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1. 发明授权

US10217773B2 Array substrate and fabrication method thereof, display panel and fabrication method thereof 有权
公开(公告)号：US10217773B2
公开(公告)日：2019-02-26
申请号：US14359006
申请日：2013-04-26
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Jingjing Jiang , Gyuhyun Lee , Min Li , Song Wang
IPC分类号： G02F1/136 , H01L27/12 , G02F1/1368 , H01L29/786 , G02F1/1362 , G02F1/1335 , G02F1/1333
摘要： Embodiments of the disclosure provide an array substrate and a fabrication method thereof, and a display panel and a fabrication method thereof. A passivation layer of the array substrate is made of a black insulation material and the passivation layer is provided with an opening at a pixel display region of the array substrate. The passivation layer is simultaneously used as a black matrix, and thus the aperture ratio of the display panel is effectively increased.

2. 发明授权

US09625760B2 Method for manufacturing color filter substrate, color filter substrate and display device 有权
公开(公告)号：US09625760B2
公开(公告)日：2017-04-18
申请号：US14416658
申请日：2014-06-20
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Jikai Zhang , Tonghua Yang , Jiyu Wan , Dan Wang , Gyuhyun Lee
IPC分类号： G02B5/22 , G02B7/00 , G02F1/1335 , G02F1/1339 , G02B1/14 , G02B5/20 , G03F7/00 , G02F1/1337
CPC分类号： G02F1/133516 , G02B1/14 , G02B5/201 , G02F1/133512 , G02F1/1337 , G02F1/133723 , G02F1/13394 , G03F7/0007
摘要： Provided are method for manufacturing a color filter substrate, color filter substrate and display device. The method includes the following steps: providing a substrate; forming a color pixel unit on the substrate; forming a protective layer on the color pixel unit; coating an alignment film paint and a spacer paint on the protective layer in turn, and forming an alignment film and a spacer via a single patterning process or double patterning processes.

3. 发明授权

US09274433B2 Fly eye lens and proximity exposure machine optical system 有权
标题翻译：飞眼镜片和邻近曝光机光学系统
公开(公告)号：US09274433B2
公开(公告)日：2016-03-01
申请号：US14065647
申请日：2013-10-29
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Min Li , Hongjiang Wu , Gyuhyun Lee , Jikai Zhang , Tonghua Yang
IPC分类号： G03F7/20
CPC分类号： G03F7/70083 , G03F7/70058 , G03F7/70066 , G03F7/70075 , G03F7/7035
摘要： An embodiment of the present invention provides a fly eye lens which is applied to a proximity exposure machine optical system. The fly lens includes a first lens assembly and a second lens assembly, wherein the first lens assembly includes a plurality of lenses which form a first lens face, and the second lens assembly includes a plurality of lenses which form a second lens face. The first lens face is used to split an incident broad light beam into narrow light beams and then refract the narrow light beams onto the second lens face, and the second lens face is used to dispersively refract the received narrow light beams onto a concave mirror in the optical system. A lens closer to a center of the second lens face has a higher transmittivity, and a lens farther from the center of the second lens face has a lower transmittivity. According to the embodiment of the present invention, since different lenses on the second lens face have different transmittivities, the illuminances of light radiated to different regions of a mask plate through the fly eye lens are different, and thus the uniformity of the critical dimensions of the exposed patterns can be improved to a certain extent.
摘要翻译：本发明的实施例提供了一种应用于接近曝光机光学系统的飞眼镜片。飞行透镜包括第一透镜组件和第二透镜组件，其中第一透镜组件包括形成第一透镜面的多个透镜，并且第二透镜组件包括形成第二透镜面的多个透镜。第一透镜面用于将入射的宽光束分裂成窄光束，然后将窄光束折射到第二透镜面上，并且使用第二透镜面将接收的窄光束分散地折射到凹面镜上光系统。靠近第二透镜面的中心的透镜具有更高的透射率，并且离第二透镜面的中心更远的透镜具有较低的透射率。根据本发明的实施例，由于第二透镜面上的不同透镜具有不同的透射率，所以通过飞眼透镜辐射到掩模板的不同区域的光的照度是不同的，因此临界尺寸的均匀性可以在一定程度上改善曝光图案。

4. 发明申请

US20150160563A1 EXPOSURE METHOD AND EXPOSURE DEVICE 有权
标题翻译：曝光方法和曝光装置
公开(公告)号：US20150160563A1
公开(公告)日：2015-06-11
申请号：US14382435
申请日：2013-06-14
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Changgang Huang , Hongjiang Wu , Song Wang , Jiyu Wan , Gyuhyun Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/2014
摘要： Embodiments of the disclosure provide an exposure method and an exposure device. The exposure method comprises: placing at least two transparent substrates coated with photoresist under one mask, wherein all of the at least two substrates are in parallel with the mask; irradiating the mask vertically with parallel exposure light to respectively expose the photoresist on the at least two substrates along a propagation direction of the exposure light.
摘要翻译：本公开的实施例提供曝光方法和曝光装置。曝光方法包括：在一个掩模下放置涂覆有光致抗蚀剂的至少两个透明基板，其中所述至少两个基板全部与掩模平行; 以平行的曝光光垂直照射掩模，以分别在曝光光的传播方向上暴露至少两个基板上的光致抗蚀剂。

5. 发明授权

US09581939B2 Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US09581939B2
公开(公告)日：2017-02-28
申请号：US14421726
申请日：2013-08-07
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Changgang Huang , Hongjiang Wu , Gyuhyun Lee
IPC分类号： G03F7/32 , G03G15/10
CPC分类号： G03G15/104 , G03F7/30 , G03F7/3021 , H01L27/1259
摘要： The present disclosure provides a developing device and method. The developing device includes the nozzle for spraying the developing liquid, the machine table for bearing the glass substrate, and the inclination controller for controlling the nozzle and the machine table to be inclined towards a predetermined direction of the machine table at a predetermined angle and keeping the inclined angle within a preset period. The method includes controlling, by the inclination controller, the machine table and the nozzle to be inclined towards a first direction of the machine table at a predetermined angle during the inclination cycle period and keeping the inclined angle within the preset period, and controlling, by the inclination controller, the machine table and the nozzle to be sequentially inclined towards other directions of the machine table at a predetermined angle according to the preset inclination direction sequence and keeping the inclined angle within the preset period.
摘要翻译：本公开提供了一种显影装置和方法。显影装置包括用于喷射显影液的喷嘴，用于承载玻璃基板的机台，以及用于控制喷嘴和机台的倾斜控制器，以预定角度朝着机台的预定方向倾斜并保持预设期间的倾斜角度。该方法包括：通过倾斜控制器，在倾斜循环周期期间使机台和喷嘴以预定角度朝机器台的第一方向倾斜并将倾斜角保持在预设期间，并通过倾斜控制器，机台和喷嘴根据预设的倾斜方向顺序以预定的角度依次倾斜到机台的其他方向，并将倾斜角保持在预设的时间段内。

6. 发明申请

US20150234326A1 DEVELOPING DEVICE AND DEVELOPING METHOD 有权
标题翻译：开发设备和开发方法
公开(公告)号：US20150234326A1
公开(公告)日：2015-08-20
申请号：US14421726
申请日：2013-08-07
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Changgang Huang , Hongjiang Wu , Gyuhyun Lee
IPC分类号： G02F1/13
CPC分类号： G03G15/104 , G03F7/30 , G03F7/3021 , H01L27/1259
摘要： The present disclosure provides a developing device and method. The developing device includes the nozzle for spraying the developing liquid, the machine table for bearing the glass substrate, and the inclination controller for controlling the nozzle and the machine table to be inclined towards a predetermined direction of the machine table at a predetermined angle and keeping the inclined angle within a preset period. The method includes controlling, by the inclination controller, the machine table and the nozzle to be inclined towards a first direction of the machine table at a predetermined angle during the inclination cycle period and keeping the inclined angle within the preset period, and controlling, by the inclination controller, the machine table and the nozzle to be sequentially inclined towards other directions of the machine table at a predetermined angle according to the preset inclination direction sequence and keeping the inclined angle within the preset period
摘要翻译：本公开提供了一种显影装置和方法。显影装置包括用于喷射显影液的喷嘴，用于承载玻璃基板的机台，以及用于控制喷嘴和机台的倾斜控制器，以预定角度朝着机台的预定方向倾斜并保持预设期间的倾斜角度。该方法包括：通过倾斜控制器，在倾斜循环周期期间使机台和喷嘴以预定角度朝机器台的第一方向倾斜并将倾斜角保持在预设期间，并通过倾斜控制器，机台和喷嘴根据预设的倾斜方向顺序以预定角度顺序地朝机器台的其他方向倾斜，并将倾斜角度保持在预设时段内

7. 发明申请

US20150085216A1 ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, DISPLAY PANEL AND FABRICATION METHOD THEREOF 审中-公开
标题翻译：阵列基板及其制造方法，显示面板及其制造方法
公开(公告)号：US20150085216A1
公开(公告)日：2015-03-26
申请号：US14359006
申请日：2013-04-26
申请人： BOE TECHNOLOGY GROUP CO. LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD
发明人： Jingjing Jiang , Gyuhyun Lee , Min Li , Song Wang
IPC分类号： H01L27/12 , G02F1/1368
CPC分类号： H01L27/1248 , G02F1/133512 , G02F1/136209 , G02F1/1368 , G02F2001/133357 , H01L27/1262 , H01L29/78633
摘要： Embodiments of the disclosure provide an array substrate and a fabrication method thereof, and a display panel and a fabrication method thereof. A passivation layer of the array substrate is made of a black insulation material and the passivation layer is provided with an opening at a pixel display region of the array substrate. The passivation layer is simultaneously used as a black matrix, and thus the aperture ratio of the display panel is effectively increased.
摘要翻译：本发明的实施例提供阵列基板及其制造方法，以及显示面板及其制造方法。阵列基板的钝化层由黑色绝缘材料制成，钝化层在阵列基板的像素显示区域设有开口。钝化层同时用作黑矩阵，从而有效地提高了显示面板的开口率。

8. 发明授权

US09568843B2 Exposure method and exposure device 有权
标题翻译：曝光方法和曝光装置
公开(公告)号：US09568843B2
公开(公告)日：2017-02-14
申请号：US14382435
申请日：2013-06-14
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Changgang Huang , Hongjiang Wu , Song Wang , Jiyu Wan , Gyuhyun Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/2014
摘要： Embodiments of the disclosure provide an exposure method and an exposure device. The exposure method comprises: placing at least two transparent substrates coated with photoresist under one mask, wherein all of the at least two substrates are in parallel with the mask; irradiating the mask vertically with parallel exposure light to respectively expose the photoresist on the at least two substrates along a propagation direction of the exposure light.
摘要翻译：本公开的实施例提供曝光方法和曝光装置。曝光方法包括：在一个掩模下放置涂覆有光致抗蚀剂的至少两个透明基板，其中所述至少两个基板全部与掩模平行; 以平行的曝光光垂直照射掩模，以分别在曝光光的传播方向上暴露至少两个基板上的光致抗蚀剂。

9. 发明申请

US20150124200A1 COLOR FILTER SUBSTRATE, METHOD FOR FABRICATING THE SAME AND LIQUID CRYSTAL DISPLAY SCREEN 审中-公开
标题翻译：彩色滤光片基板，其制造方法和液晶显示屏
公开(公告)号：US20150124200A1
公开(公告)日：2015-05-07
申请号：US14362055
申请日：2013-06-17
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Jingjing Jiang , Min Li , Gyuhyun Lee , Hongjiang Wu
IPC分类号： G02B5/20 , G03F7/30 , G02B27/22 , G02B3/00 , G02F1/1335
CPC分类号： G02B5/201 , G02B3/0006 , G02B27/2207 , G02B27/2214 , G02F1/133514 , G02F1/133516 , G02F1/133526 , G02F2001/133562 , G03F7/30 , H04N13/305 , H04N2213/001
摘要： A color filter substrate and its fabrication method as well as a LCD screen are disclosed. The color filter substrate includes a base substrate, a plurality of color filter elements, and a microlens structure. The plurality of color filter elements are disposed on the base substrate, and the microlens structure is disposed on the plurality of color filter elements.
摘要翻译：公开了一种滤色器基板及其制造方法以及LCD屏。滤色器基板包括基底基板，多个滤色器元件和微透镜结构。多个滤色器元件设置在基底基板上，微透镜结构设置在多个滤色器元件上。

10. 发明申请

US20140168621A1 Fly Eye Lens and Proximity Exposure Machine Optical System 有权
标题翻译：飞眼镜和接近曝光机光学系统
公开(公告)号：US20140168621A1
公开(公告)日：2014-06-19
申请号：US14065647
申请日：2013-10-29
申请人： Beijing BOE Display Technology Co., Ltd. , BOE Technology Group Co., Ltd.
发明人： Min Li , Hongjiang Wu , Gyuhyun Lee , Jikai Zhang , Tonghua Yang
IPC分类号： G02B27/12
CPC分类号： G03F7/70083 , G03F7/70058 , G03F7/70066 , G03F7/70075 , G03F7/7035
摘要： An embodiment of the present invention provides a fly eye lens which is applied to a proximity exposure machine optical system. The fly lens includes a first lens assembly and a second lens assembly, wherein the first lens assembly includes a plurality of lenses which form a first lens face, and the second lens assembly includes a plurality of lenses which form a second lens face. The first lens face is used to split an incident broad light beam into narrow light beams and then refract the narrow light beams onto the second lens face, and the second lens face is used to dispersively refract the received narrow light beams onto a concave mirror in the optical system. A lens closer to a center of the second lens face has a higher transmittivity, and a lens farther from the center of the second lens face has a lower transmittivity. According to the embodiment of the present invention, since different lenses on the second lens face have different transmittivities, the illuminances of light radiated to different regions of a mask plate through the fly eye lens are different, and thus the uniformity of the critical dimensions of the exposed patterns can be improved to a certain extent.
摘要翻译：本发明的实施例提供了一种应用于接近曝光机光学系统的飞眼镜片。飞行透镜包括第一透镜组件和第二透镜组件，其中第一透镜组件包括形成第一透镜面的多个透镜，并且第二透镜组件包括形成第二透镜面的多个透镜。第一透镜面用于将入射的宽光束分裂成窄光束，然后将窄光束折射到第二透镜面上，并且使用第二透镜面将接收的窄光束分散地折射到凹面镜上光学系统。靠近第二透镜面的中心的透镜具有更高的透射率，并且离第二透镜面的中心更远的透镜具有较低的透射率。根据本发明的实施例，由于第二透镜面上的不同透镜具有不同的透射率，所以通过飞眼透镜辐射到掩模板的不同区域的光的照度是不同的，因此临界尺寸的均匀性可以在一定程度上改善曝光图案。

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