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1. 发明授权

US10197912B2 Method for manufacturing color photoresist pattern in color filter 有权
公开(公告)号：US10197912B2
公开(公告)日：2019-02-05
申请号：US15358709
申请日：2016-11-22
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Tonghua Yang , Hongjiang Wu , Min Li , Jikai Zhang
IPC分类号： G03F7/00 , G03F7/32 , G02F1/1335
摘要： A method for manufacturing a color photoresist pattern in a color filter is provided. The method includes applying a layer of negative color resist onto a substrate; exposing the layer of negative color resist through a mask; and developing the exposed layer of negative color resist with a developer composition which comprises 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5.0 parts by weight of surfactant, 0.1 to 10.0 parts by weight of water-soluble organic solvent, 85 to 99 parts by weight of water, and 0 to 2 parts by weight of additives, based on 100 parts by weight of the developer composition.

2. 发明授权

US09752052B2 Auto-repairing compositions for overcoat layer, method of producing the same, and display apparatus 有权
公开(公告)号：US09752052B2
公开(公告)日：2017-09-05
申请号：US14369464
申请日：2013-12-20
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Tonghua Yang , Min Li , Jikai Zhang , Sikai Zhang , He Feng
IPC分类号： C08K5/101 , C09D133/06 , C09D175/04 , C09D133/08 , C09D133/14 , C09D163/00 , G02F1/1335 , C09D4/06 , C08F222/10 , C08G59/42 , C08G59/44
CPC分类号： C09D175/04 , C08F222/10 , C08F2222/104 , C08G59/4215 , C08G59/4223 , C08G59/44 , C08K5/101 , C09D4/06 , C09D133/06 , C09D133/068 , C09D133/08 , C09D133/14 , C09D163/00 , G02F1/133516 , G02F2001/133519 , Y10T428/254 , C08L33/00
摘要： Disclosed are an auto-repairing composition for overcoat layer, a method of producing the same, and a display apparatus. The composition for overcoat layer comprising 1-10 wt % of microcapsules based on the total weight of the composition for overcoat layer, said microcapsule including a capsule wall and a capsule core, wherein the capsule wall comprises an alkali-insoluble resin, and the capsule core comprises, based on the total weight of the capsule core, 30-60 wt % of a photo-curable unsaturated oligomer, 30-60 wt % of a photo-polymerizable monomer, 1-10 wt % of a photo-initiator, and 0-5 wt % of additive.

3. 发明授权

US09417536B2 Exposure apparatus and exposure system 有权
标题翻译：曝光装置和曝光系统
公开(公告)号：US09417536B2
公开(公告)日：2016-08-16
申请号：US14339608
申请日：2014-07-24
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Changjun Zha , Min Li , Hongjiang Wu
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/7035 , G03F7/707 , G03F7/70783 , G03F7/70791
摘要： An exposure apparatus is provided. It comprises: a substrate stage on which a holding region is provided to hold a substrate to be exposed, the holding region being provided with a support portion thereon for supporting the substrate to be exposed; a supporter configured to support a mask; a light source system configured to provide an exposure light which is illuminated on the substrate to be exposed via the mask to reproduce a pattern of the mask onto the substrate, wherein the support portion has a height which decreases gradually from an outer periphery of the holding region to a center of the holding region, such that an exposure distance is constant at all of positions on the holding region. With the above structure, the graph dimension may be kept uniform on the substrate even if the mask becomes bent.
摘要翻译：提供曝光装置。它包括：衬底台，其上设有保持区以保持要暴露的衬底，所述保持区在其上设置有用于支撑要暴露的衬底的支撑部; 配置为支持掩模的支撑件; 光源系统，被配置为提供照射在待通过掩模曝光的基板上的曝光光，以将掩模的图案再现到基板上，其中支撑部分具有从保持件的外周逐渐减小的高度区域到保持区域的中心，使得曝光距离在保持区域上的所有位置都是恒定的。利用上述结构，即使掩模弯曲，也可以在基板上保持图形尺寸均匀。

4. 发明申请

US20150285968A1 COLOR FILTER SUBSTRATE, PREPARING METHOD THEREOF, AND DISPLAY DEVICE 审中-公开
标题翻译：彩色滤光片，其制备方法和显示装置
公开(公告)号：US20150285968A1
公开(公告)日：2015-10-08
申请号：US14436388
申请日：2014-08-21
申请人： BOE Technology Group Co., Ltd. , Beijing Boe Display Technology Co., Ltd.
发明人： Changjun Zha , Min Li , Jingjing Jiang , Hongjiang Wu
IPC分类号： G02B5/20
CPC分类号： G02B5/201 , G02F1/133512 , G02F1/133516 , G02F1/13394 , G02F2001/13396
摘要： A color filter substrate, a preparing method thereof and a display device are provided. The method includes: preparing a black matrix pattern and a color filter pattern on a substrate; preparing planarization layer and spacers including primary spacers and secondary spacers. The black matrix pattern includes primary areas and secondary areas, and the primary area has a width in the column direction of the black matrix pattern greater than the width of the secondary area in the column direction of the black matrix pattern. The primary spacers are located on primary areas of the black matrix pattern; and the secondary spacers are located on secondary areas of the black matrix pattern, the primary spacers have a height greater than that of the secondary spacers.
摘要翻译：提供滤色器基板，其制备方法和显示装置。该方法包括：在基板上制备黑矩阵图案和滤色器图案; 制备平面化层和包括主间隔物和次间隔物的间隔物。黑矩阵图案包括主区域和次区域，并且主区域在黑矩阵图案的列方向上的宽度大于黑矩阵图案的列方向上的次区域的宽度。主要间隔物位于黑矩阵图案的主要区域上; 并且次级间隔物位于黑矩阵图案的次要区域上，主间隔物的高度大于次间隔物的高度。

5. 发明申请

US20150085216A1 ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, DISPLAY PANEL AND FABRICATION METHOD THEREOF 审中-公开
标题翻译：阵列基板及其制造方法，显示面板及其制造方法
公开(公告)号：US20150085216A1
公开(公告)日：2015-03-26
申请号：US14359006
申请日：2013-04-26
申请人： BOE TECHNOLOGY GROUP CO. LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD
发明人： Jingjing Jiang , Gyuhyun Lee , Min Li , Song Wang
IPC分类号： H01L27/12 , G02F1/1368
CPC分类号： H01L27/1248 , G02F1/133512 , G02F1/136209 , G02F1/1368 , G02F2001/133357 , H01L27/1262 , H01L29/78633
摘要： Embodiments of the disclosure provide an array substrate and a fabrication method thereof, and a display panel and a fabrication method thereof. A passivation layer of the array substrate is made of a black insulation material and the passivation layer is provided with an opening at a pixel display region of the array substrate. The passivation layer is simultaneously used as a black matrix, and thus the aperture ratio of the display panel is effectively increased.
摘要翻译：本发明的实施例提供阵列基板及其制造方法，以及显示面板及其制造方法。阵列基板的钝化层由黑色绝缘材料制成，钝化层在阵列基板的像素显示区域设有开口。钝化层同时用作黑矩阵，从而有效地提高了显示面板的开口率。

6. 发明授权

US10217773B2 Array substrate and fabrication method thereof, display panel and fabrication method thereof 有权
公开(公告)号：US10217773B2
公开(公告)日：2019-02-26
申请号：US14359006
申请日：2013-04-26
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Jingjing Jiang , Gyuhyun Lee , Min Li , Song Wang
IPC分类号： G02F1/136 , H01L27/12 , G02F1/1368 , H01L29/786 , G02F1/1362 , G02F1/1335 , G02F1/1333
摘要： Embodiments of the disclosure provide an array substrate and a fabrication method thereof, and a display panel and a fabrication method thereof. A passivation layer of the array substrate is made of a black insulation material and the passivation layer is provided with an opening at a pixel display region of the array substrate. The passivation layer is simultaneously used as a black matrix, and thus the aperture ratio of the display panel is effectively increased.

7. 发明申请

US20150205208A1 DEVELOPER COMPOSITION 审中-公开
标题翻译：开发商组合
公开(公告)号：US20150205208A1
公开(公告)日：2015-07-23
申请号：US14351740
申请日：2013-12-10
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Tonghua Yang , Hongjiang Wu , Min Li , Jikai Zhang
IPC分类号： G03F7/32
CPC分类号： G03F7/32
摘要： A developer composition including 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5.0 parts by weight of surfactant, 0.1 to 10.0 parts by weight of water-soluble organic solvent, 85 to 99 parts by weight of water, and 0 to 2 parts by weight of additives, based on 100 parts by weight of the developer composition.
摘要翻译：显影剂组合物，其包含0.01〜5.0重量份的无机酸或有机酸，0.01〜5.0重量份表面活性剂，0.1〜10.0重量份水溶性有机溶剂，85〜99重量份水，0〜基于100重量份的显影剂组合物2重量份的添加剂。

8. 发明授权

US10317585B2 Color filter substrate and manufacturing method thereof, and display device 有权
公开(公告)号：US10317585B2
公开(公告)日：2019-06-11
申请号：US14315862
申请日：2014-06-26
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Sikai Zhang , Min Li , Hongjiang Wu
IPC分类号： G02B5/20
摘要： Embodiments of the invention provide a color film substrate and a manufacturing method thereof, and a display device, which are used in the field of display technology, and can improve the product quality, reduce costs, and improve production capacity. The color film substrate includes a plurality of first and second black matrixes which are arranged to intersect, and a color filter structure; wherein, the color filter structure includes at least first, second and third color filters, each of the first, second and third color filters includes a first and a second openings, area of a first region between a second opening of the first color filter and a first opening of the second color filter is not the same as that of a second region between a second opening of the second color filter and a first opening of the third color filter.

9. 发明授权

US09891463B2 Mask for forming color filter layer, method for fabricating color filter substrate, and color filter substrate 有权
公开(公告)号：US09891463B2
公开(公告)日：2018-02-13
申请号：US14381527
申请日：2013-06-14
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Jingjing Jiang , Min Li , Hongjiang Wu , Yu Xiao
IPC分类号： G02F1/1339 , G02F1/1335 , G03F1/50 , G03F7/00
CPC分类号： G02F1/133516 , G02F1/13394 , G02F2001/13396 , G03F1/50 , G03F7/0007
摘要： A mask for forming color filter layer, a method for fabricating a color filter substrate and a color filter substrate are provided. A light regulating structure is disposed in a portion of a transparent region of the mask for forming color filter layer, and the light regulating structure is disposed at a position corresponding to a base of a columnar spacer above the color filter layer.

10. 发明授权

US09274433B2 Fly eye lens and proximity exposure machine optical system 有权
标题翻译：飞眼镜片和邻近曝光机光学系统
公开(公告)号：US09274433B2
公开(公告)日：2016-03-01
申请号：US14065647
申请日：2013-10-29
申请人： BOE Technology Group Co., Ltd. , Beijing BOE Display Technology Co., Ltd.
发明人： Min Li , Hongjiang Wu , Gyuhyun Lee , Jikai Zhang , Tonghua Yang
IPC分类号： G03F7/20
CPC分类号： G03F7/70083 , G03F7/70058 , G03F7/70066 , G03F7/70075 , G03F7/7035
摘要： An embodiment of the present invention provides a fly eye lens which is applied to a proximity exposure machine optical system. The fly lens includes a first lens assembly and a second lens assembly, wherein the first lens assembly includes a plurality of lenses which form a first lens face, and the second lens assembly includes a plurality of lenses which form a second lens face. The first lens face is used to split an incident broad light beam into narrow light beams and then refract the narrow light beams onto the second lens face, and the second lens face is used to dispersively refract the received narrow light beams onto a concave mirror in the optical system. A lens closer to a center of the second lens face has a higher transmittivity, and a lens farther from the center of the second lens face has a lower transmittivity. According to the embodiment of the present invention, since different lenses on the second lens face have different transmittivities, the illuminances of light radiated to different regions of a mask plate through the fly eye lens are different, and thus the uniformity of the critical dimensions of the exposed patterns can be improved to a certain extent.
摘要翻译：本发明的实施例提供了一种应用于接近曝光机光学系统的飞眼镜片。飞行透镜包括第一透镜组件和第二透镜组件，其中第一透镜组件包括形成第一透镜面的多个透镜，并且第二透镜组件包括形成第二透镜面的多个透镜。第一透镜面用于将入射的宽光束分裂成窄光束，然后将窄光束折射到第二透镜面上，并且使用第二透镜面将接收的窄光束分散地折射到凹面镜上光系统。靠近第二透镜面的中心的透镜具有更高的透射率，并且离第二透镜面的中心更远的透镜具有较低的透射率。根据本发明的实施例，由于第二透镜面上的不同透镜具有不同的透射率，所以通过飞眼透镜辐射到掩模板的不同区域的光的照度是不同的，因此临界尺寸的均匀性可以在一定程度上改善曝光图案。

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