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    • 1. 发明授权
    • Vapor deposition process
    • 气相沉积工艺
    • US06790486B2
    • 2004-09-14
    • US10064887
    • 2002-08-27
    • Boris A. MovchanIrene SpitsbergRamgopal Darolia
    • Boris A. MovchanIrene SpitsbergRamgopal Darolia
    • C08J718
    • C23C14/083C23C14/30C23C14/548C23C28/321C23C28/3215C23C28/325C23C28/345C23C28/3455
    • A process for depositing a ceramic coating on a component. The process involves a technique for evaporating an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having a vapor pressure that is higher than the remaining oxide compounds, to deposit a coating of the multiple oxide compounds. A high energy beam is projected onto the evaporation source to melt and form a vapor cloud of the oxide compounds of the evaporation source, while preventing the vapor cloud from contacting and condensing on the component during an initial phase in which the relative amount of the one oxide compound in the vapor cloud is greater than its relative amount in the evaporation source. During a subsequent phase in which the relative amount of the one oxide compound in the vapor cloud has decreased to something approximately equal to its relative amount in the evaporation source, the vapor cloud is allowed to contact and condense on the component to form the coating.
    • 用于在组件上沉积陶瓷涂层的方法。 该方法涉及一种用于蒸发含有多种不同氧化物化合物的蒸发源的技术,至少一种具有高于其余氧化物化合物的蒸汽压的氧化物化合物沉积多种氧化物化合物的涂层。 将高能量束投影到蒸发源上以熔化并形成蒸发源的氧化物化合物的蒸汽云,同时防止蒸气云在初始阶段期间在组分上接触和冷凝,其中相对量 蒸汽云中的氧化物化合物大于其在蒸发源中的相对量。 在蒸发云中的一种氧化物化合物的相对量已经降低到与蒸发源中的相对量近似相似的量的后续阶段中,允许蒸汽云接触并冷凝在组分上以形成涂层。
    • 2. 发明授权
    • Vapor deposition process and apparatus therefor
    • 气相沉积工艺及其设备
    • US07393416B2
    • 2008-07-01
    • US10709668
    • 2004-05-21
    • Boris A. MovchanIrene SpitsbergRamgopal Darolia
    • Boris A. MovchanIrene SpitsbergRamgopal Darolia
    • C23C14/28C23C14/30
    • C23C16/52C23C14/08C23C14/30C23C14/564
    • An apparatus for depositing a ceramic coating on a component. The apparatus includes an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having a vapor pressure that is higher than the remaining oxide compounds, to deposit on the component a coating of the multiple oxide compounds. The apparatus further includes a device for introducing the evaporation source into a coating chamber, a device for suspending the component near the evaporation source, a device for projecting a high-energy beam on the evaporation source to melt and form a vapor cloud of the oxide compounds of the evaporation source, a device capable of preventing the vapor cloud from contacting and condensing on the component, and a device for moving the preventing device to allow the vapor cloud to contact and condense on the component.
    • 一种用于在组件上沉积陶瓷涂层的装置。 所述装置包括含有多种不同氧化物化合物的蒸发源,所述氧化物化合物中的至少一种具有比剩余的氧化物化合物高的蒸汽压,以在所述组分上沉积所述多种氧化物化合物的涂层。 该装置还包括用于将蒸发源引入涂覆室的装置,用于将部件悬浮在蒸发源附近的装置,用于将高能束投影到蒸发源上以熔化并形成氧化物蒸汽云的装置 蒸发源的化合物,能够防止蒸气云在部件上接触和冷凝的装置,以及用于使防止装置移动以允许蒸汽云接触并冷凝在部件上的装置。
    • 5. 发明申请
    • VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR
    • 蒸气沉积工艺及其设备
    • US20130327271A1
    • 2013-12-12
    • US11538908
    • 2006-10-05
    • Boris A. MovchanIrene SpitsbergRamgopal Darolia
    • Boris A. MovchanIrene SpitsbergRamgopal Darolia
    • C23C16/52
    • C23C16/52C23C14/08C23C14/30C23C14/564
    • An apparatus for depositing a ceramic coating on a component. The apparatus is configured to make use of an evaporation source containing multiple different oxide compounds, in which at least one of the oxide compounds has a vapor pressure that is higher than the remaining oxide compounds. The apparatus is operable to introduce the evaporation source into a coating chamber, suspend the component near the evaporation source, and project a high-energy beam on the evaporation source to melt and form a vapor cloud having a composition comprising the oxide compounds of the evaporation source. The apparatus includes a feature that prevents the vapor cloud from contacting and condensing on the component during an initial phase of operation, and subsequently permit and then again prevent the vapor cloud from contacting and condensing on the component during subsequent phases of operation in response to changes in the composition of the vapor cloud.
    • 一种用于在组件上沉积陶瓷涂层的装置。 该装置被配置为利用含有多种不同氧化物化合物的蒸发源,其中至少一种氧化物化合物的蒸汽压高于剩余的氧化物化合物。 该装置可操作以将蒸发源引入涂覆室中,将组分悬浮在蒸发源附近,并将蒸发源上的高能量束投射,以熔化并形成蒸气云,该组成包含蒸发的氧化物化合物 资源。 该装置包括防止蒸汽云在初始操作阶段期间接触和冷凝组件的特征,并且随后允许并随后再次防止蒸气云随着响应于变化的后续操作阶段中的部件接触和冷凝 在蒸气云的组成中。