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    • 10. 发明授权
    • Method and structure for optimizing yield of 3-D chip manufacture
    • 优化3-D芯片制造产量的方法和结构
    • US07737003B2
    • 2010-06-15
    • US11163226
    • 2005-10-11
    • Edward M. DeMulderSarah H. KnickerbockerMichael J. ShapiroAlbert M. Young
    • Edward M. DeMulderSarah H. KnickerbockerMichael J. ShapiroAlbert M. Young
    • H01L21/00
    • H01L21/8221H01L27/0688H01L2224/13
    • The process begins with separate device wafers having complimentary chips. Thin metal capture pads, having a preferred thickness of about 10 microns so that substantial pressure may be applied during processing without damaging capture pads, are deposited on both device wafers, which are then tested and mapped for good chip sites. A handle wafer is attached to one device wafer, which can then be thinned to improve via etching and filling. Capture pads are removed and replaced after thinning. The device wafer with handle wafer is diced, and good chips with attached portions of the diced handle wafer are positioned and bonded to the good chip sites of the other device wafer, and the handle wafer portions are removed. The device wafer having known good 3-D chips then undergoes final processing.
    • 该过程开始于具有互补芯片的单独的器件晶片。 薄金属捕获垫具有约10微米的优选厚度,使得在处理过程中可能施加大的压力而不损坏捕获垫,沉积在两个器件晶片上,然后对其进行测试和映射以获得良好的芯片位置。 处理晶片连接到一个器件晶片,然后可以通过蚀刻和填充来减薄其改进。 捕获垫被去除并在变薄后更换。 切割具有处理晶片的器件晶片,并且将具有切割手柄晶片的附接部分的良好芯片定位并结合到另一器件晶片的良好芯片位置,并移除处理晶片部分。 具有已知良好3-D芯片的器件晶片然后进行最终处理。