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1. 发明申请

US20060017386A1 Apparatus and methods for a fixed impedance transformation network for use in connection with a plasma chamber 有权
公开(公告)号：US20060017386A1
公开(公告)日：2006-01-26
申请号：US11179036
申请日：2005-07-11
申请人： Carl Sorensen , John White , Suhail Anwar
发明人： Carl Sorensen , John White , Suhail Anwar
IPC分类号： H01J7/24
CPC分类号： H01J37/32082 , H01J37/32183
摘要： In certain embodiments, an apparatus for providing a fixed impedance transformation network for driving a plasma chamber includes a pre-match network adapted to couple between an Active RF match network and a plasma chamber load associated with the plasma chamber. The pre-match network includes (1) a first capacitive element; (2) an inductive element connected in parallel with the first capacitive element to form a parallel circuit that presents a stepped-up impedance to an output of the Active RF match network such that a voltage required to drive the plasma chamber load is reduced; and (3) a second capacitive element coupled to the parallel circuit and adapted to couple to the plasma chamber load. The second capacitive element reduces or cancels at least in part a reactance corresponding to an inductance associated with the plasma chamber load. Numerous other aspects are provided.

2. 发明申请

US20060027327A1 Apparatus and methods for a low inductance plasma chamber 审中-公开
标题翻译：低电感等离子体室的装置和方法
公开(公告)号：US20060027327A1
公开(公告)日：2006-02-09
申请号：US11179035
申请日：2005-07-11
申请人： Carl Sorensen , John White , Suhail Anwar
发明人： Carl Sorensen , John White , Suhail Anwar
IPC分类号： C23F1/00
CPC分类号： H01J37/32082 , H01J37/32183
摘要： In certain aspects, a plasma chamber is provided that has (1) a chamber size of at least about 1.8 by 2.0 meters; and (2) an effective inductance having an inductive reactance of not more than about 12-15 ohms. The plasma chamber may be used, for example, to process substrates used for flat panel displays. Numerous other aspects are provided.
摘要翻译：在某些方面，提供了一种等离子体室，其具有（1）至少约1.8×2.0米的室尺寸; 和（2）具有不大于约12-15欧姆的感抗的有效电感。等离子体室可以用于例如处理用于平板显示器的基板。提供了许多其他方面。

3. 发明申请

US20050251990A1 Plasma uniformity control by gas diffuser hole design 有权
标题翻译：通过气体扩散器孔设计的等离子体均匀性控制
公开(公告)号：US20050251990A1
公开(公告)日：2005-11-17
申请号：US10889683
申请日：2004-07-12
申请人： Soo Young Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
发明人： Soo Young Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
IPC分类号： H01L21/02 , C23C16/00 , C23C16/34 , C23C16/44 , C23C16/455 , C23C16/505 , C23C16/509 , C23F1/00 , H01J37/32 , H01L21/205
CPC分类号： H01J37/3244 , C23C16/345 , C23C16/455 , C23C16/45565 , C23C16/5096 , H01J37/32082 , H01J37/32091 , H01J37/32541 , H01J37/32596 , H01J2237/327 , H01J2237/3321 , H01J2237/3323 , H01J2237/3325 , Y10T29/49885 , Y10T29/49996
摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.
摘要翻译：提供了用于在处理室中分配气体的气体扩散板的实施例。气体分配板包括具有上游侧和下游侧的扩散板，以及在扩散板的上游侧和下游侧之间通过的多个气体通路。气体通道包括在下游侧的中空阴极腔，以增强等离子体电离。延伸到下游端的气体通道的空心阴极腔的深度，直径，表面积和密度可以从扩散板的中心到边缘逐渐增加，以改善衬底上的膜厚度和性能均匀性。从扩散板的中心到边缘的直径，深度和表面积的增加可以通过向下游侧弯曲扩散板，然后在凸出的下游侧加工出来。扩散板的弯曲可以通过热处理或真空工艺来实现。从扩散板的中心到边缘的直径，深度和表面积的增加也可以用计算机数字控制加工。具有从扩散板的中心到边缘的中空阴极腔的直径逐渐增加，深度和表面积逐渐增大的扩散板已被证明可以产生改善的膜厚度和膜性质的均匀性。

4. 发明申请

US20060236934A1 Plasma uniformity control by gas diffuser hole design 审中-公开
公开(公告)号：US20060236934A1
公开(公告)日：2006-10-26
申请号：US11473661
申请日：2006-06-22
申请人： Soo Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
发明人： Soo Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： H01J37/3244 , C23C16/345 , C23C16/455 , C23C16/45565 , C23C16/5096 , H01J37/32082 , H01J37/32091 , H01J37/32541 , H01J37/32596 , H01J2237/327 , H01J2237/3321 , H01J2237/3323 , H01J2237/3325 , Y10T29/49885 , Y10T29/49996
摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.

5. 发明申请

US20050265818A1 Methods and apparatus for supporting substrates 有权
标题翻译：用于支撑基材的方法和装置
公开(公告)号：US20050265818A1
公开(公告)日：2005-12-01
申请号：US11140777
申请日：2005-05-31
申请人： Wendell Blonigan , Carl Sorensen , John White , Robin Tiner
发明人： Wendell Blonigan , Carl Sorensen , John White , Robin Tiner
IPC分类号： H01L21/683 , B65G1/00 , B66C1/00 , B66C3/00 , H01L21/00 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67259 , H01L21/68742 , H01L21/68778
摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要翻译：衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为感受器被升高并且防止由此产生的基板不均匀的支撑。

6. 发明申请

US20070080141A1 Low-voltage inductively coupled source for plasma processing 审中-公开
标题翻译：用于等离子体处理的低压感应耦合源
公开(公告)号：US20070080141A1
公开(公告)日：2007-04-12
申请号：US11245557
申请日：2005-10-07
申请人： John White , Carl Sorensen
发明人： John White , Carl Sorensen
IPC分类号： B44C1/22 , C23F1/00 , B01J19/08 , C23C16/00
CPC分类号： H01L21/67207 , H01J37/321 , H01J37/32174 , H01L21/6719 , H01L21/67745
摘要： A chamber for plasma processing a substrate. The chamber includes one or more chamber walls defining a plasma processing region and an RF transmitting device configured to transmit RF energy to the plasma processing region. The RF transmitting device comprises a first coil portion and a second coil portion connected in parallel. Each of the first coil portion and the second coil portion is a half turn coil and the voltage at an input of the first coil portion and the voltage at an input of the second coil portion are about the same.
摘要翻译：用于等离子体处理衬底的室。腔室包括限定等离子体处理区域的一个或多个室壁和被配置为将RF能量传输到等离子体处理区域的RF发送装置。 RF发送装置包括并联连接的第一线圈部分和第二线圈部分。第一线圈部分和第二线圈部分中的每一个都是半匝线圈，并且第一线圈部分的输入处的电压和第二线圈部分的输入处的电压大致相同。

7. 发明申请

US20070046391A1 Methods and apparatus for symmetrical and/or concentric radio frequency matching networks 有权
标题翻译：用于对称和/或同心的射频匹配网络的方法和装置
公开(公告)号：US20070046391A1
公开(公告)日：2007-03-01
申请号：US11507649
申请日：2006-08-21
申请人： Carl Sorensen , John White
发明人： Carl Sorensen , John White
IPC分类号： H03H7/38
CPC分类号： H01J37/32183 , H01J37/32082 , H05H1/46
摘要： Apparatus and methods are provided that are adapted to match the impedance of an electrical load to an impedance of an electrical signal generator. The invention includes providing a plurality of electrical components adapted to collectively match the impedance of the electrical load to the impedance of the electrical signal generator. The electrical components are arranged symmetrically and concentrically about an axis. Additionally, the invention may also include a first connector adapted to electrically couple the electrical signal generator to the electrical components. Additionally, the invention may also include a second connector adapted to electrically couple the load to the electrical components. Numerous other aspects are provided.
摘要翻译：提供了适于将电负载的阻抗与电信号发生器的阻抗相匹配的装置和方法。本发明包括提供多个电气部件，其适于将电负载的阻抗统一地匹配到电信号发生器的阻抗。电气部件围绕轴对称地并且同心地布置。另外，本发明还可以包括适于将电信号发生器电耦合到电气部件的第一连接器。另外，本发明还可以包括适于将负载电耦合到电气部件的第二连接器。提供了许多其他方面。

8. 发明授权

US08901269B2 Cross-linkable silicone composition for the production of non-stick coatings for flexible substrates and an attachment-promoting additive contained in said composition 有权
标题翻译：用于生产用于柔性基底的不粘涂层和包含在所述组合物中的附着促进添加剂的可交联硅氧烷组合物
公开(公告)号：US08901269B2
公开(公告)日：2014-12-02
申请号：US13636658
申请日：2011-03-22
申请人： Sébastien Marrot , John White , Michel Feder , Fédéric Magd
发明人： Sébastien Marrot , John White , Michel Feder , Fédéric Magd
IPC分类号： C08G77/14 , C09D183/04 , C08G77/38
CPC分类号： C09D183/04 , C08G77/38 , C08L83/00
摘要： The invention relates to cross-linkable or cross-linked silicone compositions that can be used, in particular, to form a non-stick water-repellent coating for flexible substrates, for example paper or similar, in the form of natural or synthetic polymer films.
摘要翻译：本发明涉及可交联或交联的有机硅组合物，其可以特别用于形成天然或合成聚合物膜形式的柔性基材例如纸或类似物的不粘拒水涂料。

9. 发明授权

US08900240B2 Spinal rod and screw securing apparatus and method 有权
标题翻译：脊柱和螺丝固定装置及方法
公开(公告)号：US08900240B2
公开(公告)日：2014-12-02
申请号：US13025715
申请日：2011-02-11
申请人： John White , Daniel Rae Robinson , Matthew F. Hanfelt , Jason P. Sandstrom , Jeffrey A. Hoffman
发明人： John White , Daniel Rae Robinson , Matthew F. Hanfelt , Jason P. Sandstrom , Jeffrey A. Hoffman
IPC分类号： A61B17/70 , A61B17/86
CPC分类号： A61B17/7032 , A61B17/7086 , A61B17/8605 , A61B17/864 , A61B17/8685
摘要： A minimally invasive and open surgery surgical system for implanting spinal screw assemblies to be connected by a spinal rod is disclosed. In one form, the system includes an improved tool device for inserting a cap insert into an initial and final locking of a screw assembly and securing a spinal rod inserted through an incision to a vertebra. In another form, the system also includes a screw fixation system that allows greater variability in thread diameter for orthopedic implant for in the spine, iliac crest, or bones.
摘要翻译：公开了一种用于植入由脊柱杆连接的脊椎螺钉组件的微创和开放手术外科系统。在一种形式中，该系统包括改进的工具装置，用于将帽插入件插入到螺钉组件的初始和最终锁定中并将通过切口插入的脊柱杆固定到椎骨。在另一种形式中，系统还包括螺钉固定系统，其允许在脊柱，髂嵴或骨骼中矫形植入物的螺纹直径更大的变化。

10. 发明授权

US08647364B2 Tissue puncture closure device with automatic tamping 有权
标题翻译：具有自动捣固的组织穿刺闭合装置
公开(公告)号：US08647364B2
公开(公告)日：2014-02-11
申请号：US13051786
申请日：2011-03-18
申请人： William Fiehler , John White
发明人： William Fiehler , John White
IPC分类号： A61B17/08 , A61D1/00
CPC分类号： A61B17/0057 , A61B17/06123 , A61B2017/00637 , A61B2017/00654 , A61B2017/00659
摘要： A method and apparatus for sealing a puncture or incision formed percutaneously in tissue separating two internal portions of the body of a living being with an anchor, a sealing plug and a filament connecting the anchor and sealing plug. The method and apparatus provide for automatic tamping and/or cinching of the sealing plug when the apparatus is withdrawn from the puncture site. The automatic tamping and/or cinching is facilitated by transducing a motive force generated by the withdrawal of the apparatus into a tamping and/or cinching force.
摘要翻译：一种用于密封穿刺形成的穿刺或切口的方法和装置，所述组织通过锚固体，密封塞和连接锚固件和密封塞的细丝分离生物体的两个内部部分。该方法和装置提供当设备从穿刺部位抽出时自动捣固和/或收紧密封塞。通过将由装置抽出产生的动力转换成捣固和/或收紧力来促进自动捣固和/或收紧。

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