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1. 发明授权

US07166854B2 Uniformity control multiple tilt axes, rotating wafer and variable scan velocity 有权
标题翻译：均匀性控制多个倾斜轴，旋转晶片和可变扫描速度
公开(公告)号：US07166854B2
公开(公告)日：2007-01-23
申请号：US11021420
申请日：2004-12-23
申请人： Anthony Renau , Joseph C. Olson , Donna L. Smatlak , Jun Lu
发明人： Anthony Renau , Joseph C. Olson , Donna L. Smatlak , Jun Lu
IPC分类号： H01J37/08
CPC分类号： H01J37/3023 , H01J37/304 , H01J37/3171 , H01J2237/20214 , H01J2237/31703 , H01L21/265
摘要： A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially untuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan directions) of the target at variable or non-uniform scan velocities. The non-uniform scan velocities are dictated by a scan velocity profile that is generated based on the ion beam profile and/or the scan direction. The beam can be of any size, shape or tuning. A platen holding a wafer is rotated to a new desired rotationally-fixed orientation after a scan, and a subsequent scan occurs at the same scan velocity profile or a different scan velocity profile. Also included is a method, system and program product for conducting a uniform dose ion implantation in which the target is rotated and tilted about greater than one axes relative to the ion beam.
摘要翻译：公开了一种用于在离子注入期间增强剂量均匀性的系统，方法和程序产品。本发明旨在允许使用至少部分未经调制的离子束以可变或不均匀的扫描速度扫描靶的多个旋转固定取向（扫描方向）来获得均匀的注入。不均匀的扫描速度由基于离子束分布和/或扫描方向产生的扫描速度分布决定。光束可以是任何尺寸，形状或调谐。在扫描之后，保持晶片的压板旋转到新的期望的旋转固定取向，并且随后的扫描以相同的扫描速度分布或不同的扫描速度分布发生。还包括用于进行均匀剂量离子注入的方法，系统和程序产品，其中靶相对于离子束旋转并且倾斜大于大于一个轴。

2. 发明授权

US07161161B2 Uniformity control using multiple fixed wafer orientations and variable scan velocity 有权
标题翻译：使用多个固定晶片取向和可变扫描速度的均匀性控制
公开(公告)号：US07161161B2
公开(公告)日：2007-01-09
申请号：US11008764
申请日：2004-12-08
申请人： Anthony Renau , Joseph C. Olson , Donna L. Smatlak , Jun Lu
发明人： Anthony Renau , Joseph C. Olson , Donna L. Smatlak , Jun Lu
IPC分类号： G21K5/10
CPC分类号： H01J37/3023 , H01J37/304 , H01J37/3171 , H01J2237/20214 , H01J2237/31703 , H01L21/265
摘要： A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially un-tuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan directions) of the target at variable or non-uniform scan velocities. The non-uniform scan velocities are dictated by a scan velocity profile that is generated based on the ion beam profile and/or the scan direction. The beam can be of any size, shape or tuning. A platen holding a wafer is rotated to a new desired rotationally-fixed orientation after a scan, and a subsequent scan occurs at the same scan velocity profile or a different scan velocity profile. This technique may be used independently or in conjunction with other uniformity approaches to achieve the required level of uniformity.
摘要翻译：公开了一种用于在离子注入期间增强剂量均匀性的系统，方法和程序产品。本发明旨在允许使用至少部分未调谐的离子束通过以可变或不均匀的扫描速度以目标的多个旋转固定取向（扫描方向）扫描光束来获得均匀的注入。不均匀的扫描速度由基于离子束分布和/或扫描方向产生的扫描速度分布决定。光束可以是任何尺寸，形状或调谐。在扫描之后，保持晶片的压板旋转到新的期望的旋转固定取向，并且随后的扫描以相同的扫描速度分布或不同的扫描速度分布发生。该技术可以独立地使用或与其他均匀性方法结合使用以实现所需的均匀性水平。

3. 发明申请

US20050263721A1 Uniformity control using multiple tilt axes, rotating wafer and variable scan velocity 有权
标题翻译：使用多个倾斜轴，旋转晶片和可变扫描速度的均匀性控制
公开(公告)号：US20050263721A1
公开(公告)日：2005-12-01
申请号：US11021420
申请日：2004-12-23
申请人： Anthony Renau , Joseph Olson , Donna Smatlak , Jun Lu
发明人： Anthony Renau , Joseph Olson , Donna Smatlak , Jun Lu
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3023 , H01J37/304 , H01J37/3171 , H01J2237/20214 , H01J2237/31703 , H01L21/265
摘要： A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially untuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan directions) of the target at variable or non-uniform scan velocities. The non-uniform scan velocities are dictated by a scan velocity profile that is generated based on the ion beam profile and/or the scan direction. The beam can be of any size, shape or tuning. A platen holding a wafer is rotated to a new desired rotationally-fixed orientation after a scan, and a subsequent scan occurs at the same scan velocity profile or a different scan velocity profile. Also included is a method, system and program product for conducting a uniform dose ion implantation in which the target is rotated and tilted about greater than one axes relative to the ion beam.
摘要翻译：公开了一种用于在离子注入期间增强剂量均匀性的系统，方法和程序产品。本发明旨在允许使用至少部分未经调制的离子束以可变或不均匀的扫描速度扫描靶的多个旋转固定取向（扫描方向）来获得均匀的注入。不均匀的扫描速度由基于离子束分布和/或扫描方向产生的扫描速度分布决定。光束可以是任何尺寸，形状或调谐。在扫描之后，保持晶片的压板旋转到新的期望的旋转固定取向，并且随后的扫描以相同的扫描速度分布或不同的扫描速度分布发生。还包括用于进行均匀剂量离子注入的方法，系统和程序产品，其中靶相对于离子束旋转并且倾斜大于大于一个轴。

4. 发明申请

US20050258379A1 Uniformity control using multiple fixed wafer orientations and variable scan velocity 有权
标题翻译：使用多个固定晶片取向和可变扫描速度的均匀性控制
公开(公告)号：US20050258379A1
公开(公告)日：2005-11-24
申请号：US11008764
申请日：2004-12-08
申请人： Anthony Renau , Joseph Olson , Donna Smatlak , Jun Lu
发明人： Anthony Renau , Joseph Olson , Donna Smatlak , Jun Lu
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3023 , H01J37/304 , H01J37/3171 , H01J2237/20214 , H01J2237/31703 , H01L21/265
摘要： A system, method and program product for enhancing dose uniformity during ion implantation are disclosed. The present invention is directed to allowing the use of an at least partially un-tuned ion beam to obtain a uniform implant by scanning the beam in multiple rotationally-fixed orientations (scan directions) of the target at variable or non-uniform scan velocities. The non-uniform scan velocities are dictated by a scan velocity profile that is generated based on the ion beam profile and/or the scan direction. The beam can be of any size, shape or tuning. A platen holding a wafer is rotated to a new desired rotationally-fixed orientation after a scan, and a subsequent scan occurs at the same scan velocity profile or a different scan velocity profile. This technique may be used independently or in conjunction with other uniformity approaches to achieve the required level of uniformity.
摘要翻译：公开了一种用于在离子注入期间增强剂量均匀性的系统，方法和程序产品。本发明旨在允许使用至少部分未调谐的离子束通过以可变或不均匀的扫描速度以目标的多个旋转固定取向（扫描方向）扫描光束来获得均匀的注入。不均匀的扫描速度由基于离子束分布和/或扫描方向产生的扫描速度分布决定。光束可以是任何尺寸，形状或调谐。在扫描之后，保持晶片的压板旋转到新的期望的旋转固定取向，并且随后的扫描以相同的扫描速度分布或不同的扫描速度分布发生。该技术可以独立地使用或与其他均匀性方法结合使用以实现所需的均匀性水平。

5. 发明公开

US20230371749A1 Combination Condiment Shaker 审中-公开
公开(公告)号：US20230371749A1
公开(公告)日：2023-11-23
申请号：US18108007
申请日：2023-02-09
申请人： Jun Lu
发明人： Jun Lu
IPC分类号： A47J42/34
CPC分类号： A47J42/34
摘要： The present invention comprises a condiment shaker/crusher for crushing, holding and dispensing seasonings to add taste to edible food. The condiment shaker comprises a body member having an opening. The body member is made of a squeezable material and defines an interior space for holding the seasonings to be crushed and dispensed. A top is removably engaged about the opening of the body member.

6. 发明申请

US20190202179A1 POLY(VINYL ACETAL) RESIN COMPOSITIONS, LAYERS, AND INTERLAYERS HAVING ENHANCED OPTICAL PROPERTIES 审中-公开
公开(公告)号：US20190202179A1
公开(公告)日：2019-07-04
申请号：US16292923
申请日：2019-03-05
申请人： Jun Lu , Wenjie Chen , Curtis Schilling, III , John Joseph D'Errico , Weihong Cui
发明人： Jun Lu , Wenjie Chen , Curtis Schilling, III , John Joseph D'Errico , Weihong Cui
IPC分类号： B32B27/08 , B32B17/10 , C08L1/00 , B32B27/30
CPC分类号： B32B27/08 , B32B17/10761 , B32B27/22 , B32B27/30 , B32B27/306 , B32B27/36 , B32B2250/03 , B32B2250/246 , B32B2270/00 , B32B2307/412 , B32B2307/418 , B32B2307/558 , B32B2307/56 , B32B2307/732 , B32B2419/00 , B32B2457/12 , B32B2551/00 , B32B2571/02 , B32B2605/006 , B32B2607/02 , C08L1/00
摘要： Resin compositions, layers, and interlayers comprising two or more thermoplastic polymers and at least one RI balancing agent for adjusting the refractive index of at least one of the resins or layers is provided. Such compositions, layers, and interlayers exhibit enhanced optical properties while retaining other properties, such as impact resistance and acoustic performance.

7. 发明授权

US09399629B2 Process for the manufacture of 3-oxo-tetrahydrofuran 有权
标题翻译：制备3-氧代 - 四氢呋喃的方法
公开(公告)号：US09399629B2
公开(公告)日：2016-07-26
申请号：US14203666
申请日：2014-03-11
申请人： Lidong Xing , Weitong Dong , Jun Lu , Ulrich Scholz , Jun Yan , Jinsong Yang
发明人： Lidong Xing , Weitong Dong , Jun Lu , Ulrich Scholz , Jun Yan , Jinsong Yang
IPC分类号： C07D307/32 , C07D307/20 , C07D315/00
CPC分类号： C07D307/32 , C07D307/20
摘要： This invention relates to a novel method for the preparation of 3-oxo-tetrahydrofuran comprising oxidizing 3-hydroxy-tetrahydrofuran in the presence of a catalytic amount of 2,2,6,6-tetramethyl-piperidine-N-oxyl (TEMPO) with trichloroisocyanuric acid.
摘要翻译：本发明涉及一种制备3-氧代 - 四氢呋喃的新方法，其包括在催化量的2,2,6,6-四甲基 - 哌啶-N-氧基（TEMPO）存在下氧化3-羟基 - 四氢呋喃与三氯异氰脲酸。

8. 发明授权

US09367371B2 Widget framework, real-time service orchestration, and real-time resource aggregation 有权
标题翻译： Widget框架，实时服务编排和实时资源聚合
公开(公告)号：US09367371B2
公开(公告)日：2016-06-14
申请号：US12754564
申请日：2010-04-05
申请人： Bin Ni , Diego Lagunas , Jun Lu , Venu Reddy , Ramamurthy Kumar , Sami Ben Romdhane
发明人： Bin Ni , Diego Lagunas , Jun Lu , Venu Reddy , Ramamurthy Kumar , Sami Ben Romdhane
IPC分类号： G06F9/54 , G06F9/50 , G06F9/455 , G06F9/445 , H04L29/08
CPC分类号： G06F9/547 , G06F8/60 , H04L65/1063 , H04L67/04 , H04L67/1002
摘要： A method to optimize calls to a service by components of an application running on an application server is provided. The method includes receiving a first call and a second call, the first call made to a service by a first one of a plurality of components included in the application, and the second call made to the service by a second one of the plurality of components; selecting one of a plurality of optimizations, the plurality of optimizations including orchestrating the first call and the second call into a third call to the service; and, in response to the selecting of the orchestrating of the first call and the second call into the third call as the one of the plurality of optimizations, orchestrating the first call and the second call into the third call.
摘要翻译：提供了一种通过应用程序服务器上运行的应用程序的组件优化对服务的调用的方法。该方法包括接收第一呼叫和第二呼叫，由应用程序中包含的多个组件中的第一个组件进行的对服务的第一呼叫，以及由多个组件中的第二个组件对该服务进行的第二呼叫 ; 选择多个优化中的一个，所述多个优化包括将所述第一呼叫和所述第二呼叫协调为对所述服务的第三呼叫; 并且响应于将所述第一呼叫的协调选择和所述第三呼叫中的所述第二呼叫作为所述多个优化中的一个进行优化，将所述第一呼叫和所述第二呼叫编排到所述第三呼叫中。

9. 发明授权

US09326928B2 Thick cleaning composition 有权
标题翻译：厚的清洗组成
公开(公告)号：US09326928B2
公开(公告)日：2016-05-03
申请号：US13989007
申请日：2011-11-03
申请人： Haiyang Tong , Jun Lu , Anjian Hui
发明人： Haiyang Tong , Jun Lu , Anjian Hui
IPC分类号： A61K8/92 , A61K8/18 , A61Q19/00 , A61Q19/10 , A61K8/44 , A61K8/34 , A61K8/36 , A61K8/37 , A61Q5/02 , A61Q11/00 , A61Q90/00
CPC分类号： A61K8/442 , A61K8/342 , A61K8/361 , A61K8/37 , A61K8/44 , A61Q5/02 , A61Q11/00 , A61Q19/10 , A61Q90/00
摘要： A thick cleaning composition, comprising a long-chain fatty acyl acidic amino acid ester; a fatty compound of fatty acid, fatty alcohol, fatty alcohol ether or polyol fatty acid ester; a surfactant; a solvent composed of water, lower alcohol, polyol and polyol ether; and further comprising a beautifying and cleaning adjuvant for skin, eyes, teeth and hair. The cleaning composition can achieve satisfactory thick appearance when used for cleaning skin and hair, and maintain stable viscosity at different temperatures. In use, the composition can be easily daubed, and foams quickly with good foaming quality.
摘要翻译：一种厚的清洁组合物，其包含长链脂肪酰基酸性氨基酸酯; 脂肪酸，脂肪醇，脂肪醇醚或多元醇脂肪酸酯的脂肪族化合物; 表面活性剂; 由水，低级醇，多元醇和多元醇醚组成的溶剂; 并且还包括用于皮肤，眼睛，牙齿和头发的美化和清洁辅助剂。当用于清洁皮肤和头发时，清洁组合物可以获得令人满意的厚外观，并且在不同温度下保持稳定的粘度。在使用中，组合物可以容易地涂抹，并且具有良好的泡沫质量的泡沫。

10. 发明授权

US09214417B2 Combined packaged power semiconductor device 有权
标题翻译：组合封装功率半导体器件
公开(公告)号：US09214417B2
公开(公告)日：2015-12-15
申请号：US14186275
申请日：2014-02-21
申请人： Yueh-Se Ho , Hamza Yilmaz , Yan Xun Xue , Jun Lu
发明人： Yueh-Se Ho , Hamza Yilmaz , Yan Xun Xue , Jun Lu
IPC分类号： H01L23/495 , H01L27/088
CPC分类号： H01L23/49575 , H01L23/49503 , H01L23/49513 , H01L23/49524 , H01L23/49555 , H01L23/49558 , H01L23/49562 , H01L23/49568 , H01L24/36 , H01L24/37 , H01L24/40 , H01L24/41 , H01L24/48 , H01L24/49 , H01L27/088 , H01L2224/05554 , H01L2224/0603 , H01L2224/371 , H01L2224/40095 , H01L2224/40245 , H01L2224/48137 , H01L2224/48245 , H01L2224/48247 , H01L2224/48257 , H01L2224/49111 , H01L2224/49171 , H01L2224/73221 , H01L2224/8385 , H01L2224/8485 , H01L2924/00014 , H01L2924/13091 , H01L2924/181 , H01L2924/00012 , H01L2924/00 , H01L2224/45015 , H01L2924/207 , H01L2224/45099 , H01L2224/85399 , H01L2224/05599
摘要： A combined packaged power semiconductor device includes flipped top source low-side MOSFET electrically connected to top surface of a die paddle, first metal interconnection plate connecting between bottom drain of a high-side MOSFET or top source of a flipped high-side MOSFET to bottom drain of the low-side MOSFET, and second metal interconnection plate stacked on top of the high-side MOSFET chip. The high-side, low-side MOSFET and the IC controller can be packaged three-dimensionally reducing the overall size of semiconductor devices and can maximize the chip's size within a package of the same size and improves the performance of the semiconductor devices. The top source of flipped low-side MOSFET is connected to the top surface of the die paddle and thus is grounded through the exposed bottom surface of die paddle, which simplifies the shape of exposed bottom surface of the die paddle and maximizes the area to facilitate heat dissipation.
摘要翻译：组合封装的功率半导体器件包括电连接到管芯焊盘的顶表面的翻转顶部源极低侧MOSFET，第一金属互连板，将高边MOSFET的底部漏极或翻转的高侧MOSFET的顶部源极连接到底部低端MOSFET的漏极和堆叠在高边MOSFET芯片顶部的第二金属互连板。高侧，低端MOSFET和IC控制器可以三维封装，减小半导体器件的总体尺寸，并可在相同尺寸的封装内最大化芯片的尺寸，并提高半导体器件的性能。翻转的低侧MOSFET的顶部源极连接到管芯焊盘的顶表面，并且因此通过裸片的裸露的底表面接地，这简化了裸片焊盘的暴露的底面的形状，并使面积最大化散热。

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