会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Multi-junction photovoltaic cell having buffer layers for the growth of single crystal boron compounds
    • 具有用于生长单晶硼化合物的缓冲层的多结光伏电池
    • US07122733B2
    • 2006-10-17
    • US10236797
    • 2002-09-06
    • Authi A. NarayananJoel A. Schwartz
    • Authi A. NarayananJoel A. Schwartz
    • H01L31/04H01L31/06
    • H01L31/0687H01L31/03046H01L31/0693Y02E10/544
    • The present invention provides a solar cell comprising a substrate, a first buffer layer disposed above the base layer, a second buffer layer disposed above the first buffer layer, a first boron compound layer disposed above the second buffer layer, a second boron compound layer disposed above the first compound layer, and a window layer disposed above the second compound layer, wherein the first compound layer comprises a first type of doping, wherein the second compound layer comprises a second type of doping, wherein the second buffer layer comprises a higher energy bandgap than the first compound layer, and wherein the first buffer layer and the second buffer layer permit a boron content in the first compound layer and the second compound layer to be greater than 3 %.
    • 本发明提供了一种太阳能电池,其包括基板,设置在基底层上方的第一缓冲层,设置在第一缓冲层上方的第二缓冲层,设置在第二缓冲层上方的第一硼化合物层,设置在第二缓冲层上的第二硼化合物层 在第一化合物层上方,以及设置在第二化合物层上方的窗口层,其中第一化合物层包括第一类型的掺杂,其中第二化合物层包括第二类型的掺杂,其中第二缓冲层包含较高的能量 并且其中第一缓冲层和第二缓冲层允许第一化合物层和第二化合物层中的硼含量大于3%。
    • 4. 发明授权
    • Method for fabricating and using a light waveguide
    • 制造和使用光波导的方法
    • US07217585B1
    • 2007-05-15
    • US11395702
    • 2006-03-31
    • David S. SumidaAuthi A. NarayananHans W. Bruesselbach
    • David S. SumidaAuthi A. NarayananHans W. Bruesselbach
    • H01L21/20
    • G02B6/1342
    • A waveguide is fabricated by first preparing two waveguide precursor pieces. Each waveguide precursor piece includes a single-crystal substrate, and an epitaxial coating layer of an oxide coating material on the substrate. The oxide substrate material preferably comprises yttrium as a substrate-material cation, and the oxide coating material preferably comprises a coating-material cation selected from the group consisting of ytterbium, thulium, erbium, and holmium. The two substrates are placed together with the coating layers in contact to form a precursor structure. The precursor structure is heated to an elevated diffusion temperature so that the coating layers bond together and the coating materials and the respective substrate materials interdiffuse to form the waveguide having an interdiffused region. A laser beam may be directed through the interdiffused region, while the interdiffused region is optionally optically pumped through one or both of the substrates.
    • 通过首先制备两个波导前体件来制造波导。 每个波导前体件包括单晶衬底和在衬底上的氧化物涂层材料的外延涂层。 氧化物基材优选包含作为基材材料阳离子的钇,氧化物涂层材料优选包含选自镱,ium,铒和钬的涂料阳离子。 将两个基板与涂层接触放置在一起以形成前体结构。 将前体结构加热到升高的扩散温度,使得涂层结合在一起,并且涂层材料和相应的衬底材料相互扩散以形成具有相互扩散区​​域的波导。 激光束可以被引导穿过相互扩散的区域,而相互扩散的区域可选地被光泵浦通过一个或两个基底。
    • 6. 发明授权
    • Broadband protective optical window coating
    • 宽带保护光学窗口涂层
    • US5993981A
    • 1999-11-30
    • US844715
    • 1997-04-18
    • Joel AskinaziAuthi A. NarayananHoa T. BuiJoseph A. VigilJohn J. Vajo
    • Joel AskinaziAuthi A. NarayananHoa T. BuiJoseph A. VigilJohn J. Vajo
    • G02B1/11B32B9/00G02B1/10
    • G02B1/115
    • The present invention provides a broadband transmitting protective coating (10) including an AlGaP protective layer (14) deposited on an optical substrate (12) and an anti-reflection film (16) deposited on the AlGaP protective layer (14). The coating (10) is suitable for use with typical infrared and broadband optical substrate materials such as germanium or multi-spectral ZnS. In the case of a germanium substrate (12), the anti-reflection film (16), (16a) preferably consists of a single layer of hard carbon or alternating layers of hard carbon and silicon. In the case of a multi-spectral ZnS substrate (12a), the anti-reflection film (16b) preferably consists of layered Al.sub.2 O.sub.3 /TaO.sub.5 /LaF.sub.3 /MgF.sub.2. The protective coating (10) is preferably deposited on the optical substrate (12) by a metal organic chemical vapor deposition process wherein an initial layer of AlP is nucleated on the substrate (12) at a temperature of approximately 400.degree. C. The temperature of the substrate (12) is then raised to approximately 600.degree. C. and a layer of AlGaP (14) is grown on the substrate (12) to a preselected thickness. The AlGaP coated optical substrate (12) is then polished to a desired smoothness. The anti-reflection film (16) is then deposited on the AlGaP layer (14) using an RF chemical vapor deposition process or a thermal evaporation process.
    • 本发明提供了一种宽带传输保护涂层(10),其包括沉积在AlGaP保护层(14)上的沉积在光学基片(12)上的AlGaP保护层(14)和抗反射膜(16)。 涂层(10)适用于典型的红外和宽带光学基板材料,如锗或多光谱ZnS。 在锗基板(12)的情况下,防反射膜(16),(16a)优选由单层硬碳或硬碳和硅的交替层组成。 在多光谱ZnS衬底(12a)的情况下,抗反射膜(16b)优选由层状Al 2 O 3 / TaO 5 / LaF 3 / MgF 2组成。 保护涂层(10)优选通过金属有机化学气相沉积方法沉积在光学基底(12)上,其中初始的AlP层在基底(12)上在约400℃的温度下成核。 然后将衬底(12)升高至约600℃,并且在衬底(12)上生长一层AlGaP(14)至预定厚度。 然后将AlGaP涂覆的光学基板(12)抛光至所需的平滑度。 然后使用RF化学气相沉积工艺或热蒸发工艺将抗反射膜(16)沉积在AlGaP层(14)上。