis Clube
IPC分类号： G03F7/20
CPC分类号： G03F7/201 , G03F7/70408
摘要： A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.
摘要翻译：一种方法和装置将周期特征的图案打印到感光层中。所述方法包括以下步骤：提供承载该层的衬底，提供掩模，布置衬底，使得掩模在与其垂直的第一平面中相对于衬底具有倾斜角，并提供用于照亮掩模图案的准直光以产生由Talbot距离分开的Talbot平面之间的横向强度分布范围组成的透射光场，使得透射的光场在第一平面中具有强度包络。在平行于第一平面的方向和衬底上相对于掩模移动衬底的情况下，用光照亮面罩。倾斜角度和强度包络被布置成使得该层暴露于横向强度分布范围的平均值。

7. 发明申请

US20220155691A1 METHOD AND APPARATUS FOR PRINTING A PERIODIC PATTERN WITH A VARYING DUTY CYCLE 有权
公开(公告)号：US20220155691A1
公开(公告)日：2022-05-19
申请号：US17598409
申请日：2020-03-27
申请人： Francis Clube , Andreas Amrein , Maxime Lebugle , Harun Solak , Li Wang
发明人： Francis Clube , Andreas Amrein , Maxime Lebugle , Harun Solak , Li Wang
IPC分类号： G03F7/20 , G03F1/70 , G02B5/18
摘要： A method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist includes: providing a first mask bearing a high-resolution grating of linear features, arranging the first mask at a first distance from a substrate, providing a second mask bearing a variable-transmission grating of opaque and transparent linear features that has a designed spatial variation of duty cycle, arranging the second mask at a distance before the first mask such that the linear features of the variable-transmission grating are orthogonal to the linear features of the high-resolution grating, illuminating the second mask while varying the first distance according to displacement Talbot lithography and also displacing the second mask at an angle to its linear features such that there is substantially no component of modulation with the period of the variable-transmission grating in the energy density distribution that exposes the photoresist.

8. 发明申请

US20130323651A1 SYSTEM AND METHOD FOR PRODUCTION OF NANOSTRUCTURES OVER LARGE AREAS 有权
标题翻译：用于生产大面积纳米结构的系统和方法
公开(公告)号：US20130323651A1
公开(公告)日：2013-12-05
申请号：US13997335
申请日：2011-12-20
申请人： Harun Solak , Francis Clube
发明人： Harun Solak , Francis Clube
IPC分类号： G03F7/20
CPC分类号： G03F7/201 , G03F7/70408
摘要： A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.
摘要翻译：一种方法和装置将周期特征的图案打印到感光层中。所述方法包括以下步骤：提供承载该层的衬底，提供掩模，布置衬底，使得掩模在与其垂直的第一平面中相对于衬底具有倾斜角，并提供用于照亮掩模图案的准直光以产生由Talbot距离分开的Talbot平面之间的横向强度分布范围组成的透射光场，使得透射的光场在第一平面中具有强度包络。在平行于第一平面的方向和衬底上相对于掩模移动衬底的情况下，用光照亮面罩。倾斜角度和强度包络被布置成使得该层暴露于横向强度分布范围的平均值。

9. 发明授权

US08617775B2 Optimized mask design for fabricating periodic and quasi-periodic patterns 有权
标题翻译：用于制造周期性和准周期性图案的优化掩模设计
公开(公告)号：US08617775B2
公开(公告)日：2013-12-31
申请号：US13509642
申请日：2010-09-14
申请人： Harun Solak
发明人： Harun Solak
IPC分类号： G03F7/20 , G03F1/00 , G03F1/26
CPC分类号： G03F1/70 , G03F1/26 , G03F1/36 , G03F7/20 , G03F7/2041 , G03F7/70325 , G03F7/7035 , G03F7/70408
摘要： A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.
摘要翻译：一种用于将点特征的期望的周期性或准周期性图案印刷到设置在基板上的感光层中的方法，包括以下步骤：设计具有每个具有环形特征的单位单元的周期性或准周期性阵列的掩模图案，形成具有所述掩模图案的掩模，将掩模基本上平行于感光层布置，根据消色差的Talbot光刻和位移Talbot光刻的方法之一，将光敏层从掩模布置并照射掩模，由此照射通过该掩模将感光层暴露于打印所需图案的积分强度分布。

10. 发明申请

US20130095418A1 OPTIMIZED MASK DESIGN FOR FABRICATING PERIODIC AND QUASI-PERIODIC PATTERNS 有权
标题翻译：用于制作周期性和周期性图案的优化面膜设计
公开(公告)号：US20130095418A1
公开(公告)日：2013-04-18
申请号：US13509642
申请日：2010-09-14
申请人： Harun Solak
发明人： Harun Solak
IPC分类号： G03F1/70 , G03F7/20
CPC分类号： G03F1/70 , G03F1/26 , G03F1/36 , G03F7/20 , G03F7/2041 , G03F7/70325 , G03F7/7035 , G03F7/70408
摘要： A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.
摘要翻译：一种用于将点特征的期望的周期性或准周期性图案印刷到设置在基板上的感光层中的方法，包括以下步骤：设计具有每个具有环形特征的单位单元的周期性或准周期性阵列的掩模图案，形成具有所述掩模图案的掩模，将掩模基本上平行于感光层布置，根据消色差的Talbot光刻和位移Talbot光刻的方法之一，将光敏层从掩模布置并照射掩模，由此照射通过该掩模将感光层暴露于打印所需图案的积分强度分布。

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